Accéder directement au contenu

Corinne Duluard

34
Documents
Affiliations actuelles
  • 581146
  • 1001048
Identifiants chercheurs

Publications

Image document

Depopulation mechanisms of atomic hydrogen in the n=3 level following two-photon excitation by a picosecond laser

Corinne Y Duluard , Laurent Invernizzi , Khaled Hassouni , Guillaume Lombardi , Kristaq Gazeli
Plasma Sources Science and Technology, 2024, 33 (1), pp.015003. ⟨10.1088/1361-6595/ad10f1⟩
Article dans une revue hal-04312385v1
Image document

Peculiarities of measuring fluorescence decay times by a streak camera for ps-TALIF experiments in reactive plasmas

Laurent Invernizzi , C.Y. Duluard , Hans Höft , Khaled Hassouni , Guillaume Lombardi
Measurement Science and Technology, 2023, 34 (9), pp.095203. ⟨10.1088/1361-6501/acd8db⟩
Article dans une revue hal-03886543v2
Image document

Progresses on the Use of Two-Photon Absorption Laser Induced Fluorescence (TALIF) Diagnostics for Measuring Absolute Atomic Densities in Plasmas and Flames

Kristaq Gazeli , Guillaume Lombardi , Xavier Aubert , Corinne y Duluard , Swaminathan Prasanna
plasma, 2021, 4 (1), pp.145-171. ⟨10.3390/plasma4010009⟩
Article dans une revue hal-03358464v1
Image document

Picosecond two-photon absorption laser induced fluorescence (ps-TALIF) in krypton: the role of photoionization on the density depletion of the fluorescing state Kr 5p´[3/2]2

K. Gazeli , X Aubert , Swaminathan Prasanna , C. Duluard , G. Lombardi
Physics of Plasmas, 2021, 28 (4), ⟨10.1063/5.0041471⟩
Article dans une revue hal-03087285v2
Image document

Investigation of N(4S) kinetics during the transients of a strongly emissive pulsed ECR plasma using ns-TALIF

E Bisceglia , Swaminathan Prasanna , K. Gazeli , X. Aubert , C.Y. Duluard
Plasma Sources Science and Technology, In press, 30, pp.095001. ⟨10.1088/1361-6595/ac0da1⟩
Article dans une revue hal-03059103v3

Comparison of three optical diagnostic techniques for the measurement of boron atom density in a H 2 /B 2 H 6 microwave plasma

A. Aubert , C. Duluard , N. Sadeghi , A. Gicquel
Plasma Sources Science and Technology, 2017, 26 (11), ⟨10.1088/1361-6595/aa94d8⟩
Article dans une revue hal-01765999v1
Image document

Influence of ambient air on the flowing afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma

C.Y. Duluard , Thierry Dufour , J Hubert , F Reniers
Journal of Applied Physics, 2013, 113 (9), pp.093303. ⟨10.1063/1.4794324⟩
Article dans une revue hal-01303173v2
Image document

PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species

Thierry Dufour , Julie Hubert , Pascal Viville , C.Y. Duluard , Simon Desbief
Plasma Processes and Polymers, 2012, 9 (8), pp.820-829. ⟨10.1002/ppap.201100209⟩
Article dans une revue hal-01303165v2

Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , Jeremy Pereira , El-Houcine Oubensaid
Journal of Micromechanics and Microengineering, 2011, 21, pp.065015
Article dans une revue hal-00655003v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process

J. Pereira , L.E. Pichon , R. Dussart , Christophe Cardinaud , C.Y. Duluard
Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩
Article dans une revue hal-00432322v1

Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , B. Morillon , Mohamed Boufnichel
Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩
Article dans une revue hal-00413753v1

Neutral species in inductively coupled SF6/SiCl4 plasmas

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , El-Houcine Oubensaid , Jeremy Pereira
Journal of Physics D: Applied Physics, 2009, 42, pp.115206
Article dans une revue hal-00396438v1

Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , Jeremy Pereira , Mohamed Boufnichel
Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩
Article dans une revue hal-00400936v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Christophe Cardinaud , Corinne Y. Duluard
Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩
Article dans une revue hal-00365892v1

SO2 passivating chemistry for silicon cryogenic deep etching

Corinne Y. Duluard , Remi Dussart , Thomas Tillocher , Laurianne E. Pichon , Philippe Lefaucheux
Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩
Article dans une revue hal-00349344v1

Investigation of picosecond laser pulse properties using a streak camera and their utilization for TALIF studies in a microwave plasma torch

Dimitrios Stefas , Abdoulaye Constant Siby , Yanis Agha , Laurent Invernizzi , C.Y. Duluard
AIAA Science and Technology Forum and Exposition (AIAA SciTech Forum), Jan 2024, Orlando (Florida), United States. ⟨10.2514/6.2024-0806⟩
Communication dans un congrès hal-04230342v1

Characterization of a helium micro-plasma jet by means of ps-TALIF and a streak camera

Kristaq Gazeli , L Invernizzi , Charalambos Anastassiou , Joachim Franzke , Corinne y Duluard
Plasma Thin Film International Union Meeting (PLATHINIUM), Sep 2023, Antibes (France), France
Communication dans un congrès hal-04228751v1

Determination of absolute atomic hydrogen densities by TALIF in a H2/CH4 microwave plasma at high power and high pressure

M. Wartel , C. Duluard , X. Aubert , C. Rond , A. Gicquel
9th International Workshop Strong Microwaves and Terahertz Waves, Jul 2014, Volga river, Russia
Communication dans un congrès hal-01056888v1

Determination of absolute atomic hydrogen densities by Two-Photon Absorption Laser Induced Fluorescence in a H2/CH4 Microwave Plasma at High Pressure and High Microwave Power

M. Wartel , C. Duluard , X. Aubert , C. Rond , A. Gicquel
Gas Discharge 2014, Jul 2014, Orléans, France. pp.718-721
Communication dans un congrès hal-01056857v1

Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma

M. Wartel , C. Rond , N. Derkaoui , C. Duluard , A. Gicquel
The 10th Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands
Communication dans un congrès hal-01056898v1

Atomic Hydrogen density and temperature measurements by Two-Photon Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma

M. Wartel , C. Duluard , C. Rond , N. Derkaoui , A. Gicquel
The XXXI edition of the International Conference on Phenomena in Ionized Gases (ICPIG) 2013, Jul 2013, Grenade, Spain
Communication dans un congrès hal-01056903v1
Image document

Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma used for polymer surface treatment

C.Y. Duluard , Thierry Dufour , J Hubert , F Reniers
30th ICPIG, Aug 2011, Belfast, Ireland. pp.C.10
Communication dans un congrès hal-01303169v2

STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances

Jeremy Pereira , Hao Jiang , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard
Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium
Communication dans un congrès hal-00444370v1

A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching

Corinne Y. Duluard , Thomas Tillocher , Laurianne E. Pichon , Remi Dussart , Philippe Lefaucheux
AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States
Communication dans un congrès hal-00442683v1

Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard , El-Houcine Oubensaid
AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States
Communication dans un congrès hal-00444361v1

A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy

Corinne Y. Duluard , Remi Dussart , Laurianne E. Pichon , Philippe Lefaucheux , Michel Puech
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès hal-00444208v1

Cryoetching of silicon for MEMS and microelectronic components

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès hal-00442662v1

SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature

Remi Dussart , Laurianne E. Pichon , Corinne Y. Duluard , Philippe Lefaucheux , Mohamed Boufnichel
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Communication dans un congrès hal-00444198v1

Neutral production in SF6/SiCl4 inductively coupled plasmas

Corinne Y. Duluard , Remi Dussart , Laurianne E. Pichon , El-Houcine Oubensaid , Philippe Lefaucheux
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00444252v1

A robust passivation-enhanced cryogenic process used for deep silicon etching

Laurianne E. Pichon , El-Houcine Oubensaid , Corinne Y. Duluard , Remi Dussart , Philippe Lefaucheux
AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States
Communication dans un congrès hal-00444264v1

SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature

Laurianne E. Pichon , Corinne Y. Duluard , Thomas Tillocher , Remi Dussart , Philippe Lefaucheux
18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105
Communication dans un congrès hal-00444241v1

Enhanced robustness of the cryogenic process for silicon deep etching

Remi Dussart , Thomas Tillocher , El-Houcine Oubensaid , Philippe Lefaucheux , Pierre Ranson
Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark
Communication dans un congrès hal-00444248v1

A new generation of cryogenic processes for silicon deep etching

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00442668v1