Karim Inal
2
Documents
Présentation
Thèse Orsay-ENSAM, ATER ENSAM Paris, MCF ENSAM Metz puis Aix en Provence, Pr ENSMSE Gardanne, Pr MinesParisTech Sophia
Publications
- 2
- 2
- 2
- 1
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- 2
Discharge frequency and reagents choice effects on robustness of silicon nitride (Si3N4) thin layers deposited by PECVD (Plasma-Enhanced Chemical Vapor Deposition)European Conference on Heat Treatment and Surface Engineering, Jun 2017, Nice, France
Communication dans un congrès
hal-01721378v1
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The impact of nitrogen plasma treatments on SixNyHz moisture sensitivityConference on Plasma Based Ion Implantation & Deposition, Oct 2017, Shanghai, France
Communication dans un congrès
hal-01721379v1
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