Accéder directement au contenu

Raphaël Ramos

63
Documents

Publications

Image document

Direct growth of carbon nanotubes forests on carbon fibers to replace microporous layers in proton exchange membrane fuel cells

Marie Fontana , Raphaël Ramos , Arnaud Morin , Jean Dijon
Carbon, 2021, 172, pp.762 - 771. ⟨10.1016/j.carbon.2020.10.049⟩
Article dans une revue hal-03493137v1
Image document

Investigation of Pt-Salt-Doped-Standalone-Multiwall Carbon Nanotubes for On-Chip Interconnect Applications

Jie Liang , Rongmei Chen , Raphaël Ramos , Jaeyoung Lee , Hanako Okuno
IEEE Transactions on Electron Devices, 2019, 66 (5), pp.2346-2352. ⟨10.1109/TED.2019.2901658⟩
Article dans une revue lirmm-02082869v1
Image document

Understanding Electromigration in Cu-CNT Composite Interconnects: A Multiscale Electrothermal Simulation Study

Jaehyun Lee , Salim Berrada , Fikru Adamu-Lema , Nicole Nagy , Vihar P. Georgiev
IEEE Transactions on Electron Devices, 2018, 65 (9), pp.3884-3892. ⟨10.1109/TED.2018.2853550⟩
Article dans une revue lirmm-01867729v1
Image document

Variability Study of MWCNT Local Interconnects Considering Defects and Contact Resistances - Part II: Impact of Charge Transfer Doping

Rongmei Chen , Jie Liang , Jaehyun Lee , Vihar P. Georgiev , Raphael Ramos
IEEE Transactions on Electron Devices, 2018, 65 (11), pp.4963-4970. ⟨10.1109/TED.2018.2868424⟩
Article dans une revue lirmm-01879940v1
Image document

Variability study of MWCNT local interconnects considering defects and contact resistances - Part I: pristine MWCNT

Rongmei Chen , Jie Liang , Jaehyun Lee , Vihar P. Georgiev , Raphael Ramos
IEEE Transactions on Electron Devices, 2018, 65 (11), pp.4955-4962. ⟨10.1109/TED.2018.2868421⟩
Article dans une revue lirmm-01879935v1

A Survey of Carbon Nanotube Interconnects for Energy Efficient Integrated Circuits

Aida Todri-Sanial , Raphael Ramos , Hanako Okuno , Jean Dijon , Abitha Dhavamani
IEEE Circuits and Systems Magazine -New Series-, 2017, 17 (2), pp.47-62. ⟨10.1109/MCAS.2017.2689538⟩
Article dans une revue lirmm-01795757v1

Enhanced ionic liquid mobility induced by confinement in 1D CNT membranes

Q. Berrod , F. Ferdeghini , P. Judeinstein , N. Genevaz , R. Ramos
Nanoscale, 2016, 8 (15), pp.7845-7848. ⟨10.1039/C6NR01445C⟩
Article dans une revue hal-02051297v1

No cytotoxicity or genotoxicity of graphene and graphene oxide in murine lung epithelial FE1 cells in vitro

Stefan Bengtson , Kirsten Kling , Anne Mette Madsen , Asger W. Noergaard , Nicklas Raun Jacobsen
Environmental and Molecular Mutagenesis, 2016, 57 (6), pp.469-482. ⟨10.1002/em.22017⟩
Article dans une revue cea-01849346v1

Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment

M. Brihoum , R. Ramos , K. Menguelti , G. Cunge , E. Pargon
Journal of Applied Physics, 2013, 113, pp.013302. ⟨10.1063/1.4773068⟩
Article dans une revue hal-00904412v1

Plasma treatments to improve Linewidth roughness during gate patterning

L. Azarnouche , E. Pargon , K. Menguelti , M. Fouchier , M. Brihoum
Proceedings of SPIE, the International Society for Optical Engineering, 2012, Vol. 8328, 83280H, 11pp
Article dans une revue hal-00808681v1

Radical surface interactions in industrial silicon plasma etch reactors

G. Cunge , D. Vempaire , R. Ramos , M. Touzeau , O. Joubert
Plasma Sources Science and Technology, 2010, 19, pp.4017. ⟨10.1088/0963-0252/19/3/034017⟩
Article dans une revue hal-01005939v1

Gas temperature measurement in HBr, Cl2, SF6, CF4 and O2 plasmas

G. Cunge , R. Ramos , D. Vempaire , M. Touzeau , M. Neijbauer
Journal of Vacuum Science and Technology, 2009, 27 (3), pp.471-478. ⟨10.1116/1.3106626⟩
Article dans une revue hal-00388592v1

Plasma reactor dry cleaning strategy after TaC, MoN, WSi, W and WN etching processes

R. Ramos , G. Cunge , O. Joubert , T. Lill
Journal of Vacuum Science and Technology, 2009, B 27, pp.113-120
Article dans une revue hal-00397116v1

Velocity distribution function of sputtered Ga atoms during inductively-coupled Ar plasma treatment of a GaAs surface

Emilie Despiau-Pujo , Pascal Chabert , R. Ramos , G. Cunge , N. Sadeghi
Journal of Vacuum Science & Technology A, 2009, 27, pp.356-361. ⟨10.1116/1.3081967⟩
Article dans une revue hal-00462482v1

Tungsten metal gate etching in Cl2/O2 inductively coupled high density plasmas

T. Morel , S. Barnola , R. Ramos , A. Beaurain , E. Pargon
Journal of Vacuum Science and Technology, 2008, pp.B 26, (2008), 1875-1882
Article dans une revue hal-00397097v1

Plasma reactor dry cleaning strategy after TiN, TaN and HfO2 etching processes

R. Ramos , G. Cunge , O. R. Joubert
Journal of Vacuum Science and Technology, 2008, pp.B 26 (1), (2008), 181-188
Article dans une revue hal-00397102v1

Measured velocity distribution of sputtered Al atoms perpendicularly and parallel to the target

R. Ramos , G. Cunge , M. Touzeau , N. Sadeghi
Journal of Physics D: Applied Physics, 2008, pp.41 (15), (2008), 152003
Article dans une revue hal-00397105v1

Absorption Spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperature of BCl molecule

R. Ramos , G. Cunge , M. Touzeau , N. Sadeghi
Journal of Physics D: Applied Physics, 2008, pp.41 (11), (2008), 115205
Article dans une revue hal-00397107v1

Influence of the reactor walls composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: II. During silicon etching

G. Cunge , N. Sadeghi , R. Ramos
Journal of Applied Physics, 2007, 102 (9), pp.102 093305. ⟨10.1063/1.2803881⟩
Article dans une revue hal-00384292v1

Influence of the reactor walls composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching

G. Cunge , N. Sadeghi , R. Ramos
Journal of Applied Physics, 2007, pp.102, (2007), 093304
Article dans une revue hal-00397074v1

Cleaning Aluminum Fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas

R. Ramos , G. Cunge , B. Pelissier , O. Joubert
Plasma Sources Science and Technology, 2007, pp.16, 711-715
Article dans une revue hal-00384274v1

Plasma/reactor walls interactions in advanced gate etching processes

R. Ramos , G. Cunge , O. Joubert , N. Sadeghi , M. Mori
Thin Solid Films, 2007, 515 (12), pp.4846-4852
Article dans une revue hal-00397069v1
Image document

On the interest of carbon-coated plasma reactor for advanced gate stack etching processes

R. Ramos , G. Cunge , O. Joubert
Journal of Vacuum Science and Technology, 2007, 25, pp.290-303. ⟨10.1116/1.2464126⟩
Article dans une revue hal-00397072v1

Etching mechanisms of HfO2, SiO2, and poly-Si substrates in BCl3 plasmas

E. Sungauer , E. Pargon , X. Mellhaoui , R. Ramos , G. Cunge
Journal of Vacuum Science and Technology, 2007, pp.B 25, (2007), 1640-1646
Article dans une revue hal-00397068v1

New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes

G. Cunge , B. Pelissier , O. Joubert , R. Ramos , C. Maurice
Plasma Sources Science and Technology, 2005, pp.14 599
Article dans une revue hal-00384291v1
Image document

Towards the industrialization of solid-state batteries: Impact of dry room exposure on sulfide-based solid electrolyte materials

Xavier Randrema , Ivan Leteyi Mfiban , Marine Soler , Sébastien Launois , Sébastien Diry
NordBatt 2022 - The 5th NordBatt conference, Oct 2022, Goteborg, Sweden
Communication dans un congrès cea-04049568v1

Etch process cleaning to improve wafer to wafer reproducibility

T. Chevolleau , C. Petit-Etienne , Gilles Cunge , Erwine Pargon , L. Vallier
ENRIS 2019 (European Nanofabrication Research Infrastructure Symposium), 2019, UNIVERSITY OF TWENTE, Netherlands
Communication dans un congrès hal-02624143v1
Image document

Progress on carbon nanotube BEOL interconnects

Benjamin Uhlig , Jie Liang , Lee Jaehyun , Raphael Ramos , Abitha Dhavamani
DATE 2018 - 21st Design, Automation and Test in Europe Conference and Exhibition, Mar 2018, Dresden, Germany. pp.937-942, ⟨10.23919/DATE.2018.8342144⟩
Communication dans un congrès lirmm-01880198v1

Challenges and Progress on Carbon Nanotube Integration for BEOL Interconnects

Benjamin Uhlig , Abitha Dhavamani , Nicole Nagy , Katharina Lilienthal , R. Liske
IITC: International Interconnect Technology Conference, Jun 2018, Santa Clara, United States. pp.16-18, ⟨10.1109/IITC.2018.8430411⟩
Communication dans un congrès lirmm-01880138v1

A physics-based investigation of Pt-salt doped carbon nanotubes for local interconnects

Jie Liang , Raphael Ramos , Jean Dijon , H. Okuno , D. Kalita
IEDM: International Electron Devices Meeting, Dec 2017, San Francisco, United States. ⟨10.1109/IEDM.2017.8268502⟩
Communication dans un congrès lirmm-01795777v1
Image document

The impact of vacancy defects on CNT interconnects: From statistical atomistic study to circuit simulations

Jaehyun Lee , Salim Berrada , Jie Liang , Toufik Sadi , Vihar Georgiev
SISPAD: Simulation of Semiconductor Processes and Devices, Sep 2017, Kamakura, Japan. pp.157-160, ⟨10.23919/SISPAD.2017.8085288⟩
Communication dans un congrès lirmm-01795799v1

On the origin of the line width roughness of photoresist patterns after plasma exposure

R. Ramos , M. Brihoum , K. Menguelti , L. Azarnouche , M. Fouchier
AVS 59th Symposium, Oct 2012, tampa, United States
Communication dans un congrès hal-00808675v1

Challenges related to linewidth roughness

Erwine Pargon , Laurent Azarnouch , Kevin Menguelti , Marc Fouchier , Melisa Brihoum
China Semiconductor Technology International Conference (CSTIC), Mar 2012, Shanghai, China
Communication dans un congrès hal-02338405v1

Challenges and future prospects in plasma etching processes

O. Joubert , E. Pargon , G. Cunge , Maxime Darnon , L. Vallier
3rd International Conference on PLAsma NanoTechnology and Science, Mar 2010, Nagoya,, Japan
Communication dans un congrès hal-00625378v1

Absorption spectroscopy for plasma diagnostics

G. Cunge , P. Bodart , D. Vempaire , R. Ramos , N. Sadeghi
3rd workshop on Plasma Etch and Strip in Microelectronics PESM2010, Mar 2010, Grenoble, France
Communication dans un congrès hal-00944938v1

Challenges and future prospects in plasma etching

G. Cunge , E. Pargon , O. R. Joubert , L. Vallier , T. Chevolleau
ISPlasma 2009, 2009, Nagoya, United States
Communication dans un congrès hal-00397853v1

Laser and LED based optical diagnostic techniques applied in industrial plasma etch reactors

N. Sadeghi , G. Cunge , D. Vempaire , M. Touzeau , R. Ramos
56th International AVS Symposium & Topical Conferences, 2009, San Jose, United States
Communication dans un congrès hal-00461002v1

Reaction mechanisms in industrial silicon plasma etch reactors

G. Cunge , D. Vempaire , N. Sadeghi , R. Ramos , M. Touzeau
XXIX International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2009, Cancun, Mexico
Communication dans un congrès hal-00460996v1

Gate Stack Patterning: challenges of the future

O. R. Joubert , E. Pargon , G. Cunge , T. Chevolleau , B. Pelissier
1st International Conference on Plasma-Nanotechnology & Science (IC-PLANTS), 2008, nagoya, Japan
Communication dans un congrès hal-00397778v1

The challenges in gate stack patterning for the next technological nodes

E. Pargon , T. Morel , E. Sungauer , A. Bazin , M. Martin
Gordon research conference, Plasma processing science,, 2008, United States
Communication dans un congrès hal-00397773v1

Velocity distribution of Al sputtered atoms in an ICP reactor by laser absorption and Laser Induced Fluorescence

R. Ramos , M. Touzeau , G. Cunge , N. Sadeghi
9th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and 21st Symposium on Plasma Science for Materials (SPSM), 2008, China
Communication dans un congrès hal-00398880v1

Spectroscopic investigation of plasma etching reactors

M. Touzeau , R. Ramos , D. Vempaire , G. Cunge , N. Sadeghi
VI Workshop em Fisica Molecular e Spectroscopia, 2008, Brazil
Communication dans un congrès hal-00397783v1

Physical and chemical reactions in Cl2 based etching plasmas: influence of plasma-surface interactions

G. Cunge , N. Sadeghi , D. Vempaire , M. Touzeau , R. Ramos
9th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and 21st Symposium on Plasma Science for Materials, Oct 2008, Huangshan, China
Communication dans un congrès hal-00944941v1

Physical and chemical reactions in chlorine based etching plasmas: influence of plasma-surface interactions

G. Cunge , N. Sadeghi , D. Vempaire , M. Touzeau , R. Ramos
9th Asia-Pacific Conference on Plasma Science and Technology (APCPST) and 21st Symposium on Plasma Science for Materials, 2008, China
Communication dans un congrès hal-00397781v1

Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase

E. Despiau-Pujo , P. Chabert , R. Ramos , G. Cunge , N. Sadeghi
55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States
Communication dans un congrès hal-00400658v1

Plasma etching challenges involved in gate stack patterning for 45 nm technological nodes and beyond

O. R. Joubert , E. Pargon , G. Cunge , T. Chevolleau , B. Pelissier
1st workshop on plasma etch and strip in microelectronic (PESM), 2007, Louvain, Belgium
Communication dans un congrès hal-00397771v1

Blue diode laser absorption spectroscopy of sputtered aluminium atoms

R. Ramos , M. Touzeau , G. Cunge , N. Sadeghi
Frontiers in Low Temperature Plasma Diagnostics VII,, 2007, United States
Communication dans un congrès hal-00398863v1

Interaction of Cl2 based plasmas with chamber walls in a silicon etching reactor

G. Cunge , N. Sadeghi , R. Ramos , O. R. Joubert , M. Touzeau
Frontiers in Low Temperature Plasma Diagnostics VII,, 2007, United Kingdom
Communication dans un congrès hal-00397769v1

Impact of reactor walls chemical composition on radicals' densities in the chlorine based silicon etching ICP plasmas

N. Sadeghi , G. Cunge , R. Ramos
18th International Symposium on Plasma Chemistry (ISPC), Aug 2007, Kyoto, Japan
Communication dans un congrès hal-00944971v1

Restoring the chamber walls surfaces of plasma reactors exposed to repeated fluorine-based plasma cleans

R. Ramos , G. Cunge , B. Pelissier , O. R. Joubert , T. Chevolleau
16th International Colloquium on Plasma processes (CIP), 2007, toulouse, France
Communication dans un congrès hal-00398865v1

Understanding the impact of chamber walls during plasma etching: a key to control plasma processes in ULSI

R. Ramos , G. Cunge , O. R. Joubert , M. Orlowski , T. Lill
53rd International AVS Symposium & Topical Conferences, 2006, san francisco, United States
Communication dans un congrès hal-00400472v1

Plasma etching challenges of new materials involved in gate stack patterning for sub 45nm technological node

O. R. Joubert , A. Le Gouil , R. Ramos , M. Helot , O. Luere
53rd International AVS Symposium & Topical Conferences, 2006, San Francisco, United States. ⟨10.1149/MA2006-01/8/367⟩
Communication dans un congrès hal-00397753v1

Impact of chamber walls on radicals densities in Cl2 ICP plasmas

G. Cunge , N. Sadeghi , R. Ramos , O. R. Joubert
53rd International AVS Symposium & Topical Conferences, 2006, san francisco, United States
Communication dans un congrès hal-00400475v1

Plasma etching challenges of new materials involved in gate stack patterning for sub-45 nm technological nodes

O. Joubert , A. Le Gouil , R. Ramos , M. Helot , G. Cunge
209th ECS meeting, Denver, May 2006, Denver, United States
Communication dans un congrès hal-00944953v1

Plasma Etching Challenges of New Materials Involved in Gate Stack Patterning for sub 45 nm Technological Nodes

O. R. Joubert , A. Le Gouil , R. Ramos , M. Helot , G. Cunge
Proceedings of the Electrochemical. Society (209th Meeting), 2006, denver, United States
Communication dans un congrès hal-00398859v1

Metal gate stack plasma patterning studies

L. Vallier , T. Chevolleau , O. R. Joubert , G. Cunge , A. Le Gouil
IEEE International Conference on Plasma Processes (ICOPS 06), 2006, traverse city, United States
Communication dans un congrès hal-00397763v1

Emerging Application of Fluorocarbon Plasmas for Integrated Circuits Fabrication

T. Chevolleau , G. Cunge , Maxime Darnon , R. Ramos , L. Vallier
8th International workshop on fluorocarbon plasma, 2006, autrans, France
Communication dans un congrès hal-00400476v1

Plasma/reactor wall interactions in gate etching processes

G. Cunge , R. Ramos , O. R. Joubert , N. Sadeghi , M. Mori
27th International symposium on dry process (DPS), 2005, jeju, South Korea
Communication dans un congrès hal-00397119v1

Innovative strategy to improve the stability of plasma etching processes

R. Ramos , G. Cunge , B. Pelissier , O. R. Joubert
52nd International AVS Symposium & Topical Conferences, 2005, boston, United States
Communication dans un congrès hal-00400466v1