Corinne Duluard

Identifiants chercheurs

IdHAL :

corinne-y-duluard

ORCID :

0000-0003-1773-6551

ResearcherID :

JCN-4766-2023

Publications

Article dans une revue (14)

Depopulation mechanisms of atomic hydrogen in the n=3 level following two-photon excitation by a picosecond laser Corinne Y Duluard,Laurent Invernizzi,Khaled Hassouni,Guillaume Lombardi,Kristaq Gazeliet al. Plasma Sources Science and Technology, 2024, 33 (1), pp.015003. ⟨10.1088/1361-6595/ad10f1⟩ Article dans une revue hal-04312385v1
Peculiarities of measuring fluorescence decay times by a streak camera for ps-TALIF experiments in reactive plasmas Laurent Invernizzi,C.Y. Duluard,Hans Höft,Khaled Hassouni,Guillaume Lombardiet al. Measurement Science and Technology, 2023, 34 (9), pp.095203. ⟨10.1088/1361-6501/acd8db⟩ Article dans une revue hal-03886543v2
Picosecond two-photon absorption laser induced fluorescence (ps-TALIF) in krypton: the role of photoionization on the density depletion of the fluorescing state Kr 5p´[3/2]2 K. Gazeli,X Aubert,Swaminathan Prasanna,C. Duluard,G. Lombardiet al. Physics of Plasmas, 2021, 28 (4), ⟨10.1063/5.0041471⟩ Article dans une revue hal-03087285v2
Progresses on the Use of Two-Photon Absorption Laser Induced Fluorescence (TALIF) Diagnostics for Measuring Absolute Atomic Densities in Plasmas and Flames Kristaq Gazeli,Guillaume Lombardi,Xavier Aubert,Corinne y Duluard,Swaminathan Prasannaet al. plasma, 2021, 4 (1), pp.145-171. ⟨10.3390/plasma4010009⟩ Article dans une revue hal-03358464v1
Investigation of N(4S) kinetics during the transients of a strongly emissive pulsed ECR plasma using ns-TALIF E Bisceglia,Swaminathan Prasanna,K. Gazeli,X. Aubert,C.Y. Duluardet al. Plasma Sources Science and Technology, In press, 30, pp.095001. ⟨10.1088/1361-6595/ac0da1⟩ Article dans une revue hal-03059103v3
Comparison of three optical diagnostic techniques for the measurement of boron atom density in a H 2 /B 2 H 6 microwave plasma A. Aubert,C. Duluard,N. Sadeghi,A. Gicquel Plasma Sources Science and Technology, 2017, 26 (11), ⟨10.1088/1361-6595/aa94d8⟩ Article dans une revue hal-01765999v1
Influence of ambient air on the flowing afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma C.Y. Duluard,Thierry Dufour,J Hubert,F Reniers Journal of Applied Physics, 2013, 113 (9), pp.093303. ⟨10.1063/1.4794324⟩ Article dans une revue hal-01303173v2
PTFE Surface Etching in the Post-discharge of a Scanning RF Plasma Torch: Evidence of Ejected Fluorinated Species Thierry Dufour,Julie Hubert,Pascal Viville,C.Y. Duluard,Simon Desbiefet al. Plasma Processes and Polymers, 2012, 9 (8), pp.820-829. ⟨10.1002/ppap.201100209⟩ Article dans une revue hal-01303165v2
Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching Corinne Y. Duluard,Pierre Ranson,Laurianne E. Pichon,Jeremy Pereira,El-Houcine Oubensaidet al. Journal of Micromechanics and Microengineering, 2011, 21, pp.065015 Article dans une revue hal-00655003v1
Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy El-Houcine Oubensaid,Corinne Y. Duluard,Laurianne E. Pichon,B. Morillon,Mohamed Boufnichelet al. Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩ Article dans une revue istex hal-00413753v1
Neutral species in inductively coupled SF6/SiCl4 plasmas Corinne Y. Duluard,Pierre Ranson,Laurianne E. Pichon,El-Houcine Oubensaid,Jeremy Pereiraet al. Journal of Physics D: Applied Physics, 2009, 42, pp.115206 Article dans une revue hal-00396438v1
In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process Jeremy Pereira,Laurianne E. Pichon,Remi Dussart,Christophe Cardinaud,Corinne Y. Duluardet al. Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩ Article dans une revue hal-00365892v1
Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching El-Houcine Oubensaid,Corinne Y. Duluard,Laurianne E. Pichon,Jeremy Pereira,Mohamed Boufnichelet al. Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩ Article dans une revue istex hal-00400936v1
SO2 passivating chemistry for silicon cryogenic deep etching Corinne Y. Duluard,Remi Dussart,Thomas Tillocher,Laurianne E. Pichon,Philippe Lefaucheuxet al. Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩ Article dans une revue istex hal-00349344v1

Communication dans un congrès (18)

Investigation of picosecond laser pulse properties using a streak camera and their utilization for TALIF studies in a microwave plasma torch Dimitrios Stefas,Abdoulaye Constant Siby,Yanis Agha,Laurent Invernizzi,C.Y. Duluardet al. AIAA Science and Technology Forum and Exposition (AIAA SciTech Forum), Jan 2024, Orlando (Florida), United States. ⟨10.2514/6.2024-0806⟩ Communication dans un congrès hal-04230342v1
Characterization of a helium micro-plasma jet by means of ps-TALIF and a streak camera Kristaq Gazeli,L Invernizzi,Charalambos Anastassiou,Joachim Franzke,Corinne y Duluardet al. Plasma Thin Film International Union Meeting (PLATHINIUM), Sep 2023, Antibes (France), France Communication dans un congrès hal-04228751v1
Determination of absolute atomic hydrogen densities by TALIF in a H2/CH4 microwave plasma at high power and high pressure M. Wartel,C. Duluard,X. Aubert,C. Rond,A. Gicquel 9th International Workshop Strong Microwaves and Terahertz Waves, Jul 2014, Volga river, Russia Communication dans un congrès hal-01056888v1
Determination of absolute atomic hydrogen densities by Two-Photon Absorption Laser Induced Fluorescence in a H2/CH4 Microwave Plasma at High Pressure and High Microwave Power M. Wartel,C. Duluard,X. Aubert,C. Rond,A. Gicquel Gas Discharge 2014, Jul 2014, Orléans, France. pp.718-721 Communication dans un congrès hal-01056857v1
Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma M. Wartel,C. Rond,N. Derkaoui,C. Duluard,A. Gicquel The 10th Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands Communication dans un congrès hal-01056898v1
Atomic Hydrogen density and temperature measurements by Two-Photon Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma M. Wartel,C. Duluard,C. Rond,N. Derkaoui,A. Gicquel The XXXI edition of the International Conference on Phenomena in Ionized Gases (ICPIG) 2013, Jul 2013, Grenade, Spain Communication dans un congrès hal-01056903v1
Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma used for polymer surface treatment C.Y. Duluard,Thierry Dufour,J Hubert,F Reniers 30th ICPIG, Aug 2011, Belfast, Ireland. pp.C.10 Communication dans un congrès hal-01303169v2
STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances Jeremy Pereira,Hao Jiang,Laurianne E. Pichon,Remi Dussart,Corinne Y. Duluardet al. Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium Communication dans un congrès hal-00444370v1
A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching Corinne Y. Duluard,Thomas Tillocher,Laurianne E. Pichon,Remi Dussart,Philippe Lefaucheuxet al. AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States Communication dans un congrès hal-00442683v1
Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge Jeremy Pereira,Laurianne E. Pichon,Remi Dussart,Corinne Y. Duluard,El-Houcine Oubensaidet al. AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States Communication dans un congrès hal-00444361v1
Cryoetching of silicon for MEMS and microelectronic components Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Laurianne E. Pichon,Corinne Y. Duluardet al. 16th International Colloquium on Plasma Processes, Jun 2007, France Communication dans un congrès hal-00442662v1
SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature Laurianne E. Pichon,Corinne Y. Duluard,Thomas Tillocher,Remi Dussart,Philippe Lefaucheuxet al. 18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105 Communication dans un congrès hal-00444241v1
Enhanced robustness of the cryogenic process for silicon deep etching Remi Dussart,Thomas Tillocher,El-Houcine Oubensaid,Philippe Lefaucheux,Pierre Ransonet al. Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark Communication dans un congrès hal-00444248v1
A robust passivation-enhanced cryogenic process used for deep silicon etching Laurianne E. Pichon,El-Houcine Oubensaid,Corinne Y. Duluard,Remi Dussart,Philippe Lefaucheuxet al. AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States Communication dans un congrès hal-00444264v1
A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy Corinne Y. Duluard,Remi Dussart,Laurianne E. Pichon,Philippe Lefaucheux,Michel Puechet al. 16th International Colloquium on Plasma Processes, Jun 2007, France Communication dans un congrès hal-00444208v1
A new generation of cryogenic processes for silicon deep etching Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Laurianne E. Pichon,Corinne Y. Duluardet al. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00442668v1
SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature Remi Dussart,Laurianne E. Pichon,Corinne Y. Duluard,Philippe Lefaucheux,Mohamed Boufnichelet al. 16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France Communication dans un congrès hal-00444198v1
Neutral production in SF6/SiCl4 inductively coupled plasmas Corinne Y. Duluard,Remi Dussart,Laurianne E. Pichon,El-Houcine Oubensaid,Philippe Lefaucheuxet al. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00444252v1

Thèse (1)

Etude de nouvelles voies de passivation non polymérisante pour la gravure profonde du silicium Corinne Y. Duluard Physique [physics]. Université d'Orléans, 2009. Français. ⟨NNT : ⟩ Thèse tel-00413276v1