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Laurent PEDESSEAU
19
Documents
Identifiants chercheurs
- laurent-pedesseau
- 0000-0001-9414-8644
- IdRef : 069404003
Présentation
Education:
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**2019:** Habilitation Degree in Physics, Université Rennes (France)
**2004:** Ph.D in Physics, Université Paul Sabatier at Toulouse (France); Advisor: Prof. David Mainprice
About:
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Dr Pedesseau is an Associate Professor at the INSA Rennes (FOTON Institute - CNRS) whose work is aimed at the understanding of physical processes in the III-V semiconductor nanostructures for silicon photonics, the hybrid perovskites and novel materials for photovoltaics, and optoelectronic device simulations for optical-communications. His recent scientific interests include: 1) polar surface and interface energies of semiconductors; 2) first principles simulation (including the spin-orbit effect) of mechanical stability, electronic, and optical properties of 3D and 2D semiconductors; 3) electronic structure theory beyond the DFT such as hybrid functionals (HSE), many-body corrections GW, and DFT-1/2; 4) HPC technology for exotic and highly demanding simulations in terms of the large memory footprint and extensive CPUs communications (thousands).
Employment:
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**2011-present:** Associate Professor, Physics Department, INSA of Rennes, France
**2008-2011:** Postdoctoral fellow, ICG and LCC, University of Montpellier, France
**2006-2008:** Postdoctoral fellow, Physics Department, INSA of Rennes, France
**2004-2006:** Postdoctoral fellow, Chemistry department, University College London, London, UK
**2001-2004:** Ph.D. fellow, University Paul Sabatier, Toulouse, France
Research interests:
======================
Material science, Semiconductor physics, Quantum nanostructures, Solar Energy, Advanced Materials
Theoretical physics, Phase transitions, Dielectric and piezoelectric properties
Density functional theory, k.p method, Finite element method
Administrative responsibilities:
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**- Since 2016:** Leader of workgroup 1 (Nanostructure) for the COST Action MP1406 - MultiscaleSolar
**- Since 2016:** In charge of International Affairs for the Materials science dept. at the INSA Rennes.
Selected publications:
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\- Structural and thermodynamic limits of layer thickness in 2D halide perovskites. ***PNAS***, 116, 58, **2019**
\- Concept of Lattice mismatch an emergence of surface states in 2D hybrid perovskite QW. ***Nano Lett.***, 18, 9, **2018**
\- Universal description of III-V/Si epitaxial growth processes. ***Phys. Rev. Materials***, 2, 060401(R), **2018**
\- A stress-free and textured GaP template on Si for sol. wat. split.. ***Ad. Funct. Mat.***, 28, 1801585, **2018**
\- Scaling law for excitons in 2D perovskite quantum wells. ***Nat. Com.***, 9, 2254, **2018**
\- Anharmonicity and Disorder in the Black Phases of etc. ***ACS Nano***, 12, 3477, **2018**
\- Composite Nature of Layered Hybrid Perovskites: etc. ***ACS Nano***, 12, 3321, **2018**
\- Hybrid Dion–Jacobson 2D Lead Iodide Perovskites. ***JACS***, 140, 3775, **2018**
\- Decreasing the electronic confinement in layered perovskites through intercalation. ***Chem. Sci.***, **2017**
\- Extremely efficient internal exciton dissociation through edge states in 2D HOP. ***Science***, 355, **2017**
\- Advances and Promises of Layered Halide Hybrid Perovskite Semiconductors. ***ACS Nano***, 10, **2016**
\- Rashba and Dresselhaus Effects in HOP: From Basics to Devices. ***ACS Nano***, 9, 11557, **2015**
\- First-principles study of a NBS glass-former. I &II. ***Phys. Rev. B*** 91, 134201 & 134202, **2015**
\- Analysis of Multivalley and Multibandgap Absorption etc. ***J. Phys. Chem. C*** 118, 11566, **2014**
\- DFT and k·p modelling of the phase transitions of lead HOP etc. ***RRL*** 8, 31, **2014**
\- Importance of soc in hop for photovoltaic applications. ***J. Phys. Chem. Lett.*** 4, 2999, **2013**
\- Electronic model for self-assembled hybrid perovskite etc. ***Phys. Rev. B*** 86, 205301, **2012**
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Strong Electron–Phonon Interaction in 2D Vertical Homovalent III–V SingularitiesACS Nano, 2020, 14 (10), pp.13127-13136. ⟨10.1021/acsnano.0c04702⟩
Article dans une revue
hal-03032030v1
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A Stress-Free and Textured GaP Template on Silicon for Solar Water SplittingAdvanced Functional Materials, 2018, 28 (30), pp.1801585. ⟨10.1002/adfm.201801585⟩
Article dans une revue
hal-01803990v1
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Universal description of III-V/Si epitaxial growth processesPhysical Review Materials, 2018, 2 (6), pp.060401(R). ⟨10.1103/PhysRevMaterials.2.060401⟩
Article dans une revue
hal-01833206v1
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Hétéro-épitaxie III-V/Si : contrôle des propriétés des surfaces et interfaces pour la photo-électrochimie35èmes Journées Surfaces et Interfaces, Jan 2022, Dijon (virtual), France
Communication dans un congrès
hal-03588378v1
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Monolithic integration of III-V semiconductors on silicon for photonics and solar hydrogen productionSPb Photonic, Optoelectronic, & Electronic Materials (SPb-POEM 2019), Apr 2019, St Petersburg, Russia
Communication dans un congrès
hal-02112743v1
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A universal mechanism to describe III-V epitaxy on Si20th European Molecular Beam Epitaxy Workshop (Euro-MBE 2019), Feb 2019, Lenggries, Germany
Communication dans un congrès
hal-02048639v1
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Universal growth mechanism of III-V/Si: using antiphase boundaries for devices.Réunion plénière du GDR Pulse (PULSE 2019), Jul 2019, Clermont-Ferrand, France
Communication dans un congrès
hal-02189095v1
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(114) GaP surface texturation on Si for water splittingEMRS Spring meeting 2018, Jun 2018, Strasbourg, France
Communication dans un congrès
hal-01708047v1
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A universal mechanism to describe the III-V on Si growth by Molecular Beam Epitaxy20th International Conference on Molecular-Beam Epitaxy (ICMBE 2018), Sep 2018, Shanghai, China. pp.Th-C1-3(S)
Communication dans un congrès
hal-01910554v1
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GaP-based materials on silicon for photonics and energySmart NanoMaterials 2018: Advances, Innovation and Applications (SNAIA2018), Dec 2018, Paris, France
Communication dans un congrès
hal-01954362v1
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III-V/Si heterogeneous growth : thermodynamics and antiphase domains formation34th International Conference on the Physics of Semiconductors (ICPS 2018), Jul 2018, Montpellier, France
Communication dans un congrès
hal-01910543v1
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A general III-V/Si growth process descriptionEuropean Materials Research Society - Spring Meeting 2018 (E-MRS 2018 Spring Meeting), Jun 2018, Strasbourg, France
Communication dans un congrès
hal-01910535v1
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Large scale textured GaP(114) growth on vicinal Si substrate by Molecular Beam Epitaxy for water splitting applications20th International Conference on Molecular-Beam Epitaxy (ICMBE 2018), Sep 2018, Shanghai, China. pp.Tu-P-43(S)
Communication dans un congrès
hal-01910556v1
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III-V/Si 3D crystal growth: a thermodynamic descriptionEnergy Materials Nanotechnology Meeting 2017 / Collaborative Conference on Crystal Growth (EMN 3CG 2017), Aug 2017, Berlin, Germany
Communication dans un congrès
hal-01708282v1
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GaP/Si(001) polar-on-nonpolar epitaxial growth revisited by scanning tunneling microscopy.Réunion plénière du GDR Pulse (PULSE 2017), Oct 2017, Paris, France
Communication dans un congrès
hal-01715954v1
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Etude de la croissance cohérente de GaP/Si(001) en couche minceRéunion plénière du GDR Pulse (PULSE 2016), Jul 2016, Marseille, France
Communication dans un congrès
hal-01497149v1
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3D GaP/Si(001) growth mode and antiphase boundaries19th International Conference on Molecular-Beam Epitaxy (IC-MBE 2016), Sep 2016, Montpellier, France
Communication dans un congrès
hal-01497144v1
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Study of the 3D growth mode of III-V on Si by DFTRéunion plénière du GDR Pulse (PULSE 2017), Oct 2017, Paris, France
Poster de conférence
hal-01708149v1
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Relationship between antiphase domains, roughness and surface/interface energies during the epitaxial growth of GaP on SiEuropean Materials Research Society - Spring Meeting 2016 (E-MRS 2016 Spring Meeting), May 2016, Lille, France
Poster de conférence
hal-01497064v1
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