Erik Johnson

Publications

Article dans une revue (72)

Tuning the optoelectronic properties of NiOx thin films by atomic layer deposition with a precise incorporation of aluminum atoms Damien Coutancier,Yann Pinal,Tristan Priaud,Erik V Johnson,Solène Béchuet al. Journal of Vacuum Science & Technology A, 2026, 44 (3), pp.032410. ⟨10.1116/6.0005334⟩ Article dans une revue hal-05604451v1
Amorphous GaN matrix embedded nanocrystals exhibiting bulk bandgap luminescence Lakshman Srinivasan,Jean-Luc Maurice,Stefano Pirotta,Stéphane Collin,Erik Johnsonet al. APL Materials, 2025, 13 (6), ⟨10.1063/5.0253319⟩ Article dans une revue hal-05386997v1
Investigation of Patterned Plasma Etching Processes for HJT-IBC Solar Cells: Keys to Maintaining a High Electronic Quality Surface Junkang Wang,Chandralina Patra,Weixi Wang,Monalisa Ghosh,Pavel Bulkinet al. Solar Energy Materials and Solar Cells, 2025, 288, pp.113653. ⟨10.1016/j.solmat.2025.113653⟩ Article dans une revue hal-05060178v1
Amorphous GaN matrix embedded nanocrystals exhibiting bulk band-gap luminescence Lakshman Srinivasan,Jean-Luc Maurice,Stefano Pirotta,Stéphane Collin,Erik Johnsonet al. APL Materials, 2025, 13 (6), ⟨10.1063/5.0253319⟩ Article dans une revue hal-05388096v1
Homoepitaxial growth of device-grade GaAs using low-pressure remote plasma CVD Lise Watrin,François Silva,Ludovic Largeau,Nathaniel Findling,Mirella Al Katribet al. Materials Science in Semiconductor Processing, 2025, 186, pp.109069. ⟨10.1016/j.mssp.2024.109069⟩ Article dans une revue hal-05386846v1
Investigation of Patterned Plasma Etching Processes for HJT-IBC Solar Cells: Keys to Maintaining a High Electronic Quality Surface Junkang Wang,Chandralina Patra,Weixi Wang,Monalisa Ghosh,Pavel Bulkinet al. Solar Energy Materials and Solar Cells, 2025, 288, pp.113653. ⟨10.1016/j.solmat.2025.113653⟩ Article dans une revue hal-05388130v1
Plasma-Driven Solid–Liquid Dynamics in Cu–Sn Catalysts and Nucleation of Silicon Nanowires Revealed by Environmental TEM Weixi Wang,Eric Ngo,Pavel Bulkin,Martin Foldyna,Pere Roca i Cabarrocaset al. Nano Letters, 2025, 25 (44), pp.15832-15839. ⟨10.1021/acs.nanolett.5c03612⟩ Article dans une revue hal-05363494v1
Homoepitaxial growth of device-grade GaAs using low-pressure remote plasma CVD Lise Watrin,François Silva,Ludovic Largeau,Nathaniel Findling,Mirella Al Katribet al. Materials Science in Semiconductor Processing, 2025, 186, pp.109069. ⟨10.1016/j.mssp.2024.109069⟩ Article dans une revue hal-04814334v1
Low-Temperature, PECVD-Grown Nanocrystalline Silicon Oxide as a Metal Diffusion Barrier for Silicon Heterojunction Solar Cells Chandralina Patra,Junkang Wang,Kassiogé Dembélé,Pavel Bulkin,Pere Roca i Cabarrocaset al. ACS Applied Energy Materials, 2025, ⟨10.1021/acsaem.5c02998⟩ Article dans une revue hal-05387014v1
Investigation of Patterned Plasma Etching Processes for HJT-IBC Solar Cells: Keys to Maintaining a High Electronic Quality Surface Junkang Wang,Chandralina Patra,Weixi Wang,Monalisa Ghosh,Pavel Bulkinet al. Solar Energy Materials and Solar Cells, 2025, 288, pp.113653. ⟨10.1016/j.solmat.2025.113653⟩ Article dans une revue hal-05386911v1
Direct growth of highly oriented GaN thin films on silicon by remote plasma CVD Lisa Watrin,François Silva,Cyril Jadaud,Pavel Bulkin,Jean-Charles Vanelet al. Journal of Physics D: Applied Physics, 2024, 57 (31), pp.315106. ⟨10.1088/1361-6463/ad436c⟩ Article dans une revue hal-04577076v1
Evolution of Cu-In Catalyst Nanoparticles under Hydrogen Plasma Treatment and Silicon Nanowire Growth Conditions Weixi Wang,Éric Ngo,Pavel Bulkin,Zhengyu Zhang,Martin Foldynaet al. Nanomaterials, 2023, 13 (14), pp.2061. ⟨10.3390/nano13142061⟩ Article dans une revue hal-04278157v1
Reactive plasma sputtering deposition of polycrystalline GaN thin films on silicon substrates at room temperature Lakshman Srinivasan,Cyril Jadaud,François Silva,Jean-Charles Vanel,Jean-Luc Mauriceet al. Journal of Vacuum Science & Technology A, 2023, 41 (5), ⟨10.1116/6.0002718⟩ Article dans une revue hal-04278185v1
Maskless patterned plasma fabrication of interdigitated back contact silicon heterojunction solar cells: Characterization and optimization Junkang Wang,Monalisa Ghosh,Karim Ouaras,Dmitri Daineka,Pavel Bulkinet al. Solar Energy Materials and Solar Cells, 2023, 258, pp.112417. ⟨10.1016/j.solmat.2023.112417⟩ Article dans une revue hal-04269861v1
Evolution of Cu-In Catalyst Nanoparticles under Hydrogen Plasma Treatment and Silicon Nanowire Growth Conditions Weixi Wang,Éric Ngo,Pavel Bulkin,Zhengyu Zhang,Martin Foldynaet al. Nanomaterials, 2023, 13 (14), pp.2061. ⟨10.3390/nano13142061⟩ Article dans une revue hal-04298103v2
Maskless interdigitated a-Si:H PECVD process on full M0 c-Si wafer: Homogeneity and passivation assessment Karim Ouaras,Sergej Filonovich,Bastien Bruneau,Junkang Wang,Monalisa Ghoshet al. Solar Energy Materials and Solar Cells, 2022, 246, pp.111927. ⟨10.1016/j.solmat.2022.111927⟩ Article dans une revue hal-03866046v1
Maskless interdigitated a-Si:H PECVD process on full M0 c-Si wafer: Homogeneity and passivation assessment Karim Ouaras,Sergej Filonovich,Bastien Bruneau,Junkang Wang,Monalisa Ghoshet al. Solar Energy Materials and Solar Cells, 2022, 246 (8), pp.2200248. ⟨10.1016/j.solmat.2022.111927⟩ Article dans une revue hal-03861471v1
Triple Radial Junction Hydrogenated Amorphous Silicon Solar Cells with &gt;2 V Open‐Circuit Voltage Chaoqi Wang,Martin Foldyna,Erik V Johnson,Pere Roca i Cabarrocas Solar RRL, 2022, 6 (8), pp.2200248. ⟨10.1002/solr.202200248⟩ Article dans une revue hal-03861463v1
Ultrathin Ge epilayers on Si produced by low-temperature PECVD acting as virtual substrates for III-V / c-Si tandem solar cells Monalisa Ghosh,Pavel Bulkin,François Silva,Erik Johnson,Ileana Floreaet al. Solar Energy Materials and Solar Cells, 2022, 236, pp.111535. ⟨10.1016/j.solmat.2021.111535⟩ Article dans une revue hal-03861478v1
Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon Ghewa Akiki,Mathieu Frégnaux,Ileana Florea,Pavel Bulkin,Dmitri Dainekaet al. Journal of Vacuum Science & Technology A, 2021, 39 (1), pp.013201. ⟨10.1116/6.0000653⟩ Article dans une revue hal-03060642v1
Formation of inverse cones in crystalline silicon by selective etching of amorphous regions resulting from epitaxial breakdown H Mohsin,W Chen,D Daineka,P Roca I Cabarrocas,E Johnson Journal of Physics D: Applied Physics, 2021, 54 (49), pp.495103. ⟨10.1088/1361-6463/ac22d8⟩ Article dans une revue hal-03383213v1
Observation of photovoltaic effect within locally doped silicon nanojunctions using conductive probe AFM R. Khoury,J Alvarez,T. Ohashi,I. Martín,P. Ortegaet al. Nano Energy, 2020, 76, pp.105072. ⟨10.1016/j.nanoen.2020.105072⟩ Article dans une revue hal-02905754v1
Area selective deposition of silicon by plasma enhanced chemical vapor deposition using a fluorinated precursor Ghewa Akiki,Daniel Suchet,Dmitri Daineka,Sergej Filonovich,Pavel Bulkinet al. Applied Surface Science, 2020, 531, pp.147305. ⟨10.1016/j.apsusc.2020.147305⟩ Article dans une revue hal-03001811v1
Maskless and contactless patterned silicon deposition using a localized PECVD process Ronan Leal,Bastien Bruneau,Pavel Bulkin,Tatiana Novikova,François Silvaet al. Plasma Sources Science and Technology, 2020, 29 (2), pp.025023. ⟨10.1088/1361-6595/ab5e2c⟩ Article dans une revue hal-02545248v1
Direct etching at the nanoscale through nanoparticle-directed capillary condensation M. Garín,R. Khoury,I. Martín,Erik Johnson Nanoscale, 2020, 12 (16), pp.9240-9245. ⟨10.1039/C9NR10217E⟩ Article dans une revue hal-03001169v1
Impact of charged species transport coefficients on self-bias voltage in an electrically asymmetric RF discharge Jean-Maxime Orlac'H,Tatiana Novikova,Vincent Giovangigli,Erik Johnson,Pere Roca Plasma Sources Science and Technology, 2019, 28 (5), pp.055003. ⟨10.1088/1361-6595/ab067d⟩ Article dans une revue hal-01856184v3
Experimental demonstration of multifrequency impedance matching for tailored voltage waveform plasmas Junkang Wang,Sébastien Diné,Jean-Paul Booth,Erik Johnson Journal of Vacuum Science & Technology A, 2019, 37 (2), pp.021303. ⟨10.1116/1.5056205⟩ Article dans une revue hal-02081466v1
Microcrystalline silicon thin film deposition from silicon tetrafluoride: Isolating role of ion energy using tailored voltage waveform plasmas Junkang Wang,Dmitri Daineka,Mustapha Elyaakoubi,Erik Johnson Solar Energy Materials and Solar Cells, 2019, 190, pp.65-74. ⟨10.1016/j.solmat.2018.10.014⟩ Article dans une revue hal-02391003v1
Impact of charged species transport coefficients on self-bias voltage in an electrically asymmetric RF discharge Jean-Maxime Orlac’h,Tatiana Novikova,Vincent Giovangigli,Erik Johnson,Pere Roca I Cabarrocas Plasma Sources Science and Technology, 2019, 28 (5), pp.055003. ⟨10.1088/1361-6595/ab067d⟩ Article dans une revue hal-04286867v1
Erratum: Multi frequency matching for voltage waveform tailoring &lt;A href=&quot;/abs/&quot;&gt;(2018 Plasma Sources Sci. Technol. 27 095012&lt;/A&gt;) Frederik Schmidt,Julian Schulze,Erik Johnson,Jean-Paul Booth,Douglas Keilet al. Plasma Sources Science and Technology, 2019, 28, pp.019601. ⟨10.1088/1361-6595/aaeb4b⟩ Article dans une revue hal-03730658v1
Excitation of Ar, O 2 , and SF 6 /O 2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron excitation mode G Fischer,K. Ouaras,E Drahi,B. Bruneau,E Johnson Plasma Sources Science and Technology, 2018, 27 (7), pp.074003. ⟨10.1088/1361-6595/aaca05⟩ Article dans une revue hal-02391062v1
Large Area Radial Junction Silicon Nanowire Solar Mini-Modules Mutaz Al-Ghzaiwat,Martin Foldyna,Takashi Fuyuki,Wanghua Chen,Erik Johnsonet al. Scientific Reports, 2018, 8 (1), ⟨10.1038/s41598-018-20126-5⟩ Article dans une revue hal-01908687v1
Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases Z. Donkó,A. Derzsi,Ihor Korolov,P. Hartmann,S. Brandtet al. Plasma Physics and Controlled Fusion, 2018, 60 (1), pp.014010. ⟨10.1088/1361-6587/aa8378⟩ Article dans une revue hal-01895567v1
Optical Study and Experimental Realization of Nanostructured Back Reflectors with Reduced Parasitic Losses for Silicon Thin Film Solar Cells Zeyu Li,Rusli E,Chenjin Chen,Ari Prakoso,Martin Foldynaet al. Nanomaterials, 2018, 8 (626), ⟨10.3390/nano8080626⟩ Article dans une revue hal-01908707v1
Multi frequency matching for voltage waveform tailoring Frederik Schmidt,J. Schulze,Erik Johnson,Jean-Paul Booth,D. Keilet al. Plasma Sources Science and Technology, 2018, 27 (9), pp.095012. ⟨10.1088/1361-6595/aad2cd⟩ Article dans une revue hal-02271985v1
Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature Zhang Song,Tiphaine Bourgeteau,Itaru Raifuku,Yvan Bonnassieux,Erik Johnsonet al. Thin Solid Films, 2018, 646, pp.209 - 215. ⟨10.1016/j.tsf.2017.12.003⟩ Article dans une revue hal-01908690v1
Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control P. Diomede,Bastien Bruneau,S. Longo,E.V. Johnson,Jean-Paul Booth Plasma Sources Science and Technology, 2017, 26 (7), pp.075007. ⟨10.1088/1361-6595/aa752c⟩ Article dans une revue hal-01895582v1
Natural occurrence of the diamond hexagonal structure in silicon nanowires grown by a plasma-assisted vapour-liquid-solid method J. Tang,Maurice J.L.,F. Fossard,I. Florea,Chen W.et al. Nanoscale, 2017, 9 (24), pp.8113-8118. ⟨10.1039/c7nr01299c⟩ Article dans une revue hal-01632386v1
Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges A. Derzsi,Bastien Bruneau,Andrew Gibson,Erik Johnson,D. O'Connellet al. Plasma Sources Science and Technology, 2017, 26 (3), pp.034002. ⟨10.1088/1361-6595/aa56d6⟩ Article dans une revue hal-01895575v1
Texturing optimization for bifacial n-PERT: are pyramids and/or black silicon the way to go for thinner devices? Rafaël Peyronnet,Guillaume Fischer,Thomas Blévin,Erik Johnson,Etienne Drahiet al. Energy Procedia, 2017, 124, pp.250-259 Article dans une revue hal-02018312v1
Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties Guillaume Fischer,Étienne Drahi,Martin Foldyna,Thomas A. Germer,Erik V. Johnson Optics Express, 2017, 25 (24), ⟨10.1364/OE.25.0A1057⟩ Article dans une revue hal-01640105v1
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF&lt;SUB&gt;4&lt;/SUB&gt; S. Brandt,B. Berger,E. Schüngel,Ihor Korolov,A. Derzsiet al. Plasma Sources Science and Technology, 2016, 25 (4), pp.045015. ⟨10.1088/0963-0252/25/4/045015⟩ Article dans une revue hal-01549325v1
Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects E. Schüngel,Ihor Korolov,Bastien Bruneau,A. Derzsi,E.V. Johnsonet al. Journal of Physics D: Applied Physics, 2016, 49 (26), pp.265203. ⟨10.1088/0022-3727/49/26/265203⟩ Article dans une revue hal-01549338v1
Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas Bastien Bruneau,Ihor Korolov,Trevor Lafleur,T. Gans,D. O'Connellet al. Journal of Applied Physics, 2016, 119 (16), pp.163301. ⟨10.1063/1.4947453⟩ Article dans une revue hal-01549329v1
Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms Bastien Bruneau,Trevor Lafleur,Jean-Paul Booth,Erik Johnson Plasma Sources Science and Technology, 2016, 25 (2), pp.025006. ⟨10.1088/0963-0252/25/2/025006⟩ Article dans une revue hal-01549334v1
Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H&lt;SUB&gt;2&lt;/SUB&gt; and CF&lt;SUB&gt;4&lt;/SUB&gt; Bastien Bruneau,Trevor Lafleur,T. Gans,D. O'Connell,Arthur Grebet al. Plasma Sources Science and Technology, 2016, 25 (1), pp.01LT02. ⟨10.1088/0963-0252/25/1/01LT02⟩ Article dans une revue hal-01549332v1
Plasma-Assisted Growth of Silicon Nanowires by Sn Catalyst: Step-by-Step Observation Jian Tang,Jean-Luc Maurice,Wanghua Chen,Soumyadeep Misra,Martin Foldynaet al. Nanoscale Research Letters, 2016, 11 (1), ⟨10.1186/s11671-016-1681-5⟩ Article dans une revue hal-01401083v1
Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms Bastien Bruneau,T. Gans,D. O'Connell,Arthur Greb,E.V. Johnsonet al. Physical Review Letters, 2015, 114, pp.125002. ⟨10.1103/PhysRevLett.114.125002⟩ Article dans une revue hal-01549359v1
Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas Bastien Bruneau,T. Novikova,Trevor Lafleur,Jean-Paul Booth,E.V. Johnson Plasma Sources Science and Technology, 2015, 24 (1), pp.015021. ⟨10.1088/0963-0252/24/1/015021⟩ Article dans une revue hal-01549355v1
Understanding Light Harvesting in Radial Junction Amorphous Silicon Thin Film Solar Cells Linwei Yu,Soumyadeep Misra,Junzhuan Wang,Shengyi Qian,Martin Foldynaet al. Scientific Reports, 2014, 4, pp.4357. ⟨10.1038/srep04357⟩ Article dans une revue hal-01083479v1
Low temperature hydrogenated microcrystalline silicon-carbon alloys deposited by RF-PECVD Sofia Gaiaschi,Marie-Estelle Gueunier-Farret,Erik V. Johnson Physica Status Solidi C: Current Topics in Solid State Physics, 2014, 11 (11-12), pp.1665-1668. ⟨10.1002/pssc.201400034⟩ Article dans une revue istex hal-01104328v1
Use of radio frequency power, silicon tetrafluoride and methane as parameters to tune structural properties of hydrogenated microcrystalline silicon carbon alloys S Gaiaschi,R Ruggeri,M-E Gueunier-Farret,E V Johnson Journal of Physics D: Applied Physics, 2014, 47 (45), pp.455102. ⟨10.1088/0022-3727/47/45/455102⟩ Article dans une revue hal-01104321v1
Substrate and p-layer effects on polymorphous silicon solar cells S.N. Abolmasov,H. Woo,R. Planques,J. Holovský,E.V. Johnsonet al. EPJ Photovoltaics, 2014, 5, ⟨10.1051/epjpv/2014007⟩ Article dans une revue hal-01230707v1
anglais Jean-Christophe Dornstetter,Junkang Wang,Bastien Bruneau,Erik V. Johnson,Pere Roca I Cabarrocas Canadian Journal of Physics, 2014, 92 (7/8), ⟨10.1139/cjp-2013-0606⟩ Article dans une revue hal-01230710v1
Understanding the amorphous-to-microcrystalline silicon transition in SiF4/H2/Ar gas mixtures Jean-Christophe Dornstetter,Bastien Bruneau,Pavel Bulkin,Erik V. Johnson,Pere Roca I Cabarrocas The Journal of Chemical Physics, 2014, 140 (23), ⟨10.1063/1.4883503⟩ Article dans une revue hal-01230708v1
Evolution in morphological, optical, and electronic properties of ZnO:Al thin films undergoing a laser annealing and etching process C. Charpentier,R. Boukhicha,P. Prod׳homme,T. Emeraud,J.-F. Leratet al. Solar Energy Materials and Solar Cells, 2014, 125, ⟨10.1016/j.solmat.2014.02.027⟩ Article dans une revue istex hal-01230703v1
Structural properties of hydrogenated microcrystalline silicon–carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate S. Gaiaschi,R. Ruggeri,E.V. Johnson,P. Bulkin,P. Chaponet al. Thin Solid Films, 2014, 550, pp.312-318. ⟨10.1016/j.tsf.2013.11.081⟩ Article dans une revue istex hal-01099597v1
Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms Bastien Bruneau,T. Novikova,Trevor Lafleur,Jean-Paul Booth,E.V. Johnson Plasma Sources Science and Technology, 2014, 23 (6), pp.065010. ⟨10.1088/0963-0252/23/6/065010⟩ Article dans une revue hal-01549377v1
Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms Trevor Lafleur,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth Plasma Physics and Controlled Fusion, 2013, 55 (12), pp.124002. ⟨10.1088/0741-3335/55/12/124002⟩ Article dans une revue hal-01549416v1
Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations Pierre-Alexandre Delattre,Trevor Lafleur,Erik Johnson,Jean-Paul Booth Journal of Physics D: Applied Physics, 2013, 46, pp.235201. ⟨10.1088/0022-3727/46/23/235201⟩ Article dans une revue hal-01549413v1
Radio frequency current-voltage probe for impedance and power measurements in multi-frequency unmatched loads Trevor Lafleur,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth,Sébastien Diné Review of Scientific Instruments, 2013, 84, pp.015001. ⟨10.1063/1.4773540⟩ Article dans une revue hal-01549400v1
Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring E.V. Johnson,S. Pouliquen,Pierre-Alexandre Delattre,Jean-Paul Booth Journal of Non-Crystalline Solids, 2012, 358 (17), pp.1974-1977. ⟨10.1016/j.jnoncrysol.2012.01.014⟩ Article dans une revue istex hal-01549432v1
Low Temperature Plasma Synthesis of Nanocrystals and their Application to the Growth of Crystalline Silicon and Germanium Thin Films Pere Roca I Cabarrocas,Ka-Hyun Kim,Romain Cariou,Martin Labrune,Erik Johnsonet al. MRS Online Proceedings Library, 2012, 1426, pp.319. ⟨10.1557/opl.2012.1094⟩ Article dans une revue hal-00797647v1
Tailored voltage waveform deposition of Microcrystalline Silicon thin films from hydrogen-diluted silane and silicon tetrafluoride: optoelectronic properties of films E.V. Johnson,S. Pouliquen,Pierre-Alexandre Delattre,Jean-Paul Booth Japanese Journal of Applied Physics, 2012, 51, pp.08HF01. ⟨10.1143/JJAP.51.08HF01⟩ Article dans une revue hal-01549433v1
Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms E.V. Johnson,Pierre-Alexandre Delattre,Jean-Paul Booth Applied Physics Letters, 2012, 100, pp.133504. ⟨10.1063/1.3699222⟩ Article dans une revue hal-01549437v1
Separate control of the ion flux and ion energy in capacitively coupled rf discharges using voltage waveform tailoring Trevor Lafleur,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth Applied Physics Letters, 2012, 101, pp.124104. ⟨10.1063/1.4754692⟩ Article dans une revue hal-01549435v1
Control of Nanocrystalline Silicon Growth Phase and Deposition Rate through Voltage Waveform Tailoring during PECVD E.V. Johnson,S. Pouliquen,Pierre-Alexandre Delattre,Jean-Paul Booth MRS Online Proceedings Library, 2011, 1339, pp.mrss11-1339-s04-5. ⟨10.1557/opl.2011.993⟩ Article dans une revue hal-01549456v1
Geometrical optimization and electrical performance comparison of thin-film tandem structures based on pm-Si:H and µc-Si:H using computer simulation Foudil Dadouche,Olivier Bethoux,Marie-Estelle Gueunier-Farret,Erik Johnson,Pere Roca I Cabarrocaset al. EPJ Photovoltaics, 2011, 2, pp.20301. ⟨10.1051/pvd/2011001⟩ Article dans une revue hal-00642129v1
Open-circuit voltage increase dynamics in high and low deposition rate polymorphous silicon solar cells E.V. Johnson,Foudil Dadouche,Marie-Estelle Farret-Gueunier,Jean-Paul Kleider,Pere Roca I Cabarrocas Physica Status Solidi A (applications and materials science), 2010, 207 (3), pp.691-694 Article dans une revue hal-00555228v1
Nanocrystalline silicon film growth morphology control through RF waveform tailoring E.V. Johnson,T. Verbeke,J-C Vanel,Jean-Paul Booth Journal of Physics D: Applied Physics, 2010, 43, pp.412001. ⟨10.1088/0022-3727/43/41/412001⟩ Article dans une revue istex hal-01549485v1
Device grade hydrogenated polymorphous silicon deposited at high rates Yrebegnan Moussa Soro,A. Abramov,Marie-Estelle Gueunier-Farret,E.V. Johnson,Christophe Longeaudet al. Journal of Non-Crystalline Solids, 2008, 354, pp.2092 Article dans une revue hal-00350767v1
Polymorphous silicon thin films deposited at high rate: transport properties and density of states Yrebegnan Moussa Soro,A. Abramov,Marie-Estelle Gueunier-Farret,E.V. Johnson,Christophe Longeaudet al. Thin Solid Films, 2008, 516, pp.6888 Article dans une revue hal-00350886v1

Communication dans un congrès (48)

Area Selective Plasma Enhanced Chemical Vapor Deposition of Silicon using a Fluorinated Precursor Ghewa Akiki,Mathieu Frégnaux,Ileana Florea,Sergej Filonovich,Pavel Bulkinet al. AVS 67, Oct 2021, Virtual (On-line), United States Communication dans un congrès hal-04425884v1
A Contactless Patterned Plasma Processing for Interdigitated Back Contact Silicon Heterojunction Solar Cells Fabrication Junkang Wang,Monalisa Ghosh,Fatima Ouadjane,Borja Carbonell,Pavel Bulkinet al. 2021 IEEE 48th Photovoltaic Specialists Conference (PVSC), Jun 2021, Fort Lauderdale, France. pp.0596-0601, ⟨10.1109/PVSC43889.2021.9518831⟩ Communication dans un congrès hal-03836937v1
Role of Fluorinated Precursor in Area Selective PECVD of Silicon on SiOxNy Ghewa Akiki,Mathieu Frégnaux,Ileana Florea,Pavel Bulkin,Dmitri Dainekaet al. 5th Area Selective Deposition Workshop (ASD 2021), Apr 2021, Virtual conference, United States Communication dans un congrès hal-04425827v1
Experimental Demonstration of Multifrequency Matching for Tailored Voltage Waveform Plasma Excitation Sebastien Dine,Jean-Paul Booth,E.V. Johnson,Junkang Wang International Conference on Phenomena in Ionised Gases, Jul 2019, Hokkaido, Japan Communication dans un congrès hal-02341689v1
Multifrequency impedance matching solutions for plasma excitation by Tailored Voltage Waveforms Erik Johnson,Sebastien Dine,Jean-Paul Booth AVS Symposium, Nov 2016, Nashville, United States Communication dans un congrès hal-02593689v1
Study of Electronic Properties of Hydrogenated Amorphous Silicon Thin Film from SiH4/H2 using Tailored Voltage Waveforms Junkang Wang,Federico Ventosinos,Christophe Longeaud,Bastien Bruneau,D. Dainekaet al. E-MRS 2016 Spring Meeting, May 2016, Lille, France Communication dans un congrès hal-01363727v1
Charged Particle Dynamics in Technological Radio Frequency Plasmas Operated in CF&lt;SUB&gt;4&lt;/SUB&gt; J. Schulze,B. Berger,S. Brandt,Bastien Bruneau,Y. Liuet al. AVS Symposium, Nov 2016, Nashville, United States Communication dans un congrès hal-02573358v1
Modelling and experimental validation of capacitively coupled plasmas in hydrogen D. Diomede,Bastien Bruneau,Trevor Lafleur,D. J. Economou,S. Longoet al. EPS Plasma, Jul 2016, Leuven, Belgium Communication dans un congrès hal-02573350v1
ELECTRON POWER ABSORPTION DYNAMICS AND ION ENERGY DISTRIBUTIONS IN CAPACITIVE DISCHARGES DRIVEN BY CUSTOMIZED VOLTAGE WAVEFORMS IN ARGON AND CF&lt;SUB&gt;4&lt;/SUB&gt; B. Berger,S. Brandt,J. Franek,E. Shuengel,M. Koepkeet al. IEEE-ICOPS, Jun 2016, Banff, Canada Communication dans un congrès hal-02593683v1
Heating dynamics and control of energy distribution functions in capacitive discharges driven by tailored voltage waveforms J. Schulze,B. Berger,S. Brandt,M. Koepke,T. Mussenbrocket al. International Conference on Plasma Physics ICPP, Jun 2016, Kaohsiung, Taiwan Communication dans un congrès hal-02573352v1
Cleaning and doping of CVD graphene using tailored voltage waveform capacitively coupled plasma Daniil Marinov,Bastien Bruneau,Erik Johnson,Jean-Paul Booth Plasma Etch and Strip in Microelectronics _PESM, Apr 2015, Louvain, Belgium Communication dans un congrès hal-02593662v1
Low Pressure Plasma Cleaning and Doping of CVD Graphene D. Marinov,G. Cunge,D. Ferrah,E.V. Johnson,J.P. Booth AVS 62nd International Symposium & Exhibition, 2015, San José, United States Communication dans un congrès hal-01878405v1
Comparison of the effect of sawtooth-like voltage waveforms on discharge dynamics of Ar, H&lt;SUB&gt;2&lt;/SUB&gt;, and CF&lt;SUB&gt;4&lt;/SUB&gt; plasmas Bastien Bruneau,Erik Johnson,T. Gans,Arthur Greb,Ihor Korolovet al. Gaseaous Electronics Conference, Oct 2015, Honolulu, United States Communication dans un congrès hal-02593667v1
Ion flux asymmetry obtained by sawtooth-like waveforms: A new degree of freedom in capacitively coupled plasmas Bastien Bruneau,T. Gans,D. O'Connell,Arthur Greb,Trevor Lafleuret al. Plasma Etch and Strip in Microelectronics (PESM), Apr 2015, Louvain, Belgium Communication dans un congrès hal-02593661v1
Capacitively coupled CF&lt;SUB&gt;4&lt;/SUB&gt; discharges excited by tailored waveforms: experiments and kinetic simulations Bastien Bruneau,Erik Johnson,Jean-Paul Booth,Trevor Lafleur,T. Ganset al. Radiofrequency Plasma Workshop, Jun 2015, Dublin, Ireland Communication dans un congrès hal-02573343v1
Low temperature hydrogenated microcrystalline silicon-carbon alloys deposited by RF-PECVD for photovoltaic application Sofia Gaiaschi,E.V. Johnson,Marie-Estelle Gueunier-Farret,Christophe Longeaud,P. Chaponet al. E-MRS Spring Meeting 2014, European Materials Research Society, May 2014, Lille, France Communication dans un congrès hal-01099573v1
Control over the ion flux obtained by sawtooth-like waveforms in radiofrequency capacitively coupled plasmas Bastien Bruneau,T. Novikova,Trevor Lafleur,Jean-Paul Booth,Erik Johnson AVS Annual Symposium, Nov 2014, Baltimore, Maryland, United States Communication dans un congrès hal-02593674v1
Structural and electrical properties of hydrogenated microcrystalline silicon-carbon alloys deposited at low substrate temperature by RF-PECVD Sofia Gaiaschi,Marie-Estelle Gueunier-Farret,Christophe Longeaud,E.V. Johnson,P. Chaponet al. E-MRS Spring Meeting 2014, European Materials Research Society, May 2014, Lille, France Communication dans un congrès hal-01099579v1
RF power influence on structural and electrical properties of µc-Si1-xCx:H Sofia Gaiaschi,Marie-Estelle Gueunier-Farret,Christophe Longeaud,E.V. Johnson,Pavel Bulkinet al. EUPVSEC 2013, Sep 2013, Paris, France Communication dans un congrès hal-00931310v1
Capacitively coupled plasmas excited by tailored voltage waveforms Trevor Lafleur,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth EPS Plasma, Jul 2013, Espoo, Finland Communication dans un congrès hal-02573294v1
Tailoring plasma properties using pulse-shaping technology, Jean-Paul Booth,E.V. Johnson,Trevor Lafleur,Pierre-Alexandre Delattre,R.W. Boswell 21st ISPC, Aug 2013, Cairns, Australia Communication dans un congrès hal-02573330v1
IN-SITU OBSERVATION OF MICROCRYSTALLINE SILICON THIN FILM GROWTH USING TAILORED VOLTAGE WAVEFORMS E.V. Johnson,Bastien Bruneau,Pierre-Alexandre Delattre,Trevor Lafleur,Jean-Paul Booth International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-02594804v1
Tailored Voltage deposition of µc-Si1-xCx:H from H2 diluted SiH4 and CH4 gas mixtures Sofia Gaiaschi,R. Ruggeri,E.V. Johnson,Marie-Estelle Gueunier-Farret,Christophe Longeaudet al. ICANS 25, Aug 2013, Toronto, Canada Communication dans un congrès hal-00931312v1
µc-Si1-xCx:H deposited by RF-PECVD: a novel material for PV applications Sofia Gaiaschi,E.V. Johnson,Marie-Estelle Gueunier-Farret,Christophe Longeaud,Pavel Bulkinet al. E-MRS Fall Meeting 2013, Sep 2013, Warsaw, Poland Communication dans un congrès hal-00931311v1
Structural and electrical characterization of microcrystalline silicon-carbon alloys deposited by RF-PECVD Sofia Gaiaschi,R. Ruggeri,E.V. Johnson,Pavel Bulkin,Marie-Estelle Gueunier-Farretet al. E-MRS Spring Meeting 2013, May 2013, Strasbourg, France Communication dans un congrès hal-00931313v1
Practical Aspects of using Tailored Voltage Waveforms for Thin Film Processing of Photovoltaic Devices E.V. Johnson,Bastien Bruneau,Pierre-Alexandre Delattre,Trevor Lafleur,Jean-Paul Booth AVS Symposium, Oct 2013, Long Beach, California, United States Communication dans un congrès hal-02573331v1
Thin Film Deposition with Tailored Voltage Waveforms: Material Questions and Practical Answers E.V. Johnson,Bastien Bruneau,Pierre-Alexandre Delattre,Trevor Lafleur,Jean-Paul Booth RF Plasma workshop, May 2013, Presqu île de Giens, France Communication dans un congrès hal-02573291v1
Tailored Voltage Waveform Capacitively-Coupled Plasmas for IEDF and electron density control: Application to Microcrystalline Si Deposition Jean-Paul Booth,Erik Johnson,Trevor Lafleur,Pierre-Alexandre Delattre Semicon Korea, Jan 2013, Seoul, Korea, Unknown Region Communication dans un congrès hal-02573289v1
Deposition of microcrystalline silicon-carbon alloys by RF-PECVD and MDECR Sofia Gaiaschi,E.V. Johnson,Pavel Bulkin,P. Chapon,Marie-Estelle Gueunier-Farretet al. E-MRS Spring Meeting 2012, May 2012, Strasbourg, France Communication dans un congrès hal-00779004v1
Caracterisations structurales et electriques de μc-Si1−xCx :H deposes par RF-PECVD Sofia Gaiaschi,R. Ruggeri,E.V. Johnson,Pavel Bulkin,Marie-Estelle Gueunier-Farretet al. JNPV 2012, Dec 2012, Chantilly, France Communication dans un congrès hal-00781749v1
Tailored Voltage Waveform Capacitively-Coupled Plasmas Jean-Paul Booth,Trevor Lafleur,Pierre-Alexandre Delattre,E.V. Johnson GEC, Oct 2012, Austin, Texas, United States Communication dans un congrès hal-02594732v1
Plasma deposition processes excited using Tailored Voltage Waveforms: from microcrystalline silicon thin films to devices E.V. Johnson,S. Pouliquen,Pierre-Alexandre Delattre,Jean-Paul Booth AVS Symposium, Oct 2012, Tampa, Floride, United States Communication dans un congrès hal-02573299v1
Plasma deposition of nanocrystalline silicon for solar cells : RF waveform tailoring to optimize deposition rate and film morphology Jean-Paul Booth,E.V. Johnson,Pierre-Alexandre Delattre Gaseous Electronics Meeting, Feb 2012, Murramarang, Australia Communication dans un congrès hal-02573287v1
Plasma Excitation using Tailored Voltage Waveforms for the Deposition of Thin Film Silicon for Photovoltaics: From Plasma Physics to Devices E.V. Johnson,Pierre-Alexandre Delattre,Trevor Lafleur,Jean-Paul Booth 5th International Symposium on Atomically Controlled, Oct 2012, Osaka, Japan Communication dans un congrès hal-02573298v1
DEPOSITION OF THIN FILM OF SILICON MICROCRISTALLINE BY RADIO FREQUENCY VOLTAGE WAVEFORM TAILORING S. Pouliquen,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth AVS, Oct 2011, Nashville, Tennessee, United States Communication dans un congrès hal-02594748v1
Tailored Voltage Waveforms for the Deposition of Microcrystalline Silicon E.V. Johnson,Pierre-Alexandre Delattre,Jean-Paul Booth ICANS, Aug 2011, Nara, Japan Communication dans un congrès hal-02594746v1
VOLTAGE WAVEFORM TAILORING: A PROMISING NEW METHOD FOR SILICON DEPOSITION Pierre-Alexandre Delattre,S. Pouliquen,E.V. Johnson,Nishant Sirse,Jean-Paul Booth CIP (Congres International sur les Plasmas), Jun 2011, Nantes, France Communication dans un congrès hal-02594747v1
Control of Nanocrystalline Growth Phase and Deposition Rate through Voltage Waveform Tailoring E.V. Johnson,Pierre-Alexandre Delattre,Jean-Paul Booth MRS spring meeting, Apr 2011, San Francisco, California, United States Communication dans un congrès hal-02594741v1
RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD Jean-Paul Booth,E.V. Johnson,Pierre-Alexandre Delattre,T. Verbeke,J-C Vanel International Conference on Plasmas and Nanotechnology (ICPLANTS), Feb 2011, Takayama, Japan Communication dans un congrès hal-02594739v1
RF waveform tailoring to control film morphology during nanocrystalline silicon PECVD Jean-Paul Booth,E.V. Johnson,T. Verbeke,J-C Vanel UK-Technological Plasmas Workshop, Dec 2010, Bristol, United Kingdom Communication dans un congrès hal-02595161v1
Control of Microcrystalline Silicon Deposition by RF Waveform Tailoring E.V. Johnson,Jean-Paul Booth,J-C Vanel,T. Verbeke Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-02595158v1
Nanocrystalline silicon film growth morphology control through RF waveform tailoring Jean-Paul Booth,E.V. Johnson,T. Verbeke,J-C Vanel AVS Symposium, Oct 2010, Albuquerque, New Mexico, United States Communication dans un congrès hal-02595160v1
Open-circuit voltage increase dynamics in high and low deposition rate polymorphous silicon solar cells E.V. Johnson,Foudil Dadouche,Marie-Estelle Farret-Gueunier,Jean-Paul Kleider,Pere Roca I Cabarrocas 23rd International Conference on Amorphous and Nanocrystalline Semiconductors - ICANS23, 2009, Utrecht, Netherlands Communication dans un congrès hal-00446010v1
Comparative study of thin-film silicon cell tandem structures pm-Si:H/µc-Si:H in system association prospect Foudil Dadouche,Olivier Bethoux,Marie-Estelle Farret-Gueunier,E.V. Johnson,Pere Roca I Cabarrocaset al. European Materials Research Society – EMRS Spring Meeting, 2009, Strasbourg, France. pp.CD-Rom Proceedings Communication dans un congrès hal-00446008v1
A system study on silicon thin-film pm-Si:H/µc-Si:H tandem cell structure Foudil Dadouche,Olivier Bethoux,Eric Labouré,E.V. Johnson,Pere Roca I Cabarrocaset al. 24th European Photovoltaic Solar Energy Conference, Sep 2009, Hambourg, Germany. pp. 3699-3705 Communication dans un congrès hal-00446011v1
Hydrogenated polymorphous silicon at high deposition rate : serious alternative for cost-effective modules E.V. Johnson,A. Abramov,K.H. Kim,Yrebegnan Soro,Marie-Estelle Farret-Gueunieret al. 18th International Photovoltaic Science and Engineering Conference and Exhibition, 2009, Kolkata, India Communication dans un congrès hal-00446006v1
Polymorphous silicon thin films deposited at high rate: transport properties and density of states Yrebegnan Moussa Soro,A. Abramov,Marie-Estelle Gueunier-Farret,E.V. Johnson,Christophe Longeaudet al. E-MRS 2007 Spring Meeting, 2007, France Communication dans un congrès hal-00322303v1
Device grade hydrogenated polymorphous silicon deposited at high rates Yrebegnan Moussa Soro,A. Abramov,Marie-Estelle Gueunier-Farret,E.V. Johnson,Christophe Longeaudet al. 22nd International Conference on Amorphous and Nanocrystalline Semiconductors, ICANS 22, 2007, United States Communication dans un congrès hal-00322281v1

Poster de conférence (7)

Experimental Benchmarks and sensitivity analysis of PIC/MC simulations of oxygen CCP's Z. Donko,Aranka Derszi,Bastien Bruneau,Andrew Gibson,E.V. Johnsonet al. International Workshop on Radio-Frequency Plasmas, May 2017, Presqu'île de Giens, France. 2017 Poster de conférence hal-02611351v1
Frequency dependence of the Electrical Asymmetry Effect in electronegative capacitive RF discharges driven by Tailored Voltage Waveforms J. Schulze,E. Schuengel,Bastien Bruneau,E.V. Johnson,Jean-Paul Boothet al. GEC, Oct 2016, Bochum, Germany. 2016 Poster de conférence hal-02611341v1
Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS) N. Puspitosari,S. Gaiaschi,C. Longeaud,M.E. Gueunier,E. V. Johnson Journées Nationales du Photovoltaïque 2015, Dec 2015, Dourdan, France Poster de conférence hal-01245742v1
Density of states measurements of RF-power, SiF4 and CH4 –tuned-hydrogenated microcrystalline silicon carbon alloy thin films using Fourier transform photocurrent spectroscopy (FTPS) N. Puspitosari,S. Gaiaschi,C. Longeaud,M. E. Gueunier,E. V. Johnson European Photovoltaïc Solar Energy Conference, Sep 2015, Hambourg, Germany. Proceedings of the European Photovoltaïc Solar Energy Conference Poster de conférence hal-01242764v1
Hybrid Model of Parallel Plate RF Discharges in H&lt;SUB&gt;2&lt;/SUB&gt;: Effect of DC and Tailored Voltage Waveforms P. Diomede,Pierre-Alexandre Delattre,E.V. Johnson,Jean-Paul Booth,S. Longoet al. ESCAMPIG, Jul 2012, Viana do Costello, Portugal. 2012 Poster de conférence hal-02611272v1
Investigation of Voltage Waveform Tailoring Effect in CapacitivelyCoupled H&lt;SUB&gt;2&lt;/SUB&gt; Discharge: Fluid Simulations and Experimental Validation T. Novikova,E.V. Johnson,M. Mao,P. Bulkin,Jean-Paul Boothet al. EPS Plasma Physics, Jul 2012, Stockholm, Sweden. 2012 Poster de conférence hal-02611270v1
Voltage Waveform Tailoring in a RF-CCP reactor: Exploration of self-bias, electron density and current waveform Pierre-Alexandre Delattre,S. Pouliquen,E.V. Johnson,Jean-Paul Booth ICPIG, Aug 2011, Belfast, Northern Ireland, United Kingdom. 2011 Poster de conférence hal-02611277v1

Ouvrages (1)

L'énergie solaire photovoltaïque Daniel Suchet,E.V. Johnson EDP science, 2022, Introduction à.., Michèle Leduc; Michel Le Bellac, 9782759829231 Ouvrages hal-04465191v1