Elisabeth BLANQUET
Publications
Publications
Growth of n-doped polycrystalline SiC thin films by chemical vapor deposition for brain-implantable devicesWOCSDICE-EXMATEC 2024, May 2024, Heraklion (Crete Island), Greece |
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Atomic Layer Deposition Processes for emerging materialsInternational Seminar on Advances in Materials, Oct 2024, Madras (Chennai) - online, India |
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Thermodynamics applied to gas – solid processesSadi Carnot's Legacy - "Celebrating the 200th anniversary of the 2nd law of thermodynamics", Ecole Polytechnique, Sep 2024, Palaiseau (Ecole Polytechnique), France |
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Thermodynamic simulations applied to Gas-Solid Materials Fabrication ProcessesSadi Carnot's Legacy - "Celebrating the 200th anniversary of the 2nd law of thermodynamics", Ecole Polytechnique, Sep 2024, Palaiseau (Ecole Polytechnique), France |
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Silicon and cellulose: influence of the substrate on the growth of ALD Al2O3RAFALD 2024, Nov 2024, Nantes, France |
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Revisited Thermal and Plasma Enhanced Atomic Layer Deposition processes of metal nitridesALD/ALE 2022, 22nd International Conference on Atomic Layer Deposition, Jun 2022, Ghent (BE), Belgium |
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Growth of c-axis Textured AlN PVD Film on a 2D-MoS2 Seed LayerAVS 68th international symposium & exhibition, Nov 2022, Pittburgh, Philadelphia, USA, United States |
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Ti3SiC2-SiC multilayer thin films deposited by High Temperature Reactive Chemical Vapor Deposition48th International Conference on Metallurgical Coatings and Thin Films, ICMCTF 2022, May 2022, San Diego, United States |
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Gaseous phase thermodynamics for TaN thin filmsCALPHAD 2022, CALPHAD, May 2022, STOCKHLOM, Sweden |
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Chemical vapor deposition of Ti3SiC2 thin films on SiC materials: process modeling and experimentsICSCRM2022, Oct 2022, Davos (Suisse), Switzerland |
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Stability enhancement of silver nanowire based transparent electrodes coated with metal nitride thin films by PE-ALDRAFALD 2021, Nov 2021, Marseille, France |
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Improvement of Mechanical Properties of Nanoparticles-Based Thin Films by Using Atomic Layer DepositionALD 2021 - 21st International Conference on Atomic Layer Deposition, 2021, Virtual (On-line), France |
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Study of the Impact of Annealing and Doping Element on the Crystallinity of Hafnium Oxide: Application for FeFET MemoriesALD 2021 - 21st International Conference on Atomic Layer Deposition, 2021, Virtual / Online, France |
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Revisited Thermal and Plasma Enhanced Atomic Layer Deposition combined with Chemical Vapor Deposition processes of metal nitrides: challenges and opportunitiesMRS Fall Meeting, Symposium Advanced Atomic Layer Deposition and Chemical Vapor Deposition Techniques and Applications, Dec 2019, Boston, United States |
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AlN coatings on 3D titanium alloy structureselaborated by Electron Beam MeltingEuroCVD 22 – Baltic ALD 16, Jun 2019, Luxembourg, Luxembourg |
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High temperature chemical vapor deposition of aluminum nitride thin films and coatings: properties and applications2nd International Conference on materials science and engineering, Mar 2019, Cairo, Egypt |
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Epitaxial 33°Y-oriented LiNbO3 films for Silicon TechnologyISAF-EMF-ICE-IWPM-PFM meeting, Jul 2019, Lausanne, Switzerland |
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From process modelling to the evaluation of superconducting properties of ultrathin films of epitaxial niobium nitrideEuroCVD 22-Baltic ALD 16 Conference, Jun 2019, Luxemburg, Luxembourg |
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ALD: opportunities and challengesChemistry of Atomic Layer Deposition, Belux 3 LIST, Mar 2018, Luxemburg, Luxembourg |
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Visualizing the incipient Atomic Layer Deposition of ZnO ultra thin films on In0.53Ga0.47As for tailoring contact resistivityE-MRS Spring 2017, May 2017, Strasbourg, France |
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In situ X-ray studies during the early stage of ZnO Atomic Layer Deposition on InGaAsRayons X & Matière, Nov 2017, Villeneuve d'Ascq, France |
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Advances in nitride film and coating growth by chemical vapor deposition78th Japan Society of Applied Physics Conference, Sep 2017, Fukuoka, Japan |
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In Situ X-ray Studies of Crystalline Texture and Strain During the Initial Stages of ZnO Atomic Layer DepositionWorkshop on synchrotron radiation to study atomic layer deposition, Jun 2016, ALBA synchrotron, Barcelona, Spain |
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In-situ synchrotron analysis of the very first ALD growth steps of ZnO on a-SiO2 and c-plane Al2O3Workshop RAFALD 2015, Nov 2015, Grenoble, France |
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Functionalization of HTCVD Grown Aluminium NitrideInternational Conference on Semiconductor Materials and Devices (ISSMD-3), 2015, Chennai, India |
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In Situ X-Ray Scattering and Optical Substrate Curvature Studies of ZnO Growth by Atomic Layer and Metal Organic Chemical Vapor DepositionMRS spring meeting, Apr 2015, San Francisco, United States |
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CVD of silicon on steels for flexible solar cellsIndian Conference on Crystal Growth, 2015, Chennai, India |
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CVD of aluminium nitrides for high temperature applicationsInternational Conference on Crystal Growth (3CG), Nitrides for lighting, Photovoltaics and sensing applications, Dec 2015, Hong Khong, Japan |
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Combined Effects of Supersaturation and Stress for the Control of AlN Film QualityInternational Conference on Metallurgical Coatings and Thin Films (ICMCTF), " Hard Coatings and Vapor Deposition Technology, Apr 2017, San Diego, United States |
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Functionalization of Aluminium Nitride Thin Films and CoatingsInternational Conference on Metallurgical Coatings and Thin Films (ICMCTF), " Hard Coatings and Vapor Deposition Technology", 2015, San Diego, United States |
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Various Applications of (Ti,Al)N Thin films Grown from a Vapor Phase3CG Collaborative Conference on Crystal Growth, 2014, Phuket, Thailand |
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Functionalization of HTCVD Grown Aluminium Nitride3CG Collaborative Conference on Crystal Growth, 2014, Phuket, Thailand |
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Niobium Nitride Thin Films deposited by High Temperature Chemical Vapor Deposition3CG Collaborative Conference on Crystal Growth, 2014, Phuket, Thailand |
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High temperature chemical vapor deposition of aluminum nitride, growth and evaluationEuropean Conference on Chemical Vapor Deposition, EUROCVD19, 2013, Varna, Bulgaria |
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Atomic Layer Deposition of TiO2 ultrathin films on 3D substrates for energy applicationsMRS 2012, 2012, San Francisco CA, France. pp.63-68, ⟨10.1557/opl.2012.913⟩ |
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HTCVD of silicon on steels for the development of inexpensive solar cells5th International Conference on Functional Materials, ISFM2012, Dec 2012, Perth, Australia. pp.28-30 |
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Deposition of nanostructures by Atomic Layer DepositionInternational Workshop−CVD−Diagnostic−Modeling, Jun 2012, Nancy, France |
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Thermodynamic simulations Applied to Gas-Solid Materials Fabrication ProcessesTwenty Fourth National Seminar on crystal growth, Dec 2012, Chennai, India |
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Chemistry of iodine and aerosol composition in the primary circuit of a nuclear power plant21st International Conference Nuclear Energy for Europe, Sep 2012, Lubiana, Slovenia |
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High Temperature Chemical Vapor Deposition of thick (5 to 20 mm) Aluminum nitride layersInternational Workshop on crystal growth and characterization of advanced materials and devices., Dec 2012, Chennai, India |
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Chemistry of iodine and aerosol composition in the primary circuit of a nuclear power plantInternational Congress on Advances in Nuclear Power Plants, May 2011, Nice, France |
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SiC and AlN growth processing : experiments and simulation.International Workshop on Wide Band Gap Semiconductor Nanostructures, Jan 2011, Chennai, India |
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Vapor phase processes: From HTCVD processes for high rate epitaxial growth to ALD processes for conformal ultra thin film fabrication.International Workshop on Wide Band Gap Semiconductor Nanostructures, Jan 2011, Chennai, India |
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Plasma Enhanced Atomic Layer Deposition of ZrO2: A Thermodynamic Approach.219th ECS Meeting, May 2011, Montréal, Canada |
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Numerical Simulation of SiC Growth processes: a characterization tool for the design of epitaxial structures in electronicsRenewable Energy 2010, Jun 2010, Yokohama, Japan |
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Développements de dépôts ALD : expériences et évaluations thermodynamiquesMatériaux 2010, Oct 2010, NANTES, France |
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On the cracks formation in AlN films grown by chlorinated High Temperature Chemical Vapor Deposition.IWN 2010, Sep 2010, TAMPA, United States |
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Developments of ALD Processes: Experiments and Thermodynamic Evaluations218th ECS Meeting, Oct 2010, LAS VEGAS, NV, United States |
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Influence of the N/Al Ratio in the Gas Phase on the Growth of AlN by High Temperature Chemical Vapor Deposition (HTCVD)7th European Conference on Silicon Carbide and Related Materials, Sep 2008, Barcelone, Spain. pp.987-990 |
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Experimental and Thermodynamics for the Evaluation of ALD growth processesInternational Conference on Metallurgical Coatings and Thin Films (ICMCTF) 2009, 2009, United States |
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Chemical Vapour Deposition and Atomic layer Deposition processes of amorphous or nanocrystalline thin filmsInternational Symposium on Metastable, Amorphous and Nanostructured Materials (ISMANAM 2009), Jul 2009, Pékin, China. ⟨10.1016/j.jallcom.2010.03.205⟩ |
Silicon Carbide Growth: C/Si Ratio Evaluation and ModelingInternatinal Conference on Silicon Carbide and Related Materials, ICSCRM2007, 2007, Kyoto, Japan. pp.83-88 |
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The ways to deposit amorphous or nanocrystalline material from a vapor phase11th International Conference on Advanced Materials (ICAM), Sep 2009, Rio de Janeiro, Brazil |
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Growth of thick AlN layers by High Temperature CVDInternatinal Conference on Silicon Carbide and Related Materials, ICSCRM2007, 2007, Otsu, Japan. pp.1269-1272 |
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Chemical Vapour Deposition processes of metallic amorphous or nanocrystalline thin filmsWorld Premier Institute, AIMR (Advanced Institute of Materials Research) WPI-EUROPE-INPG on Metallic Glasses, Aug 2009, GRENOBLE, France |
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Experimental ant Thermodynamics for the Evaluation of Atomic Layer Deposition processes.ICMCTF - international Conference Metallurgical Coatings and Thin Films, Apr 2009, SAN DIEGO, United States |
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Knudsen cell mass spectrometry applied to the investigation of organometallic precursors vapoursEUROCVD, Sep 2007, Netherlands. pp.8813-8817 |
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Large grain polySiC boules for wafer-boundingInternatinal Conference on Silicon Carbide and Related Materials, ICSCRM2005, 2005, Pittsburgh, United States. pp.71-74 |
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SiC growth : evaluation and modelingMRS Spring Meeting "B- Silicon Carbide – Materials, Processing and Devices", Apr 2006, San Francisco, United States. pp.64-77 |
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High Temperature Silicon Carbide Chemical Vapor deposition processes: from pure thermodynamic to Mass transport modelingEuropean conference on Computational Dynamics, Symposium, Sep 2006, Egmondaan Zee, Netherlands. pp.1-20 |
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High temperature processing of poly-SiC substrates from the vapor phase for wafer-bondingInternational Conference on Metallurgical cCoating and Thin Films, ICMCTF, 2006, San Diego, United States |
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Oxydation et évaluation de la température d'inflammation de poudres d'UC et d'UNMATERIAUX 2006, 2006, Dijon, France. a paraitre |
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Ion beam analysis of ternary silicides me-Si-N (Me = Re Ta Ti W) thin films used as diffusion barriers in advanced metallizationInternational Symposium on Chemical Vapor Deposition : CDV-XIV and EUROCVD11, Sep 1997, Paris, France. pp.1-8 |
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Ti-Al-N-Based Hard Coatings: Thermodynamical Background, CVD Deposition, and Properties. A ReviewJaime Andres Perez Taborda; Alba Avila. Coatings and Thin-Film Technologies, IntechOpen, 2019, ⟨10.5772/intechopen.79747⟩ |
Thermodynamics simulations applied to gas-solid materials fabrication processesThermodynamics - Fundamentals and its application in science, INTECH, pp.191-214, 2012, 979-953-307-836-5 |
Method for functionalizing a polymer-based substrate by chemical deposition of a thin layerUnited States, Patent n° : 20230272522 - App. 18/006,335. 2023 |
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Structure adaptée à la formation de cellules solairesFrance, N° de brevet: FR2971086 (A1). EPM. 2012 |
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Quantum critical scaling of the conductivity tensor at the metal-insulator transition in Nb$_{1-x}$Ti$_{x}$N2019 |