|
Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ?
Emilie Despiau-Pujo
2èmes Journées du GDR EMILI, Oct 2023, NANCY, France
Communication dans un congrès
hal-04509431
v1
|
|
Molecular dynamics simulations for a better understanding of plasma-surface interactions
E. Despiau-Pujo
,
A. Davydova
,
V. Martirosyan
,
Db Graves
,
G. Cunge
et al.
34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan
Communication dans un congrès
hal-02337568
v1
|
|
Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process
F. Pinzan
,
C. Petit-Etienne
,
F. Leverd
,
E. Despiau-Pujo
41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan
Communication dans un congrès
hal-02337577
v1
|
|
Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching process
F. Pinzan
,
R. Blanc
,
F. Leverd
,
E. Despiau-Pujo
Plasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France
Communication dans un congrès
hal-02337587
v1
|
|
A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching
Emilie Despiau-Pujo
66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States
Communication dans un congrès
hal-02337554
v1
|
|
Towards selective etching with nanometric control using remote plasma source
E. Pargon
,
V. Renaud
,
C. Petit-Etienne
,
F. Pinzan
,
E. Despiau-Pujo
et al.
236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States
Communication dans un congrès
hal-02324706
v1
|
|
Plasma solutions for atomic-precision etching: From atomistic simulations to experiments
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès
hal-01954916
v1
|
|
Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processes
F Pinzan
,
F. Leverd
,
E. Despiau-Pujo
AVS 65th International Symposium, Oct 2018, Long Beach, United States
Communication dans un congrès
hal-01954929
v1
|
|
Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès
hal-01942798
v1
|
|
Towards atomic scale control of plasma processes: application to graphene
G. Cunge
,
H. Mehedi
,
F. Djawhar
,
H. Okuno
,
A. Davydova
et al.
The 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan
Communication dans un congrès
hal-01891303
v1
|
|
Atomic-scale simulations of low-damage plasma etching processes
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan
Communication dans un congrès
hal-01891290
v1
|
|
Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch Processes
V. Martirosyan
,
E. Despiau-Pujo
,
O. Joubert
AVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States
Communication dans un congrès
hal-01929202
v1
|
|
New trends in Plasma Technologies
O. Joubert
,
G. Cunge
,
E. Pargon
,
L. Vallier
,
E. Despiau-Pujo
et al.
43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal
Communication dans un congrès
hal-01891286
v1
|
|
Ultra-high selective etching in remote plasmas: application to smart etch processes
G. Cunge.
,
C Petit−etienne.
,
L Vallier.
,
J Dubois.
,
R Soriano.
et al.
PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium
Communication dans un congrès
hal-01891297
v1
|
|
Plasma solutions for nanometric-precision etching: insights from MD simulations
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France
Communication dans un congrès
hal-01882912
v1
|
|
ICP plasmas treatment of 2D materials: example of graphene
G. Cunge
,
D. Ferrah
,
D Marinov
,
J Zapatas
,
C. Petit-Etienne
et al.
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès
hal-01882928
v1
|
|
Ion-induced damage and etching in reactive plasmas: Modelling and experimental support
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
O. Joubert
1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France
Communication dans un congrès
hal-01882808
v1
|
|
Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes
V. Martirosyan
,
E. Despiau-Pujo
,
O Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882922
v1
|
|
H2 Plasma Interaction with CVD Graphene
G. Cunge
,
D. Ferrah
,
D Marinov
,
J Zapatas
,
E. Despiau-Pujo
et al.
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882915
v1
|
|
Roughness generation during Si etching in Cl2 pulsed plasmas
Odile Mourey
,
Camille Petit-Etienne
,
Gilles Cunge
,
Maxime Darnon
,
Emilie Despiau-Pujo
et al.
Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France
Communication dans un congrès
hal-02339971
v1
|
|
Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-films
E. Despiau-Pujo
,
V. Martirosyan
,
O. Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882917
v1
|
|
Atomistic simulations of He plasma modification of Si thin-films for advanced etch processes
V. Martirosyan
,
E. Despiau-Pujo
,
O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès
hal-01882933
v1
|
|
RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas
G. Cunge.
,
M. Darnon.
,
J Dubois.
,
P Bezard.
,
O Mourey.
et al.
Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France
Communication dans un congrès
hal-01878109
v1
|
|
Plasma processing of graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès
hal-01877980
v1
|
|
Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments
E. Despiau-Pujo
,
G. Cunge
,
M Darnon
,
N. Sadeghi
,
N Braithwaite
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878115
v1
|
|
Plasmas interaction with graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db Graves
22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium
Communication dans un congrès
hal-01877972
v1
|
|
Plasmas interaction with graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
D.B. Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès
hal-01878411
v1
|
|
Measuring IVDF through high−aspect holes in pulsed ICP plasmas
G. Cunge.
,
M. Darnon.
,
J Dubois.
,
P Bezard.
,
O Mourey.
et al.
68th GEC / ICRP−9, Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878113
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
L. Vallier
,
J Dubois
et al.
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès
hal-01877989
v1
|
|
Measuring IVDF through high-aspect holes in pulsed ICP plasma
G. Cunge
,
M Darnon
,
J Dubois
,
P. Bézard
,
O. Mourey
et al.
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878046
v1
|
|
Molecular dynamics simulations of plasma-surface interactions for advanced etch processes
E. Despiau-Pujo
,
P. Brichon
,
O. Joubert
42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal
Communication dans un congrès
hal-01877976
v1
|
|
Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions
P. Brichon
,
E. Despiau-Pujo
,
O. Mourey
,
G. Cunge
,
O. Joubert
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès
hal-01878118
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
P. Brichon
,
J Dubois
et al.
SPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States
Communication dans un congrès
hal-01878051
v1
|
|
Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma
Odile Mourey
,
C. Petit-Etienne
,
G. Cunge
,
M. Darnon
,
E. Despiau-Pujo
et al.
AVS 2014, , 2014, Baltimore, United States
Communication dans un congrès
hal-01798348
v1
|
|
Hydrogen plasmas processing of graphene
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
,
Db Graves
61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States
Communication dans un congrès
hal-01798382
v1
|
|
Pulsed ICP plasmas processing: 0D Model vs. Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
M Darnon
,
N Braithwaite
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798532
v1
|
|
Producing ion waves from acoustic pressure waves in pulsed inductive plasmas
Emilie Despiau-Pujo
,
Gilles Cunge
,
Maxime Darnon
,
Nader Sadeghi
,
Nicholas Braithwaite
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France
Communication dans un congrès
hal-01798411
v1
|
|
Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor
Nader Sadeghi
,
Gilles Cunge
,
Maxime Darnon
,
Emilie Despiau-Pujo
,
Nicholas St J Braithwaite
1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey
Communication dans un congrès
hal-02338122
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
M Darnon
et al.
2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States
Communication dans un congrès
hal-01798393
v1
|
|
Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
M Darnon
,
N Braithwaite
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France
Communication dans un congrès
hal-01798407
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
G. Cunge
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798524
v1
|
|
MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
G. Cunge
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798396
v1
|
|
Molecular Dynamics simulations of hydrogen plasma-graphene interaction
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
L. Magaud
,
L. Delfour
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798403
v1
|
|
Pulsed Plasmas for etching in micro and nanoelectronics
Maxime Darnon
,
Gilles Cunge
,
Camille Petit-Etienne
,
Moritz Haass
,
Paul Bodart
et al.
Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland
Communication dans un congrès
hal-02338129
v1
|
|
Molecular Dynamics simulations of hydrogen plasma – graphene interaction
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
L. Magaud
,
L. Delfour
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798558
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
L. Vallier
,
P. Brichon
et al.
Sematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States
Communication dans un congrès
hal-01798418
v1
|
|
Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations?
L. Delfour
,
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
Db Graves
et al.
European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten, Croatia
Communication dans un congrès
hal-01798516
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes
P. Brichon
,
E. Despiau-Pujo
,
G. Cunge
,
Maxime Darnon
,
O. Joubert
AVS 2013, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00919179
v1
|
|
Pulsed plasmas for etching in microelectronics
Maxime Darnon
,
G. Cunge
,
C. Petit-Etienne
,
M. Haass
,
P. Bodart
et al.
Journées du réseau plasma froids, 2013, La Rochelle, France
Communication dans un congrès
hal-00925769
v1
|
|
Pulsed ICP plasmas processing : A combined modelling and experimental study
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N.S. Braithwaite
et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00925794
v1
|
|
Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching
G. Cunge
,
M. Brihoum
,
Maxime Darnon
,
E. Despiau-Pujo
,
A. Davydova
et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904432
v1
|
|
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes
Gilles Cunge
,
Maxime Darnon
,
Camille Petit-Etienne
,
Paulin Brichon
,
Romuald Blanc
et al.
11th Technological Plasma Workshop, Dec 2013, York, United Kingdom
Communication dans un congrès
hal-02338133
v1
|
|
Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N.S. Braithwaite
et al.
4th Workshop on Radio Frequency Discharges, May 2013, giens, France
Communication dans un congrès
hal-00860934
v1
|
|
Pulsed plasma processing: A combined modelling and experimental study
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N. Braithwaite
et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00904428
v1
|
|
Pulsed plasmas for etching at the nanoscale
Maxime Darnon
,
G. Cunge
,
C. Petit Etienne
,
E. Pargon
,
L. Vallier
et al.
Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France
Communication dans un congrès
hal-00860922
v1
|
|
MD simulations of H2 plasma-graphene interactions
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Delfour
,
L. Magaud
et al.
Plasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium
Communication dans un congrès
hal-00860933
v1
|
|
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes
G. Cunge
,
Maxime Darnon
,
M. Brihoum
,
E. Despiau-Pujo
,
A. Davydova
et al.
AVS 60h international symposium, Oct 2013, Long Beach, United States
Communication dans un congrès
hal-00925763
v1
|
|
Molecular Dynamics Simulation for Hydrogen Plasma Processing of Graphene
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
D.B. Graves
,
L. Delfour
et al.
AVS 60th International Symposium, Oct 2013, Long Beach, United States
Communication dans un congrès
hal-00925810
v1
|
|
Molecular Dynamics Simulations for Hydrogen Plasma Processing of Graphene
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
D.B. Graves
,
L. Delfour
et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904430
v1
|
|
MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes
P. Brichon
,
E. Despiau-Pujo
,
G. Cunge
,
Maxime Darnon
,
O. Joubert
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904431
v1
|
|
Time resolved ion flux measurement in pulsed ICP plasmas
G. Cunge
,
Maxime Darnon
,
N. Braithwaite
,
E. Despiau-Pujo
,
P. Bodart
et al.
Tampa, Oct 2012, Tampa, United States
Communication dans un congrès
hal-00762123
v1
|
|
2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments
E. Despiau-Pujo
,
G. Cunge
,
N. Sadeghi
,
N.St.J. Braithwaite
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès
hal-00762116
v1
|
|
2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments
E. Despiau-Pujo
,
G. Cunge
,
N. Sadeghi
,
N.St.J. Braithwaite
65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States
Communication dans un congrès
hal-00925814
v1
|
|
MD simulations of hydrogen plasma interaction with graphene surfaces
D.B. Graves
,
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès
hal-00762119
v1
|
|
MD simulations of hydrogen plasma interaction with graphene surface
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
,
D.B. Graves
AVS 59th Symposium, Oct 2012, Tampa, United States
Communication dans un congrès
hal-00808676
v1
|
|
Molecular dynamics simulations of hydrogen plasma interaction with graphene
E. Despiau-Pujo
11th APCPST, Oct 2012, Kyoto, Japan
Communication dans un congrès
hal-00762110
v1
|
|
Molecular dynamics simulations of hydrogen plasmas interaction with graphene
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db. Graves
11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan
Communication dans un congrès
hal-00925797
v1
|
|
PECVD of GeTe for next generation of non volatile memory
Corentin Vallée
,
L. Dussault
,
E. Despiau-Pujo
,
E. Gourvest
,
D. Jourde
et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France
Communication dans un congrès
hal-00925819
v1
|
|
PE-MOCVD of GeTe material for Phase Change Memory
E. Despiau-Pujo
,
L. Dussault
,
Corentin Vallée
,
E. Gourvest
,
D. Jourde
et al.
58th National Symposium AVS, Oct 2011, Nashville, United States
Communication dans un congrès
hal-00650192
v1
|
|
PE-MOCVD of GeTe materials for Phase Change Memory Applications
E. Despiau-Pujo
,
L. Dussault
,
Corentin Vallée
,
E. Gourvest
,
D. Jourde
et al.
AVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States
Communication dans un congrès
hal-00925816
v1
|
|
Modelling of chlorine inductive discharges
Pascal Chabert
,
Emilie Despiau-Pujo
25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia
Communication dans un congrès
hal-02573325
v1
|
|
Modelling of chlorine inductive discharges
Pascal Chabert
,
Emilie Despiau-Pujo
International Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan
Communication dans un congrès
hal-02573326
v1
|
|
Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase
E. Despiau-Pujo
,
P. Chabert
,
R. Ramos
,
G. Cunge
,
N. Sadeghi
55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States
Communication dans un congrès
hal-00400658
v1
|