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Remi Dussart

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Quasi In Situ XPS on a SiO x F y Layer Deposited on Silicon by a Cryogenic Process

G. Antoun , A. Girard , T. Tillocher , P. Lefaucheux , J. Faguet
ECS Journal of Solid State Science and Technology, 2022, 11 (1), pp.013013. ⟨10.1149/2162-8777/ac4c7d⟩
Journal articles hal-03565995v1
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On the validity of neutral gas temperature by emission spectroscopy in micro-discharges close to atmospheric pressure

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenović , Volker Schulz-von Der Gathen
Plasma Sources Science and Technology, 2019, 28 (6), pp.065003. ⟨10.1088/1361-6595/ab1dfb⟩
Journal articles hal-02117169v1
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Morphology control in thin films of PS: PLA homopolymer blends by dip-coating deposition

Alexane Vital , Marylène Vayer , Thomas Tillocher , Remi Dussart , Mohamed Boufnichel
Applied Surface Science, 2017, 393, pp.127-133. ⟨10.1016/j.apsusc.2016.09.151⟩
Journal articles hal-01561189v1
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Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries

Joe Sakai , Erwann Luais , Jérôme Wolfman , Thomas Tillocher , Remi Dussart
Journal of Applied Physics, 2017, 122 (15), pp.155103. ⟨10.1063/1.4997713⟩
Journal articles hal-01686032v1

Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Philippe Lefaucheux , Thomas Tillocher
Journal of Physics D: Applied Physics, 2016, 49 (17), pp.175203. ⟨10.1088/0022-3727/49/17/175203⟩
Journal articles hal-01324407v1

Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices

Valentin Felix , Philippe Lefaucheux , Olivier Aubry , Judith Golda , Volker Schulz-von Der Gathen
Plasma Sources Science and Technology, 2016, 25, pp.025021. ⟨10.1088/0963-0252/25/2/025021⟩
Journal articles hal-01287230v1

Elucidating the effects of gas flow rate on an SF6 inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation

Stefan Tinck , Thomas Tillocher , Remi Dussart , Erik Neyts , Annemie Bogaerts
Journal of Physics D: Applied Physics, 2016, 49 (38), pp.385201. ⟨10.1088/0022-3727/49/38/385201⟩
Journal articles hal-01374746v1

Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study

Stefan Tinck , Thomas Tillocher , Rémi Dussart , Annemie Bogaerts
Journal of Physics D: Applied Physics, 2015, 48, pp.155204. ⟨10.1088/0022-3727/48/15/155204⟩
Journal articles hal-01135854v1

Polymer masks for structured surface and plasma etching

Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux
Applied Surface Science, 2015, 332, pp.237. ⟨10.1016/j.apsusc.2015.01.040⟩
Journal articles hal-01219273v1

Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation

Nicolas Gosset , Mohamed Boufnichel , Emilie Bahette , Walid Khalfaoui , Rami Ljazouli
Journal of Micromechanics and Microengineering, 2015, 25, pp.095011. ⟨10.1088/0960-1317/25/9/095011⟩
Journal articles hal-01217644v1

Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining

Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux
Polymer, 2015, 76, pp.123-130. ⟨10.1016/j.polymer.2015.08.062⟩
Journal articles hal-01228427v1

Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas

Floriane Leroy , Liping Zhang , Thomas Tillocher , Koichi Yatsuda , Kaoru Maekawa
Journal of Physics D: Applied Physics, 2015, 48, pp.435202. ⟨10.1088/0022-3727/48/43/435202⟩
Journal articles hal-01217648v1

Width dependent interaction of trench-like microdischarges arranged in sub-arrays on a single silicon based chip

Mukesh Kulsreshath , Judith Golda , V. Schulz-von Der Gathen , Remi Dussart
Plasma Sources Science and Technology, 2014, 23, pp.045012. ⟨10.1088/0963-0252/23/4/045012⟩
Journal articles hal-01021943v1

Energy Transferred From a Hot Nickel Target During Magnetron Sputtering

Mariem El Mokh , Amaël Caillard , Nadjib Semmar , Rémi Dussart , Thomas Lecas
IEEE Transactions on Plasma Science, 2014, pp.Plasma Science, IEEE Transactions on (Volume:PP Issue: 99 ). ⟨10.1109/TPS.2014.2338742⟩
Journal articles hal-01057286v1

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
Journal of Physics D: Applied Physics, 2014, pp.123001. ⟨10.1088/0022-3727/47/12/123001⟩
Journal articles hal-00959819v1

Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Pierre-Antoine Cormier , A. Balhamri , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar
Surface and Coatings Technology, 2014, Vol 254 (2014), Volume 254, 15 September 2014, Pages 291-297. ⟨10.1016/j.surfcoat.2014.06.037⟩
Journal articles hal-01057278v1

Alternated process for the deep etching of titanium

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
Journal of Micromechanics and Microengineering, 2014, 24, pp.075021. ⟨10.1088/0960-1317/24/7/075021⟩
Journal articles hal-01015146v1

Circular Emission and Destruction Patterns on a Silicon-Based Microdischarge Array

Judith Golda , Mukesh Kulsreshath , H Boettner , Valentin Felix , Remi Dussart
IEEE Transactions on Plasma Science, 2014, 42 (10), pp.2646. ⟨10.1109/TPS.2014.2337657⟩
Journal articles hal-01082634v1
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Ignition and extinction phenomena in helium micro hollow cathode discharges

M. K. Kulsreshath , N. Sadeghi , L. Schwaederle , T. Dufour , L. J. Overzet
Journal of Applied Physics, 2013, 114 (24), pp.243303. ⟨10.1063/1.4858418⟩
Journal articles hal-01303176v2

A novel amorphization-etch alternating process for Si(100)

Nasreddine Mekkakia Maaza , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
Journal of Micromechanics and Microengineering, 2013, 23, pp.045023. ⟨10.1088/0960-1317/23/4/045023⟩
Journal articles hal-00831302v1

IR emission from the target during plasma magnetron sputter deposition

Pierre-Antoine Cormier , Anne Lise Thomann , Vincent Dolique , A. Balhamri , Remi Dussart
Thin Solid Films, 2013, pp.547(2013) 44-49. ⟨10.1016/j.tsf.2013.07.025⟩
Journal articles hal-00943789v1
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Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere

Anne-Lise Thomann , Pierre-Antoine Cormier , Vincent Dolique , Nadjib Semmar , Remi Dussart
Thin Solid Films, 2013, 539, pp.88. ⟨10.1016/j.tsf.2013.05.075⟩
Journal articles hal-00839010v1

Measuring the energy flux at the substrate position during magnetron sputter deposition processes

Pierre-Antoine Cormier , A. Balhamri , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar
Journal of Applied Physics, 2013, 113, pp.013305. ⟨10.1063/1.4773103⟩
Journal articles hal-00831364v1

Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart
ECS Journal of Solid State Science and Technology, 2013, 2 (6), pp.N131. ⟨10.1149/2.001306jss⟩
Journal articles hal-00831339v1
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IR emission from the target during plasma magnetron sputter deposition

P.-A. Cormier , A.-L. Thomann , Vincent Dolique , A. Balhamri , R. Dussart
Thin Solid Films, 2013, 545, pp.44-49. ⟨10.1016/j.tsf.2013.07.025⟩
Journal articles in2p3-00874718v1
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Breakdown study of dc silicon micro-discharge devices

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Thomas Tillocher
Journal of Physics D: Applied Physics, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩
Journal articles hal-00667649v1

Study of dc micro-discharge arrays made in silicon using CMOS compatible technology

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Philippe Lefaucheux , Julien Ladroue
Journal of Physics D: Applied Physics, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩
Journal articles hal-00713105v1

Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenches

Thomas Defforge , Gaël Gautier , Thomas Tillocher , Remi Dussart , François Tran-Van
Journal of Vacuum Science & Technology A, 2012, 30 (1), pp.010601. ⟨10.1116/1.3665217⟩
Journal articles hal-00655000v1

Damage Free Cryogenic Etching of a Porous Organosilica Ultralow-k Film

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart
Electrochemical and Solid-State Letters, 2012, 2 (2), pp.N5. ⟨10.1149/2.007302ssl⟩
Journal articles hal-00831289v1

Probing dusty-plasma/surface interactions with a heat flux microsensor

Sergey Abolmasov , Pierre-Antoine Cormier , A. Torres Rios , Remi Dussart , Nadjib Semmar
Applied Physics Letters, 2012, pp.100, 1, 011601. ⟨10.1063/1.3674290⟩
Journal articles hal-00943785v1

Scalloping removal on DRIE via using low concentrated alkaline solutions at low temperature

Thomas Defforge , Xi Song , Gaël Gautier , Thomas Tillocher , Remi Dussart
Sensors and Actuators A: Physical , 2011, 170 (1-2), pp.114. ⟨10.1016/j.sna.2011.05.028⟩
Journal articles hal-00655001v1

Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , Jeremy Pereira , El-Houcine Oubensaid
Journal of Micromechanics and Microengineering, 2011, 21, pp.065015
Journal articles hal-00655003v1

Optimization of submicron deep trench profiles with the STiGer cryoetching process: reduction of defects

Thomas Tillocher , Wassim Kafrouni , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel
Journal of Micromechanics and Microengineering, 2011, 21, pp.085005. ⟨10.1088/0960-1317/21/8/085005⟩
Journal articles hal-00655002v1
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Experimental study and simulation of a micro-discharge with limited cathode area

Thierry Dufour , Lawrence J. Overzet , Remi Dussart , L. C. Pitchford , N Sadeghi
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.565-574. ⟨10.1140/epjd/e2010-00273-6⟩
Journal articles hal-01303159v2

Integrated micro-plasmas in silicon operating in helium

Remi Dussart , Lawrence J. Overzet , Philippe Lefaucheux , Thierry Dufour , Mukesh Kulsreshath
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.601. ⟨10.1140/epjd/e2010-00272-7⟩
Journal articles hal-00655009v1
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RF impedance measurements of DC atmospheric micro-discharges

Lawrence J. Overzet , D. Jung , Monali Mandra , Matthew Goeckner , Thierry Dufour
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449-454. ⟨10.1140/epjd/e2010-00274-5⟩
Journal articles hal-01303158v1
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On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

Pierre-Antoine Cormier , Marc Stahl , Anne-Lise Thomann , Rémi Dussart , Matthias Wolter
Journal of Physics D: Applied Physics, 2010, 43 (46), pp.465201. ⟨10.1088/0022-3727/43/46/465201⟩
Journal articles hal-00569747v1

Deep GaN etching by inductively coupled plasma and induced surface defects

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson
Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1226. ⟨10.1116/1.3478674⟩
Journal articles hal-00519022v1

RF impedance measurements of DC atmospheric micro-discharges

Lawrence J. Overzet , D. Jung , Monali Mandra , Matthew Goeckner , Thierry Dufour
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449. ⟨10.1140/epjd/e2010-00274-5⟩
Journal articles hal-00655011v1
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Integrated micro-plasmas in silicon operating in helium

Remi Dussart , Lawrence J. Overzet , P Lefaucheux , Thierry Dufour , M Kulsreshath
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.601-608. ⟨10.1140/epjd/e2010-00272-7⟩
Journal articles hal-01303160v2
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Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

L Bedra , a L Thomann , N Semmar , R Dussart , J Mathias
Journal of Physics D: Applied Physics, 2010, 43 (6), pp.65202. ⟨10.1088/0022-3727/43/6/065202⟩
Journal articles hal-00569757v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process

J. Pereira , L.E. Pichon , R. Dussart , Christophe Cardinaud , C.Y. Duluard
Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩
Journal articles hal-00432322v1

Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , B. Morillon , Mohamed Boufnichel
Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩
Journal articles hal-00413753v1

Neutral species in inductively coupled SF6/SiCl4 plasmas

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , El-Houcine Oubensaid , Jeremy Pereira
Journal of Physics D: Applied Physics, 2009, 42, pp.115206
Journal articles hal-00396438v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Christophe Cardinaud , Corinne Y. Duluard
Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩
Journal articles hal-00365892v1

Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , Jeremy Pereira , Mohamed Boufnichel
Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩
Journal articles hal-00400936v1

SO2 passivating chemistry for silicon cryogenic deep etching

Corinne Y. Duluard , Remi Dussart , Thomas Tillocher , Laurianne E. Pichon , Philippe Lefaucheux
Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩
Journal articles hal-00349344v1

Two Cryogenic Processes Involving SF6, O2, and SiF4 for Silicon Deep Etching

Thomas Tillocher , Remi Dussart , Lawrence J. Overzet , Xavier Mellhaoui , Philippe Lefaucheux
Journal of The Electrochemical Society, 2008, 155 (3), pp.D187. ⟨10.1149/1.2826280⟩
Journal articles hal-00349343v1
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Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma

Remi Dussart , Anne-Lise Thomann , Laurianne E. Pichon , Larbi Bedra , Nadjib Semmar
Applied Physics Letters, 2008, 93, pp.131502. ⟨10.1063/1.2995988⟩
Journal articles hal-00336392v1

Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium

Thierry Dufour , Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Lawrence J. Overzet
Applied Physics Letters, 2008, 93, pp.071508. ⟨10.1063/1.2966144⟩
Journal articles hal-00349341v1
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Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium

Thierry Dufour , Remi Dussart , P Lefaucheux , P Ranson , Lawrence J. Overzet
Applied Physics Letters, 2008, 93 (071508), ⟨10.1063/1.2966144͔⟩
Journal articles hal-01303157v3

The passivation layer formation in the cryo-etching plasma process

Remi Dussart , Xavier Mellhaoui , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
Microelectronic Engineering, 2007, 84, pp.1128. ⟨10.1016/j.mee.2007.01.048⟩
Journal articles hal-00365894v1

Silicon cryo-etching of deep holes

Thomas Tillocher , Remi Dussart , Xavier Mellhaoui , Philippe Lefaucheux , Mohamed Boufnichel
Microelectronic Engineering, 2007, 84, pp.1120. ⟨10.1016/j.mee.2007.01.148⟩
Journal articles hal-00365907v1
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Oxidation threshold in silicon etching at cryogenic temperatures

Thomas Tillocher , Philippe Lefaucheux , Xavier Mellhaoui , Remi Dussart , Pierre Ranson
Journal of Vacuum Science & Technology A, 2006, 24 (4), pp.1073. ⟨10.1116/1.2210946⟩
Journal articles hal-00365909v1
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CURRENT DISTRIBUTION OF AC SURFACE DISCHARGES AND ASSOCIATED CHEMISTRY

Emmanuel Odic , Alice Goldman , Max Goldman , Marielle Dhainaut , Rémi Dussart
Journal of Electrostatics, 2006, 64 (7-9), pp.477-484
Journal articles hal-00221383v1

Diagnostic system for plasma/surface energy transfer characterization

Anne Lise Thomann , Nadjib Semmar , Rémi Dussart , Jacky Mathias , Vladislav Lang
Review of Scientific Instruments, 2006, 77 (2), pp.033501-6
Journal articles hal-00097829v1

Origin, control and elimination of undercut in silicon deep plasma etching in the cryogenic process

Mohamed Boufnichel , Philippe Lefaucheux , Said Aachboun , Rémi Dussart , Pierre Ranson
Microelectronic Engineering, 2005, 77, pp.327-336
Journal articles hal-00098398v1

SiOxFy passivation layer in silicon cryoetching

Xavier Mellhaoui , Rémi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
Journal of Applied Physics, 2005, 98, pp.104901-10
Journal articles hal-00098638v1

Optical emission spectroscopy spatial characterization of a silicon based Micro Hollow Cathode Discharge operating in Helium in DC regime

Elane Kouadou , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
76th Annual Gaseous Electronics Conference, Oct 2023, Ann Arbor, United States
Conference papers hal-04134203v1

Advances in optical diagnostics of Microplasmas: imaging and spectroscopy

Sylvain Iséni , Nelly Bonifaci , Ahmed Khacef , Volker Schulz-von Der Gathen , Goran Sretenović
International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States
Conference papers hal-03633854v1

Fabrication process and first charactesisation of novel silicon-based microplasma reactors

Elane Kouadou , Arnaud Stolz , Sylvain Iséni , Philippe Lefaucheux , Remi Dussart
International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States
Conference papers hal-03698719v1
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Atmospheric Plasma DC Source in the Micro Scale Elaborated by Micro-Nanotechnologies

Ronan Michaud , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
XXV Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXII), Jul 2022, Paris, France
Conference papers hal-03049315v1

Physical mechanisms involved in silicon based plasma microreactors operating in DC

Remi Dussart , Ronan Michaud , Arnaud Stolz , Sylvain Iséni , Olivier Aubry
5th Asia Pacific Conference on Plasma Physics (AAPPS-DPP2021), Association of Asia-Pacific Physical Societies and Division of Plasma Physics, Sep 2021, online - Kyushu University, Japan
Conference papers hal-03355293v1

Recent advances in micro-discharges ‒ sources and diagnostics

Sylvain Iséni , Nelly Bonifaci , Ahmed Khacef , Remi Dussart
MGK Colloquium - Transient Atmospheric Plasmas: from plasmas to liquids to solids, Apr 2021, Bochum, Germany
Conference papers hal-03218025v1

Atomic Layer Etching of Gallium Nitride (GaN) using fluorinated chemistry

Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel
42nd International Symposium on Dry Process, Nov 2021, Online, Japan
Conference papers hal-03539418v1

Atomic layer etching of Gallium Nitride (GaN) using SF6 and Ar plasmas

Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Conference papers hal-03539383v1

Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies

Remi Dussart , Thomas Tillocher , Gaelle Antoun , Jack Nos , Philippe Lefaucheux
42nd International Symposium on Dry Process, Nov 2021, Online, Japan
Conference papers hal-03539474v1

SiOxFy layer deposition for cryogenic nanoscale etching

Gaelle Antoun , Thomas Tillocher , Philippe Lefaucheux , Jack Nos , Aurélie Girard
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Conference papers hal-03539368v1

Études Spectroscopiques Aux Petites Échelles de Décharges à Haute Pression~: Intérêt Des Transitions Résonantes

Sylvain Iséni , Ronan Michaud , Cecile Pichard , Ahmed Khacef , Remi Dussart
Ecole Technologique Du Reseau Des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
Conference papers hal-03049312v1

Resonance Broadening as a Valuable Diagnostic to Study Atmospheric Pressure Plasma \textendash ~Application to Micro-Plasmas

Sylvain Iséni , Cecile Pichard , Ronan Michaud , Remi Dussart , Ahmed Khacef
9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany
Conference papers hal-03049314v1

Resonance broadening as a valuable diagnostic to study atmospheric pressure plasma – application to micro-plasmas

Sylvain Iséni , Cécile Pichard , Ronan Michaud , Remi Dussart , Ahmed Khacef
9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany
Conference papers hal-03374037v1

Cryogenic process for Atomic Layer Etching

Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Kumiko Yamazaki
Plasma Etch and Strip in Microtechnology, May 2019, Grenoble, France
Conference papers hal-02311291v1

Atomic Layer Etching at cryogenic temperature

Gaëlle Antoun , Gaelle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart
Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France
Conference papers hal-02311323v1

Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids atmosphériques: diagnostic des ondes d’ionisations et de micro-cavités

Sylvain Iséni , A. Khacef , Ronan Michaud , Remi Dussart
25e Congrès Général de la Société Française de Physique, Jul 2019, Nantes, France
Conference papers hal-02189144v1

Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids à haute pression: diagnostic des ondes d’ionisations et de micro-cavités

Sylvain Iséni , Cécile Pichard , Ronan Michaud , Remi Dussart , A. Khacef
1e Rencontres Scientifiques Plasmas Froids et Lasers, Nov 2019, Toulouse, France
Conference papers hal-02189173v1

Atomic Layer Etching at low substrate temperature

Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Kumiko Yamazaki
19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, United States
Conference papers hal-02311308v1

Plasma processes applied to SiO2 cryo-atomic layer etching

Gaëlle Antoun , Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Tahara Shigeru
XXXIV International Conference on Phenomena in Ionized Gases - 10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan
Conference papers hal-02311288v1

Étude par spectroscopie d'émission de la température du gaz à l'intérieur et au voisinage d'une micro-cavité plasma (MHCD)

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenovic , V Schulz-von Der Gathen
14e Journées du Réseau Plasmas Froids, Oct 2018, La Rochelle, France
Conference papers hal-01974867v1

Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage

Romain Chanson , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Liping Zhang
40th International Symposium on Dry Process, Nov 2018, Nagoya, France
Conference papers hal-02311275v1

Bulk micromachined Titanium MEMS

Gwenaël Bécan , Baptiste Rousset , Samson Edmond , Nathalie Isac , Maïté Do Vale
16th NAMIS Workshop (NAMIS 2018), Jun 2018, Oulu, Finland
Conference papers hal-02306373v1

The role of SiF4 physisorption in the cryogenic etching process of silicon

Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Tahara Shigeru
40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan
Conference papers hal-02311267v1

Electro-optical probe for dielectric barrier discharge analysis

Farah Aljammal , Gwenaël Gaborit , Laurence Galtier , Guillaume Revillod , Sylvain Iséni
45th IEEE International Conference on Plasma Science (ICOPS 2018), Jun 2018, Denver, United States
Conference papers hal-02017951v1

Cryo-etching mechanism characterization by in-situ spectroscopic ellipsometry

Remi Dussart , Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux
Surface Fest 2018, Jun 2018, Bordeaux, France
Conference papers hal-02311254v1

Titanium-based MEMS: Application for a novel implantable feedthrough using TTV (Through Titanium Vias) technologies

Bertrand Boutaud , Edouard Laudrel , Marion Woytasik , Elie Lefeuvre , Thomas Tillocher
6th Micro/Nano-Electronics Packaging and Assembly, Design and Manufacturing Forum (MiNaPAD 2018), May 2018, Grenoble, France
Conference papers hal-02306370v1

Plasma properties of DC silicon based micro hollow cavity discharge (MHCD) operating in various gases - a spectroscopic study

Sylvain Iséni , Ronan Michaud , Claudia Lazzaroni , Philippe Lefaucheux , Volker Schulz-von Der Gathen
71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States
Conference papers hal-02131687v1

Vectorial Electric Field Characterization Of Plasmas Using An Optical Probe

Farah Aljammal , Gwenaël Gaborit , Laurence Galtier , Guillaume Revillod , Sylvain Iséni
71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States
Conference papers hal-02018204v1

CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK

Mukesh Kulsreshath , Christophe Sinturel , Philippe Lefaucheux , Marylène Vayer , Thomas Tillocher
International Conference on Plasma Processes 2017 (CIP2017), Jun 2017, Nice, France
Conference papers hal-01561252v1

Microstructuration of titanium for implantable components

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Marion Woytasik , Fabrice Michel
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2017, Orléans, France
Conference papers hal-02306063v1

Microdischarge integration on silicon based devices

Rémi Dussart , Remi Dussart
70th Gaseous Electronics Conference, Nov 2017, Pittsburgh, United States
Conference papers hal-01686038v1

Low-Damage etching of highly porous OSG low-k dielectrics

Jean-Francois de Marneffe , Liping Zhang , Mikhail Baklanov , Koichi Yatsuda , Kaoru Maekawa
SPIE Advanced Lithography 2016, Feb 2016, San José, United States
Conference papers hal-01280267v1

Effects of gas and surface temperatures during cryogenic etching of silicon with SF6/O2

Stefan Tinck , Erik Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
69th Gaseous Electronic Conference, Oct 2016, Bochum, France
Conference papers hal-01379701v1

Cryoetching mechanisms and STiGer process evaluation

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher
International Symposium on Dry Process 2016 (DPS 2016), Nov 2016, Sapporo, Japan
Conference papers hal-01561210v1

Cryogenic processes for advanced material plasma etching

Remi Dussart , Thomas Tillocher , Philippe Lefaucheux
Quo vadis : Complex plasmas - TR 24, Aug 2016, Hambourg, Germany
Conference papers hal-01374747v1

Numerical and experimental investigation of cryogenic etching of silicon and porous low-dielectric

Stefan Tinck , Thomas Tillocher , Remi Dussart , Erik Neyts , Annemie Bogaerts
International Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan
Conference papers hal-01561212v1

Enhanced lifetime for thin-dielectric microdischarge-arrays operating in DC

Remi Dussart , Valentin Félix , Lawrence J. Overzet , Olivier Aubry , Arnaud Stolz
69th Gaseous Electronic Conference, Oct 2016, Bochum, Germany
Conference papers hal-01379698v1

Bulk titanium deep etching by plasma processes

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
, 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France
Conference papers hal-01166023v1

Cryoetching processes applied to ULK material

Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Koichi Yatsuda
37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan
Conference papers hal-01228477v1

Cryogenic Etching of Silicon with SF6/O2/SiF4 plasmas: a modeling and experimental study

Stefan Tinck , Erik Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium
Conference papers hal-01151530v1

Reduction of plasma induced damage in cryogenic etching of low-k materials

Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Christian Dussarat
4th French Symposium on Emerging Technologies for micro-nanofabrication, Nov 2015, Ecully, France
Conference papers hal-01277115v1

Limitation of surface defects in deep GaN etching

Nicolas Gosset , Thomas Tillocher , Floriane Leroy , Julien Ladroue , Philippe Lefaucheux
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Conference papers hal-01228462v1

Low damage cryoetching of low-K materials

Remi Dussart , Thomas Tillocher , Floriane Leroy , Philippe Lefaucheux , Koichi Yatsuda
SPIE Advanced Lithography 2015, Feb 2015, San José, United States
Conference papers hal-01151543v1

A novel low temperature etch approach to reduce ULK plasma damage

Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Rami Ljazouli , Philippe Lefaucheux
Plasma Etch and Strip in Microtecnology, Apr 2015, Leuven, Belgium
Conference papers hal-01151524v1

DC and AC microplasmas on silicon : performances and limitations

Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux
Asian-European Plasma Surface Engineering, Masaru Hori, Sep 2015, Jeju, South Korea
Conference papers hal-01217651v1
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Cryoetching processes applied to ULK material

Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christian Dussarat
37th International Symposium on Dry process , Nov 2015, Awaji, Japan
Conference papers hal-01287233v1

Ignition phase of a silicon-based microdischarge array with excitation by burst waveforms

Judith Golda , Valentin Felix , Remi Dussart , Lawrence J. Overzet , V. Schulz-von Der Gathen
International workshop on microplasmas, May 2015, Newark, United States
Conference papers hal-01166021v1

Energy flux diagnostics in thin film deposition by magnetron sputtering

Anne-Lise Thomann , Amaël Caillard , El Mokh Mariem , Nadjib Semmar , Remi Dussart
XXXII International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2015, Iasi, Romania
Conference papers hal-01290726v1

Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis

Floriane Leroy , Thomas Tillocher , Liping Zhang , A. Girard , Christophe Cardinaud
Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium
Conference papers hal-01151528v1

Surface state improvement in GaN deep etching for power electronics applications

Nicolas Gosset , Floriane Leroy , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux
37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan
Conference papers hal-01228470v1

Plasma Cryogenic Etching: from 3D Integration to Low-k Materials

Thomas Tillocher , Remi Dussart , Floriane Leroy , Philippe Lefaucheux , Mohamed Boufnichel
China Semiconductor Technology International Conference, Mar 2015, Shanghai, China
Conference papers hal-01151533v1

Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films

Alexane Vital , Mohamed Boufnichel , Remi Dussart , Nicolas Gosset , Philippe Lefaucheux
2015 MRS Spring Meeting & Exhibit, Apr 2015, San francisco, United States
Conference papers hal-01151542v1

Performances and limitations of DC microdischarges on silicon platforms

Remi Dussart , Valentin Felix , Olivier Aubry , Philippe Lefaucheux
20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France
Conference papers hal-01166022v1

DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Conference papers hal-01228465v1

Performances and instabilities of silicon based microdischarges

Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux
International workshop on microplasmas, May 2015, Newark, United States
Conference papers hal-01166019v1

Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage

Floriane Leroy , Thomas Tillocher , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Conference papers hal-01228458v1

Cryogenic etching of silicon with SF6/O2/SiF4 plasmas: a modelling and experimental study

Stefan Tinck , E.C. Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium
Conference papers hal-01228451v1

Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process

Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda
22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium
Conference papers hal-01228448v1

Multiscale etching of holes by cryogenic silicon etching

Thomas Tillocher , Xiao Liu , Alexane Vital , Nicolas Gosset , Philippe Lefaucheux
Plasma Etch and Strip in Microtechnology, May 2014, Gernoble, France
Conference papers hal-01057242v1

Low damage cryogenic etching of low-K materials for advanced interconnects

Mikhail Baklanov , Liping Zhang , Jean-Francois de Marneffe , Remi Dussart , Andy Goodyear
Materials for Advanced Metallization, Mar 2014, Dresden, Germany
Conference papers hal-01006369v1

Cryoetching of Silicon and Advanced Materials for 3D Interconnects

Remi Dussart , Thomas Tillocher , Nicolas Gosset , Philippe Lefaucheux , Mohamed Boufnichel
226th meeting of the Electroschemical Society, Oct 2014, Cancun, Mexico
Conference papers hal-01151844v1

Study of energy transfers at the substrate during “transition steps” in magnetron sputter deposition

Anne-Lise Thomann , El Mariem , Amaël Caillard , Nadjib Semmar , Thomas Lecas
14th International Conference on Plasma Surface Engineering PSE 2014 , Sep 2014, Garmisch-Partenkirchen, Germany
Conference papers hal-01289446v1

Spectroscopic investigations of transient processes in micro-cavity discharge reactors

V. Schulz-von Der Gathen , Judith Golda , Daniel Schröder , H. Boettner , Arthur Greb
International Symposium on Non-equilibrium Plasmas and Complex Systems, Feb 2014, Osaka, Japan
Conference papers hal-01006368v1

Cryogenic etching of submicronic features in silicon using masks based on porous polymer films

Thomas Tillocher , Alexane Vital , Marylène Vayer , Nicolas Gosset , Philippe Lefaucheux
226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico
Conference papers hal-01151839v1

Improvement of GaN Deep Etched Surface State by Fluorination Dedicated to Power Devices

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico
Conference papers hal-01151851v1

Effect of surface fluorination on GaN deep dry etching defects

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France
Conference papers hal-01057239v1

Plasma cryoetching processes for silicon and advanced materials

Remi Dussart , Thomas Tillocher , Nicolas Gosset , Alexane Vital , Philippe Lefaucheux
International Conference on Microelectronics and Plasma Technology, Jul 2014, Gunsan, South Korea
Conference papers hal-01057585v1

Submicrometric structured silicon surfaces obtained from polymer blend film by silica replication and cryogenic plasma etching

Alexane Vital , Thomas Tillocher , Remi Dussart , Marylène Vayer , Christophe Sinturel
Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France
Conference papers hal-01057586v1

Plasma deep etching of silicon, titanium and gallium nitride for microtechnology

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Nicolas Gosset , Julien Ladroue
AVS 60th International Symposium & Exhibition, Oct 2013, United States
Conference papers hal-01006364v1

Titanium deep etching for medical applications

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States
Conference papers hal-01057236v1

Damage Free Cryogenic Etching of Ultra Low-k Materials

Mikhail Baklanov , Liping Zhang , Jean-Francois de Marneffe , Remi Dussart
International Interconnect Technology Conference, Jun 2013, Kyoto, Japan
Conference papers hal-01056603v1

Integrated microplasmas on silicon: performances and limitations

Remi Dussart , Mukesh Kulsreshath , Valentin Félix , Lawrence J. Overzet , Judith Golda
19th International Vacuum Conference, Sep 2013, Paris, France
Conference papers hal-01056618v1

Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Pierre Ranson , Mohamed Boufnichel
Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium
Conference papers hal-00831344v1

Radio Frequency Diagnostics of Microplasmas

Lawrence J. Overzet , Matthew Goeckner , Remi Dussart , Philippe Lefaucheux , Valentin Félix
Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands
Conference papers hal-00831368v1

RF diagnostics performed on DC Microplasmas

Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen
19th International Vacuum Conference, Sep 2013, Paris, France
Conference papers hal-01056614v1

Reproducible process for titanium deep etching

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
19th International Vacuum Conference, Sep 2013, Paris, France
Conference papers hal-01057233v1

Reproducible process for Titanium deep etching

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium
Conference papers hal-00831358v1

Deep etching processes for silicon micro- and nano-machining

Thomas Tillocher , Philippe Lefaucheux , Remi Dussart
Le Studium workshop : Bottom-up approaches to nanotechnology, May 2013, Orléans, France
Conference papers hal-00831360v1

Dry deep etching of GaN wide band-gap Semiconductor

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States
Conference papers hal-01057235v1

Dry deep etching of GaN wide-bandgap semiconductor

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
19th International Vacuum Conference, Sep 2013, Paris, France
Conference papers hal-01056606v1

Energy flux measurements at the substrate deposition during reactive and non-reactive magnetron sputter deposition processes

Pierre-Antoine Cormier , A. Balhamri , Anne Lise Thomann , Remi Dussart , Nadjib Semmar
19th International Vacuum Conference, Sep 2013, Paris, France
Conference papers hal-01166024v1

On Causes of the Destruction of MHCD Sources During Operation

Lawrence J. Overzet , Valentin Felix , Remi Dussart , Philippe Lefaucheux , Mukesh Kulsreshath
International Workshop on Microplasmas, May 2013, Pékin, China
Conference papers hal-00831363v1

RF Diagnostics of Microplasmas

Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen
International Workshop on Microplasmas, May 2013, Pékin, China
Conference papers hal-00831362v1

Deep etching of gallium nitride by chlorine based plasma

Remi Dussart , Julien Ladroue , Thomas Tillocher , Mohamed Boufnichel , Nicolas Gosset
Journées Nationales des Technologies Emergentes, May 2013, Evian, France
Conference papers hal-00831346v1

Plasma surface interactions in deep dry etching

Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel , Remi Dussart
Workshop on particle - surface interactions : from surface analysis to materials processing, Jun 2013, Luxembourg, Luxembourg
Conference papers hal-00831337v1

Spectroscopic Diagnostics of Ceramic MHCDs

Judith Golda , V Schulz-von Der Gathen , Valentin Félix , Remi Dussart , Philippe Lefaucheux
International Workshop on Microplasmas, May 2013, Pékin, China
Conference papers hal-00831354v1

Development and limitations of microplasma arrays on silicon operating in DC

Remi Dussart , Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux
AVS 59th International Symposium and Exhibition, Oct 2012, United States
Conference papers hal-00747741v1

Damage free cryogenic etching of porous organosilicate low-k films for advanced interconnect application

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Conference papers hal-00747749v1

Optimization of STiGer process used to etch high aspect ratio silicon microstructures

Thomas Tillocher , Philippe Lefaucheux , Julien Ladroue , Mohamed Boufnichel , Pierre Ranson
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Conference papers hal-00747743v1

Advantages of energy influx measurements in low pressure plasma processes

Pierre-Antoine Cormier , Anne-Lise Thomann , Nadjib Semmar , Remi Dussart , Vincent Dolique
International Conference on Plasma Surface Engineering, Sep 2012, Garmisch-Partenkirchen, Germany
Conference papers hal-00831371v1

Deep GaN Etching : Role of SiCl4 in Plasma Chemistry

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Conference papers hal-00747746v1

Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry

Thomas Tillocher , Judith Golda , Philippe Lefaucheux , Bertrand Boutaud , Pierre Ranson
ESCAMPIG 2012, Jul 2012, Viana do Castelo, Portugal
Conference papers hal-00831352v1

Balanced/unbalanced planar magnetron plasma behaviour. Microscopic analysis by PIC-MCC modelling of the ion flux on thermal probes

Tiberiu Minea , Lise Caillault , Pierre-Antoine Cormier , Remi Dussart , Nadjib Semmar
13th International Conference on Plasma Surface Engineering PSE 2012, Sep 2012, Garmisch-Partenkirchen, Germany
Conference papers hal-01288936v1

Integrated microplasmas on silicon: a new tool for lab-on-a-chip applications

Remi Dussart , Mukesh Kulsreshath , Valentin Felix , Lawrence J. Overzet , Thomas Tillocher
Cancer Cells On Chip, Jun 2012, Lyon, France
Conference papers hal-00707933v1

Formation of black silicon by cryogenic plasma etching processes

Thomas Tillocher , Jérémy Pereira , Nasreddine Mekkakia Maaza , Philippe Lefaucheux , Pierre Ranson
Micro- and Nano-Engineering (MNE), Sep 2012, Toulouse, France
Conference papers hal-00831357v1

Caractérisation de matrices de micro plasmas sur silicium

Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux , Thomas Tillocher
XIIeme congrès de la division Plasmas de la Société Française de Physique, May 2012, Orléans, France
Conference papers hal-00707935v1

Development of microdicharge arrays in silicon operating in DC and AC

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias
European Physical Society/International Conference on Plasma Physics, Jul 2012, Stockholm, Sweden
Conference papers hal-00831351v1

Development of microdicharges in silicon operating in DC for medical applications

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias
4th International Conference on Plasma Medecine, Jun 2012, Orléans, France
Conference papers hal-00831349v1

Development and characterization of microplasma arrays on Silicon

Remi Dussart , Thierry Dufour , Mukesh Kulsreshath , Valentin Felix , Laurent Schwaederlé
International Workshop on Physics of Microplasmas, May 2012, Bochum, Germany
Conference papers hal-00707932v1

Direct energy influx measurements between a biased substrate and a low pressure plasma

Pierre-Antoine Cormier , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar , Jacky Mathias
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00707930v1

Micro plasma reactor arrays made in silicon

Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , H. Boettner , V. Schulz-von Der Gathen
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00707927v1

Deep Gallium Nitride Etching: ways to avoid etching defects

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Mar 2011, Nagoya, Japan
Conference papers hal-00696396v1

Deep GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
HeteroSiC-WASMPE 2011, Jun 2011, Tours, France
Conference papers hal-00696418v1

Obtaining a smooth surface after deep GaN etching

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00696419v1

Characterization of the ignition and the extinction of a Micro Hollow Cathode Discharge

Remi Dussart , N. Sadeghi , Lawrence J. Overzet , Mukesh Kulsreshath , Laurent Schwaederlé
6th International Workshop on Microplasmas, Apr 2011, Paris, France
Conference papers hal-00707924v1

Characterisation of Silicon based micro discharge plasma arrays in Direct Current (DC) at atmospheric pressure

Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , Thomas Tillocher , Julien Ladroue
6th International Workshop on Microplasmas, Apr 2011, Paris, France
Conference papers hal-00707925v1

Energy influx measurements in low pressure plasmas for material processing

Anne-Lise Thomann , Pierre-Antoine Cormier , Remi Dussart , Nadjib Semmar , Jacky Mathias
Innovations in Thin Film Processing and Characterisation, and Magnetron, Ion Processing and Arc Technologies European Conference, ITFPC-MIATEC 2011 , Nov 2011, Nancy, France
Conference papers hal-01289043v1

STiGer process for silicon deep etching: extended scalloping reduction on submicron trenches

Wassim Kafrouni , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00696422v1

Deep etching of bulk titanium by plasma

Thomas Tillocher , Julien Ladroue , Wassim Kafrouni , Mukesh Kulsreshath , Philippe Lefaucheux
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00696425v1

Deep silicon etching of 0.8 µm to hundreds of microns wide trenches with the STiGer process

Thomas Tillocher , Wassim Kafrouni , Julien Ladroue , Philippe Lefaucheux , Pierre Ranson
AVS 58th International Symposium & Exhibition, Oct 2011, Nashville, United States
Conference papers hal-00696428v1

Direct energy influx measurements in high power impulse sputtering

Pierre-Antoine Cormier , Balharmi A. , Anne-Lise Thomann , Stephanos Konstantinidis , Remi Dussart
2nd International Conference on HiPIMS, HiPIMS2011 , Jun 2011, Braunschweig, Germany
Conference papers hal-01288780v1

Microcathode sustained discharges using Si integrated micro-discharges arrays

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Remi Dussart
6th International Workshop on Microplasmas, Apr 2011, France, France
Conference papers hal-00707926v1

Microcathode sustained discharges using Si integrated micro-reactors

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Remi Dussart , Philippe Lefaucheux
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Conference papers hal-00707929v1

Micro Hollow Cathode Discharge Arrays in silicon devices

Remi Dussart , Mukesh Kulsreshath , Lawrence J. Overzet , Laurent Schwaederlé , Thomas Tillocher
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Conference papers hal-00681902v1

Deep GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France
Conference papers hal-00487363v1

RF Diagnostics of Atmospheric Pressure Micro-Plasmas

Lawrence J. Overzet , Monali Mandra , D. Jung , Thierry Dufour , Remi Dussart
Diagnostics Microplasmas, Mar 2010, Germany
Conference papers hal-00487366v1

Comparaison d'une sonde calorimétrique et d'un capteur à thermopile pour la mesure des transferts d'énergie plasma basse pression/surface'

Nadjib Semmar , Pierre-Antoine Cormier , Anne Lise Thomann , Rémi Dussart , Jacky Mathias
Congrès Français de Thermique, May 2010, Le Touquet, France. pp.755-760
Conference papers hal-00504417v1

Micro-discharge plasma using silicon platform

Mukesh Kulsreshath , Thierry Dufour , Philippe Lefaucheux , Olivier Aubry , Sébastien Dozias
AVS 57th International Symposium & Exhibition, Oct 2010, Albuquerque, United States
Conference papers hal-00707922v1

Les Microdécharges en France

Remi Dussart
Journées Plasma Québec du Réseau Plasma Froid, Jun 2010, France
Conference papers hal-00503123v1

Deep Gallium Nitride Etching

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Conference papers hal-00696376v1

Study of an MHCD operating in He using optical and electrical diagnostics

Remi Dussart , Thierry Dufour , Thomas Tillocher , Mukesh Kulsreshath , Olivier Aubry
Diagnostics Microplasmas, Mar 2010, Germany
Conference papers hal-00487365v1

Ignition and extinction of a Micro Hollow Cathode Discharge operating in DC regime

Remi Dussart , Mukesh Kulsreshath , Thierry Dufour , Lawrence J. Overzet , Philippe Lefaucheux
AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States
Conference papers hal-00696390v1

Gravure du GaN pour la prochaine génération de diodes Schottky

Julien Ladroue , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
Workshop MNTS 12-20, Minatec, Mar 2010, Grenoble, France
Conference papers hal-00487358v1

Silicon deep cryoetching with the STiGer process

Thomas Tillocher , Vincent L. Girault , Guillaume Gomme , Franck Moro , Laurianne E. Pichon
3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France
Conference papers hal-00487360v1

Optimization of STiGer process for silicon deep etching

Thomas Tillocher , Wassim Kafrouni , Vincent Girault , Julien Ladroue , Philippe Lefaucheux
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Conference papers hal-00696366v1

Deep Inductively Coupled Plasma Etching of GaN

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States
Conference papers hal-00696393v1

STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances

Jeremy Pereira , Hao Jiang , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard
Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium
Conference papers hal-00444370v1

Formation of Columnar MicroStructures of silicon (CMS) in SF6/O2 plasma in cryogenic conditions

Jeremy Pereira , Remi Dussart , Laurianne E. Pichon , Vincent L. Girault , Philippe Lefaucheux
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Conference papers hal-00444402v1

STiGer cryoetching process on silicon : results on performances for 0.8 um trenches

Vincent L. Girault , Remi Dussart , Laurianne E. Pichon , Jeremy Pereira , Philippe Lefaucheux
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Conference papers hal-00444466v1

Electrical Characterization of Direct Current Atmospheric Pressure Micro-Discharges Using Radio Frequency Signals in Argon

Monali Mandra , Lawrence J. Overzet , Matthew Goeckner , Thierry Dufour , Remi Dussart
62nd Gaseous Electronics Conference, Oct 2009, Saratoga Springs, United States
Conference papers hal-00444482v1

Direct measurement of energy transfers during deposition of sputtered metal atoms

Larbi Bedra , Anne-Lise Thomann , Nadjib Semmar , Rémi Dussart , Jacky Mathias
17th International Colloquium on Plasma Processes, CIP 09, Jun 2009, Marseille, France
Conference papers hal-00445581v1

A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching

Corinne Y. Duluard , Thomas Tillocher , Laurianne E. Pichon , Remi Dussart , Philippe Lefaucheux
AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States
Conference papers hal-00442683v1

GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Conference papers hal-00444471v1

Experiment and simulation results of limited cathode area MHCDs operating in He

Remi Dussart , Thierry Dufour , Lawrence J. Overzet , Monali Mandra , Jeong Bong Lee
AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States
Conference papers hal-00444491v1

Ignition and characterization of Micro Hollow Cathode Discharges in Helium

Thierry Dufour , Remi Dussart , Lawrence J. Overzet , Monali Mandra , Jeong Bong Lee
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Conference papers hal-00444380v1

Inductively Coupled Plasma Etching of GaN and Induced Defects

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson
AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States
Conference papers hal-00444488v1

A direct measurement of the energy flux density in plasma surface interaction

Rémi Dussart , Anne-Lise Thomann , Nadjib Semmar , Laurianne E. Pichon , Larbi Bedra
61st Gaseous Electronics Conference, 2008, United States
Conference papers hal-00448760v1

Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard , El-Houcine Oubensaid
AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States
Conference papers hal-00444361v1

New Approach of Heat Transfer Characterization on Thin Si and Cu Solids.-Effects of Thermal Contact Resistance

Larbi Bedra , Nadjib Semmar , Anne-Lise Thomann , Rémi Dussart , Jacky Mathias
5th European Thermal-Sciences Conference, Eutrotherm 2008, May 2008, Netherlands. pp.101-106
Conference papers hal-00443101v1

Micro transfert d'énergie dans un solide mince : effet de la résistance thermique de contact

Larbi Bedra , Nadjib Semmar , Anne-Lise Thomann , Rémi Dussart , Jacky Mathias
Congrès Français de Thermique, SFT 2008, Jun 2008, Toulouse, France. pp.385-390
Conference papers hal-00443715v1

Ignition of parallel Micro Hollow Cathode Discharges in He without ballasts

Thierry Dufour , Monali Mandra , Matthew Goeckner , Philippe Lefaucheux , Pierre Ranson
61st Gaseous Electronics Conference, Oct 2008, Dallas, United States
Conference papers hal-00444346v1

Direct measurements of the energy transfers in deposition or etching low pressure plasma processes

Anne-Lise Thomann , Rémi Dussart , Nadjib Semmar , Larbi Bedra , Jacky Mathias
11th International Conference on Plasma Surface Engineering, PSE2008, Sep 2008, Garmisch-Partenkirchen, Germany
Conference papers hal-00445589v1

SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature

Laurianne E. Pichon , Corinne Y. Duluard , Thomas Tillocher , Remi Dussart , Philippe Lefaucheux
18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105
Conference papers hal-00444241v1

Enhanced robustness of the cryogenic process for silicon deep etching

Remi Dussart , Thomas Tillocher , El-Houcine Oubensaid , Philippe Lefaucheux , Pierre Ranson
Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark
Conference papers hal-00444248v1

Limitation of the cathode area for direct current MHCD in Helium

Thierry Dufour , Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Monali Mandra
4th International Workshop on Microplasmas, Oct 2007, Tainan, Taiwan
Conference papers hal-00444267v1

Submicronic Etching in the Cryogenic Process

Nasreddine Mekkakia Maaza , Remi Dussart , Philippe Lefaucheux , Pierre Ranson
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Conference papers hal-00442684v1
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Direct current parallel microdischarges in helium

Thierry Dufour , Remi Dussart , Lawrence J. Overzet , Philippe Lefaucheux , Pierre Ranson
ISPC-18, Aug 2007, Kyoto, Japan
Conference papers hal-01303260v2

A robust passivation-enhanced cryogenic process used for deep silicon etching

Laurianne E. Pichon , El-Houcine Oubensaid , Corinne Y. Duluard , Remi Dussart , Philippe Lefaucheux
AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States
Conference papers hal-00444264v1

Cryoetching of silicon for MEMS and microelectronic components

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard
16th International Colloquium on Plasma Processes, Jun 2007, France
Conference papers hal-00442662v1

A new generation of cryogenic processes for silicon deep etching

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Conference papers hal-00442668v1

A new generation of cryogenic processes for silicon deep etching

Remi Dussart
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Conference papers hal-00365911v1

SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature

Remi Dussart , Laurianne E. Pichon , Corinne Y. Duluard , Philippe Lefaucheux , Mohamed Boufnichel
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Conference papers hal-00444198v1

Neutral production in SF6/SiCl4 inductively coupled plasmas

Corinne Y. Duluard , Remi Dussart , Laurianne E. Pichon , El-Houcine Oubensaid , Philippe Lefaucheux
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Conference papers hal-00444252v1

Fabrication process and electrical characterization of direct current parallel microdischarges in helium

Monali Mandra , Remi Dussart , Jeong Bong Lee , Matthew Goeckner , Thierry Dufour
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Conference papers hal-00444259v1