Emilie Despiau-Pujo

Publications

Article dans une revue (22)

Cryogenic cyclical etching of Si using CF$_4$ plasma passivation steps: The role of CF radicals Jack Nos,Sylvain Iséni,Martin Kogelschatz,Gilles Cunge,Philippe Lefaucheuxet al. Applied Physics Letters, 2025, Featured Collection, 126 (3), pp.031602. ⟨10.1063/5.0245217⟩ Article dans une revue hal-04905588v1
Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry Pierre Ducluzaux,Delia Ristoiu,Gilles Cunge,Emilie Despiau-Pujo Journal of Vacuum Science & Technology A, 2024, 42 (1), ⟨10.1116/6.0003291⟩ Article dans une revue hal-04509400v1
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective Kenji Ishikawa,Tatsuo Ishijima,Tatsuru Shirafuji,Silvia Armini,Emilie Despiau-Pujoet al. Japanese Journal of Applied Physics, 2019, 58 (SE), pp.SE0801. ⟨10.7567/1347-4065/ab163e⟩ Article dans une revue hal-02337524v1
Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas V. Martirosyan,O. Joubert,E. Despiau-Pujo Journal of Physics D: Applied Physics, 2019, 52 (055204), ⟨10.1088/1361-6463/aaefe0⟩ Article dans une revue hal-01954910v1
Helium plasma modification of Si and Si 3 N 4 thin films for advanced etch processes Vahagn Martirosyan,Emilie Despiau-Pujo,Jérôme Dubois,Gilles Cunge,Olivier Joubert Journal of Vacuum Science & Technology A, 2018, 36 (4), pp.041301. ⟨10.1116/1.5025152⟩ Article dans une revue hal-01947862v1
H + ion-induced damage and etching of multilayer graphene in H 2 plasmas A. Davydova,E. Despiau-Pujo,G. Cunge,D. Graves Journal of Applied Physics, 2017, 121 (13), ⟨10.1063/1.4979023⟩ Article dans une revue hal-01891243v1
Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas G. Cunge,Maxime Darnon,J Dubois,P. Bézard,O Moureyet al. Applied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩ Article dans une revue hal-01865123v1
Cleaning graphene: A first quantum/classical molecular dynamics approach L. Delfour,A. Davydova,E. Despiau-Pujo,G. Cunge,D. Graveset al. Journal of Applied Physics, 2016, 119 (12), pp.125309. ⟨10.1063/1.4945034⟩ Article dans une revue hal-01881977v1
Roughness generation during Si etching in Cl 2 pulsed plasma Odile Mourey,Camille Petit-Etienne,Gilles Cunge,Maxime Darnon,Emilie Despiau-Pujoet al. Journal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩ Article dans une revue hal-01881982v1
Key plasma parameters for nanometric precision etching of Si films in chlorine discharges P. Brichon,E. Despiau-Pujo,O. Mourey,O. Joubert Journal of Physics D: Applied Physics, 2015, pp.118, 053303 Article dans une revue hal-01878054v1
Hydrogen plasmas processing of graphene surfaces E. Despiau-Pujo,A. Davydova,G. Cunge,D.B. Graves Plasma Chemistry and Plasma Processing, 2015, 36 (1), pp.213-229. ⟨10.1007/s11090-015-9683-0⟩ Article dans une revue hal-01878016v1
Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experiments Emilie Despiau-Pujo,Melisa Brihoum,Paul Bodart,M Darnon,Gilles Cunge Journal of Physics D: Applied Physics, 2014, 47 (45), pp.16276 - 16282. ⟨10.1088/0022-3727/47/45/455201⟩ Article dans une revue hal-01798618v1
MD simulations of low energy Clx+ ions interaction with ultrathin silicon layers for advanced etch processes P. Brichon,E. Despiau-Pujo,O. Joubert Journal of Vacuum Science and Technology, 2014, A32, pp.021301 Article dans une revue hal-00904425v1
Elementary processes of H2 plasma-graphene interaction: A combined molecular dynamics and density functional theory study E. Despiau-Pujo,A. Davydova,G. Cunge,Laure Delfour,Laurence Magaudet al. Journal of Applied Physics, 2013, 113 (11), pp.114302. ⟨10.1063/1.4794375⟩ Article dans une revue hal-00992709v1
2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments Emilie Despiau-Pujo,Gilles Cunge,Nader Sadeghi,N. St. J. Braithwaite American Physical Society, 2012, pp.2003 Article dans une revue hal-01006016v1
MD simulations of GaN sputtering by Ar&lt;SUP&gt;+&lt;/SUP&gt; ions : Ion-induced damage and near-surface modification under continuous bombardment Emilie Despiau-Pujo,Pascal Chabert Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1105. ⟨10.1116/1.3460904⟩ Article dans une revue hal-01549488v1
Simulations of radical and ion fluxes on wafer in a Cl&lt;SUB&gt;2&lt;/SUB&gt;/Ar ICP discharge : Confrontation with GaAs and GaN etch experiments Emilie Despiau-Pujo,Pascal Chabert,S. Bansropun,D. Thenot,P. Plouhinecet al. Journal of Vacuum Science and Technology, 2010, 28 (4), pp.693. ⟨10.1116/1.3437492⟩ Article dans une revue hal-01549482v1
Low energy Ar&lt;SUP&gt;+&lt;/SUP&gt; bombardment of GaN surfaces : A statistical study of ion reflection and sputtering Emilie Despiau-Pujo,Pascal Chabert Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1263. ⟨10.1116/1.3480344⟩ Article dans une revue hal-01549491v1
Global model of instabilities in low pressure inductive chlorine discharges Emilie Despiau-Pujo,Pascal Chabert Plasma Sources Science and Technology, 2009, 18, pp.045028. ⟨10.1088/0963-0252/18/4/045028⟩ Article dans une revue istex hal-00462483v1
Velocity distribution function of sputtered Ga atoms during inductively-coupled Ar plasma treatment of a GaAs surface Emilie Despiau-Pujo,Pascal Chabert,R. Ramos,G. Cunge,N. Sadeghi Journal of Vacuum Science & Technology A, 2009, 27, pp.356-361. ⟨10.1116/1.3081967⟩ Article dans une revue hal-00462482v1
Comparison between fluid simulations and experiments in inductively coupled argon/chlorine plasmas C.S. Corr,E. Despiau-Pujo,Pascal Chabert,W.G. Graham,F.G. Marroet al. Journal of Physics D: Applied Physics, 2008, 41, pp.185202. ⟨10.1088/0022-3727/41/18/185202⟩ Article dans une revue istex hal-00462480v1
Molecular dynamics simulations of GaAs sputtering under low energy argon ion bombardment E. Despiau-Pujo,Pascal Chabert,D.B. Graves Journal of Vacuum Science & Technology A, 2008, 26, pp.274. ⟨10.1116/1.2836408⟩ Article dans une revue hal-00462479v1

Communication dans un congrès (79)

Atomic Layer Etching of SiO&lt;sub&gt;2&lt;/sub&gt; using CF&lt;sub&gt;4&lt;/sub&gt; plasma in deposition mode at cryogenic temperature Madjib Adjabi,Jack Nos,Sylvain Iséni,Gilles Cunge,Martin Kogelschatzet al. PLAsma THIN film International Union Meeting 2025 (PLATHINIUM 2025), Sep 2025, Antibes (France), France Communication dans un congrès hal-05325597v1
UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF&lt;sub&gt;4&lt;/sub&gt; plasmas Martin Kogelschatz,Jack Nos,Sylvain Iséni,Gilles Cunge,Philippe Lefaucheuxet al. Journées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France Communication dans un congrès hal-05325839v1
Cryogenic ALE of SiO&lt;sub&gt;2&lt;/sub&gt; using CF&lt;sub&gt;4&lt;/sub&gt; plasma Madjib Adjabi,Jack Nos,Sylvain Iséni,Gilles Cunge,Martin Kogelschatzet al. AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025), Jun 2025, Jeju Island (South Korea), South Korea Communication dans un congrès hal-05325605v1
Cryogenic bosch process using CF&lt;sub&gt;4&lt;/sub&gt; plasma in deposition regime Thomas Tillocher,Jack Nos,Sylvain Iséni,Gilles Cunge,Martin Kogelschatzet al. The International Plasma Technology Joint Conference 2025 (IPTJC2025), Jun 2025, New Taipei City - Taiwan, Taiwan Communication dans un congrès hal-05325733v1
Elementary surface reactions during F- and CF- based plasma cryoetching of Si and SiO2: a molecular dynamics study J. Romero Cedillo,Gilles Cunge,Emilie Despiau-Pujo 14th Workshop on Plasma Etch Strip in Microelectronics (PESM), Jun 2024, Leuven (BE), Belgium Communication dans un congrès hal-05575606v1
Mécanismes de l’interaction plasma-surface : Quid de la modélisation ? Emilie Despiau-Pujo 17èmes Journées d’échanges du Réseau Plasmas Froids, Oct 2024, Carry-le-rouet, France Communication dans un congrès hal-05460022v1
Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ? Emilie Despiau-Pujo 2èmes Journées du GDR EMILI, Oct 2023, NANCY, France Communication dans un congrès hal-04509431v1
Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process F. Pinzan,C. Petit-Etienne,F. Leverd,E. Despiau-Pujo 41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan Communication dans un congrès hal-02337577v1
Molecular dynamics simulations for a better understanding of plasma-surface interactions E. Despiau-Pujo,A. Davydova,V. Martirosyan,Db Graves,G. Cungeet al. 34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan Communication dans un congrès hal-02337568v1
Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching process F. Pinzan,R. Blanc,F. Leverd,E. Despiau-Pujo Plasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France Communication dans un congrès hal-02337587v1
A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching Emilie Despiau-Pujo 66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States Communication dans un congrès hal-02337554v1
Towards selective etching with nanometric control using remote plasma source E. Pargon,V. Renaud,C. Petit-Etienne,F. Pinzan,E. Despiau-Pujoet al. 236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States Communication dans un congrès hal-02324706v1
Plasma solutions for atomic-precision etching: From atomistic simulations to experiments E. Despiau-Pujo,P. Brichon,V. Martirosyan,J. Dubois,G. Cungeet al. 40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan Communication dans un congrès hal-01954916v1
Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processes F Pinzan,F. Leverd,E. Despiau-Pujo AVS 65th International Symposium, Oct 2018, Long Beach, United States Communication dans un congrès hal-01954929v1
Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments E. Despiau-Pujo,P. Brichon,V. Martirosyan,J. Dubois,G. Cungeet al. 40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan Communication dans un congrès hal-01942798v1
Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch Processes V. Martirosyan,E. Despiau-Pujo,O. Joubert AVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States Communication dans un congrès hal-01929202v1
New trends in Plasma Technologies O. Joubert,G. Cunge,E. Pargon,L. Vallier,E. Despiau-Pujoet al. 43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal Communication dans un congrès hal-01891286v1
Ultra-high selective etching in remote plasmas: application to smart etch processes G. Cunge.,C Petit−etienne.,L Vallier.,J Dubois.,R Soriano.et al. PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium Communication dans un congrès hal-01891297v1
Towards atomic scale control of plasma processes: application to graphene G. Cunge,H. Mehedi,F. Djawhar,H. Okuno,A. Davydovaet al. The 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan Communication dans un congrès hal-01891303v1
Atomic-scale simulations of low-damage plasma etching processes E. Despiau-Pujo,P. Brichon,V. Martirosyan,J. Dubois,G. Cungeet al. 82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan Communication dans un congrès hal-01891290v1
Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-films E. Despiau-Pujo,V. Martirosyan,O. Joubert AVS 63nd International Symposium, Nov 2016, Nashville, United States Communication dans un congrès hal-01882917v1
Atomistic simulations of He plasma modification of Si thin-films for advanced etch processes V. Martirosyan,E. Despiau-Pujo,O. Joubert Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France Communication dans un congrès hal-01882933v1
Ion-induced damage and etching in reactive plasmas: Modelling and experimental support E. Despiau-Pujo,P. Brichon,V. Martirosyan,O. Joubert 1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France Communication dans un congrès hal-01882808v1
ICP plasmas treatment of 2D materials: example of graphene G. Cunge,D. Ferrah,D Marinov,J Zapatas,C. Petit-Etienneet al. Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France Communication dans un congrès hal-01882928v1
Plasma solutions for nanometric-precision etching: insights from MD simulations E. Despiau-Pujo,P. Brichon,V. Martirosyan,O. Joubert Plasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France Communication dans un congrès hal-01882912v1
Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes V. Martirosyan,E. Despiau-Pujo,O Joubert AVS 63nd International Symposium, Nov 2016, Nashville, United States Communication dans un congrès hal-01882922v1
H2 Plasma Interaction with CVD Graphene G. Cunge,D. Ferrah,D Marinov,J Zapatas,E. Despiau-Pujoet al. AVS 63nd International Symposium, Nov 2016, Nashville, United States Communication dans un congrès hal-01882915v1
Roughness generation during Si etching in Cl2 pulsed plasmas Odile Mourey,Camille Petit-Etienne,Gilles Cunge,Maxime Darnon,Emilie Despiau-Pujoet al. Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France Communication dans un congrès hal-02339971v1
RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas G. Cunge.,M. Darnon.,J Dubois.,P Bezard.,O Mourey.et al. Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France Communication dans un congrès hal-01878109v1
Plasma processing of graphene surfaces E. Despiau-Pujo,A. Davydova,G. Cunge,Db Graves Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom Communication dans un congrès hal-01877980v1
Plasmas interaction with graphene surfaces E. Despiau-Pujo,A. Davydova,G. Cunge,Db Graves 22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium Communication dans un congrès hal-01877972v1
Plasmas interaction with graphene surfaces E. Despiau-Pujo,A. Davydova,G. Cunge,D.B. Graves Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom Communication dans un congrès hal-01878411v1
Measuring IVDF through high−aspect holes in pulsed ICP plasmas G. Cunge.,M. Darnon.,J Dubois.,P Bezard.,O Mourey.et al. 68th GEC / ICRP−9, Oct 2015, Honolulu, United States Communication dans un congrès hal-01878113v1
Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments E. Despiau-Pujo,G. Cunge,M Darnon,N. Sadeghi,N Braithwaite 68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States Communication dans un congrès hal-01878115v1
Molecular dynamics simulations of plasma-surface interactions for advanced etch processes E. Despiau-Pujo,P. Brichon,O. Joubert 42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal Communication dans un congrès hal-01877976v1
Measuring IVDF through high-aspect holes in pulsed ICP plasma G. Cunge,M Darnon,J Dubois,P. Bézard,O. Moureyet al. 68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States Communication dans un congrès hal-01878046v1
Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions P. Brichon,E. Despiau-Pujo,O. Mourey,G. Cunge,O. Joubert AVS 62nd International Symposium, Oct 2015, San José, United States Communication dans un congrès hal-01878118v1
Potential Solutions for Atomic Precision Etching O. Joubert,E. Despiau-Pujo,G. Cunge,L. Vallier,J Duboiset al. AVS 62nd International Symposium, Oct 2015, San José, United States Communication dans un congrès hal-01877989v1
Potential Solutions for Atomic Precision Etching O. Joubert,E. Despiau-Pujo,G. Cunge,P. Brichon,J Duboiset al. SPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States Communication dans un congrès hal-01878051v1
Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations? L. Delfour,A. Davydova,E. Despiau-Pujo,G. Cunge,Db Graveset al. European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten Croatia Communication dans un congrès hal-01798516v1
Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma Odile Mourey,C. Petit-Etienne,G. Cunge,M. Darnon,E. Despiau-Pujoet al. AVS 2014, , 2014, Baltimore, United States Communication dans un congrès hal-01798348v1
Pulsed ICP plasmas processing: 0D Model vs. Experiments E. Despiau-Pujo,M. Brihoum,G. Cunge,M Darnon,N Braithwaiteet al. Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France Communication dans un congrès hal-01798532v1
Hydrogen plasmas processing of graphene E. Despiau-Pujo,A. Davydova,G. Cunge,L. Magaud,Db Graves 61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States Communication dans un congrès hal-01798382v1
MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes P. Brichon,E. Despiau-Pujo,O Mourey,C. Petit-Etienne,M Darnonet al. 2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States Communication dans un congrès hal-01798393v1
Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. Experiments E. Despiau-Pujo,M. Brihoum,G. Cunge,M Darnon,N Braithwaiteet al. Plasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France Communication dans un congrès hal-01798407v1
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes. P. Brichon,E. Despiau-Pujo,O Mourey,C. Petit-Etienne,G. Cungeet al. Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France Communication dans un congrès hal-01798524v1
Producing ion waves from acoustic pressure waves in pulsed inductive plasmas Emilie Despiau-Pujo,Gilles Cunge,Maxime Darnon,Nader Sadeghi,Nicholas Braithwaite Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France Communication dans un congrès hal-01798411v1
Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor Nader Sadeghi,Gilles Cunge,Maxime Darnon,Emilie Despiau-Pujo,Nicholas St J Braithwaite 1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey Communication dans un congrès hal-02338122v1
MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes” P. Brichon,E. Despiau-Pujo,O Mourey,C. Petit-Etienne,G. Cungeet al. Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France Communication dans un congrès hal-01798396v1
Molecular Dynamics simulations of hydrogen plasma-graphene interaction A. Davydova,E. Despiau-Pujo,G. Cunge,L. Magaud,L. Delfouret al. Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France Communication dans un congrès hal-01798403v1
Pulsed Plasmas for etching in micro and nanoelectronics Maxime Darnon,Gilles Cunge,Camille Petit-Etienne,Moritz Haass,Paul Bodartet al. Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland Communication dans un congrès hal-02338129v1
Molecular Dynamics simulations of hydrogen plasma – graphene interaction A. Davydova,E. Despiau-Pujo,G. Cunge,L. Magaud,L. Delfouret al. Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France Communication dans un congrès hal-01798558v1
Potential Solutions for Atomic Precision Etching O. Joubert,E. Despiau-Pujo,G. Cunge,L. Vallier,P. Brichonet al. Sematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States Communication dans un congrès hal-01798418v1
MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes P. Brichon,E. Despiau-Pujo,G. Cunge,Maxime Darnon,O. Joubert American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States Communication dans un congrès hal-00904431v1
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes P. Brichon,E. Despiau-Pujo,G. Cunge,Maxime Darnon,O. Joubert AVS 2013, Oct 2013, Long beach, United States Communication dans un congrès hal-00919179v1
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes Gilles Cunge,Maxime Darnon,Camille Petit-Etienne,Paulin Brichon,Romuald Blancet al. 11th Technological Plasma Workshop, Dec 2013, York, United Kingdom Communication dans un congrès hal-02338133v1
Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching G. Cunge,M. Brihoum,Maxime Darnon,E. Despiau-Pujo,A. Davydovaet al. American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States Communication dans un congrès hal-00904432v1
Pulsed plasma processing: A combined modelling and experimental study E. Despiau-Pujo,M. Brihoum,G. Cunge,Maxime Darnon,N. Braithwaiteet al. 31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain Communication dans un congrès hal-00904428v1
Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments E. Despiau-Pujo,M. Brihoum,G. Cunge,Maxime Darnon,N.S. Braithwaiteet al. 4th Workshop on Radio Frequency Discharges, May 2013, giens, France Communication dans un congrès hal-00860934v1
Pulsed plasmas for etching at the nanoscale Maxime Darnon,G. Cunge,C. Petit Etienne,E. Pargon,L. Vallieret al. Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France Communication dans un congrès hal-00860922v1
Pulsed ICP plasmas processing : A combined modelling and experimental study E. Despiau-Pujo,M. Brihoum,G. Cunge,Maxime Darnon,N.S. Braithwaiteet al. 31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain Communication dans un congrès hal-00925794v1
Pulsed plasmas for etching in microelectronics Maxime Darnon,G. Cunge,C. Petit-Etienne,M. Haass,P. Bodartet al. Journées du réseau plasma froids, 2013, La Rochelle, France Communication dans un congrès hal-00925769v1
MD simulations of H2 plasma-graphene interactions E. Despiau-Pujo,A. Davydova,G. Cunge,L. Delfour,L. Magaudet al. Plasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium Communication dans un congrès hal-00860933v1
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes G. Cunge,Maxime Darnon,M. Brihoum,E. Despiau-Pujo,A. Davydovaet al. AVS 60h international symposium, Oct 2013, Long Beach, United States Communication dans un congrès hal-00925763v1
Molecular Dynamics Simulations for Hydrogen Plasma Processing of Graphene A. Davydova,E. Despiau-Pujo,G. Cunge,D.B. Graves,L. Delfouret al. American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States Communication dans un congrès hal-00904430v1
Molecular Dynamics Simulation for Hydrogen Plasma Processing of Graphene A. Davydova,E. Despiau-Pujo,G. Cunge,D.B. Graves,L. Delfouret al. AVS 60th International Symposium, Oct 2013, Long Beach, United States Communication dans un congrès hal-00925810v1
Time resolved ion flux measurement in pulsed ICP plasmas G. Cunge,Maxime Darnon,N. Braithwaite,E. Despiau-Pujo,P. Bodartet al. Tampa, Oct 2012, Tampa, United States Communication dans un congrès hal-00762123v1
2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments E. Despiau-Pujo,G. Cunge,N. Sadeghi,N.St.J. Braithwaite 65th GEC, Oct 2012, Austin, United States Communication dans un congrès hal-00762116v1
MD simulations of hydrogen plasma interaction with graphene surfaces D.B. Graves,E. Despiau-Pujo,A. Davydova,G. Cunge,L. Magaud 65th GEC, Oct 2012, Austin, United States Communication dans un congrès hal-00762119v1
2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments E. Despiau-Pujo,G. Cunge,N. Sadeghi,N.St.J. Braithwaite 65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States Communication dans un congrès hal-00925814v1
Molecular dynamics simulations of hydrogen plasma interaction with graphene E. Despiau-Pujo 11th APCPST, Oct 2012, Kyoto, Japan Communication dans un congrès hal-00762110v1
MD simulations of hydrogen plasma interaction with graphene surface E. Despiau-Pujo,A. Davydova,G. Cunge,L. Magaud,D.B. Graves AVS 59th Symposium, Oct 2012, Tampa, United States Communication dans un congrès hal-00808676v1
Molecular dynamics simulations of hydrogen plasmas interaction with graphene E. Despiau-Pujo,A. Davydova,G. Cunge,Db. Graves 11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan Communication dans un congrès hal-00925797v1
PECVD of GeTe for next generation of non volatile memory Corentin Vallée,L. Dussault,E. Despiau-Pujo,E. Gourvest,D. Jourdeet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France Communication dans un congrès hal-00925819v1
PE-MOCVD of GeTe material for Phase Change Memory E. Despiau-Pujo,L. Dussault,Corentin Vallée,E. Gourvest,D. Jourdeet al. 58th National Symposium AVS, Oct 2011, Nashville, United States Communication dans un congrès hal-00650192v1
PE-MOCVD of GeTe materials for Phase Change Memory Applications E. Despiau-Pujo,L. Dussault,Corentin Vallée,E. Gourvest,D. Jourdeet al. AVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States Communication dans un congrès hal-00925816v1
Modelling of chlorine inductive discharges Pascal Chabert,Emilie Despiau-Pujo 25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia Communication dans un congrès hal-02573325v1
Modelling of chlorine inductive discharges Pascal Chabert,Emilie Despiau-Pujo International Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan Communication dans un congrès hal-02573326v1
Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase E. Despiau-Pujo,P. Chabert,R. Ramos,G. Cunge,N. Sadeghi 55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States Communication dans un congrès hal-00400658v1

Poster de conférence (5)

SF6- and CF-based plasmas interaction with Si and SiO2 at room and cryogenic temperature: Insights from molecular dynamics simulation J. Romero Cedillo,Gilles Cunge,Emilie Despiau-Pujo 70th American Vacuum Society (AVS) International Symposium, Nov 2024, Tampa (FL), United States Poster de conférence hal-05575624v1
Plasma inductif en Cl&lt;SUB&gt;2&lt;/SUB&gt;/Ar : comparaison entre simulations hybrides et expériences Rodolphe Sarot,Emilie Despiau-Pujo,Pascal Chabert,Jean-Paul Booth,L. Gatilovaet al. Congres de la Division Plasma du SFP, May 2010, Bordeaux, France. 2010 Poster de conférence hal-02611278v1
Electron densities and temperatures in a Cl&lt;SUB&gt;2&lt;/SUB&gt;/Ar ICP Jean-Paul Booth,Rodolphe Sarot,Emilie Despiau-Pujo,Pascal Chabert,L. Gatilovaet al. Gaseous Electronics Conference, Oct 2010, Paris, France. 2010 Poster de conférence hal-02611281v1
Inductive plasmas in Cl&lt;SUB&gt;2&lt;/SUB&gt;/Ar :Comparison of hybrid model results with experimental measurements Jean-Paul Booth,Emilie Despiau-Pujo,Pascal Chabert,Rodolphe Sarot AVS Symposium, Oct 2010, Albuquerque, New Mexico, United States. 2010 Poster de conférence hal-02611282v1
Inductive plasmas in Cl&lt;SUB&gt;2&lt;/SUB&gt;/Ar : Comparison of hybrid model results with experimental measurements Jean-Paul Booth,Rodolphe Sarot,Emilie Despiau-Pujo,Pascal Chabert,L. Gatilovaet al. ESCAMPIG, Jul 2010, Novi Sad, Serbia. 2010 Poster de conférence hal-02611280v1

Brevet (3)

Procédé d’exfoliation de graphène G Cunge,D Ferrah,O Renault,A Davydova,E Despiau-Pujo France, Patent n° : FR3059316A1 / WO2018099759A1. 2018 Brevet hal-01946826v1
Procédé d’exfoliation de graphène G. Cunge,F Djawhar,A. Davydova,E. Despiau-Pujo,O. Renault France, N° de brevet: DD17214 VR. 2017 Brevet hal-01930512v1
Atomic precision etching by dynamic control of the reactive layer thickness in reactive plasmas O Joubert,G Cunge,E Despiau-Pujo,E Pargon,N Posseme United States, Patent n° : US 2015/0228495 A1. 2015 Brevet hal-01877345v1

Thèse (1)

Etching of III-V semiconductors in inductively coupled chlorine plasmas Emilie Despiau-Pujo Computer Science [cs]. Ecole Polytechnique X, 2009. English. ⟨NNT : ⟩ Thèse pastel-00005582v1