Remi Dussart

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Publications

Article dans une revue (58)

Statistical study of dc breakdown in a nanometer electrode gap and evidence of elementary mechanisms Baptiste Disson,Nelly Bonifaci,Olivier Lesaint,Chistophe Poulain,Remi Dussartet al. Physical Review E , 2025, 112 (1), pp.015202. ⟨10.1103/qqsd-kgb3⟩ Article dans une revue hal-05151567v1
Quasi In Situ XPS on a SiO x F y Layer Deposited on Silicon by a Cryogenic Process G. Antoun,A. Girard,T. Tillocher,P. Lefaucheux,J. Faguetet al. ECS Journal of Solid State Science and Technology, 2022, 11 (1), pp.013013. ⟨10.1149/2162-8777/ac4c7d⟩ Article dans une revue hal-03565995v1
On the validity of neutral gas temperature by emission spectroscopy in micro-discharges close to atmospheric pressure Sylvain Iséni,Ronan Michaud,Philippe Lefaucheux,Goran Sretenović,Volker Schulz-von Der Gathenet al. Plasma Sources Science and Technology, 2019, 28 (6), pp.065003. ⟨10.1088/1361-6595/ab1dfb⟩ Article dans une revue hal-02117169v1
Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries Joe Sakai,Erwann Luais,Jérôme Wolfman,Thomas Tillocher,Remi Dussartet al. Journal of Applied Physics, 2017, 122 (15), pp.155103. ⟨10.1063/1.4997713⟩ Article dans une revue hal-01686032v1
Morphology control in thin films of PS: PLA homopolymer blends by dip-coating deposition Alexane Vital,Marylène Vayer,Thomas Tillocher,Remi Dussart,Mohamed Boufnichelet al. Applied Surface Science, 2017, 393, pp.127-133. ⟨10.1016/j.apsusc.2016.09.151⟩ Article dans une revue hal-01561189v1
Elucidating the effects of gas flow rate on an SF6 inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation Stefan Tinck,Thomas Tillocher,Remi Dussart,Erik Neyts,Annemie Bogaerts Journal of Physics D: Applied Physics, 2016, 49 (38), pp.385201. ⟨10.1088/0022-3727/49/38/385201⟩ Article dans une revue hal-01374746v1
Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices Valentin Felix,Philippe Lefaucheux,Olivier Aubry,Judith Golda,Volker Schulz-von Der Gathenet al. Plasma Sources Science and Technology, 2016, 25, pp.025021. ⟨10.1088/0963-0252/25/2/025021⟩ Article dans une revue hal-01287230v1
Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation Liping Zhang,Jean-Francois de Marneffe,Floriane Leroy,Philippe Lefaucheux,Thomas Tillocheret al. Journal of Physics D: Applied Physics, 2016, 49 (17), pp.175203. ⟨10.1088/0022-3727/49/17/175203⟩ Article dans une revue hal-01324407v1
Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation Nicolas Gosset,Mohamed Boufnichel,Emilie Bahette,Walid Khalfaoui,Rami Ljazouliet al. Journal of Micromechanics and Microengineering, 2015, 25, pp.095011. ⟨10.1088/0960-1317/25/9/095011⟩ Article dans une revue hal-01217644v1
Polymer masks for structured surface and plasma etching Alexane Vital,Marylène Vayer,Christophe Sinturel,Thomas Tillocher,Philippe Lefaucheuxet al. Applied Surface Science, 2015, 332, pp.237. ⟨10.1016/j.apsusc.2015.01.040⟩ Article dans une revue hal-01219273v1
Cryogenic etching of silicon with SF&lt;sub&gt;6&lt;/sub&gt; inductively coupled plasmas: a combined modelling and experimental study Stefan Tinck,Thomas Tillocher,Rémi Dussart,Annemie Bogaerts Journal of Physics D: Applied Physics, 2015, 48, pp.155204. ⟨10.1088/0022-3727/48/15/155204⟩ Article dans une revue hal-01135854v1
Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining Alexane Vital,Marylène Vayer,Christophe Sinturel,Thomas Tillocher,Philippe Lefaucheuxet al. Polymer, 2015, 76, pp.123-130. ⟨10.1016/j.polymer.2015.08.062⟩ Article dans une revue hal-01228427v1
Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas Floriane Leroy,Liping Zhang,Thomas Tillocher,Koichi Yatsuda,Kaoru Maekawaet al. Journal of Physics D: Applied Physics, 2015, 48, pp.435202. ⟨10.1088/0022-3727/48/43/435202⟩ Article dans une revue hal-01217648v1
Energy Transferred From a Hot Nickel Target During Magnetron Sputtering Mariem El Mokh,Amaël Caillard,Nadjib Semmar,Rémi Dussart,Thomas Lecaset al. IEEE Transactions on Plasma Science, 2014, pp.Plasma Science, IEEE Transactions on (Volume:PP Issue: 99 ). ⟨10.1109/TPS.2014.2338742⟩ Article dans une revue hal-01057286v1
Plasma cryogenic etching of silicon: from the early days to today's advanced technologies Remi Dussart,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichel Journal of Physics D: Applied Physics, 2014, pp.123001. ⟨10.1088/0022-3727/47/12/123001⟩ Article dans une revue hal-00959819v1
Width dependent interaction of trench-like microdischarges arranged in sub-arrays on a single silicon based chip Mukesh Kulsreshath,Judith Golda,V. Schulz-von Der Gathen,Remi Dussart Plasma Sources Science and Technology, 2014, 23, pp.045012. ⟨10.1088/0963-0252/23/4/045012⟩ Article dans une revue hal-01021943v1
Circular Emission and Destruction Patterns on a Silicon-Based Microdischarge Array Judith Golda,Mukesh Kulsreshath,H Boettner,Valentin Felix,Remi Dussartet al. IEEE Transactions on Plasma Science, 2014, 42 (10), pp.2646. ⟨10.1109/TPS.2014.2337657⟩ Article dans une revue hal-01082634v1
Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution Pierre-Antoine Cormier,A. Balhamri,Anne-Lise Thomann,Remi Dussart,Nadjib Semmaret al. Surface and Coatings Technology, 2014, Vol 254 (2014), Volume 254, 15 September 2014, Pages 291-297. ⟨10.1016/j.surfcoat.2014.06.037⟩ Article dans une revue istex hal-01057278v1
Alternated process for the deep etching of titanium Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart Journal of Micromechanics and Microengineering, 2014, 24, pp.075021. ⟨10.1088/0960-1317/24/7/075021⟩ Article dans une revue hal-01015146v1
IR emission from the target during plasma magnetron sputter deposition Pierre-Antoine Cormier,Anne Lise Thomann,Vincent Dolique,A. Balhamri,Remi Dussartet al. Thin Solid Films, 2013, pp.547(2013) 44-49. ⟨10.1016/j.tsf.2013.07.025⟩ Article dans une revue istex hal-00943789v1
A novel amorphization-etch alternating process for Si(100) Nasreddine Mekkakia Maaza,Remi Dussart,Thomas Tillocher,Philippe Lefaucheux,Pierre Ranson Journal of Micromechanics and Microengineering, 2013, 23, pp.045023. ⟨10.1088/0960-1317/23/4/045023⟩ Article dans une revue hal-00831302v1
Measuring the energy flux at the substrate position during magnetron sputter deposition processes Pierre-Antoine Cormier,A. Balhamri,Anne-Lise Thomann,Remi Dussart,Nadjib Semmaret al. Journal of Applied Physics, 2013, 113, pp.013305. ⟨10.1063/1.4773103⟩ Article dans une revue hal-00831364v1
Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere Anne-Lise Thomann,Pierre-Antoine Cormier,Vincent Dolique,Nadjib Semmar,Remi Dussartet al. Thin Solid Films, 2013, 539, pp.88. ⟨10.1016/j.tsf.2013.05.075⟩ Article dans une revue hal-00839010v1
Ignition and extinction phenomena in helium micro hollow cathode discharges M. K. Kulsreshath,N. Sadeghi,L. Schwaederle,T. Dufour,L. J. Overzetet al. Journal of Applied Physics, 2013, 114 (24), pp.243303. ⟨10.1063/1.4858418⟩ Article dans une revue hal-01303176v2
IR emission from the target during plasma magnetron sputter deposition P.-A. Cormier,A.-L. Thomann,Vincent Dolique,A. Balhamri,R. Dussartet al. Thin Solid Films, 2013, 545, pp.44-49. ⟨10.1016/j.tsf.2013.07.025⟩ Article dans une revue istex in2p3-00874718v1
Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4 Liping Zhang,Rami Ljazouli,Philippe Lefaucheux,Thomas Tillocher,Remi Dussartet al. ECS Journal of Solid State Science and Technology, 2013, 2 (6), pp.N131. ⟨10.1149/2.001306jss⟩ Article dans une revue hal-00831339v1
Damage Free Cryogenic Etching of a Porous Organosilica Ultralow-k Film Liping Zhang,Rami Ljazouli,Philippe Lefaucheux,Thomas Tillocher,Remi Dussartet al. Electrochemical and Solid-State Letters, 2012, 2 (2), pp.N5. ⟨10.1149/2.007302ssl⟩ Article dans une revue hal-00831289v1
Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenches Thomas Defforge,Gaël Gautier,Thomas Tillocher,Remi Dussart,François Tran-Van Journal of Vacuum Science & Technology A, 2012, 30 (1), pp.010601. ⟨10.1116/1.3665217⟩ Article dans une revue hal-00655000v1
Breakdown study of dc silicon micro-discharge devices Laurent Schwaederlé,Mukesh Kulsreshath,Lawrence J. Overzet,Philippe Lefaucheux,Thomas Tillocheret al. Journal of Physics D: Applied Physics, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩ Article dans une revue hal-00667649v1
Study of dc micro-discharge arrays made in silicon using CMOS compatible technology Mukesh Kulsreshath,Laurent Schwaederlé,Lawrence J. Overzet,Philippe Lefaucheux,Julien Ladroueet al. Journal of Physics D: Applied Physics, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩ Article dans une revue istex hal-00713105v1
Probing dusty-plasma/surface interactions with a heat flux microsensor Sergey Abolmasov,Pierre-Antoine Cormier,A. Torres Rios,Remi Dussart,Nadjib Semmaret al. Applied Physics Letters, 2012, pp.100, 1, 011601. ⟨10.1063/1.3674290⟩ Article dans une revue hal-00943785v1
Optimization of submicron deep trench profiles with the STiGer cryoetching process: reduction of defects Thomas Tillocher,Wassim Kafrouni,Julien Ladroue,Philippe Lefaucheux,Mohamed Boufnichelet al. Journal of Micromechanics and Microengineering, 2011, 21, pp.085005. ⟨10.1088/0960-1317/21/8/085005⟩ Article dans une revue istex hal-00655002v1
Scalloping removal on DRIE via using low concentrated alkaline solutions at low temperature Thomas Defforge,Xi Song,Gaël Gautier,Thomas Tillocher,Remi Dussartet al. Sensors and Actuators A: Physical , 2011, 170 (1-2), pp.114. ⟨10.1016/j.sna.2011.05.028⟩ Article dans une revue istex hal-00655001v1
Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching Corinne Y. Duluard,Pierre Ranson,Laurianne E. Pichon,Jeremy Pereira,El-Houcine Oubensaidet al. Journal of Micromechanics and Microengineering, 2011, 21, pp.065015 Article dans une revue hal-00655003v1
Deep GaN etching by inductively coupled plasma and induced surface defects Julien Ladroue,Aline Meritan,Mohamed Boufnichel,Philippe Lefaucheux,Pierre Ransonet al. Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1226. ⟨10.1116/1.3478674⟩ Article dans une revue hal-00519022v1
On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor Pierre-Antoine Cormier,Marc Stahl,Anne-Lise Thomann,Rémi Dussart,Matthias Wolteret al. Journal of Physics D: Applied Physics, 2010, 43 (46), pp.465201. ⟨10.1088/0022-3727/43/46/465201⟩ Article dans une revue istex hal-00569747v1
Experimental study and simulation of a micro-discharge with limited cathode area Thierry Dufour,Lawrence J. Overzet,Remi Dussart,L. C. Pitchford,N Sadeghiet al. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.565-574. ⟨10.1140/epjd/e2010-00273-6⟩ Article dans une revue hal-01303159v2
RF impedance measurements of DC atmospheric micro-discharges Lawrence J. Overzet,D. Jung,Monali Mandra,Matthew Goeckner,Thierry Dufouret al. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449-454. ⟨10.1140/epjd/e2010-00274-5⟩ Article dans une revue hal-01303158v1
Integrated micro-plasmas in silicon operating in helium Remi Dussart,Lawrence J. Overzet,Philippe Lefaucheux,Thierry Dufour,Mukesh Kulsreshathet al. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.601-608. ⟨10.1140/epjd/e2010-00272-7⟩ Article dans une revue hal-01303160v2
RF impedance measurements of DC atmospheric micro-discharges Lawrence J. Overzet,D. Jung,Monali Mandra,Matthew Goeckner,Thierry Dufouret al. The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449. ⟨10.1140/epjd/e2010-00274-5⟩ Article dans une revue hal-00655011v1
Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals L Bedra,a L Thomann,N Semmar,R Dussart,J Mathias Journal of Physics D: Applied Physics, 2010, 43 (6), pp.65202. ⟨10.1088/0022-3727/43/6/065202⟩ Article dans une revue istex hal-00569757v1
In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process J. Pereira,L.E. Pichon,R. Dussart,Christophe Cardinaud,C.Y. Duluardet al. Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩ Article dans une revue hal-00432322v1
Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy El-Houcine Oubensaid,Corinne Y. Duluard,Laurianne E. Pichon,B. Morillon,Mohamed Boufnichelet al. Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩ Article dans une revue istex hal-00413753v1
In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process Jeremy Pereira,Laurianne E. Pichon,Remi Dussart,Christophe Cardinaud,Corinne Y. Duluardet al. Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩ Article dans une revue hal-00365892v1
Neutral species in inductively coupled SF6/SiCl4 plasmas Corinne Y. Duluard,Pierre Ranson,Laurianne E. Pichon,El-Houcine Oubensaid,Jeremy Pereiraet al. Journal of Physics D: Applied Physics, 2009, 42, pp.115206 Article dans une revue hal-00396438v1
Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching El-Houcine Oubensaid,Corinne Y. Duluard,Laurianne E. Pichon,Jeremy Pereira,Mohamed Boufnichelet al. Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩ Article dans une revue istex hal-00400936v1
Two Cryogenic Processes Involving SF6, O2, and SiF4 for Silicon Deep Etching Thomas Tillocher,Remi Dussart,Lawrence J. Overzet,Xavier Mellhaoui,Philippe Lefaucheuxet al. Journal of The Electrochemical Society, 2008, 155 (3), pp.D187. ⟨10.1149/1.2826280⟩ Article dans une revue hal-00349343v1
Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium Thierry Dufour,Remi Dussart,P Lefaucheux,P Ranson,Lawrence J. Overzetet al. Applied Physics Letters, 2008, 93 (071508), ⟨10.1063/1.2966144͔⟩ Article dans une revue hal-01303157v3
Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma Remi Dussart,Anne-Lise Thomann,Laurianne E. Pichon,Larbi Bedra,Nadjib Semmaret al. Applied Physics Letters, 2008, 93, pp.131502. ⟨10.1063/1.2995988⟩ Article dans une revue hal-00336392v1
Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium Thierry Dufour,Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Lawrence J. Overzetet al. Applied Physics Letters, 2008, 93, pp.071508. ⟨10.1063/1.2966144⟩ Article dans une revue hal-00349341v1
SO2 passivating chemistry for silicon cryogenic deep etching Corinne Y. Duluard,Remi Dussart,Thomas Tillocher,Laurianne E. Pichon,Philippe Lefaucheuxet al. Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩ Article dans une revue istex hal-00349344v1
The passivation layer formation in the cryo-etching plasma process Remi Dussart,Xavier Mellhaoui,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichelet al. Microelectronic Engineering, 2007, 84, pp.1128. ⟨10.1016/j.mee.2007.01.048⟩ Article dans une revue istex hal-00365894v1
Silicon cryo-etching of deep holes Thomas Tillocher,Remi Dussart,Xavier Mellhaoui,Philippe Lefaucheux,Mohamed Boufnichelet al. Microelectronic Engineering, 2007, 84, pp.1120. ⟨10.1016/j.mee.2007.01.148⟩ Article dans une revue istex hal-00365907v1
CURRENT DISTRIBUTION OF AC SURFACE DISCHARGES AND ASSOCIATED CHEMISTRY Emmanuel Odic,Alice Goldman,Max Goldman,Marielle Dhainaut,Rémi Dussart Journal of Electrostatics, 2006, 64 (7-9), pp.477-484 Article dans une revue hal-00221383v1
Oxidation threshold in silicon etching at cryogenic temperatures Thomas Tillocher,Philippe Lefaucheux,Xavier Mellhaoui,Remi Dussart,Pierre Ransonet al. Journal of Vacuum Science & Technology A, 2006, 24 (4), pp.1073. ⟨10.1116/1.2210946⟩ Article dans une revue hal-00365909v1
Diagnostic system for plasma/surface energy transfer characterization Anne Lise Thomann,Nadjib Semmar,Rémi Dussart,Jacky Mathias,Vladislav Lang Review of Scientific Instruments, 2006, 77 (2), pp.033501-6 Article dans une revue hal-00097829v1
Origin, control and elimination of undercut in silicon deep plasma etching in the cryogenic process Mohamed Boufnichel,Philippe Lefaucheux,Said Aachboun,Rémi Dussart,Pierre Ranson Microelectronic Engineering, 2005, 77, pp.327-336 Article dans une revue hal-00098398v1
SiOxFy passivation layer in silicon cryoetching Xavier Mellhaoui,Rémi Dussart,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. Journal of Applied Physics, 2005, 98, pp.104901-10 Article dans une revue hal-00098638v1

Communication dans un congrès (170)

Statistical study of Argon breakdown in a controlled nanometer electrode gap, and the evidence of field emission effect Baptiste Disson,Nelly Bonifaci,Remi Dussart,Olivier Lesaint,Christophe Poulainet al. 78th Annual Gaseous Electronics Conference, Oct 2025, Seoul (Korea), South Korea Communication dans un congrès hal-05325680v1
Claquage aux distances sub-micromètrique : si Paschen avait su Baptiste Disson,Nelly Bonifaci,Remi Dussart,Olivier Lesaint,Christophe Poulainet al. Journées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France Communication dans un congrès hal-05325821v1
Study of experimental breakdown within controlled nanometer scale electrode gaps: evidence of elementary mechanisms Baptiste Disson,Nelly Bonifaci,Remi Dussart,Olivier Lesaint,Christophe Poulainet al. IEEE Pulsed Power Plasma Science Conference (PPPS 2025), Jun 2025, Berlin, Germany Communication dans un congrès hal-05126917v1
Optical emission spectroscopy analysis of Hydrogen Hβ spectral line in confined plasma Elane Kouadou,Sylvain Iséni,Arnaud Stolz,Philippe Lefaucheux,Remi Dussart International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France Communication dans un congrès hal-04606149v1
SiC plasma etching technology processes for power and optoelectronic devices Mihai Lazar,Nour Beydoun,Frédéric Marty,Elise Usureau,Enora Marion Vuillermetet al. PESM 2024, IMEC Belgium, Jun 2024, Leuven (BE), Belgium Communication dans un congrès hal-04797018v1
Enhanced physisorption of CF radicals on Si surfaces cooled at cryogenic temperature and application to deep etching Jack Nos,Sylvain Iséni,G. Cunge,M. Kogelschatz,Philippe Lefaucheuxet al. 45th International Symposium on Dry Process (DPS2024), Nov 2024, Hokkaïdo, Japan Communication dans un congrès hal-04805187v1
Cryogenic etching of SiOxFy and SiO2 in SF6/H2 plasma Remi Dussart,Lawrence J. Overzet,Philippe Lefaucheux,Thomas Tillocher Dry Process Symposium, Nov 2024, New Chitose, Japan Communication dans un congrès hal-04824284v1
La gravure plasma, une étape critique dans la technologie SiC. Mécanismes physico-chimiques et applications Mihai Lazar,Nour Beydoun,Frédéric Marty,Elise Usureau,Enora Vuillermetet al. Journées Renatech Litho/Gravure 2024, Jun 2024, Valbonne, France Communication dans un congrès hal-04799422v1
Optical emission spectroscopy spatial characterization of a silicon based Micro Hollow Cathode Discharge operating in Helium in DC regime Elane Kouadou,Sylvain Iséni,Arnaud Stolz,Philippe Lefaucheux,Remi Dussart 76th Annual Gaseous Electronics Conference, Oct 2023, Ann Arbor, United States Communication dans un congrès hal-04134203v1
Advances in optical diagnostics of Microplasmas: imaging and spectroscopy Sylvain Iséni,Nelly Bonifaci,Ahmed Khacef,Volker Schulz-von Der Gathen,Goran Sretenovićet al. International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States Communication dans un congrès hal-03633854v1
Fabrication process and first charactesisation of novel silicon-based microplasma reactors Elane Kouadou,Arnaud Stolz,Sylvain Iséni,Philippe Lefaucheux,Remi Dussart International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States Communication dans un congrès hal-03698719v1
Physical mechanisms involved in silicon based plasma microreactors operating in DC Remi Dussart,Ronan Michaud,Arnaud Stolz,Sylvain Iséni,Olivier Aubryet al. 5th Asia Pacific Conference on Plasma Physics (AAPPS-DPP2021), Association of Asia-Pacific Physical Societies and Division of Plasma Physics, Sep 2021, online - Kyushu University, Japan Communication dans un congrès hal-03355293v1
Atomic Layer Etching of Gallium Nitride (GaN) using fluorinated chemistry Lamiae Hamraoui,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Mohamed Boufnichel 42nd International Symposium on Dry Process, Nov 2021, Online, Japan Communication dans un congrès hal-03539418v1
Recent advances in micro-discharges ‒ sources and diagnostics Sylvain Iséni,Nelly Bonifaci,Ahmed Khacef,Remi Dussart MGK Colloquium - Transient Atmospheric Plasmas: from plasmas to liquids to solids, Apr 2021, Bochum, Germany Communication dans un congrès hal-03218025v1
Atomic layer etching of Gallium Nitride (GaN) using SF6 and Ar plasmas Lamiae Hamraoui,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Mohamed Boufnichel PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France Communication dans un congrès hal-03539383v1
SiOxFy layer deposition for cryogenic nanoscale etching Gaelle Antoun,Thomas Tillocher,Philippe Lefaucheux,Jack Nos,Aurélie Girardet al. PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France Communication dans un congrès hal-03539368v1
Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies Remi Dussart,Thomas Tillocher,Gaelle Antoun,Jack Nos,Philippe Lefaucheuxet al. 42nd International Symposium on Dry Process, Nov 2021, Online, Japan Communication dans un congrès hal-03539474v1
Resonance Broadening as a Valuable Diagnostic to Study Atmospheric Pressure Plasma \textendash ~Application to Micro-Plasmas Sylvain Iséni,Cecile Pichard,Ronan Michaud,Remi Dussart,Ahmed Khacef 9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany Communication dans un congrès hal-03049314v1
Études Spectroscopiques Aux Petites Échelles de Décharges à Haute Pression~: Intérêt Des Transitions Résonantes Sylvain Iséni,Ronan Michaud,Cecile Pichard,Ahmed Khacef,Remi Dussart Ecole Technologique Du Reseau Des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France Communication dans un congrès hal-03049312v1
Atmospheric Plasma DC Source in the Micro Scale Elaborated by Micro-Nanotechnologies Ronan Michaud,Sylvain Iséni,Arnaud Stolz,Philippe Lefaucheux,Remi Dussart XXV Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXII), Jul 2022, Paris, France Communication dans un congrès hal-03049315v1
Resonance broadening as a valuable diagnostic to study atmospheric pressure plasma – application to micro-plasmas Sylvain Iséni,Cécile Pichard,Ronan Michaud,Remi Dussart,Ahmed Khacef 9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany Communication dans un congrès hal-03374037v1
Atomic Layer Etching at cryogenic temperature Gaëlle Antoun,Gaelle Antoun,Philippe Lefaucheux,Thomas Tillocher,Remi Dussartet al. Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France Communication dans un congrès hal-02311323v1
Cryogenic process for Atomic Layer Etching Gaëlle Antoun,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Kumiko Yamazakiet al. Plasma Etch and Strip in Microtechnology, May 2019, Grenoble, France Communication dans un congrès hal-02311291v1
Plasma processes applied to SiO2 cryo-atomic layer etching Gaëlle Antoun,Remi Dussart,Philippe Lefaucheux,Thomas Tillocher,Tahara Shigeruet al. XXXIV International Conference on Phenomena in Ionized Gases - 10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan Communication dans un congrès hal-02311288v1
Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids atmosphériques: diagnostic des ondes d’ionisations et de micro-cavités Sylvain Iséni,A. Khacef,Ronan Michaud,Remi Dussart 25e Congrès Général de la Société Française de Physique, Jul 2019, Nantes, France Communication dans un congrès hal-02189144v1
Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids à haute pression: diagnostic des ondes d’ionisations et de micro-cavités Sylvain Iséni,Cécile Pichard,Ronan Michaud,Remi Dussart,A. Khacef 1e Rencontres Scientifiques Plasmas Froids et Lasers, Nov 2019, Toulouse, France Communication dans un congrès hal-02189173v1
Atomic Layer Etching at low substrate temperature Gaëlle Antoun,Philippe Lefaucheux,Thomas Tillocher,Remi Dussart,Kumiko Yamazakiet al. 19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, United States Communication dans un congrès hal-02311308v1
Étude par spectroscopie d'émission de la température du gaz à l'intérieur et au voisinage d'une micro-cavité plasma (MHCD) Sylvain Iséni,Ronan Michaud,Philippe Lefaucheux,Goran Sretenovic,V Schulz-von Der Gathenet al. 14e Journées du Réseau Plasmas Froids, Oct 2018, La Rochelle, France Communication dans un congrès hal-01974867v1
Bulk micromachined Titanium MEMS Gwenaël Bécan,Baptiste Rousset,Samson Edmond,Nathalie Isac,Maïté Do Valeet al. 16th NAMIS Workshop (NAMIS 2018), Jun 2018, Oulu, Finland Communication dans un congrès hal-02306373v1
Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage Romain Chanson,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Liping Zhanget al. 40th International Symposium on Dry Process, Nov 2018, Nagoya, France Communication dans un congrès hal-02311275v1
Vectorial Electric Field Characterization Of Plasmas Using An Optical Probe Farah Aljammal,Gwenaël Gaborit,Laurence Galtier,Guillaume Revillod,Sylvain Iséniet al. 71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States Communication dans un congrès hal-02018204v1
Electro-optical probe for dielectric barrier discharge analysis Farah Aljammal,Gwenaël Gaborit,Laurence Galtier,Guillaume Revillod,Sylvain Iséniet al. 45th IEEE International Conference on Plasma Science (ICOPS 2018), Jun 2018, Denver, United States Communication dans un congrès hal-02017951v1
The role of SiF4 physisorption in the cryogenic etching process of silicon Gaëlle Antoun,Philippe Lefaucheux,Thomas Tillocher,Remi Dussart,Tahara Shigeruet al. 40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan Communication dans un congrès hal-02311267v1
Titanium-based MEMS: Application for a novel implantable feedthrough using TTV (Through Titanium Vias) technologies Bertrand Boutaud,Edouard Laudrel,Marion Woytasik,Elie Lefeuvre,Thomas Tillocheret al. 6th Micro/Nano-Electronics Packaging and Assembly, Design and Manufacturing Forum (MiNaPAD 2018), May 2018, Grenoble, France Communication dans un congrès hal-02306370v1
Plasma properties of DC silicon based micro hollow cavity discharge (MHCD) operating in various gases - a spectroscopic study Sylvain Iséni,Ronan Michaud,Claudia Lazzaroni,Philippe Lefaucheux,Volker Schulz-von Der Gathenet al. 71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States Communication dans un congrès hal-02131687v1
Cryo-etching mechanism characterization by in-situ spectroscopic ellipsometry Remi Dussart,Gaëlle Antoun,Thomas Tillocher,Philippe Lefaucheux Surface Fest 2018, Jun 2018, Bordeaux, France Communication dans un congrès hal-02311254v1
Microdischarge integration on silicon based devices Rémi Dussart,Remi Dussart 70th Gaseous Electronics Conference, Nov 2017, Pittsburgh, United States Communication dans un congrès hal-01686038v1
Microstructuration of titanium for implantable components Edouard Laudrel,Thomas Tillocher,Philippe Lefaucheux,Marion Woytasik,Fabrice Michelet al. Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2017, Orléans, France Communication dans un congrès hal-02306063v1
Low-Damage etching of highly porous OSG low-k dielectrics Jean-Francois de Marneffe,Liping Zhang,Mikhail Baklanov,Koichi Yatsuda,Kaoru Maekawaet al. SPIE Advanced Lithography 2016, Feb 2016, San José, United States Communication dans un congrès hal-01280267v1
Cryoetching mechanisms and STiGer process evaluation Remi Dussart,Philippe Lefaucheux,Thomas Tillocher International Symposium on Dry Process 2016 (DPS 2016), Nov 2016, Sapporo, Japan Communication dans un congrès hal-01561210v1
Cryogenic processes for advanced material plasma etching Remi Dussart,Thomas Tillocher,Philippe Lefaucheux Quo vadis : Complex plasmas - TR 24, Aug 2016, Hambourg, Germany Communication dans un congrès hal-01374747v1
Effects of gas and surface temperatures during cryogenic etching of silicon with SF6/O2 Stefan Tinck,Erik Neyts,Thomas Tillocher,Remi Dussart,Annemie Bogaerts 69th Gaseous Electronic Conference, Oct 2016, Bochum, France Communication dans un congrès hal-01379701v1
Numerical and experimental investigation of cryogenic etching of silicon and porous low-dielectric Stefan Tinck,Thomas Tillocher,Remi Dussart,Erik Neyts,Annemie Bogaerts International Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan Communication dans un congrès hal-01561212v1
Enhanced lifetime for thin-dielectric microdischarge-arrays operating in DC Remi Dussart,Valentin Félix,Lawrence J. Overzet,Olivier Aubry,Arnaud Stolzet al. 69th Gaseous Electronic Conference, Oct 2016, Bochum, Germany Communication dans un congrès hal-01379698v1
Low damage cryoetching of low-K materials Remi Dussart,Thomas Tillocher,Floriane Leroy,Philippe Lefaucheux,Koichi Yatsudaet al. SPIE Advanced Lithography 2015, Feb 2015, San José, United States Communication dans un congrès hal-01151543v1
A novel low temperature etch approach to reduce ULK plasma damage Liping Zhang,Jean-Francois de Marneffe,Floriane Leroy,Rami Ljazouli,Philippe Lefaucheuxet al. Plasma Etch and Strip in Microtecnology, Apr 2015, Leuven, Belgium Communication dans un congrès hal-01151524v1
Cryogenic Etching of Silicon with SF6/O2/SiF4 plasmas: a modeling and experimental study Stefan Tinck,Erik Neyts,Thomas Tillocher,Remi Dussart,Annemie Bogaerts Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium Communication dans un congrès hal-01151530v1
Limitation of surface defects in deep GaN etching Nicolas Gosset,Thomas Tillocher,Floriane Leroy,Julien Ladroue,Philippe Lefaucheuxet al. AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228462v1
Reduction of plasma induced damage in cryogenic etching of low-k materials Thomas Tillocher,Floriane Leroy,Liping Zhang,Philippe Lefaucheux,Christian Dussaratet al. 4th French Symposium on Emerging Technologies for micro-nanofabrication, Nov 2015, Ecully, France Communication dans un congrès hal-01277115v1
Ignition phase of a silicon-based microdischarge array with excitation by burst waveforms Judith Golda,Valentin Felix,Remi Dussart,Lawrence J. Overzet,V. Schulz-von Der Gathen International workshop on microplasmas, May 2015, Newark, United States Communication dans un congrès hal-01166021v1
Cryoetching processes applied to ULK material Floriane Leroy,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Christian Dussaratet al. 37th International Symposium on Dry process , Nov 2015, Awaji, Japan Communication dans un congrès hal-01287233v1
DC and AC microplasmas on silicon : performances and limitations Remi Dussart,Valentin Felix,Lawrence J. Overzet,Olivier Aubry,Philippe Lefaucheuxet al. Asian-European Plasma Surface Engineering, Masaru Hori, Sep 2015, Jeju, South Korea Communication dans un congrès hal-01217651v1
Bulk titanium deep etching by plasma processes Edouard Laudrel,Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart , 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France Communication dans un congrès hal-01166023v1
Cryoetching processes applied to ULK material Floriane Leroy,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Koichi Yatsudaet al. 37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan Communication dans un congrès hal-01228477v1
Cryogenic etching of silicon with SF6/O2/SiF4 plasmas: a modelling and experimental study Stefan Tinck,E.C. Neyts,Thomas Tillocher,Remi Dussart,Annemie Bogaerts 22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium Communication dans un congrès hal-01228451v1
Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process Thomas Tillocher,Floriane Leroy,Liping Zhang,Philippe Lefaucheux,Koichi Yatsudaet al. 22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium Communication dans un congrès hal-01228448v1
Surface state improvement in GaN deep etching for power electronics applications Nicolas Gosset,Floriane Leroy,Thomas Tillocher,Julien Ladroue,Philippe Lefaucheuxet al. 37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan Communication dans un congrès hal-01228470v1
Energy flux diagnostics in thin film deposition by magnetron sputtering Anne-Lise Thomann,Amaël Caillard,El Mokh Mariem,Nadjib Semmar,Remi Dussartet al. XXXII International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2015, Iasi, Romania Communication dans un congrès hal-01290726v1
Plasma Cryogenic Etching: from 3D Integration to Low-k Materials Thomas Tillocher,Remi Dussart,Floriane Leroy,Philippe Lefaucheux,Mohamed Boufnichelet al. China Semiconductor Technology International Conference, Mar 2015, Shanghai, China Communication dans un congrès hal-01151533v1
Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis Floriane Leroy,Thomas Tillocher,Liping Zhang,A. Girard,Christophe Cardinaudet al. Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium Communication dans un congrès hal-01151528v1
Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films Alexane Vital,Mohamed Boufnichel,Remi Dussart,Nicolas Gosset,Philippe Lefaucheuxet al. 2015 MRS Spring Meeting & Exhibit, Apr 2015, San francisco, United States Communication dans un congrès hal-01151542v1
DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES Edouard Laudrel,Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228465v1
Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage Floriane Leroy,Thomas Tillocher,Liping Zhang,Philippe Lefaucheux,Koichi Yatsudaet al. AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States Communication dans un congrès hal-01228458v1
Performances and limitations of DC microdischarges on silicon platforms Remi Dussart,Valentin Felix,Olivier Aubry,Philippe Lefaucheux 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France Communication dans un congrès hal-01166022v1
Performances and instabilities of silicon based microdischarges Remi Dussart,Valentin Felix,Lawrence J. Overzet,Olivier Aubry,Philippe Lefaucheuxet al. International workshop on microplasmas, May 2015, Newark, United States Communication dans un congrès hal-01166019v1
Cryoetching of Silicon and Advanced Materials for 3D Interconnects Remi Dussart,Thomas Tillocher,Nicolas Gosset,Philippe Lefaucheux,Mohamed Boufnichelet al. 226th meeting of the Electroschemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151844v1
Improvement of GaN Deep Etched Surface State by Fluorination Dedicated to Power Devices Nicolas Gosset,Julien Ladroue,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichelet al. 226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151851v1
Cryogenic etching of submicronic features in silicon using masks based on porous polymer films Thomas Tillocher,Alexane Vital,Marylène Vayer,Nicolas Gosset,Philippe Lefaucheuxet al. 226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico Communication dans un congrès hal-01151839v1
Spectroscopic investigations of transient processes in micro-cavity discharge reactors V. Schulz-von Der Gathen,Judith Golda,Daniel Schröder,H. Boettner,Arthur Grebet al. International Symposium on Non-equilibrium Plasmas and Complex Systems, Feb 2014, Osaka, Japan Communication dans un congrès hal-01006368v1
Study of energy transfers at the substrate during “transition steps” in magnetron sputter deposition Anne-Lise Thomann,El Mariem,Amaël Caillard,Nadjib Semmar,Thomas Lecaset al. 14th International Conference on Plasma Surface Engineering PSE 2014 , Sep 2014, Garmisch-Partenkirchen, Germany Communication dans un congrès hal-01289446v1
Multiscale etching of holes by cryogenic silicon etching Thomas Tillocher,Xiao Liu,Alexane Vital,Nicolas Gosset,Philippe Lefaucheuxet al. Plasma Etch and Strip in Microtechnology, May 2014, Gernoble, France Communication dans un congrès hal-01057242v1
Low damage cryogenic etching of low-K materials for advanced interconnects Mikhail Baklanov,Liping Zhang,Jean-Francois de Marneffe,Remi Dussart,Andy Goodyear Materials for Advanced Metallization, Mar 2014, Dresden, Germany Communication dans un congrès hal-01006369v1
Submicrometric structured silicon surfaces obtained from polymer blend film by silica replication and cryogenic plasma etching Alexane Vital,Thomas Tillocher,Remi Dussart,Marylène Vayer,Christophe Sinturel Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France Communication dans un congrès hal-01057586v1
Effect of surface fluorination on GaN deep dry etching defects Nicolas Gosset,Julien Ladroue,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichelet al. Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France Communication dans un congrès hal-01057239v1
Plasma cryoetching processes for silicon and advanced materials Remi Dussart,Thomas Tillocher,Nicolas Gosset,Alexane Vital,Philippe Lefaucheuxet al. International Conference on Microelectronics and Plasma Technology, Jul 2014, Gunsan, South Korea Communication dans un congrès hal-01057585v1
RF diagnostics performed on DC Microplasmas Valentin Félix,Remi Dussart,Mukesh Kulsreshath,Philippe Lefaucheux,V. Schulz-von Der Gathenet al. 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056614v1
Radio Frequency Diagnostics of Microplasmas Lawrence J. Overzet,Matthew Goeckner,Remi Dussart,Philippe Lefaucheux,Valentin Félixet al. Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands Communication dans un congrès hal-00831368v1
Deep etching processes for silicon micro- and nano-machining Thomas Tillocher,Philippe Lefaucheux,Remi Dussart Le Studium workshop : Bottom-up approaches to nanotechnology, May 2013, Orléans, France Communication dans un congrès hal-00831360v1
Reproducible process for Titanium deep etching Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium Communication dans un congrès hal-00831358v1
Reproducible process for titanium deep etching Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01057233v1
Integrated microplasmas on silicon: performances and limitations Remi Dussart,Mukesh Kulsreshath,Valentin Félix,Lawrence J. Overzet,Judith Goldaet al. 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056618v1
Damage Free Cryogenic Etching of Ultra Low-k Materials Mikhail Baklanov,Liping Zhang,Jean-Francois de Marneffe,Remi Dussart International Interconnect Technology Conference, Jun 2013, Kyoto, Japan Communication dans un congrès hal-01056603v1
Plasma deep etching of silicon, titanium and gallium nitride for microtechnology Remi Dussart,Philippe Lefaucheux,Thomas Tillocher,Nicolas Gosset,Julien Ladroueet al. AVS 60th International Symposium & Exhibition, Oct 2013, United States Communication dans un congrès hal-01006364v1
Titanium deep etching for medical applications Thomas Tillocher,Philippe Lefaucheux,Bertrand Boutaud,Remi Dussart AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States Communication dans un congrès hal-01057236v1
Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing Remi Dussart,Philippe Lefaucheux,Thomas Tillocher,Pierre Ranson,Mohamed Boufnichelet al. Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium Communication dans un congrès hal-00831344v1
Plasma surface interactions in deep dry etching Thomas Tillocher,Julien Ladroue,Philippe Lefaucheux,Mohamed Boufnichel,Remi Dussart Workshop on particle - surface interactions : from surface analysis to materials processing, Jun 2013, Luxembourg, Luxembourg Communication dans un congrès hal-00831337v1
Spectroscopic Diagnostics of Ceramic MHCDs Judith Golda,V Schulz-von Der Gathen,Valentin Félix,Remi Dussart,Philippe Lefaucheuxet al. International Workshop on Microplasmas, May 2013, Pékin, China Communication dans un congrès hal-00831354v1
On Causes of the Destruction of MHCD Sources During Operation Lawrence J. Overzet,Valentin Felix,Remi Dussart,Philippe Lefaucheux,Mukesh Kulsreshathet al. International Workshop on Microplasmas, May 2013, Pékin, China Communication dans un congrès hal-00831363v1
RF Diagnostics of Microplasmas Valentin Félix,Remi Dussart,Mukesh Kulsreshath,Philippe Lefaucheux,V. Schulz-von Der Gathenet al. International Workshop on Microplasmas, May 2013, Pékin, China Communication dans un congrès hal-00831362v1
Energy flux measurements at the substrate deposition during reactive and non-reactive magnetron sputter deposition processes Pierre-Antoine Cormier,A. Balhamri,Anne Lise Thomann,Remi Dussart,Nadjib Semmaret al. 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01166024v1
Dry deep etching of GaN wide-bandgap semiconductor Nicolas Gosset,Julien Ladroue,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichelet al. 19th International Vacuum Conference, Sep 2013, Paris, France Communication dans un congrès hal-01056606v1
Dry deep etching of GaN wide band-gap Semiconductor Nicolas Gosset,Julien Ladroue,Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichelet al. AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States Communication dans un congrès hal-01057235v1
Deep etching of gallium nitride by chlorine based plasma Remi Dussart,Julien Ladroue,Thomas Tillocher,Mohamed Boufnichel,Nicolas Gossetet al. Journées Nationales des Technologies Emergentes, May 2013, Evian, France Communication dans un congrès hal-00831346v1
Advantages of energy influx measurements in low pressure plasma processes Pierre-Antoine Cormier,Anne-Lise Thomann,Nadjib Semmar,Remi Dussart,Vincent Doliqueet al. International Conference on Plasma Surface Engineering, Sep 2012, Garmisch-Partenkirchen, Germany Communication dans un congrès hal-00831371v1
Optimization of STiGer process used to etch high aspect ratio silicon microstructures Thomas Tillocher,Philippe Lefaucheux,Julien Ladroue,Mohamed Boufnichel,Pierre Ransonet al. AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747743v1
Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry Thomas Tillocher,Judith Golda,Philippe Lefaucheux,Bertrand Boutaud,Pierre Ransonet al. ESCAMPIG 2012, Jul 2012, Viana do Castelo, Portugal Communication dans un congrès hal-00831352v1
Deep GaN Etching : Role of SiCl4 in Plasma Chemistry Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747746v1
Damage free cryogenic etching of porous organosilicate low-k films for advanced interconnect application Liping Zhang,Rami Ljazouli,Philippe Lefaucheux,Thomas Tillocher,Remi Dussartet al. AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States Communication dans un congrès hal-00747749v1
Development and limitations of microplasma arrays on silicon operating in DC Remi Dussart,Mukesh Kulsreshath,Laurent Schwaederlé,Valentin Felix,Philippe Lefaucheuxet al. AVS 59th International Symposium and Exhibition, Oct 2012, United States Communication dans un congrès hal-00747741v1
Development of microdicharges in silicon operating in DC for medical applications Mukesh Kulsreshath,Laurent Schwaederlé,Lawrence J. Overzet,Thomas Tillocher,Sébastien Doziaset al. 4th International Conference on Plasma Medecine, Jun 2012, Orléans, France Communication dans un congrès hal-00831349v1
Development and characterization of microplasma arrays on Silicon Remi Dussart,Thierry Dufour,Mukesh Kulsreshath,Valentin Felix,Laurent Schwaederléet al. International Workshop on Physics of Microplasmas, May 2012, Bochum, Germany Communication dans un congrès hal-00707932v1
Caractérisation de matrices de micro plasmas sur silicium Mukesh Kulsreshath,Laurent Schwaederlé,Valentin Felix,Philippe Lefaucheux,Thomas Tillocheret al. XIIeme congrès de la division Plasmas de la Société Française de Physique, May 2012, Orléans, France Communication dans un congrès hal-00707935v1
Integrated microplasmas on silicon: a new tool for lab-on-a-chip applications Remi Dussart,Mukesh Kulsreshath,Valentin Felix,Lawrence J. Overzet,Thomas Tillocheret al. Cancer Cells On Chip, Jun 2012, Lyon, France Communication dans un congrès hal-00707933v1
Formation of black silicon by cryogenic plasma etching processes Thomas Tillocher,Jérémy Pereira,Nasreddine Mekkakia Maaza,Philippe Lefaucheux,Pierre Ransonet al. Micro- and Nano-Engineering (MNE), Sep 2012, Toulouse, France Communication dans un congrès hal-00831357v1
Balanced/unbalanced planar magnetron plasma behaviour. Microscopic analysis by PIC-MCC modelling of the ion flux on thermal probes Tiberiu Minea,Lise Caillault,Pierre-Antoine Cormier,Remi Dussart,Nadjib Semmaret al. 13th International Conference on Plasma Surface Engineering PSE 2012, Sep 2012, Garmisch-Partenkirchen, Germany Communication dans un congrès hal-01288936v1
Development of microdicharge arrays in silicon operating in DC and AC Mukesh Kulsreshath,Laurent Schwaederlé,Lawrence J. Overzet,Thomas Tillocher,Sébastien Doziaset al. European Physical Society/International Conference on Plasma Physics, Jul 2012, Stockholm, Sweden Communication dans un congrès hal-00831351v1
Energy influx measurements in low pressure plasmas for material processing Anne-Lise Thomann,Pierre-Antoine Cormier,Remi Dussart,Nadjib Semmar,Jacky Mathiaset al. Innovations in Thin Film Processing and Characterisation, and Magnetron, Ion Processing and Arc Technologies European Conference, ITFPC-MIATEC 2011 , Nov 2011, Nancy, France Communication dans un congrès hal-01289043v1
Characterisation of Silicon based micro discharge plasma arrays in Direct Current (DC) at atmospheric pressure Mukesh Kulsreshath,Laurent Schwaederlé,Philippe Lefaucheux,Thomas Tillocher,Julien Ladroueet al. 6th International Workshop on Microplasmas, Apr 2011, Paris, France Communication dans un congrès hal-00707925v1
Obtaining a smooth surface after deep GaN etching Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696419v1
Deep GaN Etching by Inductively Coupled Plasma Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. HeteroSiC-WASMPE 2011, Jun 2011, Tours, France Communication dans un congrès hal-00696418v1
Characterization of the ignition and the extinction of a Micro Hollow Cathode Discharge Remi Dussart,N. Sadeghi,Lawrence J. Overzet,Mukesh Kulsreshath,Laurent Schwaederléet al. 6th International Workshop on Microplasmas, Apr 2011, Paris, France Communication dans un congrès hal-00707924v1
Micro plasma reactor arrays made in silicon Mukesh Kulsreshath,Laurent Schwaederlé,Philippe Lefaucheux,H. Boettner,V. Schulz-von Der Gathenet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00707927v1
Direct energy influx measurements between a biased substrate and a low pressure plasma Pierre-Antoine Cormier,Anne-Lise Thomann,Remi Dussart,Nadjib Semmar,Jacky Mathias 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00707930v1
Deep Gallium Nitride Etching: ways to avoid etching defects Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Mar 2011, Nagoya, Japan Communication dans un congrès hal-00696396v1
Microcathode sustained discharges using Si integrated micro-discharges arrays Laurent Schwaederlé,Mukesh Kulsreshath,Lawrence J. Overzet,Philippe Lefaucheux,Remi Dussart 6th International Workshop on Microplasmas, Apr 2011, France, France Communication dans un congrès hal-00707926v1
Microcathode sustained discharges using Si integrated micro-reactors Laurent Schwaederlé,Mukesh Kulsreshath,Lawrence J. Overzet,Remi Dussart,Philippe Lefaucheuxet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00707929v1
Deep etching of bulk titanium by plasma Thomas Tillocher,Julien Ladroue,Wassim Kafrouni,Mukesh Kulsreshath,Philippe Lefaucheuxet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696425v1
STiGer process for silicon deep etching: extended scalloping reduction on submicron trenches Wassim Kafrouni,Thomas Tillocher,Julien Ladroue,Philippe Lefaucheux,Mohamed Boufnichelet al. 18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France Communication dans un congrès hal-00696422v1
Deep silicon etching of 0.8 µm to hundreds of microns wide trenches with the STiGer process Thomas Tillocher,Wassim Kafrouni,Julien Ladroue,Philippe Lefaucheux,Pierre Ransonet al. AVS 58th International Symposium & Exhibition, Oct 2011, Nashville, United States Communication dans un congrès hal-00696428v1
Direct energy influx measurements in high power impulse sputtering Pierre-Antoine Cormier,Balharmi A.,Anne-Lise Thomann,Stephanos Konstantinidis,Remi Dussartet al. 2nd International Conference on HiPIMS, HiPIMS2011 , Jun 2011, Braunschweig, Germany Communication dans un congrès hal-01288780v1
Study of an MHCD operating in He using optical and electrical diagnostics Remi Dussart,Thierry Dufour,Thomas Tillocher,Mukesh Kulsreshath,Olivier Aubryet al. Diagnostics Microplasmas, Mar 2010, Germany Communication dans un congrès hal-00487365v1
Gravure du GaN pour la prochaine génération de diodes Schottky Julien Ladroue,Remi Dussart,Thomas Tillocher,Philippe Lefaucheux,Pierre Ranson Workshop MNTS 12-20, Minatec, Mar 2010, Grenoble, France Communication dans un congrès hal-00487358v1
Ignition and extinction of a Micro Hollow Cathode Discharge operating in DC regime Remi Dussart,Mukesh Kulsreshath,Thierry Dufour,Lawrence J. Overzet,Philippe Lefaucheuxet al. AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States Communication dans un congrès hal-00696390v1
Deep GaN Etching by Inductively Coupled Plasma Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. 3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France Communication dans un congrès hal-00487363v1
Micro Hollow Cathode Discharge Arrays in silicon devices Remi Dussart,Mukesh Kulsreshath,Lawrence J. Overzet,Laurent Schwaederlé,Thomas Tillocheret al. 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00681902v1
RF Diagnostics of Atmospheric Pressure Micro-Plasmas Lawrence J. Overzet,Monali Mandra,D. Jung,Thierry Dufour,Remi Dussartet al. Diagnostics Microplasmas, Mar 2010, Germany Communication dans un congrès hal-00487366v1
Comparaison d'une sonde calorimétrique et d'un capteur à thermopile pour la mesure des transferts d'énergie plasma basse pression/surface Nadjib Semmar,Pierre-Antoine Cormier,Anne Lise Thomann,Rémi Dussart,Jacky Mathiaset al. Congrès Français de Thermique, May 2010, Le Touquet, France. pp.755-760 Communication dans un congrès hal-00504417v1
Les Microdécharges en France Remi Dussart Journées Plasma Québec du Réseau Plasma Froid, Jun 2010, France Communication dans un congrès hal-00503123v1
Deep Gallium Nitride Etching Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00696376v1
Micro-discharge plasma using silicon platform Mukesh Kulsreshath,Thierry Dufour,Philippe Lefaucheux,Olivier Aubry,Sébastien Doziaset al. AVS 57th International Symposium & Exhibition, Oct 2010, Albuquerque, United States Communication dans un congrès hal-00707922v1
Silicon deep cryoetching with the STiGer process Thomas Tillocher,Vincent L. Girault,Guillaume Gomme,Franck Moro,Laurianne E. Pichonet al. 3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France Communication dans un congrès hal-00487360v1
Optimization of STiGer process for silicon deep etching Thomas Tillocher,Wassim Kafrouni,Vincent Girault,Julien Ladroue,Philippe Lefaucheuxet al. 63rd Gaseous Electronics Conference, Oct 2010, Paris, France Communication dans un congrès hal-00696366v1
Deep Inductively Coupled Plasma Etching of GaN Julien Ladroue,Mohamed Boufnichel,Thomas Tillocher,Philippe Lefaucheux,Pierre Ransonet al. AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States Communication dans un congrès hal-00696393v1
Formation of Columnar MicroStructures of silicon (CMS) in SF6/O2 plasma in cryogenic conditions Jeremy Pereira,Remi Dussart,Laurianne E. Pichon,Vincent L. Girault,Philippe Lefaucheuxet al. 17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France Communication dans un congrès hal-00444402v1
Direct measurement of energy transfers during deposition of sputtered metal atoms Larbi Bedra,Anne-Lise Thomann,Nadjib Semmar,Rémi Dussart,Jacky Mathias 17th International Colloquium on Plasma Processes, CIP 09, Jun 2009, Marseille, France Communication dans un congrès hal-00445581v1
STiGer cryoetching process on silicon : results on performances for 0.8 um trenches Vincent L. Girault,Remi Dussart,Laurianne E. Pichon,Jeremy Pereira,Philippe Lefaucheuxet al. 17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France Communication dans un congrès hal-00444466v1
Electrical Characterization of Direct Current Atmospheric Pressure Micro-Discharges Using Radio Frequency Signals in Argon Monali Mandra,Lawrence J. Overzet,Matthew Goeckner,Thierry Dufour,Remi Dussartet al. 62nd Gaseous Electronics Conference, Oct 2009, Saratoga Springs, United States Communication dans un congrès hal-00444482v1
STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances Jeremy Pereira,Hao Jiang,Laurianne E. Pichon,Remi Dussart,Corinne Y. Duluardet al. Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium Communication dans un congrès hal-00444370v1
Inductively Coupled Plasma Etching of GaN and Induced Defects Julien Ladroue,Aline Meritan,Mohamed Boufnichel,Philippe Lefaucheux,Pierre Ransonet al. AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States Communication dans un congrès hal-00444488v1
Ignition and characterization of Micro Hollow Cathode Discharges in Helium Thierry Dufour,Remi Dussart,Lawrence J. Overzet,Monali Mandra,Jeong Bong Leeet al. 17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France Communication dans un congrès hal-00444380v1
A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching Corinne Y. Duluard,Thomas Tillocher,Laurianne E. Pichon,Remi Dussart,Philippe Lefaucheuxet al. AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States Communication dans un congrès hal-00442683v1
GaN Etching by Inductively Coupled Plasma Julien Ladroue,Aline Meritan,Mohamed Boufnichel,Philippe Lefaucheux,Pierre Ransonet al. 17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France Communication dans un congrès hal-00444471v1
Experiment and simulation results of limited cathode area MHCDs operating in He Remi Dussart,Thierry Dufour,Lawrence J. Overzet,Monali Mandra,Jeong Bong Leeet al. AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States Communication dans un congrès hal-00444491v1
New Approach of Heat Transfer Characterization on Thin Si and Cu Solids.-Effects of Thermal Contact Resistance Larbi Bedra,Nadjib Semmar,Anne-Lise Thomann,Rémi Dussart,Jacky Mathias 5th European Thermal-Sciences Conference, Eutrotherm 2008, May 2008, Netherlands. pp.101-106 Communication dans un congrès hal-00443101v1
Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge Jeremy Pereira,Laurianne E. Pichon,Remi Dussart,Corinne Y. Duluard,El-Houcine Oubensaidet al. AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States Communication dans un congrès hal-00444361v1
A direct measurement of the energy flux density in plasma surface interaction Rémi Dussart,Anne-Lise Thomann,Nadjib Semmar,Laurianne E. Pichon,Larbi Bedraet al. 61st Gaseous Electronics Conference, 2008, United States Communication dans un congrès hal-00448760v1
Micro transfert d'énergie dans un solide mince : effet de la résistance thermique de contact Larbi Bedra,Nadjib Semmar,Anne-Lise Thomann,Rémi Dussart,Jacky Mathiaset al. Congrès Français de Thermique, SFT 2008, Jun 2008, Toulouse, France. pp.385-390 Communication dans un congrès hal-00443715v1
Direct measurements of the energy transfers in deposition or etching low pressure plasma processes Anne-Lise Thomann,Rémi Dussart,Nadjib Semmar,Larbi Bedra,Jacky Mathiaset al. 11th International Conference on Plasma Surface Engineering, PSE2008, Sep 2008, Garmisch-Partenkirchen, Germany Communication dans un congrès hal-00445589v1
Ignition of parallel Micro Hollow Cathode Discharges in He without ballasts Thierry Dufour,Monali Mandra,Matthew Goeckner,Philippe Lefaucheux,Pierre Ransonet al. 61st Gaseous Electronics Conference, Oct 2008, Dallas, United States Communication dans un congrès hal-00444346v1
Direct current parallel microdischarges in helium Thierry Dufour,Remi Dussart,Lawrence J. Overzet,Philippe Lefaucheux,Pierre Ransonet al. ISPC-18, Aug 2007, Kyoto, Japan Communication dans un congrès hal-01303260v2
Cryoetching of silicon for MEMS and microelectronic components Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Laurianne E. Pichon,Corinne Y. Duluardet al. 16th International Colloquium on Plasma Processes, Jun 2007, France Communication dans un congrès hal-00442662v1
A robust passivation-enhanced cryogenic process used for deep silicon etching Laurianne E. Pichon,El-Houcine Oubensaid,Corinne Y. Duluard,Remi Dussart,Philippe Lefaucheuxet al. AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States Communication dans un congrès hal-00444264v1
SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature Laurianne E. Pichon,Corinne Y. Duluard,Thomas Tillocher,Remi Dussart,Philippe Lefaucheuxet al. 18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105 Communication dans un congrès hal-00444241v1
Enhanced robustness of the cryogenic process for silicon deep etching Remi Dussart,Thomas Tillocher,El-Houcine Oubensaid,Philippe Lefaucheux,Pierre Ransonet al. Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark Communication dans un congrès hal-00444248v1
Limitation of the cathode area for direct current MHCD in Helium Thierry Dufour,Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Monali Mandraet al. 4th International Workshop on Microplasmas, Oct 2007, Tainan, Taiwan Communication dans un congrès hal-00444267v1
Submicronic Etching in the Cryogenic Process Nasreddine Mekkakia Maaza,Remi Dussart,Philippe Lefaucheux,Pierre Ranson 16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France Communication dans un congrès hal-00442684v1
A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy Corinne Y. Duluard,Remi Dussart,Laurianne E. Pichon,Philippe Lefaucheux,Michel Puechet al. 16th International Colloquium on Plasma Processes, Jun 2007, France Communication dans un congrès hal-00444208v1
Global evaluation of the energy transfer between an ICP argon plasma and a surface Rémi Dussart,Anne-Lise Thomann,Nadjib Semmar,Laurianne E. Pichon,Jacky Mathiaset al. Internatinal Symposium on Plasma Chemistry, ISPC-18, Aug 2007, Kyoto, Japan. 28p-5 Communication dans un congrès hal-00443518v1
Control of the ignition of direct current parallel microdischarges in helium Thierry Dufour,Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Jeong B. Leeet al. 16th International Colloquium on Plasma Processes, Jun 2007, France Communication dans un congrès hal-00442687v1
A new generation of cryogenic processes for silicon deep etching Remi Dussart 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00365911v1
A new generation of cryogenic processes for silicon deep etching Remi Dussart,Philippe Lefaucheux,Pierre Ranson,Laurianne E. Pichon,Corinne Y. Duluardet al. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00442668v1
SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature Remi Dussart,Laurianne E. Pichon,Corinne Y. Duluard,Philippe Lefaucheux,Mohamed Boufnichelet al. 16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France Communication dans un congrès hal-00444198v1
Neutral production in SF6/SiCl4 inductively coupled plasmas Corinne Y. Duluard,Remi Dussart,Laurianne E. Pichon,El-Houcine Oubensaid,Philippe Lefaucheuxet al. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00444252v1
Fabrication process and electrical characterization of direct current parallel microdischarges in helium Monali Mandra,Remi Dussart,Jeong Bong Lee,Matthew Goeckner,Thierry Dufouret al. 60th Gaseous Electronics Conference, Oct 2007, Arlington, United States Communication dans un congrès hal-00444259v1
Direct current parallel microdischarges in helium Remi Dussart,Thierry Dufour,Lawrence J. Overzet,Philippe Lefaucheux,Pierre Ransonet al. International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.27A-a3 Communication dans un congrès hal-00444228v1
SiOxFy passivation layer characterization in the silicon cryoetching Xavier Mellhaoui,Remi Dussart,Thomas Tillocher,Philippe Lefaucheux,Lawrence J. Overzetet al. Eighth International Conference on Advanced Surface Engineering (8th ICASE), Apr 2006, Japan Communication dans un congrès hal-00442663v1
Mise au point d'un micro-fluxmètre pour la caractérisation des transferts d'énergie dans un plasma d'argon Nadjib Semmar,Anne-Lise Thomann,Rémi Dussart,Jacky Mathias Congrès Français de Thermique, SFT 2006, May 2006, Île de Ré, France. pp.727-732 Communication dans un congrès hal-00443914v1
Electrical and spectroscopic study of DC microdischarges made in alumina Remi Dussart,Lawrence J. Overzet,Thierry Dufour,Philippe Lefaucheux 3rd International Workshop on Microplasmas, May 2006, Greifswald, Germany Communication dans un congrès hal-00442675v1
Mechanisms and optimization in the cryogenic etching plasma process Thomas Tillocher,Remi Dussart Workshop on Silicon dry processing, Sep 2006, Aix-La-Chapelle, Germany Communication dans un congrès hal-00442676v1
Diagnostic des plasma par micro-fluxmètre Anne-Lise Thomann,Nadjib Semmar,Rémi Dussart,Jacky Mathias Congrès de la division plasma de la SFP, 2006, May 2006, Pont-à-Mousson, France Communication dans un congrès hal-00448844v1

Poster de conférence (28)

MHCD in N2-H2 mixtures: towards a localized plasma nitriding process? Cédric Noël,Grégory Marcos,Sylvain Iséni,S. Bruyere,Thierry Czerwiecet al. International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France. Poster de conférence hal-04607581v1
Experimental study of the gas breakdown in a controlled nanometer scale electrode gap Baptiste Disson,Sylvain Iséni,Olivier Lesaint,Christophe Poulain,Remi Dussartet al. International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France. Poster de conférence hal-04606154v1
Self-Pulsing and instabilities in silicon-based Micro Hollow Cathode Discharge operating in DC excitation Elane Kouadou,Sylvain Iséni,Arnaud Stolz,Philippe Lefaucheux,Remi Dussart International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France. Poster de conférence hal-04607593v1
Experimental study of argon breakdown in a nanometer scale electrode gap Baptiste Disson,Nelly Bonifaci,Olivier Lesaint,Christophe Poulain,Remi Dussartet al. 27th International School on "Low Temperature Plasma Physics: Basics and Applications", Oct 2024, Orléans (Auditorium du Musée des Beaux Arts), Germany. Poster de conférence hal-04728032v1
Profils de raies en spectroscopie d'émission optique appliqués au diagnostic de micro-plasmas Sylvain Iséni,Elane Kouadou,Thalita Nishime,Torsten Gerling,Remi Dussart Journées 2023 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2023, Nancy, France Poster de conférence hal-04194636v1
Micro-fabricated silicon-based microplasma reactors Elane Kouadou,Arnaud Stolz,Philippe Lefaucheux,Sylvain Iséni,Olivier Aubryet al. Journées Nationales sur les Technologies Emergentes (JNTE22), Nov 2022, Besançon (France), France Poster de conférence hal-03881662v1
Cryo-ALE of Si based on SF6 physisorption Jack Nos,Thomas Tillocher,Philippe Lefaucheux,Jacques Faguet,Kaoru Maekawaet al. PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France Poster de conférence hal-03539330v1
Spectroscopic study of the neutral gas temperature of silicon based DC MHCD in various gases close to atmospheric pressure Sylvain Iséni,Ronan Michaud,Philippe Lefaucheux,Volker Schulz-von Der Gathen,Goran B Sretenovicet al. 13th Frontiers in Low-Temperature Plasma Diagnostics, May 2019, Baf Honnef, Germany. 2019 Poster de conférence hal-02131666v1
The role of SiF4 physisorption in silicon cryoetching Gaëlle Antoun,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Christophe Cardinaudet al. Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France Poster de conférence hal-02311339v1
Robust atmospheric pressure plasma source fabricated by microfabrication techniques Ronan Michaud,Arnaud Stolz,Sylvain Iséni,Olivier Aubry,Philippe Lefaucheuxet al. Journées Nationales sur les Technologies Emergentes (JNTE19), Nov 2019, Grenoble, France Poster de conférence hal-02291720v1
MEMS based nanofluidics device for the study of the nonlinear dynamics associate with the geochemical processes Mukesh Kulsreshath,Arnaud Stolz,Philippe Lefaucheux,Lionel Mercury,Remi Dussart French symposium on Emerging Technologies for Micronanofabrication, Nov 2019, Grenoble, France Poster de conférence hal-02479390v1
Neutral gas temperature in silicon based DC MHCD operated in various gases near atmospheric pressure Sylvain Iséni,Ronan Michaud,Philippe Lefaucheux,Goran Sretenovic,Volker Schulz-von Der Gathenet al. International Workshop on Microplasmas - IWM 10, May 2019, Kyoto, Japan Poster de conférence hal-02189151v1
Analysis of mechanisms involved in cryogenic ALE Gaëlle Antoun,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart,Kumiko Yamazakiet al. 19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, France Poster de conférence hal-02311314v1
Optimisation et packaging de microplasmas sur silicium Ronan Michaud,Arnaud Stolz,Olivier Aubry,Philippe Lefaucheux,Remi Dussart Colloque de l'UMI-LN2, Jul 2018, Autrans, France Poster de conférence hal-01903397v1
INTRODUCTION AU PROCÉDÉ DE GRAVURE CRYOGÉNIQUE DU SILICIUM Gaëlle Antoun,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart 15e Congrès de la Société Française de Physique Division Plasmas, Jun 2018, Bordeaux, France Poster de conférence hal-02311219v1
Time resolved investigation of rotational temperature of molecular nitrogen in micro-plasma arrays Sebastian Dzikowski,M Sifft,Ronan Michaud,Remi Dussart,V Schulz-von Der Gathen 9th International Worksop on Microplasmas, Jun 2017, Garmisch Partenkirchen, Germany Poster de conférence hal-01577608v1
Cryogenic ALE of silicon oxide Nicolas Holtzer,Thomas Tillocher,Philippe Lefaucheux,Remi Dussart Plasma Etch and Strip in Microtechnology, Oct 2017, Leuven, Belgium Poster de conférence hal-02306057v1
Silicon micromachining at cryogenic temperature Thomas Tillocher,Philippe Lefaucheux,Mohamed Boufnichel,Remi Dussart Design, Test, Integration and Packaging of MEMS/MOEMS 2017 (DTIP17), May 2017, Bordeaux, France Poster de conférence hal-01561233v1
Titanium microstructuring for implantable components Edouard Laudrel,Thomas Tillocher,Yannick Méric,Philippe Lefaucheux,Marion Woytasiket al. Design, Test, Integration and Packaging of MEMS/MOEMS, May 2017, Bordeaux, France Poster de conférence hal-01561245v1
Chlorine-based plasma deep etching of bulk titanium Edouard Laudrel,Thomas Tillocher,Yannick Méric,Philippe Lefaucheux,Bertrand Boutaudet al. International Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan Poster de conférence hal-01561222v1
Cryogenic etching of silicon with SF6/O2: a computational and experimental study Stefan Tinck,Erik Neyts,Thomas Tillocher,Remi Dussart,Annemie Bogaerts Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France Poster de conférence hal-01344725v1
Advance in low-k cryogenic etching of porous organoscilicate : Investigation of a new gas with higher boiling point Organic (HBPO) and comparison with C4F8 Floriane Leroy,Nataniel Brochu,Romain Chanson,Remi Dussart,Thomas Tillocheret al. Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France Poster de conférence hal-01344722v1
Deep silicon etching: STiGer vs. BOSCH Chengkun Tu,Ying Cui,Remi Dussart,Thomas Tillocher,Philippe Lefaucheux Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France Poster de conférence hal-01344704v1
Enhanced reproducibility of SiO2 atomic layer etching by addition of O2 steps Thomas Tillocher,Remi Dussart,Nicolas Holtzer,Philippe Lefaucheux International Symposium of Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan Poster de conférence hal-01561230v1
Near Atmospheric Pressure Etching of Silicon by Microplasma Valentin Felix,Vincent Ah-Leung,Judith Golda,Philippe Lefaucheux,Olivier Aubryet al. International workshop on microplasmas, May 2015, Newark, France Poster de conférence hal-01166020v1
On the relationship between the energy flux at the substrate surface and the phase constitution of reactively magnetron sputtered titanium dioxide thin films Stephanos Konstantinidis,Pierre-Antoine Cormier,Anne-Lise Thomann,Remi Dussart,Nadjib Semmaret al. 14th International Conference on Plasma Surface Engineering PSE 2014 , Sep 2014, Garmisch-Partenkirchen, Germany Poster de conférence hal-01289438v1
Détermination de l'énergie transférée aux surfaces lors de la modification de matériaux par procédés plasmas basse pression Pierre-Antoine Cormier,Anne-Lise Thomann,Nadjib Semmar,Remi Dussart,Dolique Vincentet al. 12ème congrès de la division plasma de la SFP , May 2012, Orléans, France Poster de conférence hal-01288927v1
Direct energy influx measurement in reactive magnetron sputtering Pierre-Antoine Cormier,Dolique Vincent,Anne-Lise Thomann,Jacky Mathias,Balharmi A.et al. Reactive sputter deposition RSD 2011, Dec 2011, Linköping, Sweden Poster de conférence hal-01288906v1

Chapitre d'ouvrage (2)

A Heat Flux Microsensor for Direct Measurements in Plasma Surface Interactions Remi Dussart,Anne-Lise Thomann,Nadjib Semmar Igor Minin. Microsensors, Intech, pp.87, 2011, 978-953-307-170-1 Chapitre d'ouvrage hal-00707968v1
Un capteur de flux d'énergie dans les plasmas Anne Lise Thomann,Nadjib Semmar,Rémi Dussart,Larbi Bedra,Jacky Mathiaset al. MRCT CNRS. Plasmas Froids : Systèmes d'analyse, Modélisation et Rayonnement, Presses imprimerie Saint-Etienne, pp.97-120, 2009 Chapitre d'ouvrage hal-00443857v1