Remi Dussart

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Publications

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Quasi In Situ XPS on a SiO x F y Layer Deposited on Silicon by a Cryogenic Process

G. Antoun , A. Girard , T. Tillocher , P. Lefaucheux , J. Faguet et al.
ECS Journal of Solid State Science and Technology, 2022, 11 (1), pp.013013. ⟨10.1149/2162-8777/ac4c7d⟩
Article dans une revue hal-03565995 v1
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On the validity of neutral gas temperature by emission spectroscopy in micro-discharges close to atmospheric pressure

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenović , Volker Schulz-von Der Gathen et al.
Plasma Sources Science and Technology, 2019, 28 (6), pp.065003. ⟨10.1088/1361-6595/ab1dfb⟩
Article dans une revue hal-02117169 v1
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Morphology control in thin films of PS: PLA homopolymer blends by dip-coating deposition

Alexane Vital , Marylène Vayer , Thomas Tillocher , Remi Dussart , Mohamed Boufnichel et al.
Applied Surface Science, 2017, 393, pp.127-133. ⟨10.1016/j.apsusc.2016.09.151⟩
Article dans une revue hal-01561189 v1
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Cryogenic plasma-processed silicon microspikes as a high-performance anode material for lithium ion-batteries

Joe Sakai , Erwann Luais , Jérôme Wolfman , Thomas Tillocher , Remi Dussart et al.
Journal of Applied Physics, 2017, 122 (15), pp.155103. ⟨10.1063/1.4997713⟩
Article dans une revue hal-01686032 v1

Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Philippe Lefaucheux , Thomas Tillocher et al.
Journal of Physics D: Applied Physics, 2016, 49 (17), pp.175203. ⟨10.1088/0022-3727/49/17/175203⟩
Article dans une revue hal-01324407 v1

Elucidating the effects of gas flow rate on an SF6 inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation

Stefan Tinck , Thomas Tillocher , Remi Dussart , Erik Neyts , Annemie Bogaerts
Journal of Physics D: Applied Physics, 2016, 49 (38), pp.385201. ⟨10.1088/0022-3727/49/38/385201⟩
Article dans une revue hal-01374746 v1

Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices

Valentin Felix , Philippe Lefaucheux , Olivier Aubry , Judith Golda , Volker Schulz-von Der Gathen et al.
Plasma Sources Science and Technology, 2016, 25, pp.025021. ⟨10.1088/0963-0252/25/2/025021⟩
Article dans une revue hal-01287230 v1

Polymer masks for structured surface and plasma etching

Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux et al.
Applied Surface Science, 2015, 332, pp.237. ⟨10.1016/j.apsusc.2015.01.040⟩
Article dans une revue hal-01219273 v1

Single and multilayered materials processing by argon ion beam etching: study of ion angle incidence and defect formation

Nicolas Gosset , Mohamed Boufnichel , Emilie Bahette , Walid Khalfaoui , Rami Ljazouli et al.
Journal of Micromechanics and Microengineering, 2015, 25, pp.095011. ⟨10.1088/0960-1317/25/9/095011⟩
Article dans une revue hal-01217644 v1

Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining

Alexane Vital , Marylène Vayer , Christophe Sinturel , Thomas Tillocher , Philippe Lefaucheux et al.
Polymer, 2015, 76, pp.123-130. ⟨10.1016/j.polymer.2015.08.062⟩
Article dans une revue hal-01228427 v1

Cryogenic etching processes applied to porous low-k materials using SF6/C4F8 plasmas

Floriane Leroy , Liping Zhang , Thomas Tillocher , Koichi Yatsuda , Kaoru Maekawa et al.
Journal of Physics D: Applied Physics, 2015, 48, pp.435202. ⟨10.1088/0022-3727/48/43/435202⟩
Article dans une revue hal-01217648 v1

Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study

Stefan Tinck , Thomas Tillocher , Rémi Dussart , Annemie Bogaerts
Journal of Physics D: Applied Physics, 2015, 48, pp.155204. ⟨10.1088/0022-3727/48/15/155204⟩
Article dans une revue hal-01135854 v1

Width dependent interaction of trench-like microdischarges arranged in sub-arrays on a single silicon based chip

Mukesh Kulsreshath , Judith Golda , V. Schulz-von Der Gathen , Remi Dussart
Plasma Sources Science and Technology, 2014, 23, pp.045012. ⟨10.1088/0963-0252/23/4/045012⟩
Article dans une revue hal-01021943 v1

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel
Journal of Physics D: Applied Physics, 2014, pp.123001. ⟨10.1088/0022-3727/47/12/123001⟩
Article dans une revue hal-00959819 v1

Circular Emission and Destruction Patterns on a Silicon-Based Microdischarge Array

Judith Golda , Mukesh Kulsreshath , H Boettner , Valentin Felix , Remi Dussart et al.
IEEE Transactions on Plasma Science, 2014, 42 (10), pp.2646. ⟨10.1109/TPS.2014.2337657⟩
Article dans une revue hal-01082634 v1

Titanium oxide thin film growth by magnetron sputtering: Total energy flux and its relationship with the phase constitution

Pierre-Antoine Cormier , A. Balhamri , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar et al.
Surface and Coatings Technology, 2014, Vol 254 (2014), Volume 254, 15 September 2014, Pages 291-297. ⟨10.1016/j.surfcoat.2014.06.037⟩
Article dans une revue hal-01057278 v1

Alternated process for the deep etching of titanium

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
Journal of Micromechanics and Microengineering, 2014, 24, pp.075021. ⟨10.1088/0960-1317/24/7/075021⟩
Article dans une revue hal-01015146 v1

Energy Transferred From a Hot Nickel Target During Magnetron Sputtering

Mariem El Mokh , Amaël Caillard , Nadjib Semmar , Rémi Dussart , Thomas Lecas et al.
IEEE Transactions on Plasma Science, 2014, pp.Plasma Science, IEEE Transactions on (Volume:PP Issue: 99 ). ⟨10.1109/TPS.2014.2338742⟩
Article dans une revue hal-01057286 v1
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Ignition and extinction phenomena in helium micro hollow cathode discharges

M. K. Kulsreshath , N. Sadeghi , L. Schwaederle , T. Dufour , L. J. Overzet et al.
Journal of Applied Physics, 2013, 114 (24), pp.243303. ⟨10.1063/1.4858418⟩
Article dans une revue hal-01303176 v2
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Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmosphere

Anne-Lise Thomann , Pierre-Antoine Cormier , Vincent Dolique , Nadjib Semmar , Remi Dussart et al.
Thin Solid Films, 2013, 539, pp.88. ⟨10.1016/j.tsf.2013.05.075⟩
Article dans une revue hal-00839010 v1

Measuring the energy flux at the substrate position during magnetron sputter deposition processes

Pierre-Antoine Cormier , A. Balhamri , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar et al.
Journal of Applied Physics, 2013, 113, pp.013305. ⟨10.1063/1.4773103⟩
Article dans une revue hal-00831364 v1
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IR emission from the target during plasma magnetron sputter deposition

P.-A. Cormier , A.-L. Thomann , Vincent Dolique , A. Balhamri , R. Dussart et al.
Thin Solid Films, 2013, 545, pp.44-49. ⟨10.1016/j.tsf.2013.07.025⟩
Article dans une revue istex in2p3-00874718 v1

Low Damage Cryogenic Etching of Porous Organosilicate Low-k Materials Using SF6/O2/SiF4

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart et al.
ECS Journal of Solid State Science and Technology, 2013, 2 (6), pp.N131. ⟨10.1149/2.001306jss⟩
Article dans une revue hal-00831339 v1

A novel amorphization-etch alternating process for Si(100)

Nasreddine Mekkakia Maaza , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
Journal of Micromechanics and Microengineering, 2013, 23, pp.045023. ⟨10.1088/0960-1317/23/4/045023⟩
Article dans une revue hal-00831302 v1

IR emission from the target during plasma magnetron sputter deposition

Pierre-Antoine Cormier , Anne Lise Thomann , Vincent Dolique , A. Balhamri , Remi Dussart et al.
Thin Solid Films, 2013, pp.547(2013) 44-49. ⟨10.1016/j.tsf.2013.07.025⟩
Article dans une revue istex hal-00943789 v1
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Breakdown study of dc silicon micro-discharge devices

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Thomas Tillocher et al.
Journal of Physics D: Applied Physics, 2012, 45, pp.065201. ⟨10.1088/0022-3727/45/6/065201⟩
Article dans une revue hal-00667649 v1

Study of dc micro-discharge arrays made in silicon using CMOS compatible technology

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Philippe Lefaucheux , Julien Ladroue et al.
Journal of Physics D: Applied Physics, 2012, 45, pp.285202. ⟨10.1088/0022-3727/45/28/285202⟩
Article dans une revue istex hal-00713105 v1

Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenches

Thomas Defforge , Gaël Gautier , Thomas Tillocher , Remi Dussart , François Tran-Van
Journal of Vacuum Science & Technology A, 2012, 30 (1), pp.010601. ⟨10.1116/1.3665217⟩
Article dans une revue hal-00655000 v1

Damage Free Cryogenic Etching of a Porous Organosilica Ultralow-k Film

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart et al.
Electrochemical and Solid-State Letters, 2012, 2 (2), pp.N5. ⟨10.1149/2.007302ssl⟩
Article dans une revue hal-00831289 v1

Probing dusty-plasma/surface interactions with a heat flux microsensor

Sergey Abolmasov , Pierre-Antoine Cormier , A. Torres Rios , Remi Dussart , Nadjib Semmar et al.
Applied Physics Letters, 2012, pp.100, 1, 011601. ⟨10.1063/1.3674290⟩
Article dans une revue hal-00943785 v1

Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , Jeremy Pereira , El-Houcine Oubensaid et al.
Journal of Micromechanics and Microengineering, 2011, 21, pp.065015
Article dans une revue hal-00655003 v1

Scalloping removal on DRIE via using low concentrated alkaline solutions at low temperature

Thomas Defforge , Xi Song , Gaël Gautier , Thomas Tillocher , Remi Dussart et al.
Sensors and Actuators A: Physical , 2011, 170 (1-2), pp.114. ⟨10.1016/j.sna.2011.05.028⟩
Article dans une revue istex hal-00655001 v1

Optimization of submicron deep trench profiles with the STiGer cryoetching process: reduction of defects

Thomas Tillocher , Wassim Kafrouni , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel et al.
Journal of Micromechanics and Microengineering, 2011, 21, pp.085005. ⟨10.1088/0960-1317/21/8/085005⟩
Article dans une revue istex hal-00655002 v1
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Experimental study and simulation of a micro-discharge with limited cathode area

Thierry Dufour , Lawrence J. Overzet , Remi Dussart , L. C. Pitchford , N Sadeghi et al.
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.565-574. ⟨10.1140/epjd/e2010-00273-6⟩
Article dans une revue hal-01303159 v2
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RF impedance measurements of DC atmospheric micro-discharges

Lawrence J. Overzet , D. Jung , Monali Mandra , Matthew Goeckner , Thierry Dufour et al.
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449-454. ⟨10.1140/epjd/e2010-00274-5⟩
Article dans une revue hal-01303158 v1
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Integrated micro-plasmas in silicon operating in helium

Remi Dussart , Lawrence J. Overzet , Philippe Lefaucheux , Thierry Dufour , Mukesh Kulsreshath et al.
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.601-608. ⟨10.1140/epjd/e2010-00272-7⟩
Article dans une revue hal-01303160 v2

RF impedance measurements of DC atmospheric micro-discharges

Lawrence J. Overzet , D. Jung , Monali Mandra , Matthew Goeckner , Thierry Dufour et al.
The European Physical Journal D : Atomic, molecular, optical and plasma physics, 2010, 60, pp.449. ⟨10.1140/epjd/e2010-00274-5⟩
Article dans une revue hal-00655011 v1
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Highly sensitive measurements of the energy transferred during plasma sputter deposition of metals

L Bedra , a L Thomann , N Semmar , R Dussart , J Mathias
Journal of Physics D: Applied Physics, 2010, 43 (6), pp.65202. ⟨10.1088/0022-3727/43/6/065202⟩
Article dans une revue istex hal-00569757 v1
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On the measurement of energy fluxes in plasmas using a calorimetric probe and a thermopile sensor

Pierre-Antoine Cormier , Marc Stahl , Anne-Lise Thomann , Rémi Dussart , Matthias Wolter et al.
Journal of Physics D: Applied Physics, 2010, 43 (46), pp.465201. ⟨10.1088/0022-3727/43/46/465201⟩
Article dans une revue istex hal-00569747 v1

Deep GaN etching by inductively coupled plasma and induced surface defects

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson et al.
Journal of Vacuum Science & Technology A, 2010, 28 (5), pp.1226. ⟨10.1116/1.3478674⟩
Article dans une revue hal-00519022 v1

Cryogenic etching of n-type silicon with p+ doped walls with the TGZM process through the Al/Si eutectic alloy

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , B. Morillon , Mohamed Boufnichel et al.
Microelectronic Engineering, 2009, 86, pp.2262. ⟨10.1016/j.mee.2009.04.002⟩
Article dans une revue istex hal-00413753 v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process

J. Pereira , L.E. Pichon , R. Dussart , Christophe Cardinaud , C.Y. Duluard et al.
Applied Physics Letters, 2009, 94 (7), pp.071501. ⟨10.1063/1.3085957⟩
Article dans une revue hal-00432322 v1

Neutral species in inductively coupled SF6/SiCl4 plasmas

Corinne Y. Duluard , Pierre Ranson , Laurianne E. Pichon , El-Houcine Oubensaid , Jeremy Pereira et al.
Journal of Physics D: Applied Physics, 2009, 42, pp.115206
Article dans une revue hal-00396438 v1

Effect of the addition of SF6 and N2 in inductively coupled SiCl4 plasma for GaN etching

El-Houcine Oubensaid , Corinne Y. Duluard , Laurianne E. Pichon , Jeremy Pereira , Mohamed Boufnichel et al.
Semiconductor Science & Technology, 2009, 24, pp.075022. ⟨10.1088/0268-1242/24/7/075022⟩
Article dans une revue istex hal-00400936 v1

In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Christophe Cardinaud , Corinne Y. Duluard et al.
Applied Physics Letters, 2009, 94, pp.071501. ⟨10.1063/1.3085957⟩
Article dans une revue hal-00365892 v1

SO2 passivating chemistry for silicon cryogenic deep etching

Corinne Y. Duluard , Remi Dussart , Thomas Tillocher , Laurianne E. Pichon , Philippe Lefaucheux et al.
Plasma Sources Science and Technology, 2008, 17, pp.045008. ⟨10.1088/0963-0252/17/4/045008⟩
Article dans une revue istex hal-00349344 v1
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Direct measurements of the energy flux due to chemical reactions at the surface of a silicon sample interacting with a SF6 plasma

Remi Dussart , Anne-Lise Thomann , Laurianne E. Pichon , Larbi Bedra , Nadjib Semmar et al.
Applied Physics Letters, 2008, 93, pp.131502. ⟨10.1063/1.2995988⟩
Article dans une revue hal-00336392 v1

Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium

Thierry Dufour , Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Lawrence J. Overzet et al.
Applied Physics Letters, 2008, 93, pp.071508. ⟨10.1063/1.2966144⟩
Article dans une revue hal-00349341 v1
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Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium

Thierry Dufour , Remi Dussart , P Lefaucheux , P Ranson , Lawrence J. Overzet et al.
Applied Physics Letters, 2008, 93 (071508), ⟨10.1063/1.2966144͔⟩
Article dans une revue hal-01303157 v3

Two Cryogenic Processes Involving SF6, O2, and SiF4 for Silicon Deep Etching

Thomas Tillocher , Remi Dussart , Lawrence J. Overzet , Xavier Mellhaoui , Philippe Lefaucheux et al.
Journal of The Electrochemical Society, 2008, 155 (3), pp.D187. ⟨10.1149/1.2826280⟩
Article dans une revue hal-00349343 v1

Silicon cryo-etching of deep holes

Thomas Tillocher , Remi Dussart , Xavier Mellhaoui , Philippe Lefaucheux , Mohamed Boufnichel et al.
Microelectronic Engineering, 2007, 84, pp.1120. ⟨10.1016/j.mee.2007.01.148⟩
Article dans une revue istex hal-00365907 v1

The passivation layer formation in the cryo-etching plasma process

Remi Dussart , Xavier Mellhaoui , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel et al.
Microelectronic Engineering, 2007, 84, pp.1128. ⟨10.1016/j.mee.2007.01.048⟩
Article dans une revue istex hal-00365894 v1
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Oxidation threshold in silicon etching at cryogenic temperatures

Thomas Tillocher , Philippe Lefaucheux , Xavier Mellhaoui , Remi Dussart , Pierre Ranson et al.
Journal of Vacuum Science & Technology A, 2006, 24 (4), pp.1073. ⟨10.1116/1.2210946⟩
Article dans une revue hal-00365909 v1
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CURRENT DISTRIBUTION OF AC SURFACE DISCHARGES AND ASSOCIATED CHEMISTRY

Emmanuel Odic , Alice Goldman , Max Goldman , Marielle Dhainaut , Rémi Dussart
Journal of Electrostatics, 2006, 64 (7-9), pp.477-484
Article dans une revue hal-00221383 v1

Diagnostic system for plasma/surface energy transfer characterization

Anne Lise Thomann , Nadjib Semmar , Rémi Dussart , Jacky Mathias , Vladislav Lang
Review of Scientific Instruments, 2006, 77 (2), pp.033501-6
Article dans une revue hal-00097829 v1

Origin, control and elimination of undercut in silicon deep plasma etching in the cryogenic process

Mohamed Boufnichel , Philippe Lefaucheux , Said Aachboun , Rémi Dussart , Pierre Ranson
Microelectronic Engineering, 2005, 77, pp.327-336
Article dans une revue hal-00098398 v1

SiOxFy passivation layer in silicon cryoetching

Xavier Mellhaoui , Rémi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
Journal of Applied Physics, 2005, 98, pp.104901-10
Article dans une revue hal-00098638 v1

Cryogenic etching of SiOxFy and SiO2 in SF6/H2 plasma

Remi Dussart , Lawrence J. Overzet , Philippe Lefaucheux , Thomas Tillocher
Dry Process Symposium, Nov 2024, New Chitose, Japan
Communication dans un congrès hal-04824284 v1

SiC plasma etching technology processes for power and optoelectronic devices

Mihai Lazar , Nour Beydoun , Frédéric Marty , Elise Usureau , Enora Marion Vuillermet et al.
PESM 2024, IMEC Belgium, Jun 2024, Leuven (BE), Belgium
Communication dans un congrès hal-04797018 v1

La gravure plasma, une étape critique dans la technologie SiC. Mécanismes physico-chimiques et applications

Mihai Lazar , Nour Beydoun , Frédéric Marty , Elise Usureau , Enora Vuillermet et al.
Journées Renatech Litho/Gravure 2024, Jun 2024, Valbonne, France
Communication dans un congrès hal-04799422 v1

Optical emission spectroscopy analysis of Hydrogen Hβ spectral line in confined plasma

Elane Kouadou , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France
Communication dans un congrès hal-04606149 v1

Optical emission spectroscopy spatial characterization of a silicon based Micro Hollow Cathode Discharge operating in Helium in DC regime

Elane Kouadou , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
76th Annual Gaseous Electronics Conference, Oct 2023, Ann Arbor, United States
Communication dans un congrès hal-04134203 v1

Advances in optical diagnostics of Microplasmas: imaging and spectroscopy

Sylvain Iséni , Nelly Bonifaci , Ahmed Khacef , Volker Schulz-von Der Gathen , Goran Sretenović et al.
International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States
Communication dans un congrès hal-03633854 v1

Fabrication process and first charactesisation of novel silicon-based microplasma reactors

Elane Kouadou , Arnaud Stolz , Sylvain Iséni , Philippe Lefaucheux , Remi Dussart
International Workshop on Microplasmas (IWM 11), Jun 2022, Raleigh, United States
Communication dans un congrès hal-03698719 v1

Recent advances in micro-discharges ‒ sources and diagnostics

Sylvain Iséni , Nelly Bonifaci , Ahmed Khacef , Remi Dussart
MGK Colloquium - Transient Atmospheric Plasmas: from plasmas to liquids to solids, Apr 2021, Bochum, Germany
Communication dans un congrès hal-03218025 v1

Atomic Layer Etching of Gallium Nitride (GaN) using fluorinated chemistry

Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel
42nd International Symposium on Dry Process, Nov 2021, Online, Japan
Communication dans un congrès hal-03539418 v1

Plasma cryogenic etching : benefits of cooling the substrate at a low temperature in etching process technologies

Remi Dussart , Thomas Tillocher , Gaelle Antoun , Jack Nos , Philippe Lefaucheux et al.
42nd International Symposium on Dry Process, Nov 2021, Online, Japan
Communication dans un congrès hal-03539474 v1

SiOxFy layer deposition for cryogenic nanoscale etching

Gaelle Antoun , Thomas Tillocher , Philippe Lefaucheux , Jack Nos , Aurélie Girard et al.
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Communication dans un congrès hal-03539368 v1

Atomic layer etching of Gallium Nitride (GaN) using SF6 and Ar plasmas

Lamiae Hamraoui , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Mohamed Boufnichel
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Communication dans un congrès hal-03539383 v1

Physical mechanisms involved in silicon based plasma microreactors operating in DC

Remi Dussart , Ronan Michaud , Arnaud Stolz , Sylvain Iséni , Olivier Aubry et al.
5th Asia Pacific Conference on Plasma Physics (AAPPS-DPP2021), Association of Asia-Pacific Physical Societies and Division of Plasma Physics, Sep 2021, online - Kyushu University, Japan
Communication dans un congrès hal-03355293 v1

Études Spectroscopiques Aux Petites Échelles de Décharges à Haute Pression~: Intérêt Des Transitions Résonantes

Sylvain Iséni , Ronan Michaud , Cecile Pichard , Ahmed Khacef , Remi Dussart
Ecole Technologique Du Reseau Des Plasmas Froids, Sep 2020, Saint-Dié-des-Voges, France
Communication dans un congrès hal-03049312 v1

Resonance Broadening as a Valuable Diagnostic to Study Atmospheric Pressure Plasma \textendash ~Application to Micro-Plasmas

Sylvain Iséni , Cecile Pichard , Ronan Michaud , Remi Dussart , Ahmed Khacef
9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany
Communication dans un congrès hal-03049314 v1
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Atmospheric Plasma DC Source in the Micro Scale Elaborated by Micro-Nanotechnologies

Ronan Michaud , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
XXV Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXII), Jul 2022, Paris, France
Communication dans un congrès hal-03049315 v1

Resonance broadening as a valuable diagnostic to study atmospheric pressure plasma – application to micro-plasmas

Sylvain Iséni , Cécile Pichard , Ronan Michaud , Remi Dussart , Ahmed Khacef
9th International Workshop and Summer School on Plasma Spectroscopy (IPS 2020), Jun 2020, Greifswald, Germany
Communication dans un congrès hal-03374037 v1

Cryogenic process for Atomic Layer Etching

Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Kumiko Yamazaki et al.
Plasma Etch and Strip in Microtechnology, May 2019, Grenoble, France
Communication dans un congrès hal-02311291 v1

Atomic Layer Etching at cryogenic temperature

Gaëlle Antoun , Gaelle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart et al.
Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France
Communication dans un congrès hal-02311323 v1

Plasma processes applied to SiO2 cryo-atomic layer etching

Gaëlle Antoun , Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Tahara Shigeru et al.
XXXIV International Conference on Phenomena in Ionized Gases - 10th International Conference on Reactive Plasmas, Jul 2019, Sapporo, Japan
Communication dans un congrès hal-02311288 v1

Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids à haute pression: diagnostic des ondes d’ionisations et de micro-cavités

Sylvain Iséni , Cécile Pichard , Ronan Michaud , Remi Dussart , A. Khacef
1e Rencontres Scientifiques Plasmas Froids et Lasers, Nov 2019, Toulouse, France
Communication dans un congrès hal-02189173 v1

Intérêt des transitions résonnantes en spectroscopie pour les plasmas froids atmosphériques: diagnostic des ondes d’ionisations et de micro-cavités

Sylvain Iséni , A. Khacef , Ronan Michaud , Remi Dussart
25e Congrès Général de la Société Française de Physique, Jul 2019, Nantes, France
Communication dans un congrès hal-02189144 v1

Atomic Layer Etching at low substrate temperature

Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Kumiko Yamazaki et al.
19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, United States
Communication dans un congrès hal-02311308 v1

Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage

Romain Chanson , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Liping Zhang et al.
40th International Symposium on Dry Process, Nov 2018, Nagoya, France
Communication dans un congrès hal-02311275 v1

Bulk micromachined Titanium MEMS

Gwenaël Bécan , Baptiste Rousset , Samson Edmond , Nathalie Isac , Maïté Do Vale et al.
16th NAMIS Workshop (NAMIS 2018), Jun 2018, Oulu, Finland
Communication dans un congrès hal-02306373 v1

Vectorial Electric Field Characterization Of Plasmas Using An Optical Probe

Farah Aljammal , Gwenaël Gaborit , Laurence Galtier , Guillaume Revillod , Sylvain Iséni et al.
71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States
Communication dans un congrès hal-02018204 v1

Electro-optical probe for dielectric barrier discharge analysis

Farah Aljammal , Gwenaël Gaborit , Laurence Galtier , Guillaume Revillod , Sylvain Iséni et al.
45th IEEE International Conference on Plasma Science (ICOPS 2018), Jun 2018, Denver, United States
Communication dans un congrès hal-02017951 v1

The role of SiF4 physisorption in the cryogenic etching process of silicon

Gaëlle Antoun , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart , Tahara Shigeru et al.
40th International Symposium on Dry Process, Nov 2018, Nagoya, Japan
Communication dans un congrès hal-02311267 v1

Titanium-based MEMS: Application for a novel implantable feedthrough using TTV (Through Titanium Vias) technologies

Bertrand Boutaud , Edouard Laudrel , Marion Woytasik , Elie Lefeuvre , Thomas Tillocher et al.
6th Micro/Nano-Electronics Packaging and Assembly, Design and Manufacturing Forum (MiNaPAD 2018), May 2018, Grenoble, France
Communication dans un congrès hal-02306370 v1

Plasma properties of DC silicon based micro hollow cavity discharge (MHCD) operating in various gases - a spectroscopic study

Sylvain Iséni , Ronan Michaud , Claudia Lazzaroni , Philippe Lefaucheux , Volker Schulz-von Der Gathen et al.
71st Annual Gaseous Electronics Conference, Nov 2018, Portland, United States
Communication dans un congrès hal-02131687 v1

Cryo-etching mechanism characterization by in-situ spectroscopic ellipsometry

Remi Dussart , Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux
Surface Fest 2018, Jun 2018, Bordeaux, France
Communication dans un congrès hal-02311254 v1

Étude par spectroscopie d'émission de la température du gaz à l'intérieur et au voisinage d'une micro-cavité plasma (MHCD)

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenovic , V Schulz-von Der Gathen et al.
14e Journées du Réseau Plasmas Froids, Oct 2018, La Rochelle, France
Communication dans un congrès hal-01974867 v1

Microstructuration of titanium for implantable components

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Marion Woytasik , Fabrice Michel et al.
Journées Nationales sur les Technologies Emergentes en micro-nanofabrication, Nov 2017, Orléans, France
Communication dans un congrès hal-02306063 v1

Microdischarge integration on silicon based devices

Rémi Dussart , Remi Dussart
70th Gaseous Electronics Conference, Nov 2017, Pittsburgh, United States
Communication dans un congrès hal-01686038 v1

Low-Damage etching of highly porous OSG low-k dielectrics

Jean-Francois de Marneffe , Liping Zhang , Mikhail Baklanov , Koichi Yatsuda , Kaoru Maekawa et al.
SPIE Advanced Lithography 2016, Feb 2016, San José, United States
Communication dans un congrès hal-01280267 v1

Cryoetching mechanisms and STiGer process evaluation

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher
International Symposium on Dry Process 2016 (DPS 2016), Nov 2016, Sapporo, Japan
Communication dans un congrès hal-01561210 v1

Cryogenic processes for advanced material plasma etching

Remi Dussart , Thomas Tillocher , Philippe Lefaucheux
Quo vadis : Complex plasmas - TR 24, Aug 2016, Hambourg, Germany
Communication dans un congrès hal-01374747 v1

Effects of gas and surface temperatures during cryogenic etching of silicon with SF6/O2

Stefan Tinck , Erik Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
69th Gaseous Electronic Conference, Oct 2016, Bochum, France
Communication dans un congrès hal-01379701 v1

Numerical and experimental investigation of cryogenic etching of silicon and porous low-dielectric

Stefan Tinck , Thomas Tillocher , Remi Dussart , Erik Neyts , Annemie Bogaerts
International Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan
Communication dans un congrès hal-01561212 v1

Enhanced lifetime for thin-dielectric microdischarge-arrays operating in DC

Remi Dussart , Valentin Félix , Lawrence J. Overzet , Olivier Aubry , Arnaud Stolz et al.
69th Gaseous Electronic Conference, Oct 2016, Bochum, Germany
Communication dans un congrès hal-01379698 v1

Bulk titanium deep etching by plasma processes

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
, 20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France
Communication dans un congrès hal-01166023 v1

Cryoetching processes applied to ULK material

Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Koichi Yatsuda et al.
37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan
Communication dans un congrès hal-01228477 v1

DC and AC microplasmas on silicon : performances and limitations

Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux et al.
Asian-European Plasma Surface Engineering, Masaru Hori, Sep 2015, Jeju, South Korea
Communication dans un congrès hal-01217651 v1
Image document

Cryoetching processes applied to ULK material

Floriane Leroy , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christian Dussarat et al.
37th International Symposium on Dry process , Nov 2015, Awaji, Japan
Communication dans un congrès hal-01287233 v1

Ignition phase of a silicon-based microdischarge array with excitation by burst waveforms

Judith Golda , Valentin Felix , Remi Dussart , Lawrence J. Overzet , V. Schulz-von Der Gathen
International workshop on microplasmas, May 2015, Newark, United States
Communication dans un congrès hal-01166021 v1

Cryogenic etching of silicon with SF6/O2/SiF4 plasmas: a modelling and experimental study

Stefan Tinck , E.C. Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium
Communication dans un congrès hal-01228451 v1

Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process

Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda et al.
22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium
Communication dans un congrès hal-01228448 v1

Energy flux diagnostics in thin film deposition by magnetron sputtering

Anne-Lise Thomann , Amaël Caillard , El Mokh Mariem , Nadjib Semmar , Remi Dussart et al.
XXXII International Conference on Phenomena in Ionized Gases (ICPIG), Jul 2015, Iasi, Romania
Communication dans un congrès hal-01290726 v1

Plasma Cryogenic Etching: from 3D Integration to Low-k Materials

Thomas Tillocher , Remi Dussart , Floriane Leroy , Philippe Lefaucheux , Mohamed Boufnichel et al.
China Semiconductor Technology International Conference, Mar 2015, Shanghai, China
Communication dans un congrès hal-01151533 v1

Surface state improvement in GaN deep etching for power electronics applications

Nicolas Gosset , Floriane Leroy , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux et al.
37th International Symposium on Dry Process (DPS 2015), Nov 2015, Awaji Island, Japan
Communication dans un congrès hal-01228470 v1

Cryogenic Etching of Porous Organosilicate Low-k Materials: Fluorine based plasma analysis

Floriane Leroy , Thomas Tillocher , Liping Zhang , A. Girard , Christophe Cardinaud et al.
Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium
Communication dans un congrès hal-01151528 v1

Performances and limitations of DC microdischarges on silicon platforms

Remi Dussart , Valentin Felix , Olivier Aubry , Philippe Lefaucheux
20th International Colloquium on Plasma Processes (CIP), Jun 2015, Saint-Etienne, France
Communication dans un congrès hal-01166022 v1

Performances and instabilities of silicon based microdischarges

Remi Dussart , Valentin Felix , Lawrence J. Overzet , Olivier Aubry , Philippe Lefaucheux et al.
International workshop on microplasmas, May 2015, Newark, United States
Communication dans un congrès hal-01166019 v1

DRY DEEP ETCHING OF BULK TITANIUM BY PLASMA PROCESSES

Edouard Laudrel , Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Communication dans un congrès hal-01228465 v1

Submicronic etched features of silicon with high aspect ratio obtained by cryogenic plasma deep-etching through perforated polymer thin films

Alexane Vital , Mohamed Boufnichel , Remi Dussart , Nicolas Gosset , Philippe Lefaucheux et al.
2015 MRS Spring Meeting & Exhibit, Apr 2015, San francisco, United States
Communication dans un congrès hal-01151542 v1

Cryogenic etching of porous organosilicate low-k materials: Reduction of plasma induced damage

Floriane Leroy , Thomas Tillocher , Liping Zhang , Philippe Lefaucheux , Koichi Yatsuda et al.
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Communication dans un congrès hal-01228458 v1

Reduction of plasma induced damage in cryogenic etching of low-k materials

Thomas Tillocher , Floriane Leroy , Liping Zhang , Philippe Lefaucheux , Christian Dussarat et al.
4th French Symposium on Emerging Technologies for micro-nanofabrication, Nov 2015, Ecully, France
Communication dans un congrès hal-01277115 v1

Low damage cryoetching of low-K materials

Remi Dussart , Thomas Tillocher , Floriane Leroy , Philippe Lefaucheux , Koichi Yatsuda et al.
SPIE Advanced Lithography 2015, Feb 2015, San José, United States
Communication dans un congrès hal-01151543 v1

Limitation of surface defects in deep GaN etching

Nicolas Gosset , Thomas Tillocher , Floriane Leroy , Julien Ladroue , Philippe Lefaucheux et al.
AVS 62nd International Symposium & Exhibition, Oct 2015, San Jose, United States
Communication dans un congrès hal-01228462 v1

A novel low temperature etch approach to reduce ULK plasma damage

Liping Zhang , Jean-Francois de Marneffe , Floriane Leroy , Rami Ljazouli , Philippe Lefaucheux et al.
Plasma Etch and Strip in Microtecnology, Apr 2015, Leuven, Belgium
Communication dans un congrès hal-01151524 v1

Cryogenic Etching of Silicon with SF6/O2/SiF4 plasmas: a modeling and experimental study

Stefan Tinck , Erik Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium
Communication dans un congrès hal-01151530 v1

Low damage cryogenic etching of low-K materials for advanced interconnects

Mikhail Baklanov , Liping Zhang , Jean-Francois de Marneffe , Remi Dussart , Andy Goodyear
Materials for Advanced Metallization, Mar 2014, Dresden, Germany
Communication dans un congrès hal-01006369 v1

Multiscale etching of holes by cryogenic silicon etching

Thomas Tillocher , Xiao Liu , Alexane Vital , Nicolas Gosset , Philippe Lefaucheux et al.
Plasma Etch and Strip in Microtechnology, May 2014, Gernoble, France
Communication dans un congrès hal-01057242 v1

Study of energy transfers at the substrate during “transition steps” in magnetron sputter deposition

Anne-Lise Thomann , El Mariem , Amaël Caillard , Nadjib Semmar , Thomas Lecas et al.
14th International Conference on Plasma Surface Engineering PSE 2014 , Sep 2014, Garmisch-Partenkirchen, Germany
Communication dans un congrès hal-01289446 v1

Spectroscopic investigations of transient processes in micro-cavity discharge reactors

V. Schulz-von Der Gathen , Judith Golda , Daniel Schröder , H. Boettner , Arthur Greb et al.
International Symposium on Non-equilibrium Plasmas and Complex Systems, Feb 2014, Osaka, Japan
Communication dans un congrès hal-01006368 v1

Cryogenic etching of submicronic features in silicon using masks based on porous polymer films

Thomas Tillocher , Alexane Vital , Marylène Vayer , Nicolas Gosset , Philippe Lefaucheux et al.
226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico
Communication dans un congrès hal-01151839 v1

Improvement of GaN Deep Etched Surface State by Fluorination Dedicated to Power Devices

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel et al.
226th meeting of the Electrochemical Society, Oct 2014, Cancun, Mexico
Communication dans un congrès hal-01151851 v1

Submicrometric structured silicon surfaces obtained from polymer blend film by silica replication and cryogenic plasma etching

Alexane Vital , Thomas Tillocher , Remi Dussart , Marylène Vayer , Christophe Sinturel
Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France
Communication dans un congrès hal-01057586 v1

Effect of surface fluorination on GaN deep dry etching defects

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel et al.
Plasma Etch and Strip in Microtechnology, May 2014, Grenoble, France
Communication dans un congrès hal-01057239 v1

Plasma cryoetching processes for silicon and advanced materials

Remi Dussart , Thomas Tillocher , Nicolas Gosset , Alexane Vital , Philippe Lefaucheux et al.
International Conference on Microelectronics and Plasma Technology, Jul 2014, Gunsan, South Korea
Communication dans un congrès hal-01057585 v1

Cryoetching of Silicon and Advanced Materials for 3D Interconnects

Remi Dussart , Thomas Tillocher , Nicolas Gosset , Philippe Lefaucheux , Mohamed Boufnichel et al.
226th meeting of the Electroschemical Society, Oct 2014, Cancun, Mexico
Communication dans un congrès hal-01151844 v1

Integrated microplasmas on silicon: performances and limitations

Remi Dussart , Mukesh Kulsreshath , Valentin Félix , Lawrence J. Overzet , Judith Golda et al.
19th International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-01056618 v1

Plasma deep etching of silicon, titanium and gallium nitride for microtechnology

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Nicolas Gosset , Julien Ladroue et al.
AVS 60th International Symposium & Exhibition, Oct 2013, United States
Communication dans un congrès hal-01006364 v1

Titanium deep etching for medical applications

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States
Communication dans un congrès hal-01057236 v1

Damage Free Cryogenic Etching of Ultra Low-k Materials

Mikhail Baklanov , Liping Zhang , Jean-Francois de Marneffe , Remi Dussart
International Interconnect Technology Conference, Jun 2013, Kyoto, Japan
Communication dans un congrès hal-01056603 v1

Applications of cryogenic plasma etching for microtechnology and advanced CMOS manufacturing

Remi Dussart , Philippe Lefaucheux , Thomas Tillocher , Pierre Ranson , Mohamed Boufnichel et al.
Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium
Communication dans un congrès hal-00831344 v1

Reproducible process for titanium deep etching

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
19th International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-01057233 v1

Reproducible process for Titanium deep etching

Thomas Tillocher , Philippe Lefaucheux , Bertrand Boutaud , Remi Dussart
Plasma Etch and Strip in Microtechnology, Mar 2013, Louvain, Belgium
Communication dans un congrès hal-00831358 v1

Deep etching processes for silicon micro- and nano-machining

Thomas Tillocher , Philippe Lefaucheux , Remi Dussart
Le Studium workshop : Bottom-up approaches to nanotechnology, May 2013, Orléans, France
Communication dans un congrès hal-00831360 v1

Spectroscopic Diagnostics of Ceramic MHCDs

Judith Golda , V Schulz-von Der Gathen , Valentin Félix , Remi Dussart , Philippe Lefaucheux et al.
International Workshop on Microplasmas, May 2013, Pékin, China
Communication dans un congrès hal-00831354 v1

Plasma surface interactions in deep dry etching

Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel , Remi Dussart
Workshop on particle - surface interactions : from surface analysis to materials processing, Jun 2013, Luxembourg, Luxembourg
Communication dans un congrès hal-00831337 v1

Energy flux measurements at the substrate deposition during reactive and non-reactive magnetron sputter deposition processes

Pierre-Antoine Cormier , A. Balhamri , Anne Lise Thomann , Remi Dussart , Nadjib Semmar et al.
19th International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-01166024 v1

On Causes of the Destruction of MHCD Sources During Operation

Lawrence J. Overzet , Valentin Felix , Remi Dussart , Philippe Lefaucheux , Mukesh Kulsreshath et al.
International Workshop on Microplasmas, May 2013, Pékin, China
Communication dans un congrès hal-00831363 v1

RF Diagnostics of Microplasmas

Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen et al.
International Workshop on Microplasmas, May 2013, Pékin, China
Communication dans un congrès hal-00831362 v1

Dry deep etching of GaN wide band-gap Semiconductor

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel et al.
AVS 60th International Symposium & Exhibition, Oct 2013, Long Beach, United States
Communication dans un congrès hal-01057235 v1

Dry deep etching of GaN wide-bandgap semiconductor

Nicolas Gosset , Julien Ladroue , Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel et al.
19th International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-01056606 v1

Deep etching of gallium nitride by chlorine based plasma

Remi Dussart , Julien Ladroue , Thomas Tillocher , Mohamed Boufnichel , Nicolas Gosset et al.
Journées Nationales des Technologies Emergentes, May 2013, Evian, France
Communication dans un congrès hal-00831346 v1

Radio Frequency Diagnostics of Microplasmas

Lawrence J. Overzet , Matthew Goeckner , Remi Dussart , Philippe Lefaucheux , Valentin Félix et al.
Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands
Communication dans un congrès hal-00831368 v1

RF diagnostics performed on DC Microplasmas

Valentin Félix , Remi Dussart , Mukesh Kulsreshath , Philippe Lefaucheux , V. Schulz-von Der Gathen et al.
19th International Vacuum Conference, Sep 2013, Paris, France
Communication dans un congrès hal-01056614 v1

Development and limitations of microplasma arrays on silicon operating in DC

Remi Dussart , Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux et al.
AVS 59th International Symposium and Exhibition, Oct 2012, United States
Communication dans un congrès hal-00747741 v1

Damage free cryogenic etching of porous organosilicate low-k films for advanced interconnect application

Liping Zhang , Rami Ljazouli , Philippe Lefaucheux , Thomas Tillocher , Remi Dussart et al.
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Communication dans un congrès hal-00747749 v1

Deep GaN Etching : Role of SiCl4 in Plasma Chemistry

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Communication dans un congrès hal-00747746 v1

Investigations in SF6 and Cl2/Ar plasmas used for titanium deep etching by means of mass spectrometry

Thomas Tillocher , Judith Golda , Philippe Lefaucheux , Bertrand Boutaud , Pierre Ranson et al.
ESCAMPIG 2012, Jul 2012, Viana do Castelo, Portugal
Communication dans un congrès hal-00831352 v1

Development and characterization of microplasma arrays on Silicon

Remi Dussart , Thierry Dufour , Mukesh Kulsreshath , Valentin Felix , Laurent Schwaederlé et al.
International Workshop on Physics of Microplasmas, May 2012, Bochum, Germany
Communication dans un congrès hal-00707932 v1

Development of microdicharges in silicon operating in DC for medical applications

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias et al.
4th International Conference on Plasma Medecine, Jun 2012, Orléans, France
Communication dans un congrès hal-00831349 v1

Balanced/unbalanced planar magnetron plasma behaviour. Microscopic analysis by PIC-MCC modelling of the ion flux on thermal probes

Tiberiu Minea , Lise Caillault , Pierre-Antoine Cormier , Remi Dussart , Nadjib Semmar et al.
13th International Conference on Plasma Surface Engineering PSE 2012, Sep 2012, Garmisch-Partenkirchen, Germany
Communication dans un congrès hal-01288936 v1

Development of microdicharge arrays in silicon operating in DC and AC

Mukesh Kulsreshath , Laurent Schwaederlé , Lawrence J. Overzet , Thomas Tillocher , Sébastien Dozias et al.
European Physical Society/International Conference on Plasma Physics, Jul 2012, Stockholm, Sweden
Communication dans un congrès hal-00831351 v1

Integrated microplasmas on silicon: a new tool for lab-on-a-chip applications

Remi Dussart , Mukesh Kulsreshath , Valentin Felix , Lawrence J. Overzet , Thomas Tillocher et al.
Cancer Cells On Chip, Jun 2012, Lyon, France
Communication dans un congrès hal-00707933 v1

Caractérisation de matrices de micro plasmas sur silicium

Mukesh Kulsreshath , Laurent Schwaederlé , Valentin Felix , Philippe Lefaucheux , Thomas Tillocher et al.
XIIeme congrès de la division Plasmas de la Société Française de Physique, May 2012, Orléans, France
Communication dans un congrès hal-00707935 v1

Formation of black silicon by cryogenic plasma etching processes

Thomas Tillocher , Jérémy Pereira , Nasreddine Mekkakia Maaza , Philippe Lefaucheux , Pierre Ranson et al.
Micro- and Nano-Engineering (MNE), Sep 2012, Toulouse, France
Communication dans un congrès hal-00831357 v1

Optimization of STiGer process used to etch high aspect ratio silicon microstructures

Thomas Tillocher , Philippe Lefaucheux , Julien Ladroue , Mohamed Boufnichel , Pierre Ranson et al.
AVS 59th International Symposium and Exhibition, Oct 2012, Tampa, United States
Communication dans un congrès hal-00747743 v1

Advantages of energy influx measurements in low pressure plasma processes

Pierre-Antoine Cormier , Anne-Lise Thomann , Nadjib Semmar , Remi Dussart , Vincent Dolique et al.
International Conference on Plasma Surface Engineering, Sep 2012, Garmisch-Partenkirchen, Germany
Communication dans un congrès hal-00831371 v1

Micro plasma reactor arrays made in silicon

Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , H. Boettner , V. Schulz-von Der Gathen et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00707927 v1

Direct energy influx measurements between a biased substrate and a low pressure plasma

Pierre-Antoine Cormier , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar , Jacky Mathias
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00707930 v1

Deep Gallium Nitride Etching: ways to avoid etching defects

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Mar 2011, Nagoya, Japan
Communication dans un congrès hal-00696396 v1

Characterization of the ignition and the extinction of a Micro Hollow Cathode Discharge

Remi Dussart , N. Sadeghi , Lawrence J. Overzet , Mukesh Kulsreshath , Laurent Schwaederlé et al.
6th International Workshop on Microplasmas, Apr 2011, Paris, France
Communication dans un congrès hal-00707924 v1

Deep GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
HeteroSiC-WASMPE 2011, Jun 2011, Tours, France
Communication dans un congrès hal-00696418 v1

Obtaining a smooth surface after deep GaN etching

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00696419 v1

Energy influx measurements in low pressure plasmas for material processing

Anne-Lise Thomann , Pierre-Antoine Cormier , Remi Dussart , Nadjib Semmar , Jacky Mathias et al.
Innovations in Thin Film Processing and Characterisation, and Magnetron, Ion Processing and Arc Technologies European Conference, ITFPC-MIATEC 2011 , Nov 2011, Nancy, France
Communication dans un congrès hal-01289043 v1

Characterisation of Silicon based micro discharge plasma arrays in Direct Current (DC) at atmospheric pressure

Mukesh Kulsreshath , Laurent Schwaederlé , Philippe Lefaucheux , Thomas Tillocher , Julien Ladroue et al.
6th International Workshop on Microplasmas, Apr 2011, Paris, France
Communication dans un congrès hal-00707925 v1

Microcathode sustained discharges using Si integrated micro-reactors

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Remi Dussart , Philippe Lefaucheux et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00707929 v1

Microcathode sustained discharges using Si integrated micro-discharges arrays

Laurent Schwaederlé , Mukesh Kulsreshath , Lawrence J. Overzet , Philippe Lefaucheux , Remi Dussart
6th International Workshop on Microplasmas, Apr 2011, France, France
Communication dans un congrès hal-00707926 v1

Deep etching of bulk titanium by plasma

Thomas Tillocher , Julien Ladroue , Wassim Kafrouni , Mukesh Kulsreshath , Philippe Lefaucheux et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00696425 v1

STiGer process for silicon deep etching: extended scalloping reduction on submicron trenches

Wassim Kafrouni , Thomas Tillocher , Julien Ladroue , Philippe Lefaucheux , Mohamed Boufnichel et al.
18th International Colloquium on Plasma Processes (CIP), Jul 2011, Nantes, France
Communication dans un congrès hal-00696422 v1

Deep silicon etching of 0.8 µm to hundreds of microns wide trenches with the STiGer process

Thomas Tillocher , Wassim Kafrouni , Julien Ladroue , Philippe Lefaucheux , Pierre Ranson et al.
AVS 58th International Symposium & Exhibition, Oct 2011, Nashville, United States
Communication dans un congrès hal-00696428 v1

Direct energy influx measurements in high power impulse sputtering

Pierre-Antoine Cormier , Balharmi A. , Anne-Lise Thomann , Stephanos Konstantinidis , Remi Dussart et al.
2nd International Conference on HiPIMS, HiPIMS2011 , Jun 2011, Braunschweig, Germany
Communication dans un congrès hal-01288780 v1

Micro Hollow Cathode Discharge Arrays in silicon devices

Remi Dussart , Mukesh Kulsreshath , Lawrence J. Overzet , Laurent Schwaederlé , Thomas Tillocher et al.
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Communication dans un congrès hal-00681902 v1

Deep GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France
Communication dans un congrès hal-00487363 v1

RF Diagnostics of Atmospheric Pressure Micro-Plasmas

Lawrence J. Overzet , Monali Mandra , D. Jung , Thierry Dufour , Remi Dussart et al.
Diagnostics Microplasmas, Mar 2010, Germany
Communication dans un congrès hal-00487366 v1

Comparaison d'une sonde calorimétrique et d'un capteur à thermopile pour la mesure des transferts d'énergie plasma basse pression/surface

Nadjib Semmar , Pierre-Antoine Cormier , Anne Lise Thomann , Rémi Dussart , Jacky Mathias et al.
Congrès Français de Thermique, May 2010, Le Touquet, France. pp.755-760
Communication dans un congrès hal-00504417 v1

Les Microdécharges en France

Remi Dussart
Journées Plasma Québec du Réseau Plasma Froid, Jun 2010, France
Communication dans un congrès hal-00503123 v1

Micro-discharge plasma using silicon platform

Mukesh Kulsreshath , Thierry Dufour , Philippe Lefaucheux , Olivier Aubry , Sébastien Dozias et al.
AVS 57th International Symposium & Exhibition, Oct 2010, Albuquerque, United States
Communication dans un congrès hal-00707922 v1

Deep Gallium Nitride Etching

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Communication dans un congrès hal-00696376 v1

Ignition and extinction of a Micro Hollow Cathode Discharge operating in DC regime

Remi Dussart , Mukesh Kulsreshath , Thierry Dufour , Lawrence J. Overzet , Philippe Lefaucheux et al.
AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States
Communication dans un congrès hal-00696390 v1

Gravure du GaN pour la prochaine génération de diodes Schottky

Julien Ladroue , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson
Workshop MNTS 12-20, Minatec, Mar 2010, Grenoble, France
Communication dans un congrès hal-00487358 v1

Silicon deep cryoetching with the STiGer process

Thomas Tillocher , Vincent L. Girault , Guillaume Gomme , Franck Moro , Laurianne E. Pichon et al.
3RD WORKSHOP ON PLASMA ETCH AND STRIP IN MICROELECTRONICS, Mar 2010, France
Communication dans un congrès hal-00487360 v1

Deep Inductively Coupled Plasma Etching of GaN

Julien Ladroue , Mohamed Boufnichel , Thomas Tillocher , Philippe Lefaucheux , Pierre Ranson et al.
AVS 57th International Symposium & Exhibition, Nov 2010, Albuquerque, United States
Communication dans un congrès hal-00696393 v1

Optimization of STiGer process for silicon deep etching

Thomas Tillocher , Wassim Kafrouni , Vincent Girault , Julien Ladroue , Philippe Lefaucheux et al.
63rd Gaseous Electronics Conference, Oct 2010, Paris, France
Communication dans un congrès hal-00696366 v1

Study of an MHCD operating in He using optical and electrical diagnostics

Remi Dussart , Thierry Dufour , Thomas Tillocher , Mukesh Kulsreshath , Olivier Aubry et al.
Diagnostics Microplasmas, Mar 2010, Germany
Communication dans un congrès hal-00487365 v1

STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances

Jeremy Pereira , Hao Jiang , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard et al.
Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium
Communication dans un congrès hal-00444370 v1

Electrical Characterization of Direct Current Atmospheric Pressure Micro-Discharges Using Radio Frequency Signals in Argon

Monali Mandra , Lawrence J. Overzet , Matthew Goeckner , Thierry Dufour , Remi Dussart et al.
62nd Gaseous Electronics Conference, Oct 2009, Saratoga Springs, United States
Communication dans un congrès hal-00444482 v1

STiGer cryoetching process on silicon : results on performances for 0.8 um trenches

Vincent L. Girault , Remi Dussart , Laurianne E. Pichon , Jeremy Pereira , Philippe Lefaucheux et al.
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Communication dans un congrès hal-00444466 v1

Direct measurement of energy transfers during deposition of sputtered metal atoms

Larbi Bedra , Anne-Lise Thomann , Nadjib Semmar , Rémi Dussart , Jacky Mathias
17th International Colloquium on Plasma Processes, CIP 09, Jun 2009, Marseille, France
Communication dans un congrès hal-00445581 v1

Inductively Coupled Plasma Etching of GaN and Induced Defects

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson et al.
AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States
Communication dans un congrès hal-00444488 v1

Ignition and characterization of Micro Hollow Cathode Discharges in Helium

Thierry Dufour , Remi Dussart , Lawrence J. Overzet , Monali Mandra , Jeong Bong Lee et al.
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Communication dans un congrès hal-00444380 v1

GaN Etching by Inductively Coupled Plasma

Julien Ladroue , Aline Meritan , Mohamed Boufnichel , Philippe Lefaucheux , Pierre Ranson et al.
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Communication dans un congrès hal-00444471 v1

A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching

Corinne Y. Duluard , Thomas Tillocher , Laurianne E. Pichon , Remi Dussart , Philippe Lefaucheux et al.
AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States
Communication dans un congrès hal-00442683 v1

Experiment and simulation results of limited cathode area MHCDs operating in He

Remi Dussart , Thierry Dufour , Lawrence J. Overzet , Monali Mandra , Jeong Bong Lee et al.
AVS 56th International Symposium & Exhibition, Nov 2009, San Jose, United States
Communication dans un congrès hal-00444491 v1

Formation of Columnar MicroStructures of silicon (CMS) in SF6/O2 plasma in cryogenic conditions

Jeremy Pereira , Remi Dussart , Laurianne E. Pichon , Vincent L. Girault , Philippe Lefaucheux et al.
17th International Colloquium on Plasma Processes, Jun 2009, Marseille, France
Communication dans un congrès hal-00444402 v1

A direct measurement of the energy flux density in plasma surface interaction

Rémi Dussart , Anne-Lise Thomann , Nadjib Semmar , Laurianne E. Pichon , Larbi Bedra et al.
61st Gaseous Electronics Conference, 2008, United States
Communication dans un congrès hal-00448760 v1

Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge

Jeremy Pereira , Laurianne E. Pichon , Remi Dussart , Corinne Y. Duluard , El-Houcine Oubensaid et al.
AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States
Communication dans un congrès hal-00444361 v1

New Approach of Heat Transfer Characterization on Thin Si and Cu Solids.-Effects of Thermal Contact Resistance

Larbi Bedra , Nadjib Semmar , Anne-Lise Thomann , Rémi Dussart , Jacky Mathias
5th European Thermal-Sciences Conference, Eutrotherm 2008, May 2008, Netherlands. pp.101-106
Communication dans un congrès hal-00443101 v1

Direct measurements of the energy transfers in deposition or etching low pressure plasma processes

Anne-Lise Thomann , Rémi Dussart , Nadjib Semmar , Larbi Bedra , Jacky Mathias et al.
11th International Conference on Plasma Surface Engineering, PSE2008, Sep 2008, Garmisch-Partenkirchen, Germany
Communication dans un congrès hal-00445589 v1

Micro transfert d'énergie dans un solide mince : effet de la résistance thermique de contact

Larbi Bedra , Nadjib Semmar , Anne-Lise Thomann , Rémi Dussart , Jacky Mathias et al.
Congrès Français de Thermique, SFT 2008, Jun 2008, Toulouse, France. pp.385-390
Communication dans un congrès hal-00443715 v1

Ignition of parallel Micro Hollow Cathode Discharges in He without ballasts

Thierry Dufour , Monali Mandra , Matthew Goeckner , Philippe Lefaucheux , Pierre Ranson et al.
61st Gaseous Electronics Conference, Oct 2008, Dallas, United States
Communication dans un congrès hal-00444346 v1

SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature

Laurianne E. Pichon , Corinne Y. Duluard , Thomas Tillocher , Remi Dussart , Philippe Lefaucheux et al.
18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105
Communication dans un congrès hal-00444241 v1

Limitation of the cathode area for direct current MHCD in Helium

Thierry Dufour , Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Monali Mandra et al.
4th International Workshop on Microplasmas, Oct 2007, Tainan, Taiwan
Communication dans un congrès hal-00444267 v1

Enhanced robustness of the cryogenic process for silicon deep etching

Remi Dussart , Thomas Tillocher , El-Houcine Oubensaid , Philippe Lefaucheux , Pierre Ranson et al.
Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark
Communication dans un congrès hal-00444248 v1

Submicronic Etching in the Cryogenic Process

Nasreddine Mekkakia Maaza , Remi Dussart , Philippe Lefaucheux , Pierre Ranson
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Communication dans un congrès hal-00442684 v1

A robust passivation-enhanced cryogenic process used for deep silicon etching

Laurianne E. Pichon , El-Houcine Oubensaid , Corinne Y. Duluard , Remi Dussart , Philippe Lefaucheux et al.
AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States
Communication dans un congrès hal-00444264 v1

Cryoetching of silicon for MEMS and microelectronic components

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard et al.
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès hal-00442662 v1

Global evaluation of the energy transfer between an ICP argon plasma and a surface

Rémi Dussart , Anne-Lise Thomann , Nadjib Semmar , Laurianne E. Pichon , Jacky Mathias et al.
Internatinal Symposium on Plasma Chemistry, ISPC-18, Aug 2007, Kyoto, Japan. 28p-5
Communication dans un congrès hal-00443518 v1

A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy

Corinne Y. Duluard , Remi Dussart , Laurianne E. Pichon , Philippe Lefaucheux , Michel Puech et al.
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès hal-00444208 v1

Control of the ignition of direct current parallel microdischarges in helium

Thierry Dufour , Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Jeong B. Lee et al.
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès hal-00442687 v1

A new generation of cryogenic processes for silicon deep etching

Remi Dussart
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00365911 v1

A new generation of cryogenic processes for silicon deep etching

Remi Dussart , Philippe Lefaucheux , Pierre Ranson , Laurianne E. Pichon , Corinne Y. Duluard et al.
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00442668 v1

Fabrication process and electrical characterization of direct current parallel microdischarges in helium

Monali Mandra , Remi Dussart , Jeong Bong Lee , Matthew Goeckner , Thierry Dufour et al.
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00444259 v1

Neutral production in SF6/SiCl4 inductively coupled plasmas

Corinne Y. Duluard , Remi Dussart , Laurianne E. Pichon , El-Houcine Oubensaid , Philippe Lefaucheux et al.
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès hal-00444252 v1

Direct current parallel microdischarges in helium

Remi Dussart , Thierry Dufour , Lawrence J. Overzet , Philippe Lefaucheux , Pierre Ranson et al.
International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.27A-a3
Communication dans un congrès hal-00444228 v1

SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature

Remi Dussart , Laurianne E. Pichon , Corinne Y. Duluard , Philippe Lefaucheux , Mohamed Boufnichel et al.
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Communication dans un congrès hal-00444198 v1
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Direct current parallel microdischarges in helium

Thierry Dufour , Remi Dussart , Lawrence J. Overzet , Philippe Lefaucheux , Pierre Ranson et al.
ISPC-18, Aug 2007, Kyoto, Japan
Communication dans un congrès hal-01303260 v2

Electrical and spectroscopic study of DC microdischarges made in alumina

Remi Dussart , Lawrence J. Overzet , Thierry Dufour , Philippe Lefaucheux
3rd International Workshop on Microplasmas, May 2006, Greifswald, Germany
Communication dans un congrès hal-00442675 v1

Mise au point d'un micro-fluxmètre pour la caractérisation des transferts d'énergie dans un plasma d'argon

Nadjib Semmar , Anne-Lise Thomann , Rémi Dussart , Jacky Mathias
Congrès Français de Thermique, SFT 2006, May 2006, Île de Ré, France. pp.727-732
Communication dans un congrès hal-00443914 v1

SiOxFy passivation layer characterization in the silicon cryoetching

Xavier Mellhaoui , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux , Lawrence J. Overzet et al.
Eighth International Conference on Advanced Surface Engineering (8th ICASE), Apr 2006, Japan
Communication dans un congrès hal-00442663 v1

Mechanisms and optimization in the cryogenic etching plasma process

Thomas Tillocher , Remi Dussart
Workshop on Silicon dry processing, Sep 2006, Aix-La-Chapelle, Germany
Communication dans un congrès hal-00442676 v1

Diagnostic des plasma par micro-fluxmètre

Anne-Lise Thomann , Nadjib Semmar , Rémi Dussart , Jacky Mathias
Congrès de la division plasma de la SFP, 2006, May 2006, Pont-à-Mousson, France
Communication dans un congrès hal-00448844 v1

Experimental study of the gas breakdown in a controlled nanometer scale electrode gap

Baptiste Disson , Sylvain Iséni , Olivier Lesaint , Christophe Poulain , Remi Dussart et al.
International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France.
Poster de conférence hal-04606154 v1

Self-Pulsing and instabilities in silicon-based Micro Hollow Cathode Discharge operating in DC excitation

Elane Kouadou , Sylvain Iséni , Arnaud Stolz , Philippe Lefaucheux , Remi Dussart
International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France.
Poster de conférence hal-04607593 v1

MHCD in N2-H2 mixtures: towards a localized plasma nitriding process?

Cédric Noël , Grégory Marcos , Sylvain Iséni , S. Bruyere , Thierry Czerwiec et al.
International Workshop on Microplasmas (IWM 12), Jun 2024, Orléans (Auditorium du Musée des Beaux Arts), France.
Poster de conférence hal-04607581 v1

Experimental study of argon breakdown in a nanometer scale electrode gap

Baptiste Disson , Nelly Bonifaci , Olivier Lesaint , Christophe Poulain , Remi Dussart et al.
27th International School on "Low Temperature Plasma Physics: Basics and Applications", Oct 2024, Orléans (Auditorium du Musée des Beaux Arts), Germany.
Poster de conférence hal-04728032 v1

Profils de raies en spectroscopie d'émission optique appliqués au diagnostic de micro-plasmas

Sylvain Iséni , Elane Kouadou , Thalita Nishime , Torsten Gerling , Remi Dussart
Journées 2023 Groupement de Recherche (GdR) étude des milieux ionisés Plasmas froids créés par décharge et laser (EMILI), Oct 2023, Nancy, France
Poster de conférence hal-04194636 v1

Micro-fabricated silicon-based microplasma reactors

Elane Kouadou , Arnaud Stolz , Philippe Lefaucheux , Sylvain Iséni , Olivier Aubry et al.
Journées Nationales sur les Technologies Emergentes (JNTE22), Nov 2022, Besançon (France), France
Poster de conférence hal-03881662 v1

Cryo-ALE of Si based on SF6 physisorption

Jack Nos , Thomas Tillocher , Philippe Lefaucheux , Jacques Faguet , Kaoru Maekawa et al.
PLATHINIUM (Plasma Thin film International Union Meeting) 2021, Sep 2021, Antibes, France
Poster de conférence hal-03539330 v1

MEMS based nanofluidics device for the study of the nonlinear dynamics associate with the geochemical processes

Mukesh Kulsreshath , Arnaud Stolz , Philippe Lefaucheux , Lionel Mercury , Remi Dussart
French symposium on Emerging Technologies for Micronanofabrication, Nov 2019, Grenoble, France
Poster de conférence hal-02479390 v1

Neutral gas temperature in silicon based DC MHCD operated in various gases near atmospheric pressure

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Goran Sretenovic , Volker Schulz-von Der Gathen et al.
International Workshop on Microplasmas - IWM 10, May 2019, Kyoto, Japan
Poster de conférence hal-02189151 v1

The role of SiF4 physisorption in silicon cryoetching

Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Christophe Cardinaud et al.
Plasma Thin Film International Union Meeting, Sep 2019, Antibes, France
Poster de conférence hal-02311339 v1

Robust atmospheric pressure plasma source fabricated by microfabrication techniques

Ronan Michaud , Arnaud Stolz , Sylvain Iséni , Olivier Aubry , Philippe Lefaucheux et al.
Journées Nationales sur les Technologies Emergentes (JNTE19), Nov 2019, Grenoble, France
Poster de conférence hal-02291720 v1

Analysis of mechanisms involved in cryogenic ALE

Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart , Kumiko Yamazaki et al.
19th International Conference on Atomic Layer Deposition - 6th International Atomic Layer Etching Workshop, Jul 2019, Seattle, France
Poster de conférence hal-02311314 v1
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Spectroscopic study of the neutral gas temperature of silicon based DC MHCD in various gases close to atmospheric pressure

Sylvain Iséni , Ronan Michaud , Philippe Lefaucheux , Volker Schulz-von Der Gathen , Goran B Sretenovic et al.
13th Frontiers in Low-Temperature Plasma Diagnostics, May 2019, Baf Honnef, Germany. 2019
Poster de conférence hal-02131666 v1

Optimisation et packaging de microplasmas sur silicium

Ronan Michaud , Arnaud Stolz , Olivier Aubry , Philippe Lefaucheux , Remi Dussart
Colloque de l'UMI-LN2, Jul 2018, Autrans, France
Poster de conférence hal-01903397 v1

INTRODUCTION AU PROCÉDÉ DE GRAVURE CRYOGÉNIQUE DU SILICIUM

Gaëlle Antoun , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart
15e Congrès de la Société Française de Physique Division Plasmas, Jun 2018, Bordeaux, France
Poster de conférence hal-02311219 v1

Cryogenic ALE of silicon oxide

Nicolas Holtzer , Thomas Tillocher , Philippe Lefaucheux , Remi Dussart
Plasma Etch and Strip in Microtechnology, Oct 2017, Leuven, Belgium
Poster de conférence hal-02306057 v1

Silicon micromachining at cryogenic temperature

Thomas Tillocher , Philippe Lefaucheux , Mohamed Boufnichel , Remi Dussart
Design, Test, Integration and Packaging of MEMS/MOEMS 2017 (DTIP17), May 2017, Bordeaux, France
Poster de conférence hal-01561233 v1

Titanium microstructuring for implantable components

Edouard Laudrel , Thomas Tillocher , Yannick Méric , Philippe Lefaucheux , Marion Woytasik et al.
Design, Test, Integration and Packaging of MEMS/MOEMS, May 2017, Bordeaux, France
Poster de conférence hal-01561245 v1

Time resolved investigation of rotational temperature of molecular nitrogen in micro-plasma arrays

Sebastian Dzikowski , M Sifft , Ronan Michaud , Remi Dussart , V Schulz-von Der Gathen
9th International Worksop on Microplasmas, Jun 2017, Garmisch Partenkirchen, Germany
Poster de conférence hal-01577608 v1

Advance in low-k cryogenic etching of porous organoscilicate : Investigation of a new gas with higher boiling point Organic (HBPO) and comparison with C4F8

Floriane Leroy , Nataniel Brochu , Romain Chanson , Remi Dussart , Thomas Tillocher et al.
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France
Poster de conférence hal-01344722 v1

Cryogenic etching of silicon with SF6/O2: a computational and experimental study

Stefan Tinck , Erik Neyts , Thomas Tillocher , Remi Dussart , Annemie Bogaerts
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France
Poster de conférence hal-01344725 v1

Deep silicon etching: STiGer vs. BOSCH

Chengkun Tu , Ying Cui , Remi Dussart , Thomas Tillocher , Philippe Lefaucheux
Plasma Etch and Strip in Microtechnology, May 2016, Grenoble, France
Poster de conférence hal-01344704 v1

Enhanced reproducibility of SiO2 atomic layer etching by addition of O2 steps

Thomas Tillocher , Remi Dussart , Nicolas Holtzer , Philippe Lefaucheux
International Symposium of Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan
Poster de conférence hal-01561230 v1

Chlorine-based plasma deep etching of bulk titanium

Edouard Laudrel , Thomas Tillocher , Yannick Méric , Philippe Lefaucheux , Bertrand Boutaud et al.
International Symposium on Dry Process 2016 (DPS2016), Nov 2016, Sapporo, Japan
Poster de conférence hal-01561222 v1

Near Atmospheric Pressure Etching of Silicon by Microplasma

Valentin Felix , Vincent Ah-Leung , Judith Golda , Philippe Lefaucheux , Olivier Aubry et al.
International workshop on microplasmas, May 2015, Newark, France
Poster de conférence hal-01166020 v1

On the relationship between the energy flux at the substrate surface and the phase constitution of reactively magnetron sputtered titanium dioxide thin films

Stephanos Konstantinidis , Pierre-Antoine Cormier , Anne-Lise Thomann , Remi Dussart , Nadjib Semmar et al.
14th International Conference on Plasma Surface Engineering PSE 2014 , Sep 2014, Garmisch-Partenkirchen, Germany
Poster de conférence hal-01289438 v1

Détermination de l'énergie transférée aux surfaces lors de la modification de matériaux par procédés plasmas basse pression

Pierre-Antoine Cormier , Anne-Lise Thomann , Nadjib Semmar , Remi Dussart , Dolique Vincent et al.
12ème congrès de la division plasma de la SFP , May 2012, Orléans, France
Poster de conférence hal-01288927 v1

Direct energy influx measurement in reactive magnetron sputtering

Pierre-Antoine Cormier , Dolique Vincent , Anne-Lise Thomann , Jacky Mathias , Balharmi A. et al.
Reactive sputter deposition RSD 2011, Dec 2011, Linköping, Sweden
Poster de conférence hal-01288906 v1

A Heat Flux Microsensor for Direct Measurements in Plasma Surface Interactions

Remi Dussart , Anne-Lise Thomann , Nadjib Semmar
Igor Minin. Microsensors, Intech, pp.87, 2011, 978-953-307-170-1
Chapitre d'ouvrage hal-00707968 v1

Un capteur de flux d'énergie dans les plasmas

Anne Lise Thomann , Nadjib Semmar , Rémi Dussart , Larbi Bedra , Jacky Mathias et al.
MRCT CNRS. Plasmas Froids : Systèmes d'analyse, Modélisation et Rayonnement, Presses imprimerie Saint-Etienne, pp.97-120, 2009
Chapitre d'ouvrage hal-00443857 v1