Emilie Despiau-Pujo

108
Documents

Publications

55
22
18
9
1
1
1
1
2
1
1
1
1
1
1
1
1
1
1
1
1
1
7
4
3
2
2
1
1
1
1
5
2
1
7
5
7
11
14
16
14
8
3
9
3
3

Publications

Deposit thumbnail

Cryogenic cyclical etching of Si using CF$_4$ plasma passivation steps: The role of CF radicals

Jack Nos , Sylvain Iséni , Martin Kogelschatz , Gilles Cunge , Philippe Lefaucheux et al.

Applied Physics Letters, 2025, Featured Collection, 126 (3), pp.031602. ⟨10.1063/5.0245217⟩

Article dans une revue hal-04905588v1

Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry

Pierre Ducluzaux , Delia Ristoiu , Gilles Cunge , Emilie Despiau-Pujo

Journal of Vacuum Science & Technology A, 2024, 42 (1), ⟨10.1116/6.0003291⟩

Article dans une revue hal-04509400v1

Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective

Kenji Ishikawa , Tatsuo Ishijima , Tatsuru Shirafuji , Silvia Armini , Emilie Despiau-Pujo et al.

Japanese Journal of Applied Physics, 2019, 58 (SE), pp.SE0801. ⟨10.7567/1347-4065/ab163e⟩

Article dans une revue hal-02337524v1

Modification mechanisms of silicon thin films in low-temperature hydrogen plasmas

V. Martirosyan , O. Joubert , E. Despiau-Pujo

Journal of Physics D: Applied Physics, 2019, 52 (055204), ⟨10.1088/1361-6463/aaefe0⟩

Article dans une revue hal-01954910v1

Helium plasma modification of Si and Si 3 N 4 thin films for advanced etch processes

Vahagn Martirosyan , Emilie Despiau-Pujo , Jérôme Dubois , Gilles Cunge , Olivier Joubert

Journal of Vacuum Science & Technology A, 2018, 36 (4), pp.041301. ⟨10.1116/1.5025152⟩

Article dans une revue hal-01947862v1

H + ion-induced damage and etching of multilayer graphene in H 2 plasmas

A. Davydova , E. Despiau-Pujo , G. Cunge , D. Graves

Journal of Applied Physics, 2017, 121 (13), ⟨10.1063/1.4979023⟩

Article dans une revue hal-01891243v1
Deposit thumbnail

Cleaning graphene: A first quantum/classical molecular dynamics approach

L. Delfour , A. Davydova , E. Despiau-Pujo , G. Cunge , D. Graves et al.

Journal of Applied Physics, 2016, 119 (12), pp.125309. ⟨10.1063/1.4945034⟩

Article dans une revue hal-01881977v1
Deposit thumbnail

Measuring ion velocity distribution functions through high-aspect ratio holes in inductively coupled plasmas

G. Cunge , Maxime Darnon , J Dubois , P. Bézard , O Mourey et al.

Applied Physics Letters, 2016, 108, pp.93109 - 32108. ⟨10.1063/1.4942892⟩

Article dans une revue hal-01865123v1

Roughness generation during Si etching in Cl 2 pulsed plasma

Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo et al.

Journal of Vacuum Science & Technology A, 2016, 34 (4), ⟨10.1116/1.4951694⟩

Article dans une revue hal-01881982v1

Key plasma parameters for nanometric precision etching of Si films in chlorine discharges

P. Brichon , E. Despiau-Pujo , O. Mourey , O. Joubert

Journal of Physics D: Applied Physics, 2015, pp.118, 053303

Article dans une revue hal-01878054v1

Hydrogen plasmas processing of graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , D.B. Graves

Plasma Chemistry and Plasma Processing, 2015, 36 (1), pp.213-229. ⟨10.1007/s11090-015-9683-0⟩

Article dans une revue hal-01878016v1

Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experiments

Emilie Despiau-Pujo , Melisa Brihoum , Paul Bodart , M Darnon , Gilles Cunge

Journal of Physics D: Applied Physics, 2014, 47 (45), pp.16276 - 16282. ⟨10.1088/0022-3727/47/45/455201⟩

Article dans une revue hal-01798618v1

MD simulations of low energy Clx+ ions interaction with ultrathin silicon layers for advanced etch processes

P. Brichon , E. Despiau-Pujo , O. Joubert

Journal of Vacuum Science and Technology, 2014, A32, pp.021301

Article dans une revue hal-00904425v1

Elementary processes of H2 plasma-graphene interaction: A combined molecular dynamics and density functional theory study

E. Despiau-Pujo , A. Davydova , G. Cunge , Laure Delfour , Laurence Magaud et al.

Journal of Applied Physics, 2013, 113 (11), pp.114302. ⟨10.1063/1.4794375⟩

Article dans une revue hal-00992709v1

2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments

Emilie Despiau-Pujo , Gilles Cunge , Nader Sadeghi , N. St. J. Braithwaite

American Physical Society, 2012, pp.2003

Article dans une revue hal-01006016v1

MD simulations of GaN sputtering by Ar<SUP>+</SUP> ions : Ion-induced damage and near-surface modification under continuous bombardment

Emilie Despiau-Pujo , Pascal Chabert

Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1105. ⟨10.1116/1.3460904⟩

Article dans une revue hal-01549488v1

Simulations of radical and ion fluxes on wafer in a Cl<SUB>2</SUB>/Ar ICP discharge : Confrontation with GaAs and GaN etch experiments

Emilie Despiau-Pujo , Pascal Chabert , S. Bansropun , D. Thenot , P. Plouhinec et al.

Journal of Vacuum Science and Technology, 2010, 28 (4), pp.693. ⟨10.1116/1.3437492⟩

Article dans une revue hal-01549482v1

Low energy Ar<SUP>+</SUP> bombardment of GaN surfaces : A statistical study of ion reflection and sputtering

Emilie Despiau-Pujo , Pascal Chabert

Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1263. ⟨10.1116/1.3480344⟩

Article dans une revue hal-01549491v1

Global model of instabilities in low pressure inductive chlorine discharges

Emilie Despiau-Pujo , Pascal Chabert

Plasma Sources Science and Technology, 2009, 18, pp.045028. ⟨10.1088/0963-0252/18/4/045028⟩

Article dans une revue istex hal-00462483v1

Velocity distribution function of sputtered Ga atoms during inductively-coupled Ar plasma treatment of a GaAs surface

Emilie Despiau-Pujo , Pascal Chabert , R. Ramos , G. Cunge , N. Sadeghi

Journal of Vacuum Science & Technology A, 2009, 27, pp.356-361. ⟨10.1116/1.3081967⟩

Article dans une revue hal-00462482v1

Comparison between fluid simulations and experiments in inductively coupled argon/chlorine plasmas

C.S. Corr , E. Despiau-Pujo , Pascal Chabert , W.G. Graham , F.G. Marro et al.

Journal of Physics D: Applied Physics, 2008, 41, pp.185202. ⟨10.1088/0022-3727/41/18/185202⟩

Article dans une revue istex hal-00462480v1

Molecular dynamics simulations of GaAs sputtering under low energy argon ion bombardment

E. Despiau-Pujo , Pascal Chabert , D.B. Graves

Journal of Vacuum Science & Technology A, 2008, 26, pp.274. ⟨10.1116/1.2836408⟩

Article dans une revue hal-00462479v1

Atomic Layer Etching of SiO<sub>2</sub> using CF<sub>4</sub> plasma in deposition mode at cryogenic temperature

Madjib Adjabi , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.

PLAsma THIN film International Union Meeting 2025 (PLATHINIUM 2025), Sep 2025, Antibes (France), France

Communication dans un congrès hal-05325597v1

UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF<sub>4</sub> plasmas

Martin Kogelschatz , Jack Nos , Sylvain Iséni , Gilles Cunge , Philippe Lefaucheux et al.

Journées 2025 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2025, Saint-etienne, France

Communication dans un congrès hal-05325839v1

Cryogenic ALE of SiO<sub>2</sub> using CF<sub>4</sub> plasma

Madjib Adjabi , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.

AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025), Jun 2025, Jeju Island (South Korea), South Korea

Communication dans un congrès hal-05325605v1

Cryogenic bosch process using CF<sub>4</sub> plasma in deposition regime

Thomas Tillocher , Jack Nos , Sylvain Iséni , Gilles Cunge , Martin Kogelschatz et al.

The International Plasma Technology Joint Conference 2025 (IPTJC2025), Jun 2025, New Taipei City - Taiwan, Taiwan

Communication dans un congrès hal-05325733v1

Mécanismes de l’interaction plasma-surface : Quid de la modélisation ?

Emilie Despiau-Pujo

17èmes Journées d’échanges du Réseau Plasmas Froids, Oct 2024, Carry-le-rouet, France

Communication dans un congrès hal-05460022v1

Etude des interactions plasma-surface par dynamique moléculaire : quels apports pour la modélisation des plasmas froids ?

Emilie Despiau-Pujo

2èmes Journées du GDR EMILI, Oct 2023, NANCY, France

Communication dans un congrès hal-04509431v1

Molecular dynamics simulations for a better understanding of plasma-surface interactions

E. Despiau-Pujo , A. Davydova , V. Martirosyan , Db Graves , G. Cunge et al.

34th International Conf. on Phenomena in Ionized Gases (ICPIG), Jul 2019, Sapporo, Japan

Communication dans un congrès hal-02337568v1

Atomic-scale simulations of Hx+ ions modification of SiO2 thin films and Si02 pattern flanks for an innovative ONO stack etching process

F. Pinzan , C. Petit-Etienne , F. Leverd , E. Despiau-Pujo

41th International Symposium on Dry Process (DPS 2019), Nov 2019, Hiroshima, Japan

Communication dans un congrès hal-02337577v1

Atomic-scale simulations of He and H2 plasma modification of SiO2 thin films for an innovative ONO dielectric stack etching process

F. Pinzan , R. Blanc , F. Leverd , E. Despiau-Pujo

Plasma Etch Strip in Microtechnology (PESM), Minatec, May 2019, Grenoble, France

Communication dans un congrès hal-02337587v1

A brief overview on Molecular Dynamics simulations of plasma-surface interaction in reactive ion etching

Emilie Despiau-Pujo

66th American Vacuum Society (AVS) International Symposium, Oct 2019, Columbus, United States

Communication dans un congrès hal-02337554v1

Towards selective etching with nanometric control using remote plasma source

E. Pargon , V. Renaud , C. Petit-Etienne , F. Pinzan , E. Despiau-Pujo et al.

236th Electrochemical Society meeting (ECS 2019), Oct 2019, Atlanta, USA, United States

Communication dans un congrès hal-02324706v1

Plasma solutions for atomic-precision etching: From atomistic simulations to experiments

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.

40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan

Communication dans un congrès hal-01954916v1

Atomic-scale simulations of helium plasma modification of SiO2 thin-films for advanced etch processes

F Pinzan , F. Leverd , E. Despiau-Pujo

AVS 65th International Symposium, Oct 2018, Long Beach, United States

Communication dans un congrès hal-01954929v1

Plasma solutions for atomic-precision etching: From molecular dynamics simulations to experiments

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.

40th International Symposium on Dry Process (DPS 2018), Nov 2018, Nagoya, Japan

Communication dans un congrès hal-01942798v1

Atomistic Simulations of H2 Plasma Modification of SiN Thin-Films for Advanced Etch Processes

V. Martirosyan , E. Despiau-Pujo , O. Joubert

AVS 64th International Symposium, Tampa (USA), Oct 29-Nov 3, 2017, Oct 2017, tampa, United States

Communication dans un congrès hal-01929202v1

New trends in Plasma Technologies

O. Joubert , G. Cunge , E. Pargon , L. Vallier , E. Despiau-Pujo et al.

43rd Conference on Micro and Nano Engineering (MNE), Sep 2017, Braga, Portugal

Communication dans un congrès hal-01891286v1

Ultra-high selective etching in remote plasmas: application to smart etch processes

G. Cunge. , C Petit−etienne. , L Vallier. , J Dubois. , R Soriano. et al.

PESM 2017 (Plasma Etch and Strip in Microtechnology), 2017, Louvain, Belgium

Communication dans un congrès hal-01891297v1

Towards atomic scale control of plasma processes: application to graphene

G. Cunge , H. Mehedi , F. Djawhar , H. Okuno , A. Davydova et al.

The 10th EU-Japan Joint Symposium on Plasma Processing, 2017, Okinawa, Japan

Communication dans un congrès hal-01891303v1

Atomic-scale simulations of low-damage plasma etching processes

E. Despiau-Pujo , P. Brichon , V. Martirosyan , J. Dubois , G. Cunge et al.

82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes, Dec 2017, Okinawa, Japan

Communication dans un congrès hal-01891290v1

Alternative solutions for nm-precision etching: H2 Plasmas Modification of Si/ SiN thin-films

E. Despiau-Pujo , V. Martirosyan , O. Joubert

AVS 63nd International Symposium, Nov 2016, Nashville, United States

Communication dans un congrès hal-01882917v1

Atomistic simulations of He plasma modification of Si thin-films for advanced etch processes

V. Martirosyan , E. Despiau-Pujo , O. Joubert

Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France

Communication dans un congrès hal-01882933v1

Plasma solutions for nanometric-precision etching: insights from MD simulations

E. Despiau-Pujo , P. Brichon , V. Martirosyan , O. Joubert

Plasma Etch Strip in Microtechnology (PESM), May 2016, Grenoble, France

Communication dans un congrès hal-01882912v1

Ion-induced damage and etching in reactive plasmas: Modelling and experimental support

E. Despiau-Pujo , P. Brichon , V. Martirosyan , O. Joubert

1st EUCASS Aerospace Thematic Workshops (ATW), Sep 2016, Aussois, France

Communication dans un congrès hal-01882808v1

ICP plasmas treatment of 2D materials: example of graphene

G. Cunge , D. Ferrah , D Marinov , J Zapatas , C. Petit-Etienne et al.

Plasma Etch Strip in Microtechnology (PESM), May 2016, grenoble, France

Communication dans un congrès hal-01882928v1

Atomistic Simulations of He Plasma Modification of Si/SiN Thin-Films for Advanced Etch Processes

V. Martirosyan , E. Despiau-Pujo , O Joubert

AVS 63nd International Symposium, Nov 2016, Nashville, United States

Communication dans un congrès hal-01882922v1

Roughness generation during Si etching in Cl2 pulsed plasmas

Odile Mourey , Camille Petit-Etienne , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo et al.

Plasma Etch and Strip in Microtechnologies conference, May 2016, Grenoble, France

Communication dans un congrès hal-02339971v1

H2 Plasma Interaction with CVD Graphene

G. Cunge , D. Ferrah , D Marinov , J Zapatas , E. Despiau-Pujo et al.

AVS 63nd International Symposium, Nov 2016, Nashville, United States

Communication dans un congrès hal-01882915v1

Plasma processing of graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , Db Graves

Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom

Communication dans un congrès hal-01877980v1

RFEA analyzers to measure IVDF through high−aspect holes in pulsed ICP plasmas

G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. et al.

Frontiers in Low Temperature Plasma Diagnostics XI, 2015, Porquerolles, France

Communication dans un congrès hal-01878109v1

Producing ion waves from acoustic pressure waves in pulsed ICP: Modelling vs. Experiments

E. Despiau-Pujo , G. Cunge , M Darnon , N. Sadeghi , N Braithwaite

68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States

Communication dans un congrès hal-01878115v1

Measuring IVDF through high−aspect holes in pulsed ICP plasmas

G. Cunge. , M. Darnon. , J Dubois. , P Bezard. , O Mourey. et al.

68th GEC / ICRP−9, Oct 2015, Honolulu, United States

Communication dans un congrès hal-01878113v1

Plasmas interaction with graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , Db Graves

22nd International Symposium on Plasma Chemistry (ISPC), Jul 2015, Antwerp, Belgium

Communication dans un congrès hal-01877972v1

Plasmas interaction with graphene surfaces

E. Despiau-Pujo , A. Davydova , G. Cunge , D.B. Graves

Fusion Frontiers and Interfaces Workshop, May 2015, York, United Kingdom

Communication dans un congrès hal-01878411v1

Molecular dynamics simulations of plasma-surface interactions for advanced etch processes

E. Despiau-Pujo , P. Brichon , O. Joubert

42nd European Physical Society (EPS) Conference on Plasma Physics, Jun 2015, Lisbonne, Portugal

Communication dans un congrès hal-01877976v1

Towards nanoscale plasma etching precision: MD simulations of Si-Cl interactions

P. Brichon , E. Despiau-Pujo , O. Mourey , G. Cunge , O. Joubert

AVS 62nd International Symposium, Oct 2015, San José, United States

Communication dans un congrès hal-01878118v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , L. Vallier , J Dubois et al.

AVS 62nd International Symposium, Oct 2015, San José, United States

Communication dans un congrès hal-01877989v1

Measuring IVDF through high-aspect holes in pulsed ICP plasma

G. Cunge , M Darnon , J Dubois , P. Bézard , O. Mourey et al.

68th Gaseous Electronics Conference (GEC), Oct 2015, Honolulu, United States

Communication dans un congrès hal-01878046v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , P. Brichon , J Dubois et al.

SPIE Advanced Etch Technology for Nanopatterning IV, Feb 2015, San José, United States

Communication dans un congrès hal-01878051v1

Cleaning Graphene with H2 plasmas: What can be learnt from Quantum/Classical MD simulations?

L. Delfour , A. Davydova , E. Despiau-Pujo , G. Cunge , Db Graves et al.

European Workshop on Epitaxial Graphene (EWEG), Jun 2014, Primosten Croatia

Communication dans un congrès hal-01798516v1

Hydrogen plasmas processing of graphene

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud , Db Graves

61th American Vacuum Society (AVS) International Symposium, Nov 2014, baltimore, United States

Communication dans un congrès hal-01798382v1

Silicon etching using CW, synchronized pulsed and bias pulsed Cl2 plasma

Odile Mourey , C. Petit-Etienne , G. Cunge , M. Darnon , E. Despiau-Pujo et al.

AVS 2014, , 2014, Baltimore, United States

Communication dans un congrès hal-01798348v1

Pulsed ICP plasmas processing: 0D Model vs. Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , M Darnon , N Braithwaite et al.

Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France

Communication dans un congrès hal-01798532v1

Producing ion waves from acoustic pressure waves in pulsed inductive plasmas

Emilie Despiau-Pujo , Gilles Cunge , Maxime Darnon , Nader Sadeghi , Nicholas Braithwaite

Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble, France

Communication dans un congrès hal-01798411v1

Optical and electrical diagnostics in chlorine based pulsed plasmas of an industrial silicon etching reactor

Nader Sadeghi , Gilles Cunge , Maxime Darnon , Emilie Despiau-Pujo , Nicholas St J Braithwaite

1st International Middle-East Plasma Science, Turkey, Apr 2014, Istambul, Turkey

Communication dans un congrès hal-02338122v1

MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes.

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge et al.

Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France

Communication dans un congrès hal-01798524v1

MD simulations of chlorine plasmas interaction with ultrathin Si films for advanced etch processes

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , M Darnon et al.

2014 Silicon Nanoelectronics Workshop (SNW), Jun 2014, Honolulu (USA), United States

Communication dans un congrès hal-01798393v1

Pulsed Cl2/Ar ICP plasmas processing : 0D Model vs. Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , M Darnon , N Braithwaite et al.

Plasma Etch and Strip in Microelectronics (PESM), May 2014, grenoble, France

Communication dans un congrès hal-01798407v1

MD simulations of Cl2 plasmas interaction with ultrathin Si films for advanced etch processes”

P. Brichon , E. Despiau-Pujo , O Mourey , C. Petit-Etienne , G. Cunge et al.

Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France

Communication dans un congrès hal-01798396v1

Molecular Dynamics simulations of hydrogen plasma-graphene interaction

A. Davydova , E. Despiau-Pujo , G. Cunge , L. Magaud , L. Delfour et al.

Plasma Etch and Strip in Microelectronics (PESM), May 2014, Grenoble (France), France

Communication dans un congrès hal-01798403v1

Pulsed Plasmas for etching in micro and nanoelectronics

Maxime Darnon , Gilles Cunge , Camille Petit-Etienne , Moritz Haass , Paul Bodart et al.

Plasma Nanoscience Conference, Mar 2014, Dublin, Ireland

Communication dans un congrès hal-02338129v1

Potential Solutions for Atomic Precision Etching

O. Joubert , E. Despiau-Pujo , G. Cunge , L. Vallier , P. Brichon et al.

Sematech Workshop on Atomic Layer Etch & Clean technology, Apr 2014, San Francisco (USA), United States

Communication dans un congrès hal-01798418v1

Molecular Dynamics simulations of hydrogen plasma – graphene interaction

A. Davydova , E. Despiau-Pujo , G. Cunge , L. Magaud , L. Delfour et al.

Plasma Etch and Strip in Microelectronics (PESM), 6th International Workshop, May 2014, grenoble, France

Communication dans un congrès hal-01798558v1

MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes

P. Brichon , E. Despiau-Pujo , G. Cunge , Maxime Darnon , O. Joubert

American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States

Communication dans un congrès hal-00904431v1

MD simulations of chlorine plasmas interaction with ultrathin silicon films for advanced etch processes

P. Brichon , E. Despiau-Pujo , G. Cunge , Maxime Darnon , O. Joubert

AVS 2013, Oct 2013, Long beach, United States

Communication dans un congrès hal-00919179v1

Pulsed ICP plasmas processing : A combined modelling and experimental study

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N.S. Braithwaite et al.

31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain

Communication dans un congrès hal-00925794v1

Pulsed plasmas for etching in microelectronics

Maxime Darnon , G. Cunge , C. Petit-Etienne , M. Haass , P. Bodart et al.

Journées du réseau plasma froids, 2013, La Rochelle, France

Communication dans un congrès hal-00925769v1

Pulsed plasma processing: A combined modelling and experimental study

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N. Braithwaite et al.

31st International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2013, Granada, Spain

Communication dans un congrès hal-00904428v1

Pulsed ICP chlorine plasmas : Numerical simulations versus Experiments

E. Despiau-Pujo , M. Brihoum , G. Cunge , Maxime Darnon , N.S. Braithwaite et al.

4th Workshop on Radio Frequency Discharges, May 2013, giens, France

Communication dans un congrès hal-00860934v1

Pulsed plasmas for etching at the nanoscale

Maxime Darnon , G. Cunge , C. Petit Etienne , E. Pargon , L. Vallier et al.

Journées Nationales des Technologies Émergentes, May 2013, Evian les bains, France

Communication dans un congrès hal-00860922v1

Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes

Gilles Cunge , Maxime Darnon , Camille Petit-Etienne , Paulin Brichon , Romuald Blanc et al.

11th Technological Plasma Workshop, Dec 2013, York, United Kingdom

Communication dans un congrès hal-02338133v1

Time-resolved Optical and Electrical Diagnostics of Pulsed Plasmas Etching

G. Cunge , M. Brihoum , Maxime Darnon , E. Despiau-Pujo , A. Davydova et al.

American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States

Communication dans un congrès hal-00904432v1

MD simulations of H2 plasma-graphene interactions

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Delfour , L. Magaud et al.

Plasma Etch and Strip in Microelectronics, Mar 2013, leuven, Belgium

Communication dans un congrès hal-00860933v1

Molecular Dynamics Simulation for Hydrogen Plasma Processing of Graphene

A. Davydova , E. Despiau-Pujo , G. Cunge , D.B. Graves , L. Delfour et al.

AVS 60th International Symposium, Oct 2013, Long Beach, United States

Communication dans un congrès hal-00925810v1

Molecular Dynamics Simulations for Hydrogen Plasma Processing of Graphene

A. Davydova , E. Despiau-Pujo , G. Cunge , D.B. Graves , L. Delfour et al.

American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States

Communication dans un congrès hal-00904430v1

Optical and Electrical Diagnostics of Pulsed Plasmas Etching Processes

G. Cunge , Maxime Darnon , M. Brihoum , E. Despiau-Pujo , A. Davydova et al.

AVS 60h international symposium, Oct 2013, Long Beach, United States

Communication dans un congrès hal-00925763v1

Time resolved ion flux measurement in pulsed ICP plasmas

G. Cunge , Maxime Darnon , N. Braithwaite , E. Despiau-Pujo , P. Bodart et al.

Tampa, Oct 2012, Tampa, United States

Communication dans un congrès hal-00762123v1

2D fluid simulations of acoustic waves in pulsed ICP discharges: Comparison with experiments

E. Despiau-Pujo , G. Cunge , N. Sadeghi , N.St.J. Braithwaite

65th GEC, Oct 2012, Austin, United States

Communication dans un congrès hal-00762116v1

MD simulations of hydrogen plasma interaction with graphene surfaces

D.B. Graves , E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud

65th GEC, Oct 2012, Austin, United States

Communication dans un congrès hal-00762119v1

2D fluid simulations of acoustic waves in pulsed ICP discharge: Comparison with experiments

E. Despiau-Pujo , G. Cunge , N. Sadeghi , N.St.J. Braithwaite

65th Gaseous Electronics Conference (GEC), Oct 2012, austin, United States

Communication dans un congrès hal-00925814v1

Molecular dynamics simulations of hydrogen plasma interaction with graphene

E. Despiau-Pujo

11th APCPST, Oct 2012, Kyoto, Japan

Communication dans un congrès hal-00762110v1

MD simulations of hydrogen plasma interaction with graphene surface

E. Despiau-Pujo , A. Davydova , G. Cunge , L. Magaud , D.B. Graves

AVS 59th Symposium, Oct 2012, Tampa, United States

Communication dans un congrès hal-00808676v1

Molecular dynamics simulations of hydrogen plasmas interaction with graphene

E. Despiau-Pujo , A. Davydova , G. Cunge , Db. Graves

11th Asia Pacific Conference on Plasma Science & Technology (APCPST), Oct 2012, kyoto, Japan

Communication dans un congrès hal-00925797v1

PECVD of GeTe for next generation of non volatile memory

Corentin Vallée , L. Dussault , E. Despiau-Pujo , E. Gourvest , D. Jourde et al.

18th International Colloquium on Plasma Processes (CIP), Jul 2011, rennes, France

Communication dans un congrès hal-00925819v1

PE-MOCVD of GeTe materials for Phase Change Memory Applications

E. Despiau-Pujo , L. Dussault , Corentin Vallée , E. Gourvest , D. Jourde et al.

AVS 58th International Symposium, Nashville, USA, Oct 30-Nov 4, 2011, Oct 2011, nashville, United States

Communication dans un congrès hal-00925816v1

PE-MOCVD of GeTe material for Phase Change Memory

E. Despiau-Pujo , L. Dussault , Corentin Vallée , E. Gourvest , D. Jourde et al.

58th National Symposium AVS, Oct 2011, Nashville, United States

Communication dans un congrès hal-00650192v1

Modelling of chlorine inductive discharges

Pascal Chabert , Emilie Despiau-Pujo

25th Summer School and International Symposium on the Physics of Ionized Gases, Aug 2010, Donji Milanovac, Serbia

Communication dans un congrès hal-02573325v1

Modelling of chlorine inductive discharges

Pascal Chabert , Emilie Despiau-Pujo

International Conference on Plasma and Nanotechnology (ICPLANTS), Mar 2010, Nagoya, Japan

Communication dans un congrès hal-02573326v1

Ar Ion Sputtering of GaAs Studied by Molecular Dynamics Simulation and Laser Spectroscopy of Ga Atoms in the Gas Phase

E. Despiau-Pujo , P. Chabert , R. Ramos , G. Cunge , N. Sadeghi

55th International AVS Symposium & Topical Conferences, Oct 2008, boston, United States

Communication dans un congrès hal-00400658v1