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Atomic Layer Etching of SiO<sub>2</sub> using CF<sub>4</sub> plasma in deposition mode at cryogenic temperature
Madjib Adjabi
,
Jack Nos
,
Sylvain Iséni
,
Gilles Cunge
,
Martin Kogelschatz
et al.
PLAsma THIN film International Union Meeting 2025 (PLATHINIUM 2025), Sep 2025, Antibes (France), France
Communication dans un congrès
hal-05325597
v1
|
|
UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmas
Martin Kogelschatz
,
Jack Nos
,
Sylvain Iséni
,
Gilles Cunge
,
Philippe Lefaucheux
et al.
Journées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France
Communication dans un congrès
hal-05325839
v1
|
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Cryogenic ALE of SiO<sub>2</sub> using CF<sub>4</sub> plasma
Madjib Adjabi
,
Jack Nos
,
Sylvain Iséni
,
Gilles Cunge
,
Martin Kogelschatz
et al.
AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025), Jun 2025, Jeju Island (South Korea), South Korea
Communication dans un congrès
hal-05325605
v1
|
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Cryogenic bosch process using CF<sub>4</sub> plasma in deposition regime
Thomas Tillocher
,
Jack Nos
,
Sylvain Iséni
,
Gilles Cunge
,
Martin Kogelschatz
et al.
The International Plasma Technology Joint Conference 2025 (IPTJC2025), Jun 2025, New Taipei City - Taiwan, Taiwan
Communication dans un congrès
hal-05325733
v1
|
|
Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ?
Emilie Despiau-Pujo
2èmes Journées du GDR EMILI, Oct 2023, NANCY, France
Communication dans un congrès
hal-04509431
v1
|
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Molecular dynamics simulations for a better understanding of plasma-surface interactions
E. Despiau-Pujo
,
A. Davydova
,
V. Martirosyan
,
Db Graves
,
G. Cunge
et al.
34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan
Communication dans un congrès
hal-02337568
v1
|
|
Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process
F. Pinzan
,
C. Petit-Etienne
,
F. Leverd
,
E. Despiau-Pujo
41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan
Communication dans un congrès
hal-02337577
v1
|
|
A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching
Emilie Despiau-Pujo
66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States
Communication dans un congrès
hal-02337554
v1
|
|
Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching process
F. Pinzan
,
R. Blanc
,
F. Leverd
,
E. Despiau-Pujo
Plasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France
Communication dans un congrès
hal-02337587
v1
|
|
Towards selective etching with nanometric control using remote plasma source
E. Pargon
,
V. Renaud
,
C. Petit-Etienne
,
F. Pinzan
,
E. Despiau-Pujo
et al.
236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States
Communication dans un congrès
hal-02324706
v1
|
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Plasma solutions for atomic-precision etching: From atomistic simulations to experiments
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès
hal-01954916
v1
|
|
Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processes
F Pinzan
,
F. Leverd
,
E. Despiau-Pujo
AVS 65th International Symposium, Oct 2018, Long Beach, United States
Communication dans un congrès
hal-01954929
v1
|
|
Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan
Communication dans un congrès
hal-01942798
v1
|
|
Ultra-high selective etching in remote plasmas: application to smart etch processes
G. Cunge.
,
C Petit−etienne.
,
L Vallier.
,
J Dubois.
,
R Soriano.
et al.
PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium
Communication dans un congrès
hal-01891297
v1
|
|
New trends in Plasma Technologies
O. Joubert
,
G. Cunge
,
E. Pargon
,
L. Vallier
,
E. Despiau-Pujo
et al.
43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal
Communication dans un congrès
hal-01891286
v1
|
|
Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch Processes
V. Martirosyan
,
E. Despiau-Pujo
,
O. Joubert
AVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States
Communication dans un congrès
hal-01929202
v1
|
|
Towards atomic scale control of plasma processes: application to graphene
G. Cunge
,
H. Mehedi
,
F. Djawhar
,
H. Okuno
,
A. Davydova
et al.
The 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan
Communication dans un congrès
hal-01891303
v1
|
|
Atomic-scale simulations of low-damage plasma etching processes
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
J. Dubois
,
G. Cunge
et al.
82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan
Communication dans un congrès
hal-01891290
v1
|
|
Atomistic simulations of He plasma modification of Si thin-films for advanced etch processes
V. Martirosyan
,
E. Despiau-Pujo
,
O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès
hal-01882933
v1
|
|
Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-films
E. Despiau-Pujo
,
V. Martirosyan
,
O. Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882917
v1
|
|
Plasma solutions for nanometric-precision etching: insights from MD simulations
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
O. Joubert
Plasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France
Communication dans un congrès
hal-01882912
v1
|
|
Ion-induced damage and etching in reactive plasmas: Modelling and experimental support
E. Despiau-Pujo
,
P. Brichon
,
V. Martirosyan
,
O. Joubert
1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France
Communication dans un congrès
hal-01882808
v1
|
|
ICP plasmas treatment of 2D materials: example of graphene
G. Cunge
,
D. Ferrah
,
D Marinov
,
J Zapatas
,
C. Petit-Etienne
et al.
Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France
Communication dans un congrès
hal-01882928
v1
|
|
Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes
V. Martirosyan
,
E. Despiau-Pujo
,
O Joubert
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882922
v1
|
|
Roughness generation during Si etching in Cl2 pulsed plasmas
Odile Mourey
,
Camille Petit-Etienne
,
Gilles Cunge
,
Maxime Darnon
,
Emilie Despiau-Pujo
et al.
Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France
Communication dans un congrès
hal-02339971
v1
|
|
H2 Plasma Interaction with CVD Graphene
G. Cunge
,
D. Ferrah
,
D Marinov
,
J Zapatas
,
E. Despiau-Pujo
et al.
AVS 63nd International Symposium, Nov 2016, Nashville, United States
Communication dans un congrès
hal-01882915
v1
|
|
Plasma processing of graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès
hal-01877980
v1
|
|
RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas
G. Cunge.
,
M. Darnon.
,
J Dubois.
,
P Bezard.
,
O Mourey.
et al.
Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France
Communication dans un congrès
hal-01878109
v1
|
|
Measuring IVDF through high−aspect holes in pulsed ICP plasmas
G. Cunge.
,
M. Darnon.
,
J Dubois.
,
P Bezard.
,
O Mourey.
et al.
68th GEC / ICRP−9, Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878113
v1
|
|
Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments
E. Despiau-Pujo
,
G. Cunge
,
M Darnon
,
N. Sadeghi
,
N Braithwaite
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878115
v1
|
|
Plasmas interaction with graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
D.B. Graves
Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom
Communication dans un congrès
hal-01878411
v1
|
|
Plasmas interaction with graphene surfaces
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db Graves
22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium
Communication dans un congrès
hal-01877972
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
L. Vallier
,
J Dubois
et al.
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès
hal-01877989
v1
|
|
Molecular dynamics simulations of plasma-surface interactions for advanced etch processes
E. Despiau-Pujo
,
P. Brichon
,
O. Joubert
42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal
Communication dans un congrès
hal-01877976
v1
|
|
Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions
P. Brichon
,
E. Despiau-Pujo
,
O. Mourey
,
G. Cunge
,
O. Joubert
AVS 62nd International Symposium, Oct 2015, San José, United States
Communication dans un congrès
hal-01878118
v1
|
|
Measuring IVDF through high-aspect holes in pulsed ICP plasma
G. Cunge
,
M Darnon
,
J Dubois
,
P. Bézard
,
O. Mourey
et al.
68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States
Communication dans un congrès
hal-01878046
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
P. Brichon
,
J Dubois
et al.
SPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States
Communication dans un congrès
hal-01878051
v1
|
|
Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations?
L. Delfour
,
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
Db Graves
et al.
European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten Croatia
Communication dans un congrès
hal-01798516
v1
|
|
Hydrogen plasmas processing of graphene
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
,
Db Graves
61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States
Communication dans un congrès
hal-01798382
v1
|
|
Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma
Odile Mourey
,
C. Petit-Etienne
,
G. Cunge
,
M. Darnon
,
E. Despiau-Pujo
et al.
AVS 2014, , 2014, Baltimore, United States
Communication dans un congrès
hal-01798348
v1
|
|
Pulsed ICP plasmas processing: 0D Model vs. Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
M Darnon
,
N Braithwaite
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798532
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
G. Cunge
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798524
v1
|
|
Producing ion waves from acoustic pressure waves in pulsed inductive plasmas
Emilie Despiau-Pujo
,
Gilles Cunge
,
Maxime Darnon
,
Nader Sadeghi
,
Nicholas Braithwaite
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France
Communication dans un congrès
hal-01798411
v1
|
|
Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor
Nader Sadeghi
,
Gilles Cunge
,
Maxime Darnon
,
Emilie Despiau-Pujo
,
Nicholas St J Braithwaite
1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey
Communication dans un congrès
hal-02338122
v1
|
|
Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
M Darnon
,
N Braithwaite
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France
Communication dans un congrès
hal-01798407
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
M Darnon
et al.
2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States
Communication dans un congrès
hal-01798393
v1
|
|
MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”
P. Brichon
,
E. Despiau-Pujo
,
O Mourey
,
C. Petit-Etienne
,
G. Cunge
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798396
v1
|
|
Molecular Dynamics simulations of hydrogen plasma-graphene interaction
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
L. Magaud
,
L. Delfour
et al.
Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France
Communication dans un congrès
hal-01798403
v1
|
|
Pulsed Plasmas for etching in micro and nanoelectronics
Maxime Darnon
,
Gilles Cunge
,
Camille Petit-Etienne
,
Moritz Haass
,
Paul Bodart
et al.
Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland
Communication dans un congrès
hal-02338129
v1
|
|
Molecular Dynamics simulations of hydrogen plasma – graphene interaction
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
L. Magaud
,
L. Delfour
et al.
Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France
Communication dans un congrès
hal-01798558
v1
|
|
Potential Solutions for Atomic Precision Etching
O. Joubert
,
E. Despiau-Pujo
,
G. Cunge
,
L. Vallier
,
P. Brichon
et al.
Sematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States
Communication dans un congrès
hal-01798418
v1
|
|
MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes
P. Brichon
,
E. Despiau-Pujo
,
G. Cunge
,
Maxime Darnon
,
O. Joubert
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904431
v1
|
|
MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes
P. Brichon
,
E. Despiau-Pujo
,
G. Cunge
,
Maxime Darnon
,
O. Joubert
AVS 2013, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00919179
v1
|
|
Pulsed plasmas for etching at the nanoscale
Maxime Darnon
,
G. Cunge
,
C. Petit Etienne
,
E. Pargon
,
L. Vallier
et al.
Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France
Communication dans un congrès
hal-00860922
v1
|
|
Pulsed plasma processing: A combined modelling and experimental study
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N. Braithwaite
et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00904428
v1
|
|
Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N.S. Braithwaite
et al.
4th Workshop on Radio Frequency Discharges, May 2013, giens, France
Communication dans un congrès
hal-00860934
v1
|
|
Pulsed ICP plasmas processing : A combined modelling and experimental study
E. Despiau-Pujo
,
M. Brihoum
,
G. Cunge
,
Maxime Darnon
,
N.S. Braithwaite
et al.
31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain
Communication dans un congrès
hal-00925794
v1
|
|
Pulsed plasmas for etching in microelectronics
Maxime Darnon
,
G. Cunge
,
C. Petit-Etienne
,
M. Haass
,
P. Bodart
et al.
Journées du réseau plasma froids, 2013, La Rochelle, France
Communication dans un congrès
hal-00925769
v1
|
|
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes
Gilles Cunge
,
Maxime Darnon
,
Camille Petit-Etienne
,
Paulin Brichon
,
Romuald Blanc
et al.
11th Technological Plasma Workshop, Dec 2013, York, United Kingdom
Communication dans un congrès
hal-02338133
v1
|
|
Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching
G. Cunge
,
M. Brihoum
,
Maxime Darnon
,
E. Despiau-Pujo
,
A. Davydova
et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904432
v1
|
|
MD simulations of H2 plasma-graphene interactions
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Delfour
,
L. Magaud
et al.
Plasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium
Communication dans un congrès
hal-00860933
v1
|
|
Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes
G. Cunge
,
Maxime Darnon
,
M. Brihoum
,
E. Despiau-Pujo
,
A. Davydova
et al.
AVS 60h international symposium, Oct 2013, Long Beach, United States
Communication dans un congrès
hal-00925763
v1
|
|
Molecular Dynamics Simulation for Hydrogen Plasma Processing of Graphene
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
D.B. Graves
,
L. Delfour
et al.
AVS 60th International Symposium, Oct 2013, Long Beach, United States
Communication dans un congrès
hal-00925810
v1
|
|
Molecular Dynamics Simulations for Hydrogen Plasma Processing of Graphene
A. Davydova
,
E. Despiau-Pujo
,
G. Cunge
,
D.B. Graves
,
L. Delfour
et al.
American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States
Communication dans un congrès
hal-00904430
v1
|
|
Time resolved ion flux measurement in pulsed ICP plasmas
G. Cunge
,
Maxime Darnon
,
N. Braithwaite
,
E. Despiau-Pujo
,
P. Bodart
et al.
Tampa, Oct 2012, Tampa, United States
Communication dans un congrès
hal-00762123
v1
|
|
2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments
E. Despiau-Pujo
,
G. Cunge
,
N. Sadeghi
,
N.St.J. Braithwaite
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès
hal-00762116
v1
|
|
2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments
E. Despiau-Pujo
,
G. Cunge
,
N. Sadeghi
,
N.St.J. Braithwaite
65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States
Communication dans un congrès
hal-00925814
v1
|
|
MD simulations of hydrogen plasma interaction with graphene surfaces
D.B. Graves
,
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
65th GEC, Oct 2012, Austin, United States
Communication dans un congrès
hal-00762119
v1
|
|
Molecular dynamics simulations of hydrogen plasma interaction with graphene
E. Despiau-Pujo
11th APCPST, Oct 2012, Kyoto, Japan
Communication dans un congrès
hal-00762110
v1
|
|
MD simulations of hydrogen plasma interaction with graphene surface
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
L. Magaud
,
D.B. Graves
AVS 59th Symposium, Oct 2012, Tampa, United States
Communication dans un congrès
hal-00808676
v1
|
|
Molecular dynamics simulations of hydrogen plasmas interaction with graphene
E. Despiau-Pujo
,
A. Davydova
,
G. Cunge
,
Db. Graves
11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan
Communication dans un congrès
hal-00925797
v1
|
|
PECVD of GeTe for next generation of non volatile memory
Corentin Vallée
,
L. Dussault
,
E. Despiau-Pujo
,
E. Gourvest
,
D. Jourde
et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France
Communication dans un congrès
hal-00925819
v1
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PE-MOCVD of GeTe material for Phase Change Memory
E. Despiau-Pujo
,
L. Dussault
,
Corentin Vallée
,
E. Gourvest
,
D. Jourde
et al.
58th National Symposium AVS, Oct 2011, Nashville, United States
Communication dans un congrès
hal-00650192
v1
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PE-MOCVD of GeTe materials for Phase Change Memory Applications
E. Despiau-Pujo
,
L. Dussault
,
Corentin Vallée
,
E. Gourvest
,
D. Jourde
et al.
AVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States
Communication dans un congrès
hal-00925816
v1
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Modelling of chlorine inductive discharges
Pascal Chabert
,
Emilie Despiau-Pujo
25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia
Communication dans un congrès
hal-02573325
v1
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Modelling of chlorine inductive discharges
Pascal Chabert
,
Emilie Despiau-Pujo
International Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan
Communication dans un congrès
hal-02573326
v1
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Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase
E. Despiau-Pujo
,
P. Chabert
,
R. Ramos
,
G. Cunge
,
N. Sadeghi
55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States
Communication dans un congrès
hal-00400658
v1
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