MD
Maxime Darnon
8
Documents
Identifiants chercheurs
- maxime-darnon
- 0000-0002-6188-7157
- Google Scholar : https://scholar.google.fr/citations?user=ZRXEV4AAAAAJ&hl=fr
- IdRef : 124051758
Présentation
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Selective dry etching of TiN nanostructures over SiO2 nanotrenches using a Cl2/Ar/N2 inductively coupled plasmaJournal of Vacuum Science and Technology, 2016, 34 (2), ⟨10.1116/1.4936885⟩
Article dans une revue
hal-01701405v1
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Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistryMicroelectronic Engineering, 2015, 141, pp.68 - 71. ⟨10.1016/j.mee.2015.01.014⟩
Article dans une revue
hal-01916788v1
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Micro-Scale III-V/Ge Multijunction Solar Cell with Through Cell Via Contacts49th IEEE Photovoltaic Specialists Conference, Jun 2022, Philadelphia, United States
Communication dans un congrès
hal-03686951v1
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Micro-Scale III-V/GeMultijunction Solar Cell with Through Cell Via Contacts49th IEEE Photovoltaic Specialists Conference, Jun 2022, Philadelphia, United States
Communication dans un congrès
hal-03821787v1
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Patterning Platinum using BEOL industrially compatible processes; Chemical Mechanical Polishing vs. ICP Plasma etching44th International Conference on Micro and Nanoengineering, Sep 2019, Copenhage, Denmark
Communication dans un congrès
hal-03178730v1
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Patterning Platinum using CMP and plasma etching industrially compatible processes45th International Conference on Micro and Nano Engineering MNE, Aug 2019, Rhodes, Greece
Communication dans un congrès
hal-02320605v1
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Selective dry etching of titanium nitride nanostructures with chlorine-based inductively coupled plasma40th Micro and Nano Engineering Conference, Sep 2014, Lausanne, Switzerland
Communication dans un congrès
hal-02339986v1
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Inductively coupled plasma etching of ultra-shallow Si3N4 and SiO2 nanostructures40th Micro and Nano Engineering Conference, Sep 2014, Lausanne, Switzerland
Communication dans un congrès
hal-02339985v1
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