Martin HYTCH
22
Documents
Présentation
Dr Martin Hytch develops quantitative electron microscopy techniques for materials science applications. After carrying out his thesis at the University of Cambridge on the quantitative analysis of high-resolution images (HRTEM) of compound semiconductors in 1991, he moved to France to work at the CECM-CNRS in Paris, where he subsequently joined the CNRS in 1995. He is notably the inventor of the Geometric Phase Analysis (GPA) technique for the determination of strain from high-resolution images and has applied the technique to a wide range of materials problems and nanostructures. He moved to the CEMES-CNRS in Toulouse in 2004 to work on aberration-corrected HRTEM and electron holography. In 2007, he invented the new technique of dark-field electron holography for the measurement of strain and in 2008, he was recipient of the prestigious European Microscopy Award (FEI-EMA), awarded every 4 years at the European Microscopy Congress. Between 2009 and 2014, he headed the nanomaterials group at the CEMES (30 permanent staff). He has authored or coauthored over 130 scientific papers and given 70 invited talks at conferences and workshops.
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In-Situ Electrical Biasing of Electrically Connected TEM Lamellae with Embedded NanodevicesISTFA 2021, Oct 2021, Phoenix, France. pp.190-195, ⟨10.31399/asm.cp.istfa2021p0190⟩
Communication dans un congrès
hal-03412037v1
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Advanced characterization of semiconductorsXV B-MRS, Sep 2016, Campinas, Brazil
Communication dans un congrès
hal-01767758v1
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Development of TEM and SEM high brightness electron guns using cold field emission from a carbon nanotipPICO-2015, Apr 2015, Jülich, Netherlands
Communication dans un congrès
hal-02123316v1
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In situ electron microscopy of hard and soft matterJoint XIII Interamerican Microscopy Congress & XVI Venezuelan Congress for Microscopy and Microanalysis 'CIASEM-2015', Oct 2015, Isla de Margarita, Venezuela
Communication dans un congrès
hal-02123302v1
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Dark-Field Electron Holography for Strain MappingAlain Claverie; Mireille Mouis. Transmission Electron Microscopy in Micro-Nanoelectronics, Wiley-Blackwell, pp.81--106, 2013, ⟨10.1002/9781118579022.ch4⟩
Chapitre d'ouvrage
hal-01736026v1
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