Emilie Despiau-Pujo

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Publications

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Cryogenic cyclical etching of Si using CF$_4$ plasma passivation steps: The role of CF radicals

Jack Nos , Sylvain Iséni , Martin Kogelschatz , Gilles Cunge , Philippe Lefaucheux et al.
Applied Physics Letters, 2025, Featured Collection, 126 (3), pp.031602. ⟨10.1063/5.0245217⟩
Article dans une revue hal-04905588 v1

Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry

Pierre Ducluzaux , Delia Ristoiu , Gilles Cunge , Emilie Despiau-Pujo
Journal of Vacuum Science & Technology A, 2024, 42 (1), ⟨10.1116/6.0003291⟩
Article dans une revue hal-04509400 v1

Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

Kenji Ishikawa , Tatsuo Ishijima , Tatsuru Shirafuji , Silvia Armini , Emilie Despiau-Pujo et al.
Japanese Journal of Applied Physics, 2019, 58 (SE), pp.SE0801. ⟨10.7567/1347-4065/ab163e⟩
Article dans une revue hal-02337524 v1

Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas

V. Martirosyan , O. Joubert , E. Despiau-Pujo
Journal of Physics D: Applied Physics, 2019, 52 (055204), ⟨10.1088/1361-6463/aaefe0⟩
Article dans une revue hal-01954910 v1

Helium plasma modification of Si and Si 3 N 4 thin films for advanced etch processes

Vahagn Martirosyan , Emilie Despiau-Pujo , Jérôme Dubois , Gilles Cunge , Olivier Joubert
Journal of Vacuum Science & Technology A, 2018, 36 (4), pp.041301. ⟨10.1116/1.5025152⟩
Article dans une revue hal-01947862 v1

H + ion-induced damage and etching of multilayer graphene in H 2 plasmas

A. Davydova , E. Despiau-Pujo , G. Cunge , D. Graves
Journal of Applied Physics, 2017, 121 (13), ⟨10.1063/1.4979023⟩
Article dans une revue hal-01891243 v1
Image document

Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

G. Cunge , Maxime Darnon , J Dubois , P. Bézard , O Mourey et al.
Applied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩
Article dans une revue hal-01865123 v1
Image document

Cleaning graphene: A first quantum/classical molecular dynamics approach

L. Delfour , A. Davydova , E. Despiau-Pujo , G. Cunge , D. Graves et al.
Journal of Applied Physics, 2016, 119 (12), pp.125309. ⟨10.1063/1.4945034⟩
Article dans une revue hal-01881977 v1

Roughness generation during Si etching in Cl 2 pulsed plasma

Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo et al.
Journal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩
Article dans une revue hal-01881982 v1

Key plasma parameters for nanometric precision etching of Si films in chlorine discharges

P. Brichon , E. Despiau-Pujo , O. Mourey , O. Joubert
Journal of Physics D: Applied Physics, 2015, pp.118, 053303
Article dans une revue hal-01878054 v1

Hydrogen plasmas processing of graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , D.B. Graves
Plasma Chemistry and Plasma Processing, 2015, 36 (1), pp.213-229. ⟨10.1007/s11090-015-9683-0⟩
Article dans une revue hal-01878016 v1

Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experiments

Emilie Despiau-Pujo , Melisa Brihoum , Paul Bodart , M Darnon , Gilles Cunge
Journal of Physics D: Applied Physics, 2014, 47 (45), pp.16276 - 16282. ⟨10.1088/0022-3727/47/45/455201⟩
Article dans une revue hal-01798618 v1

MD simulations of low energy Clx+ ions interaction with ultrathin silicon layers for advanced etch processes

P. Brichon , E. Despiau-Pujo , O. Joubert
Journal of Vacuum Science and Technology, 2014, A32, pp.021301
Article dans une revue hal-00904425 v1

Elementary processes of H2 plasma-graphene interaction: A combined molecular dynamics and density functional theory study

E. Despiau-Pujo , A. Davydova , G. Cunge , Laure Delfour , Laurence Magaud et al.
Journal of Applied Physics, 2013, 113 (11), pp.114302. ⟨10.1063/1.4794375⟩
Article dans une revue hal-00992709 v1

2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments

Emilie Despiau-Pujo , Gilles Cunge , Nader Sadeghi , N. St. J. Braithwaite
American Physical Society, 2012, pp.2003
Article dans une revue hal-01006016 v1

MD simulations of GaN sputtering by Ar<SUP>+</SUP> ions : Ion-induced damage and near-surface modification under continuous bombardment

Emilie Despiau-Pujo , Pascal Chabert
Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1105. ⟨10.1116/1.3460904⟩
Article dans une revue hal-01549488 v1

Simulations of radical and ion fluxes on wafer in a Cl<SUB>2</SUB>/Ar ICP discharge : Confrontation with GaAs and GaN etch experiments

Emilie Despiau-Pujo , Pascal Chabert , S. Bansropun , D. Thenot , P. Plouhinec et al.
Journal of Vacuum Science and Technology, 2010, 28 (4), pp.693. ⟨10.1116/1.3437492⟩
Article dans une revue hal-01549482 v1

Low energy Ar<SUP>+</SUP> bombardment of GaN surfaces : A statistical study of ion reflection and sputtering

Emilie Despiau-Pujo , Pascal Chabert
Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1263. ⟨10.1116/1.3480344⟩
Article dans une revue hal-01549491 v1

Global model of instabilities in low pressure inductive chlorine discharges

Emilie Despiau-Pujo , Pascal Chabert
Plasma Sources Science and Technology, 2009, 18, pp.045028. ⟨10.1088/0963-0252/18/4/045028⟩
Article dans une revue istex hal-00462483 v1

Velocity distribution function of sputtered Ga atoms during inductively-coupled Ar plasma treatment of a GaAs surface

Emilie Despiau-Pujo , Pascal Chabert , R. Ramos , G. Cunge , N. Sadeghi
Journal of Vacuum Science & Technology A, 2009, 27, pp.356-361. ⟨10.1116/1.3081967⟩
Article dans une revue hal-00462482 v1

Comparison between fluid simulations and experiments in inductively coupled argon/chlorine plasmas

C.S. Corr , E. Despiau-Pujo , Pascal Chabert , W.G. Graham , F.G. Marro et al.
Journal of Physics D: Applied Physics, 2008, 41, pp.185202. ⟨10.1088/0022-3727/41/18/185202⟩
Article dans une revue istex hal-00462480 v1

Molecular dynamics simulations of GaAs sputtering under low energy argon ion bombardment

E. Despiau-Pujo , Pascal Chabert , D.B. Graves
Journal of Vacuum Science & Technology A, 2008, 26, pp.274. ⟨10.1116/1.2836408⟩
Article dans une revue hal-00462479 v1

Atomic Layer Etching of SiO<sub>2</sub> using CF<sub>4</sub> plasma in deposition mode at cryogenic temperature

Madjib Adjabi , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.
PLAsma THIN film International Union Meeting 2025 (PLATHINIUM 2025), Sep 2025, Antibes (France), France
Communication dans un congrès hal-05325597 v1

UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmas

Martin Kogelschatz , Jack Nos , Sylvain Iséni , Gilles Cunge , Philippe Lefaucheux et al.
Journées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France
Communication dans un congrès hal-05325839 v1

Cryogenic ALE of SiO<sub>2</sub> using CF<sub>4</sub> plasma

Madjib Adjabi , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.
AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025), Jun 2025, Jeju Island (South Korea), South Korea
Communication dans un congrès hal-05325605 v1

Cryogenic bosch process using CF<sub>4</sub> plasma in deposition regime

Thomas Tillocher , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.
The International Plasma Technology Joint Conference 2025 (IPTJC2025), Jun 2025, New Taipei City - Taiwan, Taiwan
Communication dans un congrès hal-05325733 v1

Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ?

Emilie Despiau-Pujo
2èmes Journées du GDR EMILI, Oct 2023, NANCY, France
Communication dans un congrès hal-04509431 v1

Molecular dynamics simulations for a better understanding of plasma-surface interactions

E. Despiau-Pujo , A. Davydova , V. Martirosyan , Db Graves , G. Cunge et al.
34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan
Communication dans un congrès hal-02337568 v1

Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process

F. Pinzan , C. Petit-Etienne , F. Leverd , E. Despiau-Pujo
41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan
Communication dans un congrès hal-02337577 v1

A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching

Emilie Despiau-Pujo
66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States
Communication dans un congrès hal-02337554 v1

Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching process

F. Pinzan , R. Blanc , F. Leverd , E. Despiau-Pujo
Plasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France
Communication dans un congrès hal-02337587 v1

Towards selective etching with nanometric control using remote plasma source

E. Pargon , V. Renaud , C. Petit-Etienne , F. Pinzan , E. Despiau-Pujo et al.
236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States
Communication dans un congrès hal-02324706 v1

Plasma solutions for atomic-precision etching: From atomistic simulations to experiments

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès hal-01954916 v1

Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processes

F Pinzan , F. Leverd , E. Despiau-Pujo
AVS 65th International Symposium, Oct 2018, Long Beach, United States
Communication dans un congrès hal-01954929 v1

Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès hal-01942798 v1

Ultra-high selective etching in remote plasmas: application to smart etch processes

G. Cunge. , C Petit−etienne. , L Vallier. , J Dubois. , R Soriano. et al.
PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium
Communication dans un congrès hal-01891297 v1

New trends in Plasma Technologies

O. Joubert , G. Cunge , E. Pargon , L. Vallier , E. Despiau-Pujo et al.
43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal
Communication dans un congrès hal-01891286 v1

Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch Processes

V. Martirosyan , E. Despiau-Pujo , O. Joubert
AVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States
Communication dans un congrès hal-01929202 v1

Towards atomic scale control of plasma processes: application to graphene

G. Cunge , H. Mehedi , F. Djawhar , H. Okuno , A. Davydova et al.
The 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan
Communication dans un congrès hal-01891303 v1

Atomic-scale simulations of low-damage plasma etching processes

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.
82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan
Communication dans un congrès hal-01891290 v1

Atomistic simulations of He plasma modification of Si thin-films for advanced etch processes

V. Martirosyan , E. Despiau-Pujo , O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès hal-01882933 v1

Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-films

E. Despiau-Pujo , V. Martirosyan , O. Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès hal-01882917 v1

Plasma solutions for nanometric-precision etching: insights from MD simulations

E. Despiau-Pujo , P. Brichon , V. Martirosyan , O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France
Communication dans un congrès hal-01882912 v1

Ion-induced damage and etching in reactive plasmas: Modelling and experimental support

E. Despiau-Pujo , P. Brichon , V. Martirosyan , O. Joubert
1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France
Communication dans un congrès hal-01882808 v1

ICP plasmas treatment of 2D materials: example of graphene

G. Cunge , D. Ferrah , D Marinov , J Zapatas , C. Petit-Etienne et al.
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès hal-01882928 v1

Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes

V. Martirosyan , E. Despiau-Pujo , O Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès hal-01882922 v1

Roughness generation during Si etching in Cl2 pulsed plasmas

Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo et al.
Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France
Communication dans un congrès hal-02339971 v1

H2 Plasma Interaction with CVD Graphene

G. Cunge , D. Ferrah , D Marinov , J Zapatas , E. Despiau-Pujo et al.
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès hal-01882915 v1

Plasma processing of graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , Db Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès hal-01877980 v1

RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas

G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. et al.
Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France
Communication dans un congrès hal-01878109 v1

Measuring IVDF through high−aspect holes in pulsed ICP plasmas

G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. et al.
68th GEC / ICRP−9, Oct 2015, Honolulu, United States
Communication dans un congrès hal-01878113 v1

Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments

E. Despiau-Pujo , G. Cunge , M Darnon , N. Sadeghi , N Braithwaite
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès hal-01878115 v1

Plasmas interaction with graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , D.B. Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès hal-01878411 v1

Plasmas interaction with graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , Db Graves
22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium
Communication dans un congrès hal-01877972 v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , L. Vallier , J Dubois et al.
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès hal-01877989 v1

Molecular dynamics simulations of plasma-surface interactions for advanced etch processes

E. Despiau-Pujo , P. Brichon , O. Joubert
42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal
Communication dans un congrès hal-01877976 v1

Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions

P. Brichon , E. Despiau-Pujo , O. Mourey , G. Cunge , O. Joubert
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès hal-01878118 v1

Measuring IVDF through high-aspect holes in pulsed ICP plasma

G. Cunge , M Darnon , J Dubois , P. Bézard , O. Mourey et al.
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès hal-01878046 v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , P. Brichon , J Dubois et al.
SPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States
Communication dans un congrès hal-01878051 v1

Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations?

L. Delfour , A. Davydova , E. Despiau-Pujo , G. Cunge , Db Graves et al.
European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten Croatia
Communication dans un congrès hal-01798516 v1

Hydrogen plasmas processing of graphene

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud , Db Graves
61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States
Communication dans un congrès hal-01798382 v1

Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma

Odile Mourey , C. Petit-Etienne , G. Cunge , M. Darnon , E. Despiau-Pujo et al.
AVS 2014, , 2014, Baltimore, United States
Communication dans un congrès hal-01798348 v1

Pulsed ICP plasmas processing: 0D Model vs. Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , M Darnon , N Braithwaite et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès hal-01798532 v1

MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès hal-01798524 v1

Producing ion waves from acoustic pressure waves in pulsed inductive plasmas

Emilie Despiau-Pujo , Gilles Cunge , Maxime Darnon , Nader Sadeghi , Nicholas Braithwaite
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France
Communication dans un congrès hal-01798411 v1

Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor

Nader Sadeghi , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo , Nicholas St J Braithwaite
1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey
Communication dans un congrès hal-02338122 v1

Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , M Darnon , N Braithwaite et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France
Communication dans un congrès hal-01798407 v1

MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , M Darnon et al.
2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States
Communication dans un congrès hal-01798393 v1

MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès hal-01798396 v1

Molecular Dynamics simulations of hydrogen plasma-graphene interaction

A. Davydova , E. Despiau-Pujo , G. Cunge , L. Magaud , L. Delfour et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès hal-01798403 v1

Pulsed Plasmas for etching in micro and nanoelectronics

Maxime Darnon , Gilles Cunge , Camille Petit-Etienne , Moritz Haass , Paul Bodart et al.
Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland
Communication dans un congrès hal-02338129 v1

Molecular Dynamics simulations of hydrogen plasma – graphene interaction

A. Davydova , E. Despiau-Pujo , G. Cunge , L. Magaud , L. Delfour et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès hal-01798558 v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , L. Vallier , P. Brichon et al.
Sematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States
Communication dans un congrès hal-01798418 v1

MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes

P. Brichon , E. Despiau-Pujo , G. Cunge , Maxime Darnon , O. Joubert
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès hal-00904431 v1

MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes

P. Brichon , E. Despiau-Pujo , G. Cunge , Maxime Darnon , O. Joubert
AVS 2013, Oct 2013, Long beach, United States
Communication dans un congrès hal-00919179 v1

Pulsed plasmas for etching at the nanoscale

Maxime Darnon , G. Cunge , C. Petit Etienne , E. Pargon , L. Vallier et al.
Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France
Communication dans un congrès hal-00860922 v1

Pulsed plasma processing: A combined modelling and experimental study

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N. Braithwaite et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès hal-00904428 v1

Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N.S. Braithwaite et al.
4th Workshop on Radio Frequency Discharges, May 2013, giens, France
Communication dans un congrès hal-00860934 v1

Pulsed ICP plasmas processing : A combined modelling and experimental study

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N.S. Braithwaite et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès hal-00925794 v1

Pulsed plasmas for etching in microelectronics

Maxime Darnon , G. Cunge , C. Petit-Etienne , M. Haass , P. Bodart et al.
Journées du réseau plasma froids, 2013, La Rochelle, France
Communication dans un congrès hal-00925769 v1

Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes

Gilles Cunge , Maxime Darnon , Camille Petit-Etienne , Paulin Brichon , Romuald Blanc et al.
11th Technological Plasma Workshop, Dec 2013, York, United Kingdom
Communication dans un congrès hal-02338133 v1

Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching

G. Cunge , M. Brihoum , Maxime Darnon , E. Despiau-Pujo , A. Davydova et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès hal-00904432 v1

MD simulations of H2 plasma-graphene interactions

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Delfour , L. Magaud et al.
Plasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium
Communication dans un congrès hal-00860933 v1

Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes

G. Cunge , Maxime Darnon , M. Brihoum , E. Despiau-Pujo , A. Davydova et al.
AVS 60h international symposium, Oct 2013, Long Beach, United States
Communication dans un congrès hal-00925763 v1

Molecular Dynamics Simulation for Hydrogen Plasma Processing of Graphene

A. Davydova , E. Despiau-Pujo , G. Cunge , D.B. Graves , L. Delfour et al.
AVS 60th International Symposium, Oct 2013, Long Beach, United States
Communication dans un congrès hal-00925810 v1

Molecular Dynamics Simulations for Hydrogen Plasma Processing of Graphene

A. Davydova , E. Despiau-Pujo , G. Cunge , D.B. Graves , L. Delfour et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès hal-00904430 v1

Time resolved ion flux measurement in pulsed ICP plasmas

G. Cunge , Maxime Darnon , N. Braithwaite , E. Despiau-Pujo , P. Bodart et al.
Tampa, Oct 2012, Tampa, United States
Communication dans un congrès hal-00762123 v1

2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments

E. Despiau-Pujo , G. Cunge , N. Sadeghi , N.St.J. Braithwaite
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès hal-00762116 v1

2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments

E. Despiau-Pujo , G. Cunge , N. Sadeghi , N.St.J. Braithwaite
65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States
Communication dans un congrès hal-00925814 v1

MD simulations of hydrogen plasma interaction with graphene surfaces

D.B. Graves , E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès hal-00762119 v1

Molecular dynamics simulations of hydrogen plasma interaction with graphene

E. Despiau-Pujo
11th APCPST, Oct 2012, Kyoto, Japan
Communication dans un congrès hal-00762110 v1

MD simulations of hydrogen plasma interaction with graphene surface

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud , D.B. Graves
AVS 59th Symposium, Oct 2012, Tampa, United States
Communication dans un congrès hal-00808676 v1

Molecular dynamics simulations of hydrogen plasmas interaction with graphene

E. Despiau-Pujo , A. Davydova , G. Cunge , Db. Graves
11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan
Communication dans un congrès hal-00925797 v1

PECVD of GeTe for next generation of non volatile memory

Corentin Vallée , L. Dussault , E. Despiau-Pujo , E. Gourvest , D. Jourde et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France
Communication dans un congrès hal-00925819 v1

PE-MOCVD of GeTe material for Phase Change Memory

E. Despiau-Pujo , L. Dussault , Corentin Vallée , E. Gourvest , D. Jourde et al.
58th National Symposium AVS, Oct 2011, Nashville, United States
Communication dans un congrès hal-00650192 v1

PE-MOCVD of GeTe materials for Phase Change Memory Applications

E. Despiau-Pujo , L. Dussault , Corentin Vallée , E. Gourvest , D. Jourde et al.
AVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States
Communication dans un congrès hal-00925816 v1

Modelling of chlorine inductive discharges

Pascal Chabert , Emilie Despiau-Pujo
25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia
Communication dans un congrès hal-02573325 v1

Modelling of chlorine inductive discharges

Pascal Chabert , Emilie Despiau-Pujo
International Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan
Communication dans un congrès hal-02573326 v1

Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase

E. Despiau-Pujo , P. Chabert , R. Ramos , G. Cunge , N. Sadeghi
55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States
Communication dans un congrès hal-00400658 v1