Enora Vuillermet Post-doctorante

Identifiants chercheurs

IdHAL :

enora-vuillermet

ORCID :

0009-0001-3987-0690

Publications

Article dans une revue (6)

Integration of bright color centers into arrays of silicon carbide nanopillars Enora Vuillermet,N. Bercu,S. Kochtcheev,M. Lazar Applied Physics Letters, 2025, Defects in Solids for Quantum Technologies, 127 (2), pp.024003. ⟨10.1063/5.0255612⟩ Article dans une revue hal-05169989v1
Coupled Non-Destructive Methods, Kelvin Force Probe Microscopy and µ-Raman to Characterize Doping in 4H-SiC Power Devices Enora Marion Vuillermet,Kuan Ting Wu,Anaël Sédilot,Regis Deturche,Nicolas Bercuet al. Solid State Phenomena, 2024, 358, pp.13-21. ⟨10.4028/p-sUIlP5⟩ Article dans une revue hal-04211449v1
Infrared photoinduced force near-field spectroscopy of silicon carbide Kuan-Ting Wu,Youssef El-Helou,Elise Usureau,Enora Vuillermet,Michel Kazanet al. Applied Surface Science, 2024, 684, pp.161798. ⟨10.1016/j.apsusc.2024.161798⟩ Article dans une revue hal-04796916v1
High Quality Single Crystal Recrystallization of Thin 4H-SiC Films Deposed by PVD Techniques, a way for New Emerging Fields Elise Usureau,Enora Marion Vuillermet,Mihai Lazar,Aurore Andrieux,Alexandre Jacquemot Solid State Phenomena, 2023, 343, pp.21-28. ⟨10.4028/p-w0ryrj⟩ Article dans une revue hal-04170908v1
Cathodoluminescence Characterization of Point Defects Generated through Ion Implantations in 4H-SiC Enora Marion Vuillermet,Nicolas Bercu,Florence Etienne,Mihai Lazar Coatings, 2023, 13 (6), pp.992. ⟨10.3390/coatings13060992⟩ Article dans une revue hal-04170818v1
Light Extraction from 4H Silicon Carbide by Nanostructuring the Surface with High Temperature Annealing Enora Marion Vuillermet,Elise Usureau,Mihai Lazar,Regis Deturche Materials Science Forum, 2023, 1089, pp.37-44. ⟨10.4028/p-lu37l6⟩ Article dans une revue hal-04170897v1

Communication dans un congrès (12)

Raman and photoluminescence characterization of β-Ga2O3 for power electronic application Enora Vuillermet,Camille Sonneville,Changzi Lu,Pierre Brosselard,Jean-Marie Bluetet al. WORKSHOP ON GALLIUM OXIDE AND RELATED MATERIALS, Sep 2025, Grenoble, France Communication dans un congrès hal-05317962v1
Correlative Near-Field Characterizations with KPFM, sMIM and SCM to Characterize the Geometry of a N-Channel Failed SiC JFET Rosine Coq Germanicus,Mahima Chaudhary,Enora Vuillermet,Mihai Lazar ISTFA 2025, Nov 2025, Pasadena, France. pp.404-410, ⟨10.31399/asm.cp.istfa2025p0404⟩ Communication dans un congrès hal-05401738v1
Physical and electrical characterization of wide band gap for power electronic application Camille Sonneville,Enora Vuillermet,Ndembi Ignoumba-Ignoumba,Maroun Dagher,Nhan Tranet al. Société Française de Physique, Jun 2025, Troyes, France Communication dans un congrès hal-05097944v1
SiC plasma etching technology processes for power and optoelectronic devices Mihai Lazar,Nour Beydoun,Frédéric Marty,Elise Usureau,Enora Marion Vuillermetet al. PESM 2024, IMEC Belgium, Jun 2024, Leuven (BE), Belgium Communication dans un congrès hal-04797018v1
Technology development for nano-pillars fabrication in silicon carbide to enhance light collection from color centers Enora Vuillermet,Serguei Kochtcheev,Elise Usureau,Nicolas Bercu,Mihai Lazar International Conference on Silicon Carbide and Related Materials (ICSCRM 2024), Sep 2024, Raleigh (North Carolina), United States Communication dans un congrès hal-04796859v1
Near-field characterization of Nb2CTx MXene by non-destructive nearfield microscopy Kevin Kim,Camilo Pérez de la Vega,Youssef El Helou,Enora Vuillermet,Kuan-Ting Wuet al. SPIE OPTO, Jan 2024, San Francisco California, United States. pp.33, ⟨10.1117/12.3009437⟩ Communication dans un congrès hal-04618601v1
La gravure plasma, une étape critique dans la technologie SiC. Mécanismes physico-chimiques et applications Mihai Lazar,Nour Beydoun,Frédéric Marty,Elise Usureau,Enora Vuillermetet al. Journées Renatech Litho/Gravure 2024, Jun 2024, Valbonne, France Communication dans un congrès hal-04799422v1
Integration of micro-fabricated thermal flow rate sensors in a 4H-SiC substrate passivated by a MPECVD-grown diamond layer Enora Vuillermet,Lionel Rousseau,Georges Hamaoui,Nizar Ben Moussa,E. Nefzaouiet al. The 34th International Conference on Diamond and Carbon Materials (ICDCM 2024), Sep 2024, Dresde, Germany Communication dans un congrès hal-05374887v1
Caractérisation du dopage de dispositifs de puissance en 4H-SiC par KPFM et spectroscopie µ-Raman Anaël Sédilot,Enora Marion Vuillermet,Régis Deturche,Elise Usureau,Jérémie Béalet al. 24ème Forum des microscopies à sonde locale, Apr 2023, Obernai, France Communication dans un congrès hal-04171760v1
Cathodoluminescence study of silicon vacancies color centers generated by ion implantation in 6H-SiC Enora Marion Vuillermet,R. Haddadi,N. Bercu,L. Ottaviani,L. Giraudetet al. IEEE 2023 International semiconductor conference (CAS) - 46th edition, NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES - IMT Bucharest; IEEE – Electron Devices Society, Oct 2023, Sinaia (Romania), Romania. pp.135-138, ⟨10.1109/CAS59036.2023.10303651⟩ Communication dans un congrès hal-04304522v1
Surface nano-structuration of 4H-SiC by controlled high-temperature annealing Enora Marion Vuillermet,Elise Usureau,Régis Deturche,Mihai Lazar The 6th International Workshop on Ultraviolet Materials and Devices (IWUMD 2023), Jun 2023, Metz, France Communication dans un congrès hal-04171629v1
Recrystallization of thin 4H-SiC films deposited by PVD techniques, a way for new emerging fields Enora Marion Vuillermet,Elise Usureau,François Jomard,Léa Le Joncour,Aurore Andrieuxet al. C'Nano 2023: The Nanoscience meeting, Centre national de compétences en Nanosciences, Mar 2023, Poitiers, France Communication dans un congrès hal-04171807v1

Poster de conférence (6)

Characterization of β-Ga2O3 and device fabrication Enora Vuillermet,Changzi Lu,Camille Sonneville,Pierre Brosselard,Jean-Marie Bluetet al. Société Française de Physique, Jun 2025, Troyes, France Poster de conférence hal-05099267v1
Technology development for nano-pillars fabrication in silicon carbide to enhance light collection from color centers Enora Vuillermet,Serguei Kochtcheev,Elise Usureau,Nicolas Bercu,Mihai Lazar Journées Renatech Litho/Gravure 2024, Jun 2024, Valbonne, France Poster de conférence hal-04618701v1
Coupled non-destructive methods, Scanning Electron Microscopy, Kelvin Force Probe microscopy and µ-Raman to characterize doping in 4H-SiC power devices Enora Vuillermet,Kuan-Ting Wu,Anaël Sédilot,Régis Deturche,Nicolas Bercuet al. 5e édition des French Photonics Days, Oct 2023, Strasboug, France Poster de conférence hal-04618679v1
Characterization of silicon vacancies and divacancies in hexagonal silicon carbide formed by nitrogen and aluminum ion implantation Enora Marion Vuillermet,Nicolas Bercu,Florence Etienne,Mihai Lazar,Louis Giraudet C'Nano 2023: The Nanoscience meeting, Mar 2023, Poitiers, France. Poster de conférence hal-04171800v1
Recrystallisation of thin 4H-SiC films deposed by PVD Elise Usureau,Enora Marion Vuillermet,Mihai Lazar,Aurore Andrieux,Alexandre Jacquemot 19th International Conference on Silicon Carbide and Related Materials (ICSCRM 2022), Sep 2022, Davos, Switzerland. Poster de conférence hal-04171214v1
Nanostructuring of 4H-SiC by high temperature annealing Enora Marion Vuillermet,Elise Usureau,Mihai Lazar,Regis Deturche 19th International Conference on Silicon Carbide and Related Materials (ICSCRM 2022), Sep 2022, Davos, Switzerland. Poster de conférence hal-04171193v1

Pré-publication, Document de travail (1)

Integration of bright color centers into arrays of silicon carbide nanopillars Enora Vuillermet,Nicolas Bercu,Serguei Kochtcheev,Mihai Lazar 2025 Pré-publication, Document de travail hal-04878667v1