Emilie Despiau-Pujo
Publications
Publications
Atomic Layer Etching of SiO<sub>2</sub> using CF<sub>4</sub> plasma in deposition mode at cryogenic temperaturePLAsma THIN film International Union Meeting 2025 (PLATHINIUM 2025), Sep 2025, Antibes (France), France |
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UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmasJournées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France |
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Cryogenic ALE of SiO<sub>2</sub> using CF<sub>4</sub> plasmaAVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025), Jun 2025, Jeju Island (South Korea), South Korea |
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Cryogenic bosch process using CF<sub>4</sub> plasma in deposition regimeThe International Plasma Technology Joint Conference 2025 (IPTJC2025), Jun 2025, New Taipei City - Taiwan, Taiwan |
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Mécanismes de l’interaction plasma-surface : Quid de la modélisation ?17èmes Journées d’échanges du Réseau Plasmas Froids, Oct 2024, Carry-le-rouet, France |
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Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ?2èmes Journées du GDR EMILI, Oct 2023, NANCY, France |
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Molecular dynamics simulations for a better understanding of plasma-surface interactions34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan |
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Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan |
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Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching processPlasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France |
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A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States |
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Towards selective etching with nanometric control using remote plasma source236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States |
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Plasma solutions for atomic-precision etching: From atomistic simulations to experiments40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan |
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Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processesAVS 65th International Symposium, Oct 2018, Long Beach, United States |
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Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan |
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Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch ProcessesAVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States |
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New trends in Plasma Technologies43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal |
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Ultra-high selective etching in remote plasmas: application to smart etch processesPESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium |
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Towards atomic scale control of plasma processes: application to grapheneThe 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan |
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Atomic-scale simulations of low-damage plasma etching processes82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan |
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Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-filmsAVS 63nd International Symposium, Nov 2016, Nashville, United States |
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Atomistic simulations of He plasma modification of Si thin-films for advanced etch processesPlasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France |
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Plasma solutions for nanometric-precision etching: insights from MD simulationsPlasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France |
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Ion-induced damage and etching in reactive plasmas: Modelling and experimental support1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France |
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ICP plasmas treatment of 2D materials: example of graphenePlasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France |
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Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch ProcessesAVS 63nd International Symposium, Nov 2016, Nashville, United States |
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Roughness generation during Si etching in Cl2 pulsed plasmasPlasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France |
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H2 Plasma Interaction with CVD GrapheneAVS 63nd International Symposium, Nov 2016, Nashville, United States |
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Plasma processing of graphene surfacesFusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom |
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RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmasFrontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France |
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Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States |
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Measuring IVDF through high−aspect holes in pulsed ICP plasmas68th GEC / ICRP−9, Oct 2015, Honolulu, United States |
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Plasmas interaction with graphene surfaces22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium |
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Plasmas interaction with graphene surfacesFusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom |
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Molecular dynamics simulations of plasma-surface interactions for advanced etch processes42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal |
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Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactionsAVS 62nd International Symposium, Oct 2015, San José, United States |
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Potential Solutions for Atomic Precision EtchingAVS 62nd International Symposium, Oct 2015, San José, United States |
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Measuring IVDF through high-aspect holes in pulsed ICP plasma68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States |
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Potential Solutions for Atomic Precision EtchingSPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States |
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Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations?European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten Croatia |
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Hydrogen plasmas processing of graphene61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States |
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Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasmaAVS 2014, , 2014, Baltimore, United States |
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Pulsed ICP plasmas processing: 0D Model vs. ExperimentsPlasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France |
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Producing ion waves from acoustic pressure waves in pulsed inductive plasmasPlasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France |
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Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey |
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MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France |
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MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States |
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Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. ExperimentsPlasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France |
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MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France |
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Molecular Dynamics simulations of hydrogen plasma-graphene interactionPlasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France |
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Pulsed Plasmas for etching in micro and nanoelectronicsPlasma Nanoscience Conference, Mar 2014, Dublin, Ireland |
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Potential Solutions for Atomic Precision EtchingSematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States |
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Molecular Dynamics simulations of hydrogen plasma – graphene interactionPlasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France |
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MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch ProcessesAmerican Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States |
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MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processesAVS 2013, Oct 2013, Long beach, United States |
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Pulsed ICP plasmas processing : A combined modelling and experimental study31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain |
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Pulsed plasmas for etching in microelectronicsJournées du réseau plasma froids, 2013, La Rochelle, France |
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Pulsed plasma processing: A combined modelling and experimental study31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain |
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Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments4th Workshop on Radio Frequency Discharges, May 2013, giens, France |
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Pulsed plasmas for etching at the nanoscaleJournées Nationales des Technologies Émergentes, May 2013, Evian les bains, France |
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Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes11th Technological Plasma Workshop, Dec 2013, York, United Kingdom |
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Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas EtchingAmerican Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States |
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MD simulations of H2 plasma-graphene interactionsPlasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium |
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Molecular Dynamics Simulation for Hydrogen Plasma Processing of GrapheneAVS 60th International Symposium, Oct 2013, Long Beach, United States |
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Molecular Dynamics Simulations for Hydrogen Plasma Processing of GrapheneAmerican Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States |
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Optical and Electrical Diagnostics of Pulsed Plasmas Etching ProcessesAVS 60h international symposium, Oct 2013, Long Beach, United States |
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Time resolved ion flux measurement in pulsed ICP plasmasTampa, Oct 2012, Tampa, United States |
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2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments65th GEC, Oct 2012, Austin, United States |
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MD simulations of hydrogen plasma interaction with graphene surfaces65th GEC, Oct 2012, Austin, United States |
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2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States |
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Molecular dynamics simulations of hydrogen plasma interaction with graphene11th APCPST, Oct 2012, Kyoto, Japan |
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MD simulations of hydrogen plasma interaction with graphene surfaceAVS 59th Symposium, Oct 2012, Tampa, United States |
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Molecular dynamics simulations of hydrogen plasmas interaction with graphene11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan |
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PECVD of GeTe for next generation of non volatile memory18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France |
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PE-MOCVD of GeTe materials for Phase Change Memory ApplicationsAVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States |
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PE-MOCVD of GeTe material for Phase Change Memory58th National Symposium AVS, Oct 2011, Nashville, United States |
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Modelling of chlorine inductive discharges25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia |
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Modelling of chlorine inductive dischargesInternational Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan |
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Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States |
Plasma inductif en Cl<SUB>2</SUB>/Ar : comparaison entre simulations hybrides et expériencesCongres de la Division Plasma du SFP, May 2010, Bordeaux, France. 2010 |
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Electron densities and temperatures in a Cl<SUB>2</SUB>/Ar ICPGaseous Electronics Conference, Oct 2010, Paris, France. 2010 |
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Inductive plasmas in Cl<SUB>2</SUB>/Ar :Comparison of hybrid model results with experimental measurementsAVS Symposium, Oct 2010, Albuquerque, New Mexico, United States. 2010 |
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Inductive plasmas in Cl<SUB>2</SUB>/Ar : Comparison of hybrid model results with experimental measurementsESCAMPIG, Jul 2010, Novi Sad, Serbia. 2010 |
Procédé d’exfoliation de graphèneFrance, Patent n° : FR3059316A1 / WO2018099759A1. 2018 |
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Procédé d’exfoliation de graphèneFrance, N° de brevet: DD17214 VR. 2017 |
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Atomic precision etching by dynamic control of the reactive layer thickness in reactive plasmasUnited States, Patent n° : US 2015/0228495 A1. 2015 |
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Etching of III-V semiconductors in inductively coupled chlorine plasmasComputer Science [cs]. Ecole Polytechnique X, 2009. English. ⟨NNT : ⟩ |