Sijun Kim

Publications

Article dans une revue (40)

Future Circular Collider Feasibility Study Report: Volume 3, Civil Engineering, Implementation and Sustainability M. Benedikt,F. Zimmermann,B. Auchmann,W. Bartmann,J.P Burnetet al. Eur.Phys.J.ST, 2025, 234 (3), pp.5113-5383. ⟨10.1140/epjs/s11734-025-01958-5⟩ Article dans une revue hal-05057622v1
Constraining the nuclear symmetry energy with Fermi-energy heavy ion collisions C. Ciampi,S. Mallik,F. Gulminelli,D. Gruyer,J.D. Franklandet al. Physics Letters B, 2025, 868, pp.139815. ⟨10.1016/j.physletb.2025.139815⟩ Article dans une revue hal-04851007v2
Initiation mechanism of arcing generated in RF capacitively coupled plasma Chulhee Cho,Sijun Kim,Minsu Choi,Youngseok Lee,Inho Seonget al. Physica Scripta, 2024, 99 (5), pp.055603. ⟨10.1088/1402-4896/ad3586⟩ Article dans une revue hal-04809216v1
A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge Inho Seong,Sijun Kim,Woobeen Lee,Youngseok Lee,Chulhee Choet al. Applied Physics Express, 2024, 17 (9), pp.096001. ⟨10.35848/1882-0786/ad7667⟩ Article dans une revue hal-04809218v1
On the Quenching of Electron Temperature in Inductively Coupled Plasma Inho Seong,Si-Jun Kim,Youngseok Lee,Chulhee Cho,Wonnyoung Jeonget al. Materials, 2023, 16 (8), pp.3219. ⟨10.3390/ma16083219⟩ Article dans une revue hal-04809201v1
Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma Si-Jun Kim,Won-Nyoung Jeong,Young-Seok Lee,You-Bin Seol,Chul-Hee Choet al. Applied Science and Convergence Technology, 2023, 32 (5), pp.127-133. ⟨10.5757/ASCT.2023.32.5.127⟩ Article dans une revue hal-04809213v1
Computational Analysis on Self-Resonance Frequency of Solenoid and Planar Inductor Min-Su Choi,Si-Jun Kim,Young-Seok Lee,Chul-Hee Cho,In-Ho Seonget al. Applied Science and Convergence Technology, 2023, 32 (2), pp.54-57. ⟨10.5757/ASCT.2023.32.2.54⟩ Article dans une revue hal-04809199v1
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma Inho Seong,Sijun Kim,Minsu Choi,Woobeen Lee,Wonnyoung Jeonget al. Materials, 2023, 16 (17), pp.5746. ⟨10.3390/ma16175746⟩ Article dans une revue hal-04809210v1
Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe Si-Jun Kim,Youngseok Lee,Chulhee Cho,Inho Seong,Wonnyoung Jeonget al. Physics of Plasmas, 2023, 30 (2), ⟨10.1063/5.0140333⟩ Article dans une revue hal-04809192v1
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled Wonnyoung Jeong,Sijun Kim,Youngseok Lee,Chulhee Cho,Inho Seonget al. Materials, 2023, 16 (10), pp.3820. ⟨10.3390/ma16103820⟩ Article dans une revue hal-04809204v1
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction Minsu Choi,Youngseok Lee,Yebin You,Chulhee Cho,Wonnyoung Jeonget al. Materials, 2023, 16 (16), pp.5624. ⟨10.3390/ma16165624⟩ Article dans une revue hal-04809206v1
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method Chulhee Cho,Sijun Kim,Youngseok Lee,Inho Seong,Wonnyoung Jeonget al. Materials, 2023, 16 (7), pp.2762. ⟨10.3390/ma16072762⟩ Article dans une revue hal-04809197v1
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process Si-Jun Kim,Min-Su Choi,Sang-Ho Lee,Won-Nyoung Jeong,Young-Seok Leeet al. Sensors, 2023, 23 (5), pp.2521. ⟨10.3390/s23052521⟩ Article dans une revue hal-04809193v1
Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe Youngseok Lee,Heejung Yeom,Daehan Choi,Sijun Kim,Jangjae Leeet al. Nanomaterials, 2022, 12 (21), pp.3828. ⟨10.3390/nano12213828⟩ Article dans une revue hal-04809185v1
Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing Youngseok Lee,Yebin You,Chulhee Cho,Sijun Kim,Jangjae Leeet al. Micromachines, 2022, 13 (11), pp.1856. ⟨10.3390/mi13111856⟩ Article dans une revue hal-04809172v1
Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe Si-Jun Kim,Jang-Jae Lee,Young-Seok Lee,Chul-Hee Cho,Shin-Jae You Sensors, 2022, 22 (3), pp.1291. ⟨10.3390/s22031291⟩ Article dans une revue hal-04809146v1
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation Si-Jun Kim,In-Ho Seong,Young-Seok Lee,Chul-Hee Cho,Won-Nyoung Jeonget al. Sensors, 2022, 22 (15), pp.5871. ⟨10.3390/s22155871⟩ Article dans une revue hal-04809157v1
An electrostatic model of the cutoff probe Si-Jun Kim,Dae-Woong Kim,Jang-Jae Lee,Young-Seok Lee,Chul-Hee Choet al. Current Applied Physics, 2022, 39, pp.289-295. ⟨10.1016/j.cap.2022.05.011⟩ Article dans une revue hal-04809151v1
Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis Si-Jun Kim,Young-Seok Lee,Chul-Hee Cho,Min-Su Choi,In-Ho Seonget al. Scientific Reports, 2022, 12 (1), pp.20976. ⟨10.1038/s41598-022-25550-2⟩ Article dans une revue hal-04809190v1
Purgeless atomic layer etching of SiO 2 Y Lee,S Kim,J Lee,C Cho,I Seonget al. Journal of Physics D: Applied Physics, 2022, 55 (36), pp.365203. ⟨10.1088/1361-6463/ac7482⟩ Article dans une revue hal-04809154v1
Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma Ye-Bin You,Young-Seok Lee,Si-Jun Kim,Chul-Hee Cho,In-Ho Seonget al. Nanomaterials, 2022, 12 (21), pp.3798. ⟨10.3390/nano12213798⟩ Article dans une revue hal-04809180v1
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath Inho Seong,Sijun Kim,Youngseok Lee,Chulhee Cho,Jangjae Leeet al. Sensors, 2022, 22 (16), pp.6254. ⟨10.3390/s22166254⟩ Article dans une revue hal-04809163v1
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma Inho Seong,Jinho Lee,Sijun Kim,Youngseok Lee,Chulhee Choet al. Nanomaterials, 2022, 12 (22), pp.3963. ⟨10.3390/nano12223963⟩ Article dans une revue hal-04809188v1
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics Si-Jun Kim,Sang-Ho Lee,Ye-Bin You,Young-Seok Lee,In-Ho Seonget al. Sensors, 2022, 22 (15), pp.5487. ⟨10.3390/s22155487⟩ Article dans une revue hal-04809156v1
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma Chulhee Cho,Sijun Kim,Youngseok Lee,Wonnyoung Jeong,Inho Seonget al. Sensors, 2022, 22 (17), pp.6589. ⟨10.3390/s22176589⟩ Article dans une revue hal-04809167v1
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2 Youngseok Lee,Sijun Kim,Jangjae Lee,Chulhee Cho,Inho Seonget al. Sensors, 2022, 22 (16), pp.6029. ⟨10.3390/s22166029⟩ Article dans une revue hal-04809158v1
Plasma Treatment Mechanism in Si–SiO 2 Direct Wafer Bonding Youngseok Lee,Yebin You,Chulhee Cho,Sijun Kim,Jangjae Leeet al. Science of advanced materials, 2022, 14 (7), pp.1265-1270. ⟨10.1166/sam.2022.4313⟩ Article dans une revue hal-04809182v1
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2 Youngseok Lee,Inho Seong,Jangjae Lee,Sangho Lee,Chulhee Choet al. Journal of Vacuum Science & Technology A, 2022, 40 (1), ⟨10.1116/6.0001466⟩ Article dans une revue hal-04809147v1
A Quantification Method in Quadrupole Mass Spectrometer Measurement Youngseok Lee,Sanghyeop Oh,Jangjae Lee,Chulhee Cho,Sijun Kimet al. Applied Science and Convergence Technology, 2021, 30 (2), pp.50-53. ⟨10.5757/ASCT.2021.30.2.50⟩ Article dans une revue hal-04809136v1
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas Chulhee Cho,Kwangho You,Sijun Kim,Youngseok Lee,Jangjae Leeet al. Materials, 2021, 14 (17), pp.5036. ⟨10.3390/ma14175036⟩ Article dans une revue hal-04809143v1
Finding the optimum design of the planar cutoff probe through a computational study S. Kim,J. Lee,Y. Lee,D. Kim,S. You AIP Advances, 2021, 11 (2), ⟨10.1063/5.0033222⟩ Article dans une revue hal-04809133v1
Characterization of SiO 2 Over Poly-Si Mask Etching in Ar/C 4 F 8 Capacitively Coupled Plasma In Ho Seong,Jang Jae Lee,Chul Hee Cho,Yeong Seok Lee,Si Jun Kimet al. Applied Science and Convergence Technology, 2021, 30 (6), pp.176-182. ⟨10.5757/ASCT.2021.30.6.176⟩ Article dans une revue hal-04809150v1
Experimental Study of Argon and Helium Dielectric Barrier Discharge with Coplanar Electrodes at Intermediate Pressure for Reducing Radar Cross Section Jang Jae Lee,Si Jun Kim,Young Seok Lee,Chul Hee Cho,Min Su Choiet al. Applied Science and Convergence Technology, 2020, 29 (6), pp.170-175. ⟨10.5757/ASCT.2020.29.6.170⟩ Article dans une revue hal-04809121v1
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes Si Jun Kim,Jang Jae Lee,Young Seok Lee,Hee Jung Yeom,Hyo Chang Leeet al. Applied Sciences, 2020, 10 (20), pp.7066. ⟨10.3390/app10207066⟩ Article dans une revue hal-04809117v1
Effect of an inhomogeneous electron density profile on the transmission microwave frequency spectrum of the cutoff probe S Kim,J Lee,Y Lee,D Kim,S You Plasma Sources Science and Technology, 2020, 29 (12), pp.125014. ⟨10.1088/1361-6595/abc816⟩ Article dans une revue hal-04809126v1
A simple model of solenoidal inductively coupled plasma sources considering finite size J. Lee,S. Kim,K. Kim,Y. Lee,S. You AIP Advances, 2020, 10 (3), ⟨10.1063/1.5133862⟩ Article dans une revue hal-04809113v1
Mass Filter Characteristic and Design Role of Quadrupole Mass Spectrometer for Radical Measurement in Low-pressure Plasmas Hee Jung Yeom,Jang Jae Lee,Si Jun Kim,Young Seok Lee,Chul Hee Choet al. Applied Science and Convergence Technology, 2020, 29 (4), pp.77-81. ⟨10.5757/ASCT.2020.29.4.077⟩ Article dans une revue hal-04809109v1
Analysis of Impedance of Microwave Parallel Stripline Resonator Discharge Source for Application of Microplasma System at Atmospheric Pressure Thanh Hai Tran,Si Jun Kim,Shin Jae You Applied Science and Convergence Technology, 2019, 28 (4), pp.113-121. ⟨10.5757/ASCT.2019.28.4.113⟩ Article dans une revue hal-04809105v1
Computational study on influence of RF shielding box on inductance of coil S J Kim,J J Lee,Y S Lee,J H Kim,S J You Plasma Science and Technology, 2019, 21 (6), pp.064004. ⟨10.1088/2058-6272/ab0d42⟩ Article dans une revue hal-04809098v1
Development of High-precision RF Sensor Kwang Ki Kim,Jang Jae Lee,Si Jun Kim,Chul Hee Cho,Sung Wan Yooet al. Applied Science and Convergence Technology, 2019, 28 (4), pp.88-92. ⟨10.5757/ASCT.2019.28.4.88⟩ Article dans une revue hal-04809103v1

Communication dans un congrès (1)

Comparative Study on Microwave Diagnostics: Cutoff Probe, Hairpin Probe, and Microwave Interferometer S. Kim,Jean-Paul Booth,Garrett Curley XXXVI ICPIG, Jul 2025, Aix -en-Provence, France Communication dans un congrès hal-05357670v1

Pré-publication, Document de travail (1)

GWTC-4.0: Methods for Identifying and Characterizing Gravitational-wave Transients A. G. Abac,I. Abouelfettouh,F. Acernese,K. Ackley,S. Adhicaryet al. 2025 Pré-publication, Document de travail hal-05411478v1