
Dominique Planson
373
Documents
Présentation
M. Dominique Planson
Téléphone : 04 72 43 87 24
Ingénieur INSA-GE, option Micro-électronique (91), DEA-DEI (91), Docteur INSA (1994)
Publications
Publications
|
Repetitive Short-circuits on 650 V GaNPCIM Europe 2024, Jun 2024, Nuremberg, Germany
Communication dans un congrès
hal-04626451
v1
|
|
Electrical characterization of HV (10 kV) Power 4H-SiC Bipolar Junction TransistorInternational Conference on Silicon Carbide and Related Materials (ICSCRM 2024), Sep 2024, Raleigh (North Carolina), United States. pp.126-128
Communication dans un congrès
hal-04677764
v1
|
|
Peripheral defects related to processing technique in GaN-on-GaN vertical devicesWorkshop on Nitride Semiconductors IWN 2024, Nov 2024, O'ahu (Honolulu), United States
Communication dans un congrès
hal-04855750
v1
|
|
Carrier density analysis in stressed n-doped GaN layers on sapphireGaN Marathon, Jun 2024, Vérone, Italy
Communication dans un congrès
hal-04639487
v1
|
|
Impact of Substrate Quality on Vertical GaN-on-GaN Schottky and PiN Devicese-MRS Fall Meeting, Sep 2024, Varsovie (Warsaw), Poland
Communication dans un congrès
hal-04855745
v1
|
|
Matching physical and electrical measurements (OBIC) to simulation (FEM) on high voltage bipolar diodesInternational Conference on Silicon Carbide and Related Materials (ICSCRM 2024), Sep 2024, Raleigh (North Carolina), United States. pp.591-592
Communication dans un congrès
hal-04680725
v1
|
|
Emerging trends in OBIC characterization technique for Wide Bandgap semiconductor devicesInternational Semiconductor Conference (CAS-2023), IMT Bucharest, Oct 2023, Sinaia, Romania. pp.3-10, ⟨10.1109/CAS59036.2023.10303647⟩
Communication dans un congrès
hal-04238355
v1
|
|
Impact of Wide Band-Gap Semiconductors on the Design in Power ElectronicsSymposium on Advanced Technologies in Electrical Systems (SATES 2023), Mar 2023, Arras, France
Communication dans un congrès
hal-04224402
v1
|
Vertical pin diodes on large freestanding (100) diamond film2023 EUROPEAN MATERIALS RESEARCH SOCIETY Spring Meeting, EUROPEAN MATERIALS RESEARCH SOCIETY, May 2023, Strasbourg, France
Communication dans un congrès
hal-04219862
v1
|
|
|
Visualization of P$^+$ JTE embedded rings used for peripheral protection of high voltage Schottky diodes by the Optical Beam Induced Current (OBIC) techniqueICSCRM 2023 - International Conference on Silicon Carbide and Related Materials, Sep 2023, Sorrente, Italy
Communication dans un congrès
hal-04218429
v1
|
|
Application of the Double Source Switching Test to GaN HEMTs25th Conference on Power Electronics and Applications (and Exhibition), EPE ’23 (IEEE) ECCE Europe (Energy Conversion Congress and Expo Europe), Sep 2023, Aalborg, Denmark. ⟨10.23919/EPE23ECCEEurope58414.2023.10264519⟩
Communication dans un congrès
hal-04225311
v1
|
|
Design and Characterization of an Optical 4H-SiC Bipolar Junction TransistorICSCRM 2023 - International Conference on Silicon Carbide and Related Materials, Sep 2023, Sorrente, Italy
Communication dans un congrès
hal-04222211
v1
|
|
First Results on 1.2 kV SiC MOSFET Body Diode Robustness Tests34th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, Oct 2023, Toulouse, France
Communication dans un congrès
hal-04240602
v1
|
|
Full-SiC Single-Chip High-Side and Low-Side Dual-MOSFET for Ultimate Power Vertical Integration -Basic Concept and Technology25th Conference on Power Electronics and Applications (and Exhibition), EPE ’23 (IEEE) ECCE Europe (Energy Conversion Congress and Expo Europe), Sep 2023, Aalborg, Denmark. ⟨10.23919/EPE23ECCEEurope58414.2023.10264325⟩
Communication dans un congrès
hal-04203163
v1
|
|
Full-SiC Single-Chip Buck and Boost MOSFET-JBS Converters for Ultimate Efficient Power Vertical IntegrationIEEE 30th International Conference Mixed Design of Integrated Circuits and Systems, Institute of Computer Science of AGH University of Science and Technology, Jun 2023, Kraków, Poland. https://www.mixdes.org/Mixdes3/, ⟨10.23919/MIXDES58562.2023.10203213⟩
Communication dans un congrès
hal-04147862
v1
|
|
Micro-Raman characterization of vertical GaN Schottky and PN diodes46th Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe and 17th Expert Evaluation and Control of Compound Semiconductor Materials and Technologies (WOCSDICE-EXMATEC 2023), May 2023, Palerme, Italy
Communication dans un congrès
hal-04170420
v1
|
|
Caractérisation dynamique de thyristors SiC avec gâchette amplificatrice5ème Symposium de Génie Electrique (SGE 2023), Jul 2023, Lille, France
Communication dans un congrès
hal-04401362
v1
|
|
Courts-circuits répétitifs non-destructifs sur des transistors HEMT-GaN 650 V5ème Symposium de Génie Electrique (SGE 2023), Jul 2023, Lille, France
Communication dans un congrès
hal-04150168
v1
|
|
Concept and technology for full monolithic MOSFET and JBS vertical integration in multi-terminal 4H-SiC power convertersICSCRM 2023 - International Conference on Silicon Carbide and Related Materials, Sep 2023, Sorrente, Italy
Communication dans un congrès
hal-04221605
v1
|
Trapping effects in High-Power 4H-Silicon Carbide (4H-SiC) Bipolar PiN Rectifiers6th IEEE International Conference on Emerging Electronics (ICEE 2022), IEEE, Dec 2022, Bangalore, India
Communication dans un congrès
hal-04011039
v1
|
|
|
Multiphysics Characterizations of Vertical GaN Schottky Diodes2022 Compound Semiconductor Week (CSW), Jun 2022, Ann Arbor, United States. pp.1-2, ⟨10.1109/CSW55288.2022.9930447⟩
Communication dans un congrès
hal-03844585
v1
|
|
Design of a test package for high voltage SiC diodesProceedings of the International Workshop on Integrated Power Packaging (IWIPP 2022), Aug 2022, Grenoble, France. ⟨10.1109/IWIPP50752.2022.9894223⟩
Communication dans un congrès
hal-03772006
v1
|
Dynamic characterization of SiC thyristors with amplifying gate designE-MRS 2022 Fall Meeting, Sep 2022, Varsovie, Poland
Communication dans un congrès
hal-04011099
v1
|
|
Electrically Active Traps in Bipolar 10 kV 8 A Silicon Carbide (SiC) PiN DiodesInternational Symposium On Semiconductor Materials and Devices ISSMD 2022, Dec 2022, Bhubaneswar, India
Communication dans un congrès
hal-03990840
v1
|
|
|
Caractérisation par spectroscopie micro-Raman de diodes GaN SchottkyConférence Internationale Matériaux, Oct 2022, Lille, France
Communication dans un congrès
hal-03844887
v1
|
|
Vertical current temperature analysis of GaN-on-Si epitaxy through analytical modellingSSDM 2022 - 2022 International conference on solid state devices and materials, Sep 2022, Chiba, Japan
Communication dans un congrès
cea-03875079
v1
|
|
Electrical behavior of vertical Schottky diodes on GaN homoepitaxyIWN 2022 - International Workshop on Nitride Semiconductors, Oct 2022, Berlin, Germany
Communication dans un congrès
hal-03854620
v1
|
|
Monitoring Dynamic Resistance of AlGaN/GaN Schottky Diodes After Quasi-Static and Hard Switching Stresses2022 International Semiconductor Conference (CAS 2022), Oct 2022, Poiana Brasov, Romania. pp.195-198, ⟨10.1109/CAS56377.2022.9934143⟩
Communication dans un congrès
hal-03887865
v1
|
|
Optimized Junction Termination Extension and Ring System for 11 kV 4H-SiC BJT2022 International Semiconductor Conference (CAS 2022), Oct 2022, Poiana Brasov, Romania. pp.191-194, ⟨10.1109/CAS56377.2022.9934390⟩
Communication dans un congrès
hal-03856578
v1
|
|
Toward an Innovative Monolithic Integration of Vertical and Lateral GaN DevicesConférence Euro-méditerranéenne Matériaux, Composants et Systèmes EMCM-DS, Oct 2022, Fes, Morocco
Communication dans un congrès
hal-03946187
v1
|
|
Edge terminations for 4H-SiC power devices: a critical issueECSCRM 2020-2021, Oct 2021, Tours, France
Communication dans un congrès
hal-03418183
v1
|
Homo epitaxial n-doped GaN layers investigation using Raman Spectroscopy for Vertical device applicationsEXMATEC / WOCSDICE 2021 : 15th Expert Evaluation and Control of Compounds of Semiconductor Materials and Technologies, Jun 2021, Bristol, United Kingdom
Communication dans un congrès
hal-03676503
v1
|
|
|
Switching Behavior and Comparison of Wide Bandgap Devices for Automotive ApplicationsEPE'21 ECCE Europe, Sep 2021, Ghent, Belgium. ⟨10.23919/EPE21ECCEEurope50061.2021.9570434⟩
Communication dans un congrès
hal-03260519
v1
|
MULTIPHYSICS CHARACTERIZATIONS OF VERTICAL GaN SCHOTTKY DIODESPOWER 2021 (IMAPS), Nov 2021, Tours, France
Communication dans un congrès
hal-03676940
v1
|
|
High voltage (6kV) diamond TMBS diode design31st International Conference On Diamond and Carbon Materials, Sep 2021, Palma, Mallorca, Spain
Communication dans un congrès
hal-03715580
v1
|
|
|
4H-SiC PiN diode protected by narrow field rings investigated by the micro-OBIC methodECSCRM 2020-2021, Oct 2021, Tours, France
Communication dans un congrès
hal-03410274
v1
|
|
Conception de diodes TMBS haute tension (6kV) en diamantSYMPOSIUM DE GENIE ELECTRIQUE (SGE 2020), Jul 2021, Nantes, France
Communication dans un congrès
hal-03355128
v1
|
|
Investigation of SiC thyristors with varying amplifying gate designEuropean Conference on Silicon Carbide and Related Materials (ECSCRM2020) 2021, Oct 2021, Tours, France
Communication dans un congrès
hal-03410752
v1
|
|
Enhanced Resonant Raman scattering of GaN functional layers using Al thin films -a versatile tool for multilayer structure analysisECSCRM2020-2021, Oct 2021, Tours, France
Communication dans un congrès
hal-03410757
v1
|
|
Demonstration of the Short-circuit Ruggedness of a 10 kV Silicon Carbide Bipolar Junction TransistorEPE’20 ECCE Europe, Sep 2020, Lyon, France. ⟨10.23919/EPE20ECCEEurope43536.2020.9215769⟩
Communication dans un congrès
hal-02945919
v1
|
|
Analysis of Parasitic Elements in Power Modules Based on GaN ComponentsPCIM Europe 2020, Jul 2020, Nuremberg, Germany
Communication dans un congrès
hal-02945892
v1
|
|
Switching Loss Estimation Using a Validated Model of 650 V GaN HEMTsEPE’20 ECCE Europe, Sep 2020, Lyon, France. ⟨10.23919/EPE20ECCEEurope43536.2020.9215793⟩
Communication dans un congrès
hal-02945913
v1
|
|
SiC power MOSFETs Threshold-voltage hysteresis and its impact on Short Circuit operationESARS-ITEC, IEEE, Nov 2018, Nottingham, United Kingdom. ⟨10.1109/ESARS-ITEC.2018.8607547⟩
Communication dans un congrès
hal-01984359
v1
|
|
Effects of the laser beam size on the Optical Beam Induced Current (OBIC) for the study of Wide Band Gap (WBG) Semi-Conductor DevicesWorkshop on Compound Semiconductor Devices and Integrated Circuits 2019 (WOCSDICE 2019), Jun 2019, Cabourg, France
Communication dans un congrès
hal-02164000
v1
|
|
Interest of using a micro-meter spatial resolution to study SiC semi-conductor devices by Optical Beam Induced Current (OBIC)International Conference on Silicon Carbide and Related Materials (ICSCRM) 2019, Sep 2019, Kyoto, Japan. pp.Mo-P-23
Communication dans un congrès
hal-02428502
v1
|
|
V TH -Hysteresis and Interface States Characterisation in SiC Power MOSFETs with Planar and Trench GateIRPS, Mar 2019, Monterey, CA, United States. ⟨10.1109/IRPS.2019.8720612⟩
Communication dans un congrès
hal-02099781
v1
|
|
Static characteristics of 5 kV SiC BJTs and Darlington’sInternational Conference on Silicon Carbide and Related Materials (ICSCRM) 2019, Sep 2019, Kyoto, Japan
Communication dans un congrès
hal-02428513
v1
|
|
Advanced Electrical characterisation of high voltage 4H-SiC PiN diodesECSCRM'18, Sep 2018, Birmingham, United Kingdom. pp.WE.P.RD2
Communication dans un congrès
hal-01985994
v1
|
|
Subthreshold Drain current hysteresis of planar SiC MOSFETsECSCRM'18, Sep 2018, Birmingham, United Kingdom. pp.TU.O4a.04
Communication dans un congrès
hal-02428531
v1
|
Towards SiC thyristors with amplifying gate designSymposium de Génie Electrique (SGE'18), Université de Lorraine [UL], Jul 2018, Nancy, France
Communication dans un congrès
hal-02983373
v1
|
|
|
Multi-barrier height characterization and DLTS study on Ti/W 4H-SiC Schottky DiodeECSCRM'18, Sep 2018, Birmingham, United Kingdom
Communication dans un congrès
hal-02004837
v1
|
|
Experimental and simulation results of OBIC Technique Applied to Wide Bandgap Semiconductorse-MRS Fall Meeting, Sep 2018, Varsovie, Poland
Communication dans un congrès
hal-02116919
v1
|
|
Conception and high temperature characterization of 10 kV 50 A 4H-SiC PiN diodesEuropean Conference on Silicon Carbide and Related Materials, Sep 2018, Birmingham, United Kingdom
Communication dans un congrès
hal-02004841
v1
|
|
Mesure et analyse de la hauteur de barrière des contacts Schottky Mo sur SiC-4HSymposium de Génie Electrique (SGE'18), Université de Lorraine [UL], Jul 2018, Nancy, France
Communication dans un congrès
hal-02983328
v1
|
|
SiC lateral Schottky diode technology for integrated smart power converter2018 IEEE ICIT, Feb 2018, Lyon, France. ⟨10.1109/ICIT.2018.8352287⟩
Communication dans un congrès
hal-01864545
v1
|
|
High-Voltage SiC-JFET Fabrication and Full CharacterizationECSCRM'18, Sep 2018, Birmingham, United Kingdom. pp.TU.P_BP5
Communication dans un congrès
hal-02428523
v1
|
|
Near breakdown voltage optical beam induced current (OBIC) on 4H-SiC bipolar diodeInternational Conference on Silicon Carbide and Related Materials 2017 (ICSCRM 2017), Sep 2017, Washington, United States. pp.TH.DP.4
Communication dans un congrès
hal-02138767
v1
|
|
Emergence of SiC Thyristors Featuring Amplifying Gate DesignInternational Conference on Silicon Carbide and Related Materials, Sep 2017, Washington DC, United States
Communication dans un congrès
hal-02004843
v1
|
|
Technology Route towards SiC Thyristor Devices with Amplifying Gate DesignCompound Semiconductor Week 2017, May 2017, Berlin, Germany
Communication dans un congrès
hal-03103484
v1
|
|
Surge driven evolution of Schottky barrier height on 4H-SiC JBS diodesInternational Conference on Silicon Carbide and Related Materials 2017 (ICSCRM 2017), Sep 2017, Washington DC, United States
Communication dans un congrès
hal-02132576
v1
|
|
Realization and characterization of carbonic layers on 4H-SiC for electrochemical detectionsECSCRM'16, Sep 2016, Halkidiki, Greece. pp.WeP-52
Communication dans un congrès
hal-02138738
v1
|
OBIC Technique Applied to Wide Bandgap Semiconductors40th WOCSDICE ‐ Workshop on Compound Semiconductor Devices and Integrated Circuits held in Europe & 13th EXMATEC ‐ Expert Evaluation and Control of Compound Semiconductor Materials and Technologies, Jun 2016, Aveiro, Portugal
Communication dans un congrès
hal-01388036
v1
|
|
|
Very High Sustainable Forward Current Densities on 4H-SiC P+N- Junctions formed by localized VLS P+ epitaxyECSCRM'16, Sep 2016, Halkidiki, Greece
Communication dans un congrès
hal-02138729
v1
|
|
Étude en simulation et conception d'un transistor bipolaire (BJT) 10 kV en 4H-SiCSymposium de Génie Electrique (SGE'16), Jun 2016, Grenoble, France
Communication dans un congrès
hal-01361668
v1
|
|
Simulation-based Study on the Optical Beam Intensity Dependence of the Optically Triggered 4H-SiC Thyristors Turn-on OperationInternational Conference on Solid State Devices and Materials 2016, Sep 2016, Tsukuba International Congress Center Tsukuba, Japan. ⟨10.7567/SSDM.2016.PS-14-17L⟩
Communication dans un congrès
hal-04088082
v1
|
Vertical termination filled with adequate dielectric for SiC devices in HVDC applicationsInternational Conference on Silicon Carbide and Related Materials 2015 (ICSCRM 2015), Oct 2015, Giardini Naxos, Italy
Communication dans un congrès
hal-02138529
v1
|
|
|
Lifetime of holes determination in 4H-SiC using two-photon optical beam induced current methodCAS, Oct 2015, Sinaia, Romania. ⟨10.1109/SMICND.2015.7355226⟩
Communication dans un congrès
hal-01388024
v1
|
|
Precise Automated Semiconductor Characterization under Ambient Control for testing wide band gap semiconductorsInternational Symposium on High Voltage Engineering (ISH) 2015, Aug 2015, Pilsen, Czech Republic
Communication dans un congrès
hal-02428642
v1
|
|
Study and optimization of a 600V Pseudo-vertical GaN-on-silicon rectifier by finite elements simulationICSCRM 2015, Oct 2015, Giardini Naxos, Italy. pp.Mo-P-44
Communication dans un congrès
hal-02138522
v1
|
|
Thermally stable ohmic contact to p-type 4H-SiC based on Ti3SiC2 phaseICSCRM, Oct 2015, Giardini Naxos, Italy
Communication dans un congrès
hal-02138520
v1
|
|
Temperature Dependence of 4H-SiC Ionization Rates Using Optical Beam Induced CurrentECSCRM'14, Sep 2014, Grenoble, France. pp.MO2-IP-08
Communication dans un congrès
hal-02133683
v1
|
|
4H-SiC P-N junctions realized by VLS for JFET lateral structuresECSCRM'14, Sep 2014, Grenoble, France. pp.TU-P-61
Communication dans un congrès
hal-02133686
v1
|
|
4H-SiC VJFETs with Self-Aligned ContactsECSCRM'14, Sep 2014, Grenoble, France. pp.WE-P-75
Communication dans un congrès
hal-02133681
v1
|
|
Classic and alternative methods of p-type doping 4H-SiC for integrated lateral devicesCAS, Oct 2015, Sinaia, Romania. pp.145 - 148, ⟨10.1109/SMICND.2015.7355190⟩
Communication dans un congrès
hal-01388019
v1
|
|
Determination of 4H-SiC ionization rates using OBIC based on two-photon absorptionInternational Conference on Silicon Carbide and Related Materials 2015 (ICSCRM 2015), Oct 2015, Giardini Naxos, Italy
Communication dans un congrès
hal-02138523
v1
|
|
Localized VLS Epitaxy Process as a P-type Doping Alternative Technique for 4H-SiC P/N JunctionsSemiconductor Interface Specialists Conference (SISC 2015), Dec 2015, Arlington, United States
Communication dans un congrès
hal-02428659
v1
|
|
Etude de différents transistors de puissance SiC 1.2kV des températures cryogéniques aux hautes températuresSymposium de Génie Electrique (SGE'14), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065281
v1
|
|
Les réseaux HVDC multi-terminaux : des défis multiples en génie électrique1er Symposium de Génie Électrique (SGE 2014), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065154
v1
|
|
Optimisation de la terminaison d'une diode Schottky diamant haute tensionSymposium de Génie Electrique (SGE'14), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065274
v1
|
|
On the chemistry of epitaxial Ti3SiC2 formation on 4H-SiC using Al-Ti annealingECSCRM'14, Sep 2014, Grenoble, France. pp.TU-P-63
Communication dans un congrès
hal-02428741
v1
|
|
Imagerie 2D du champ électrique dans les diodes SiC-4H haute tension par la technique OBICSymposium de Génie Electrique (SGE'14), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065307
v1
|
|
Conception de thyristors SiC permettant l'étude de l'amplification interne de l'allumageSymposium de Génie Electrique (SGE'14), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065352
v1
|
|
Characterization and comparison of 1.2 kV SiC power devices from cryogenic to high temperatureECSCRM'14, Sep 2014, Grenoble, France
Communication dans un congrès
hal-02132486
v1
|
|
Wide bandgap semiconductors for ultra high voltage devices. Design and characterization aspectsCAS, Oct 2014, Sinaia, Romania. pp.35 - 40, ⟨10.1109/SMICND.2014.6966383⟩
Communication dans un congrès
hal-01388002
v1
|
Two-dimensional Optical Beam Induced Current measurements in 4H-SiC bipolar diodes2014 IEEE PRIME, Jun 2014, Grenoble, France. ⟨10.1109/PRIME.2014.6872761⟩
Communication dans un congrès
hal-01388043
v1
|
|
|
Nouveaux contacts électriques sur SiC-4H de type p : réalisation de phases MAXSymposium de Génie Electrique (SGE'14), Jul 2014, Cachan, France
Communication dans un congrès
hal-01065327
v1
|
|
Impact of design on electrical characteristics of 3.5 kV 4H-SiC JBS diodeInternational Silicon Carbide Hetero-Epitaxy HeteroSiC and Workshop on Advanced Semiconductor Materials and devices for Power Electronics WASMPE, Jun 2013, Nice, France
Communication dans un congrès
hal-04022951
v1
|
|
SiC power devices operation from cryogenic to high temperature: investigation of various 1.2kV SiC power devicesInternational Conference on Silicon Carbide and Related Materials (ICSCRM) 2013, Sep 2013, Miyazaki, Japan. pp.1122-1125, ⟨10.4028/www.scientific.net/MSF.778-780.1122⟩
Communication dans un congrès
hal-04169013
v1
|
|
Experimental Investigation of Electro-thermal Stress Impact on SiC-BJTs Electrical CharacteristicsHiTEN'13, Jul 2013, Oxford, United Kingdom
Communication dans un congrès
hal-03326669
v1
|
p-type SiC growth on diamond substrate by VLS TransportECSCRM 2012, Sep 2012, Saint-Pétersbourg, Russia. 2p
Communication dans un congrès
hal-04423301
v1
|
|
|
Influence of process parameters on electrical properties of PiN diodes fabricated with a highly p-type doped layer selectively grown by VLS transportInternational Conference on Silicon Carbide and Related Materials ICSCRM 2013, Sep 2013, Miyazaki, Japan
Communication dans un congrès
hal-04011693
v1
|
|
Study of the Nucleation of p-doped SiC in Selective Epitaxial Growth using VLS TransportECSCRM 2012, Sep 2012, Saint-Pétersbourg, Russia. 4p
Communication dans un congrès
hal-04362529
v1
|
|
Pulse Current Characterization of SiC GTO Thyristors with Etched JTEEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2012), Sep 2012, Saint-Petersbourg, Russia. pp.986-989, ⟨10.4028/www.scientific.net/MSF.740-742.986⟩
Communication dans un congrès
hal-04423357
v1
|
|
High temperature, Smart Power Module for aircraft actuatorsHiTEN'13, Jul 2013, Oxford, United Kingdom
Communication dans un congrès
hal-00874666
v1
|
3D TCAD Simulations for More Efficient SiC Power Devices DesignElectro Chemical Society 224th meeting, Oct 2013, San Francisco, United States. ⟨10.1149/05804.0331ecst⟩
Communication dans un congrès
hal-04240572
v1
|
|
|
A path toward high voltage devices : 3.3 kV 4H-SiC JBS and JFETHETECH, Nov 2012, Barcelone, France
Communication dans un congrès
hal-01113179
v1
|
4H-SiC P +N UV photodiodes: A comparison between beam and plasma doping processesCSCRM, Sep 2011, Cleveland, United States
Communication dans un congrès
hal-00747301
v1
|
|
Using a two step plasma etching process for diamond power devicesInternational Conference on Diamond and Carbon Materials Granada, SPAIN, 2012, Granada, Spain
Communication dans un congrès
hal-03966086
v1
|
|
|
Protections périphériques des composants 1200 V14ème EPF, Jul 2012, Bordeaux, France. 4 p
Communication dans un congrès
hal-04560447
v1
|
Electrical characteristics (I-V) of field plate protected vertical diamond Schottky diodesInternational Conference on Diamond and Carbon Materials Granada, SPAIN, 2012, Granada, Spain
Communication dans un congrès
hal-03966084
v1
|
|
|
Electrical characterization of PiN diodes fabricated on a p layer selectively grown by VLS transportProceedings of the 2012 European Conference on Silicon Carbide and Related Materials ECSCRM, Sep 2012, Saint-Pétersbourg, Russia. 4p
Communication dans un congrès
hal-04366810
v1
|
|
Design of an integrated power converter in Wide Band Gap for harsh environmentsConference on Integrated Power Electronics systems, Mar 2012, Nuremberg, Germany
Communication dans un congrès
hal-02124203
v1
|
Electrical characteristics of SiC UV-Photodetector device : from the p-i-n structure behaviour to the Junction Barrier Schottky structure behaviourHeteroSiC & WASMPE 2011, Jun 2011, Tours, France. pp.114-117, ⟨10.4028/www.scientific.net/MSF.711.114⟩
Communication dans un congrès
hal-00661511
v1
|
|
|
Pressureless Silver Sintering Die-Attach for SiC Power DevicesCSCRM, Sep 2012, Saint-Pétersbourg, Russia. 2p
Communication dans un congrès
hal-00759987
v2
|
|
Thyristors GTO haute tension en carbure de silicium avec terminaison JTE gravéeElectronique de Puissance du Futur 2012, Jul 2012, Bordeaux, France
Communication dans un congrès
hal-04423483
v1
|
|
Investigations on Ni-Ti-Al ohmic contacts obtained on p-type 4H-SiCHeteroSiC & WASMPE 2011, Jun 2011, Tours, France. pp.169-173, ⟨10.4028/www.scientific.net/MSF.711.169⟩
Communication dans un congrès
hal-00661507
v1
|
|
Protections périphériques de diodes bipolaires 10 kV en SiC-4H14ème Conférence Electronique de Puissance du Futur (EPF 2012), Jul 2012, Bordeaux, France
Communication dans un congrès
hal-04560471
v1
|
|
Evaluation of silver-sintering die attach7th CIPS, Mar 2012, Nuremberg, Germany. pp.237-243
Communication dans un congrès
hal-00707733
v1
|
|
Towards Very High Voltage SiC Power DevicesPRiME 2012-ECS, Oct 2012, Honolulu-Hawaii, United States. ⟨10.1149/05003.0425ecst⟩
Communication dans un congrès
hal-02116906
v1
|
|
Report de puce par frittage d'argent - mise en oeuvre et analyse14ème EPF, Jul 2012, Bordeaux, France. pp.CD (ref 61)
Communication dans un congrès
hal-00729156
v1
|
|
Diode PiN 6500V en SiC-4H14ème EPF, Jul 2012, Bordeaux, France. 4 p
Communication dans un congrès
hal-04573111
v1
|
|
SIMS analyses applied to open an optical window in 4H-SiC devices for electro-optical measurementsICSCRM, Sep 2011, Cleveland, United States
Communication dans un congrès
hal-00747300
v1
|
|
600 V PiN diodes fabricated using on-axis 4H silicon carbideInternational Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), Sep 2011, Cleveland, United States. pp.969-972, ⟨10.4028/www.scientific.net/MSF.717-720.969⟩
Communication dans un congrès
hal-00747295
v1
|
|
Design and characterization of a novel 3.3 kV 4H-SiC JFETProceedings of the 2012 European Conference on Silicon Carbide and Related Materials ECSCRM, Sep 2012, Saint-Pétersbourg, Russia. 4p
Communication dans un congrès
hal-04048180
v1
|
|
Edge termination design improvements for 10 kV 4H-SiC bipolar diodesEuropean Conference on Silicon Carbide and Related Materials 2012, Sep 2012, Saint-Pétersbourg, Russia
Communication dans un congrès
hal-03316271
v1
|
|
Réalisation et caractérisation de diodes Schottky en diamant monocristallin protégées par plaque de champ sur Si3N414ème EPF, Jul 2012, Bordeaux, France. 4 p
Communication dans un congrès
hal-01005917
v1
|
|
PASChAC, système automatisé de caractérisation de composants sur waferElectronique de Puissance du Futur 2012, Jul 2012, Bordeaux, France
Communication dans un congrès
hal-02282734
v1
|
Wide Band Gap Semiconductors Benefits for High Power, High Voltage and High Temperature ApplicationsCIMA, Mar 2011, Beyrouth, Lebanon. pp.CD
Communication dans un congrès
hal-00661500
v1
|
|
|
Réalisation de contact ohmique sur SiC-4H type PJNRDM2011, May 2011, Paris, France
Communication dans un congrès
hal-04560246
v1
|
OBIC measurements on avalanche diodes in 4H-SiC for the determination of impact ionization coefficientsCSCRM, Sep 2011, Cleveland, United States
Communication dans un congrès
hal-00747298
v1
|
|
Avalanche Diodes with Low Temperature Dependence in 4H-SiC Suitable for Parallel ProtectionCSCRM, Aug 2010, Oslo, Norway
Communication dans un congrès
hal-00661470
v1
|
|
Parallel and serial association of SiC light triggered thyristorsHeteroSiC & WASMPE 2011, Jun 2011, Tours, France
Communication dans un congrès
hal-00661520
v1
|
|
|
Pulse characterization of optically triggered SiC thyristorsInternational Conference on Silicon Carbide and Related Materials 2011 (ICSCRM'2011), Philipp Neudeck, Sep 2011, Cleveland, United States. pp.FR-1A-3
Communication dans un congrès
hal-00747341
v1
|
|
Influence of the Masking Material and Geometry on the 4H-SiC RIE Etched Surface StateCSCRM, Aug 2010, Oslo, Norway. pp.477-480, ⟨10.4028/www.scientific.net/MSF.679-680.477⟩
Communication dans un congrès
hal-00661443
v1
|
|
Influence of P+ layer parameters on 4H-SiC UV PiN photodetector characteristicsWOCSDICE, May 2011, Catania, Italy. pp.181
Communication dans un congrès
hal-00661522
v1
|
Perspectives on SiC and III-N Based Devices for Power Electronics220th ECS Meeting, The Electrochemical Society, Oct 2011, Boston, United States. pp.139-152, ⟨10.1149/1.3631492⟩
Communication dans un congrès
hal-02865456
v1
|
|
|
Investigation of Epitaxial SiC PiN Diodes with Variable Mesa HeightEuropean Conference on Silicon Carbide and Related Materials ECSCRM-2010, Aug 2010, Oslo (Norway), Norway
Communication dans un congrès
hal-04349694
v1
|
|
Optical triggering of 4H-SiC thyristors with a 365 nm UV LEDEuropean Conference on Silicon Carbide and Related Materials ECSCRM-2010, Aug 2010, Oslo (Norway), Norway. ⟨10.4028/www.scientific.net/MSF.679-680.690⟩
Communication dans un congrès
hal-03990671
v1
|
|
Protection périphérique pour composants de puissance en diamant13ème EPF, Jun 2010, Saint-Nazaire, France. 4p
Communication dans un congrès
hal-00618708
v1
|
A Step Toward High Temperature Intelligent Power Modules Using 1.5kV SiC-BJTCSCRM, Oct 2009, Nuremberg, Germany. pp.1155-1158, ⟨10.4028/www.scientific.net/MSF.645-648.1155⟩
Communication dans un congrès
hal-00496976
v1
|
|
Réalisation de Diodes SiC Simples pour l'Etude de Passivations13ème EPF, Jun 2010, Saint-Nazaire, France
Communication dans un congrès
hal-00618701
v1
|
|
|
Graded Etched Junction Termination for SiC ThyristorsEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2010), Aug 2010, Oslo, Norway
Communication dans un congrès
hal-04347104
v1
|
SiC BJT driver applied to a 2 kW inverter: Performances and limitations6th CIPS, Mar 2010, Nuremberg, Germany
Communication dans un congrès
hal-00579223
v1
|
|
|
Simulation and design of junction termination structures for diamond Schottky diodesEuropean Conference on Diamond Diamond-like Materials Carbon Nanotubes and Nitrides (DIAMOND 2010), Sep 2010, Budapest, Hungary
Communication dans un congrès
hal-03656932
v1
|
Chambre à Vide de Caractérisation Haute Tension de Composants Semiconducteurs Nus13ème EPF, Jun 2010, Saint-Nazaire, France
Communication dans un congrès
hal-00618684
v1
|
|
Conception d'une protection périphérique originale pour composants bipolaires en carbure de silicium (SiC)13ème EPF, Jun 2010, Saint-Nazaire, France
Communication dans un congrès
hal-00618709
v1
|
|
|
State of the art of High Temperature Power ElectronicsMicrotherm, Jun 2009, Lodz, Poland. pp.8-17
Communication dans un congrès
hal-00413349
v1
|
Temperature Dependence lifetime measurements on 3.3kV 4H-SiC PiN Diodes using OCVD TechniqueECSCRM European Conference on Silicon Carbide and Related Materials, Sep 2008, Barcelone, Spain. pp.703-706, ⟨10.4028/www.scientific.net/MSF.615-617.703⟩
Communication dans un congrès
hal-00391369
v1
|
|
|
SiC Power Semiconductor Devices for new Applications in Power Electronics13th IEEE PEMC, Sep 2008, Poznan, Poland. pp.2457 - 2463, ⟨10.1109/EPEPEMC.2008.4635632⟩
Communication dans un congrès
hal-00373016
v1
|
Normally-on devices and circuits, SiC and high temperature : using SiCJFETs in power converters5th CIPS, Mar 2008, Nuremberg, Germany. pp.08.2
Communication dans un congrès
hal-00372982
v1
|
|
Current limiting with SiC JFET structures5th CIPS, Mar 2008, Nuremberg, Germany. pp.08.5
Communication dans un congrès
hal-00373046
v1
|
|
|
Characterization of 4H-SiC junction barrier Schottky diodes by admittance vs. temperature analysesEuropean Conference on Silicon Carbide and Related Materials ECSCRM 2008, Sep 2008, Barcelone, Spain
Communication dans un congrès
hal-03331775
v1
|
Modeling and high temperature characterization of SiC-JFETIEEE PESC, Jun 2008, Rhodes, Greece. pp.3111 - 3117, ⟨10.1109/PESC.2008.4592430⟩
Communication dans un congrès
hal-00369420
v1
|
|
|
Composant de protection série en SiC 450A de forte densité de puissance12ème colloque Electronique de Puissance du Futur, Jul 2008, Tours, France
Communication dans un congrès
hal-04624757
v1
|
|
Contact ohmique de faible résistivité sur SiC-4H dopé type-P4eme colloque sur les Matériaux du Génie Electrique, May 2008, Toulouse, France
Communication dans un congrès
hal-04606381
v1
|
|
Protection périphérique d’une diode bipolaire SiC-4H. Simulation électrique de JTE à dopage variable12ème colloque Electronique de Puissance du Futur, Jul 2008, Tours, France
Communication dans un congrès
hal-04606517
v1
|
|
Prospective sur les composants de puissance verticaux grand gap (Carbure de Silicium et Diamant) et leurs applications12e EPF (Electronique de Puissance du Futur), Jul 2008, Tours, France
Communication dans un congrès
hal-04606571
v1
|
SiC JFET for high temperature power switches5th CIPS, Mar 2008, Nuremberg, Germany. pp.08.4
Communication dans un congrès
hal-00373058
v1
|
|
|
New Applications in Power Electronics Based on SiC Power DevicesICSCRM'2007, Oct 2007, Otsu, Japan. pp.925-930, ⟨10.4028/www.scientific.net/MSF.600-603.925⟩
Communication dans un congrès
hal-02958610
v1
|
|
Comparison of electrical properties of ohmic contact realized on p-type 4H-SiCICSCRM'2007, Oct 2007, Otsu, Japan
Communication dans un congrès
hal-02961607
v1
|
Use of Graphite Cap to Reduce Unwanted Post-Implantation Annealing Effects in SiCCSCRM, Sep 2006, Newcastle upon Tyne, United Kingdom. pp.611-614, ⟨10.4028/www.scientific.net/MSF.556-557.611⟩
Communication dans un congrès
hal-00368931
v1
|
|
|
Determination of ambipolar lifetime and epilayer thickness of 5 kV SiC bipolar devices by switching transient studiesICSCRM'2007, Oct 2007, Otsu, Japan. pp.1031-1034, ⟨10.4028/www.scientific.net/MSF.600-603.1031⟩
Communication dans un congrès
hal-02958620
v1
|
|
Towards an integrated inverter based on lateral JFET SiC4th CIPS, Jun 2006, Naples, Italy. pp.171-176
Communication dans un congrès
hal-00413390
v1
|
|
High temperature operating converter4th CIPS, Jun 2006, Naples, Italy. pp.201-204
Communication dans un congrès
hal-00413394
v1
|
|
Diode PiN SiC-4H 1,2kV sur épi-wafer SiCrystal11ème colloque Electronique de Puissance du Futur, Jul 2006, Grenoble, France
Communication dans un congrès
hal-04618792
v1
|
|
Deep SiC etching with RIEE-MRS 2006, May 2006, Nice, France. pp.3886392
Communication dans un congrès
hal-03305997
v1
|
Current sensing for SiC Power DevicesCSCRM, Sep 2005, Pittsburgh, PA, United States. pp.1215-1218
Communication dans un congrès
hal-00391433
v1
|
|
|
Étude de cascodes SiC en vue d’applications électroniques impulsionnelles11ème colloque Electronique de Puissance du Futur, Jul 2006, Grenoble, France
Communication dans un congrès
hal-04618765
v1
|
|
Ni-Al Ohmic contact to p-type 4H-SiC2006 Spring Meeting of the European Materials Research Society (E-MRS 2006), May 2006, Nice, France. ⟨10.1016/j.spmi.2006.08.004⟩
Communication dans un congrès
hal-03316263
v1
|
|
Optimisation de la structure double RESURF d’un transistor JFET latéral SiC-4H pour le développement de convertisseurs de puissance intégrés11ème colloque Electronique de Puissance du Futur, Jul 2006, Grenoble, France
Communication dans un congrès
hal-04619604
v1
|
|
Onduleur à JFET sans diode de roue libre externe11ème colloque Electronique de Puissance du Futur, Jul 2006, Grenoble, France
Communication dans un congrès
hal-04618123
v1
|
300 °C operating junction temperature inverter leg investigationsEPE, Sep 2005, Dresden, Germany
Communication dans un congrès
hal-00413402
v1
|
|
|
Gravure RIE profonde du SiC pour la réalisation de composants de puissance3eme colloque sur les Matériaux du Génie Electrique, Dec 2005, Lyon, France
Communication dans un congrès
hal-04620248
v1
|
|
P-type SiC layers formed by VLS induced selective epitaxial growthEuropean Conference on Silion Carbide and Related Materials (ECSCRM 2004), Sep 2004, Bologne, Italy
Communication dans un congrès
hal-02953086
v1
|
|
HIGH VOLTAGE AND SPECIFIC POWER SILICON CARBIDE DEVICES10ème colloque Electronique de Puissance du Futur, Sep 2004, Toulouse, France
Communication dans un congrès
hal-04621819
v1
|
|
Silicon Carbide Controlled Current Limiter, Current Limitation Strategies, Foreseen Applications and BenefitsInternational Power Electronics and Motion Control (IPEMC'04), Aug 2004, Xi'an, China
Communication dans un congrès
hal-02468376
v1
|
|
SiC-based current limiter devicesInternational Conference on Silicon Carbide and Related Materials (ICSCRM'2003), Oct 2003, Lyon, France. pp.951-956, ⟨10.4028/www.scientific.net/MSF.457-460.951⟩
Communication dans un congrès
hal-04032970
v1
|
|
Conception d'un transistor JFET 5 kV en SiC-4H10ème colloque Electronique de Puissance du Futur, Sep 2004, Toulouse, France
Communication dans un congrès
hal-04621465
v1
|
|
A 3.5 kV thyristor in 4H-SiC with a JTE peripheryEuropean Conference on Silion Carbide and Related Materials (ECSCRM 2004), Sep 2004, Bologne, Italy
Communication dans un congrès
hal-02953080
v1
|
On chip temperature monitoring of a SiC current limiterInternational Conference on Silicon Carbide and Related Materials (ICSCRM'2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02949618
v1
|
|
|
Electrothermal simulations of silicon carbide current limiting devices2003 IEEE International Conference on Industrial Technology, Dec 2003, Maribor, Slovenia. pp.1135-1140, ⟨10.1109/ICIT.2003.1290823⟩
Communication dans un congrès
hal-02498210
v1
|
|
Active clamping of IGBT: capacitor replaces TRANSIL diodes10th European Conference on Power Electronics and Applications (EPE'2003), Sep 2003, Toulouse, France
Communication dans un congrès
hal-02497603
v1
|
|
Design, fabrication and characterisation of 5 kV 4H-SiC p + n planar bipolar diodes protected by junction termination extensionInternational Conference on Silicon Carbide and Related Materials (ICSCRM'2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02498145
v1
|
|
The role of the ion implanted emitter state on 6H-SiC power diodes behaviour. A statistical study.International Conference on Silicon Carbide and Related Materials (ICSCRM 2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02941715
v1
|
|
Influence of different peripheral protections on the breakover voltage of a 4H-SiC GTO thyristorInternational Conference on Silicon Carbide and Related Materials (ICSCRM'2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02503456
v1
|
Silicon Carbide specific components for power electronics system protectionInternational Conference on Silicon Carbide and Related Materials (ICSCRM'2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02503449
v1
|
|
|
Current limitation with SiC devices10th European Conference on Power Electronics and Applications (EPE'2003), Sep 2003, Toulouse, France
Communication dans un congrès
hal-02497590
v1
|
|
Design and simulation of a planar anode GTO thyristor on SiCCAS (International Semiconductor Conference), Sep 2003, Sinaia, Romania. pp.222, ⟨10.1109/SMICND.2003.1252421⟩
Communication dans un congrès
hal-00410085
v1
|
|
Study of suitable dielectric material properties for high electric field and high temperature power semiconductor environment10th European Conference on Power Electronics and Applications (EPE'2003), Sep 2003, Toulouse, France
Communication dans un congrès
hal-02492270
v1
|
|
Towards the Fabrication and Measurement of High Sensitivity SiC-UV Detectors with Oxide Ramp TerminationInternational Conference on Silicon Carbide and Related Materials (ICSCRM 2003), Oct 2003, Lyon, France
Communication dans un congrès
hal-02937545
v1
|
|
A New Process for the Fabrication of SiC Power Devices and Systems on SiCOI (Silicon Carbide On Insulator) Substrates2002 MRS Fall Meeting, Dec 2002, Boston, United States. ⟨10.1557/PROC-742-K7.9⟩
Communication dans un congrès
hal-02298409
v1
|
|
Contact resistivity of Al/Ti ohmic contacts on p-type ion implanted 4H and 6H-SiC2002 MRS Fall Meeting, Dec 2002, Boston, United States. ⟨10.1557/PROC-742-K6.2⟩
Communication dans un congrès
hal-02485106
v1
|
|
OBIC measurements on 1.3 kV 6H-SiC bipolar diodes protected by Junction Lateral ExtensionEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2002), Sep 2002, Linköping, Sweden
Communication dans un congrès
hal-02464381
v1
|
|
Very low R/sub ON/ measured on 4H-SiC accu-MOSFET high power device14th International Symposium on Power Semiconductor Devices and ICs, Jun 2002, Sante Fe, United States. pp.209-212, ⟨10.1109/ISPSD.2002.1016208⟩
Communication dans un congrès
hal-02471269
v1
|
|
Substrat SiCOI : Avancées vers les applications « System on Chip »EPF2002 - Colloque 2002, Electronique de Puissance du Futur, Nov 2002, Montpellier, France
Communication dans un congrès
hal-04400220
v1
|
|
COMPOSANT NνN POUR L'ETUDE DE LA ZCEM (ZONE DE CHARGE D'ESPACE MIXTE) DES TRANSISTORS MOSElectronique de Puissance du Futur (EPF 2002), Nov 2002, Montpellier (FR), France
Communication dans un congrès
hal-04390458
v1
|
|
A 4H-SiC high-power-density VJFET as controlled current limiterIndustry Applications Society (IAS'02), Oct 2002, Pittsburgh (Pennsylvania), United States. pp.2248-2251
Communication dans un congrès
hal-02477074
v1
|
Characterization of a 4H-SiC High Power Density Controlled Current LimiterEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2002), Sep 2002, Linköping, Sweden
Communication dans un congrès
hal-02458130
v1
|
|
|
Limiteur de courant à forte densité de puissance en carbure de siliciumElectronique de Puissance du Futur (EPF 2002), Nov 2002, Montpellier (FR), France
Communication dans un congrès
hal-04398450
v1
|
SiC On Insulator as substrate for power Schottky diodesEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2002), Sep 2002, Linköping, Sweden
Communication dans un congrès
hal-02464356
v1
|
|
|
Fabrication and Characterisation of High Voltage SiC-ThyristorsEuropean Conference on Silicon Carbide and Related Materials (ECSCRM 2002), Sep 2002, Linköping, Sweden
Communication dans un congrès
hal-02485104
v1
|
Study of 6H-SiC high voltage bipolar diodes under reverse biasesEuropean Materials Research Society (E-MRS Spring Meeting) 2001, Jun 2001, Strasbourg, France
Communication dans un congrès
hal-03712596
v1
|
|
|
Study based on the numerical simulation of a 5 kV asymmetrical 4H-SiC thyristor for high power pulses applicationCAS 2001 International Semiconductor Conference, Oct 2001, Sinaia, Romania. pp.341-344, ⟨10.1109/SMICND.2001.967479⟩
Communication dans un congrès
hal-02145398
v1
|
|
Simulation study of a new current limiting device : a vertical alpha-SiC etched JFET - Controlled Current LimiterICSCRM, Oct 2001, Tsukuba, Japan
Communication dans un congrès
hal-02476207
v1
|
|
Realization of a High Current and Low RON 600V Current Limiting DeviceInternational Conference on Silicon Carbide and Related Materials, Oct 2001, Tsukuba, Japan
Communication dans un congrès
hal-02975963
v1
|
|
4H-SiC bipolar power diodes realized by ion implantationCAS 2001 International Semiconductor Conference, Oct 2001, Sinaia, Romania. pp.349-352, ⟨10.1109/SMICND.2001.967481⟩
Communication dans un congrès
hal-02145397
v1
|
|
A comparative study of high temperature Aluminium post-implantation annealing in 6H and 4H-SiC, non-uniformity temperature effectsICSCRM, Oct 2001, Tsukuba, Japan
Communication dans un congrès
hal-02476227
v1
|
|
Compatibility of VJFET Technology with MESFET Fabrication and Its Interest for System Integration: Fabrication of 6H and 4H-SiC 110 V Lateral MESFETICSCRM, Oct 2001, Tsukuba, Japan
Communication dans un congrès
hal-02471274
v1
|
|
Study of 4H-SiC high voltage bipolar diodes under reverse biases using electrical and Obic characterizationICSCRM, Oct 2001, Tsukuba, Japan
Communication dans un congrès
hal-02975956
v1
|
Bipolar silicon carbide power diodes realized by aluminum implantations and high temperature rf-annealing43rd Electronic Materials Conference (EMC 2001), Jun 2001, Notre Dame, IN, United States
Communication dans un congrès
hal-02275712
v1
|
|
Experimental characterization of a 4H-SiC high voltage current limiting deviceEuropean Materials Society (E-MRS Spring Meeting) 2001, symposium F, Jun 2001, Strasbourg, France
Communication dans un congrès
hal-03714731
v1
|
|
|
Electrical and electrothermal 2D simulations of a 4H-SiC high voltage current limiting device for serial protection applications3rd International Conference on Power Electronics and Motion Control, Aug 2000, Beijing, China. pp.396-401, ⟨10.1109/IPEMC.2000.885436⟩
Communication dans un congrès
hal-04386905
v1
|
|
Electrical and electrothermal 2D simulations of a 4H-SiC high voltage current limiting device for serial protection applications12th International Symposium on Power Semiconductor Devices & ICs. Proceedings, May 2000, Toulouse, France. pp.287-290, ⟨10.1109/ISPSD.2000.856827⟩
Communication dans un congrès
hal-02972084
v1
|
|
High Electrical Activation of Aluminium and Nitrogen Implanted in 6H-SiC at Room Temperature by RF AnnealingEuropean Conference on Silicon Carbide and Related Materials 2000 (ECSCRM 2000), Sep 2000, Kloster Banz, Germany. pp.MoP-72
Communication dans un congrès
hal-02151711
v1
|
|
Evaluation of losses in a switching cell using the finite element method. Comparison between silicon and silicon carbide components3rd International Conference on Power Electronics and Motion Control, Aug 2000, Beijing, China. pp.241-245, ⟨10.1109/IPEMC.2000.885364⟩
Communication dans un congrès
hal-04386919
v1
|
Silicon carbide power devices1998 International Semiconductor Conference. CAS'98 Proceedings, Oct 1998, Sinaia, Romania. pp.125-134, ⟨10.1109/SMICND.1998.732305⟩
Communication dans un congrès
hal-04277218
v1
|
|
|
The negative temperature coefficient of the breakdown voltage of SiC p-n structures and deep centers in SiCInternational Conference on Silicon Carbide and Related Materials ICSCRM'95, Sep 1995, Kyoto, Japan
Communication dans un congrès
hal-03712441
v1
|
|
A SIMULATION SYSTEM FOR A POWER INSULATED GATE BIPOLAR TRANSISTOR (IGBT) WITH TSUPREM-4 AND MEDICI SIMULATORS7th European Simulation Symposium (ESS-1995), Oct 1995, Erlangen-Nuremberg, Germany
Communication dans un congrès
hal-02968512
v1
|
|
Study of Silicon Carbide high voltage ability: experimental results on expitaxial-emitter and implanted-emitter diodesInternational Seminar on Silicon Carbide Semiconductor and SiC-based devices, Sep 1995, Novgorod, Russia
Communication dans un congrès
hal-02972067
v1
|
|
Realization and characterization of vertical PIN diode on 100 diamond33rd International Conference on Diamond and Carbon Materials, Sep 2023, Palma, Spain. , 2023
Poster de conférence
hal-04193251
v1
|
Optical Beam Induced Current Measurements: principles and applications to SiC device characterisationPeter Friedrichs, Tsunenobu Kimoto, Lothar Ley, Gerhard Pensl. Silicon Carbide: Volume 1: Growth, Defects, and Novel Applications, Wiley, 319-340 (chapitre 12), 2009
Chapitre d'ouvrage
hal-00661529
v1
|
|
Silicon carbide applications in power electronicsRobert Perret. Power Electronics Semiconductor Devices, Wiley-ISTE, pp.185-265, 2009
Chapitre d'ouvrage
hal-00661525
v1
|
|
Applications du carbure de silicium en électronique de puissanceRobert Perret. Mise en oeuvre des composants électroniques de puissance, HERMES, pp.243-324, 2003
Chapitre d'ouvrage
hal-03925159
v1
|
CREATION D’UNE FENETRE DE SORTIE DE RAYONNEMENT POUR UN COMPOSANT PHOTOEMETTEURFrance, N° de brevet: FR2201067. 2022
Brevet
hal-03702862
v1
|
|
FABRICATION D’UN COMPOSANT EMETTEUR DE RAYONNEMENT A PARTIR D’UN SUBSTRAT DE CARBURE DE SILICIUMFrance, N° de brevet: FR2201064. 2022
Brevet
hal-03702870
v1
|
Chargement...
Chargement...