|
Initiation mechanism of arcing generated in RF capacitively coupled plasma
Chulhee Cho
,
Sijun Kim
,
Minsu Choi
,
Youngseok Lee
,
Inho Seong
et al.
Article dans une revue
hal-04809216
v1
|
|
A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge
Inho Seong
,
Sijun Kim
,
Woobeen Lee
,
Youngseok Lee
,
Chulhee Cho
et al.
Article dans une revue
hal-04809218
v1
|
|
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process
Si-Jun Kim
,
Min-Su Choi
,
Sang-Ho Lee
,
Won-Nyoung Jeong
,
Young-Seok Lee
et al.
Article dans une revue
hal-04809193
v1
|
|
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled
Wonnyoung Jeong
,
Sijun Kim
,
Youngseok Lee
,
Chulhee Cho
,
Inho Seong
et al.
Article dans une revue
hal-04809204
v1
|
|
On the Quenching of Electron Temperature in Inductively Coupled Plasma
Inho Seong
,
Si-Jun Kim
,
Youngseok Lee
,
Chulhee Cho
,
Wonnyoung Jeong
et al.
Article dans une revue
hal-04809201
v1
|
|
Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma
Si-Jun Kim
,
Won-Nyoung Jeong
,
Young-Seok Lee
,
You-Bin Seol
,
Chul-Hee Cho
et al.
Article dans une revue
hal-04809213
v1
|
|
Computational Analysis on Self-Resonance Frequency of Solenoid and Planar Inductor
Min-Su Choi
,
Si-Jun Kim
,
Young-Seok Lee
,
Chul-Hee Cho
,
In-Ho Seong
et al.
Article dans une revue
hal-04809199
v1
|
|
Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe
Si-Jun Kim
,
Youngseok Lee
,
Chulhee Cho
,
Inho Seong
,
Wonnyoung Jeong
et al.
Article dans une revue
hal-04809192
v1
|
|
Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma
Inho Seong
,
Sijun Kim
,
Minsu Choi
,
Woobeen Lee
,
Wonnyoung Jeong
et al.
Article dans une revue
hal-04809210
v1
|
|
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction
Minsu Choi
,
Youngseok Lee
,
Yebin You
,
Chulhee Cho
,
Wonnyoung Jeong
et al.
Article dans une revue
hal-04809206
v1
|
|
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method
Chulhee Cho
,
Sijun Kim
,
Youngseok Lee
,
Inho Seong
,
Wonnyoung Jeong
et al.
Article dans une revue
hal-04809197
v1
|
|
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2
Youngseok Lee
,
Inho Seong
,
Jangjae Lee
,
Sangho Lee
,
Chulhee Cho
et al.
Article dans une revue
hal-04809147
v1
|
|
Plasma Treatment Mechanism in Si–SiO 2 Direct Wafer Bonding
Youngseok Lee
,
Yebin You
,
Chulhee Cho
,
Sijun Kim
,
Jangjae Lee
et al.
Article dans une revue
hal-04809182
v1
|
|
Purgeless atomic layer etching of SiO 2
Y Lee
,
S Kim
,
J Lee
,
C Cho
,
I Seong
et al.
Article dans une revue
hal-04809154
v1
|
|
Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis
Si-Jun Kim
,
Young-Seok Lee
,
Chul-Hee Cho
,
Min-Su Choi
,
In-Ho Seong
et al.
Article dans une revue
hal-04809190
v1
|
|
An electrostatic model of the cutoff probe
Si-Jun Kim
,
Dae-Woong Kim
,
Jang-Jae Lee
,
Young-Seok Lee
,
Chul-Hee Cho
et al.
Article dans une revue
hal-04809151
v1
|
|
Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
Youngseok Lee
,
Heejung Yeom
,
Daehan Choi
,
Sijun Kim
,
Jangjae Lee
et al.
Article dans une revue
hal-04809185
v1
|
|
Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing
Youngseok Lee
,
Yebin You
,
Chulhee Cho
,
Sijun Kim
,
Jangjae Lee
et al.
Article dans une revue
hal-04809172
v1
|
|
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation
Si-Jun Kim
,
In-Ho Seong
,
Young-Seok Lee
,
Chul-Hee Cho
,
Won-Nyoung Jeong
et al.
Article dans une revue
hal-04809157
v1
|
|
Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe
Si-Jun Kim
,
Jang-Jae Lee
,
Young-Seok Lee
,
Chul-Hee Cho
,
Shin-Jae You
Article dans une revue
hal-04809146
v1
|
|
Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma
Ye-Bin You
,
Young-Seok Lee
,
Si-Jun Kim
,
Chul-Hee Cho
,
In-Ho Seong
et al.
Article dans une revue
hal-04809180
v1
|
|
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma
Inho Seong
,
Jinho Lee
,
Sijun Kim
,
Youngseok Lee
,
Chulhee Cho
et al.
Article dans une revue
hal-04809188
v1
|
|
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath
Inho Seong
,
Sijun Kim
,
Youngseok Lee
,
Chulhee Cho
,
Jangjae Lee
et al.
Article dans une revue
hal-04809163
v1
|
|
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics
Si-Jun Kim
,
Sang-Ho Lee
,
Ye-Bin You
,
Young-Seok Lee
,
In-Ho Seong
et al.
Article dans une revue
hal-04809156
v1
|
|
Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma
Chulhee Cho
,
Sijun Kim
,
Youngseok Lee
,
Wonnyoung Jeong
,
Inho Seong
et al.
Article dans une revue
hal-04809167
v1
|
|
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2
Youngseok Lee
,
Sijun Kim
,
Jangjae Lee
,
Chulhee Cho
,
Inho Seong
et al.
Article dans une revue
hal-04809158
v1
|
|
A Quantification Method in Quadrupole Mass Spectrometer Measurement
Youngseok Lee
,
Sanghyeop Oh
,
Jangjae Lee
,
Chulhee Cho
,
Sijun Kim
et al.
Article dans une revue
hal-04809136
v1
|
|
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
Chulhee Cho
,
Kwangho You
,
Sijun Kim
,
Youngseok Lee
,
Jangjae Lee
et al.
Article dans une revue
hal-04809143
v1
|
|
Finding the optimum design of the planar cutoff probe through a computational study
S. Kim
,
J. Lee
,
Y. Lee
,
D. Kim
,
S. You
Article dans une revue
hal-04809133
v1
|
|
Characterization of SiO 2 Over Poly-Si Mask Etching in Ar/C 4 F 8 Capacitively Coupled Plasma
In Ho Seong
,
Jang Jae Lee
,
Chul Hee Cho
,
Yeong Seok Lee
,
Si Jun Kim
et al.
Article dans une revue
hal-04809150
v1
|
|
Mass Filter Characteristic and Design Role of Quadrupole Mass Spectrometer for Radical Measurement in Low-pressure Plasmas
Hee Jung Yeom
,
Jang Jae Lee
,
Si Jun Kim
,
Young Seok Lee
,
Chul Hee Cho
et al.
Article dans une revue
hal-04809109
v1
|
|
Experimental Study of Argon and Helium Dielectric Barrier Discharge with Coplanar Electrodes at Intermediate Pressure for Reducing Radar Cross Section
Jang Jae Lee
,
Si Jun Kim
,
Young Seok Lee
,
Chul Hee Cho
,
Min Su Choi
et al.
Article dans une revue
hal-04809121
v1
|
|
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes
Si Jun Kim
,
Jang Jae Lee
,
Young Seok Lee
,
Hee Jung Yeom
,
Hyo Chang Lee
et al.
Article dans une revue
hal-04809117
v1
|
|
Effect of an inhomogeneous electron density profile on the transmission microwave frequency spectrum of the cutoff probe
S Kim
,
J Lee
,
Y Lee
,
D Kim
,
S You
Article dans une revue
hal-04809126
v1
|
|
A simple model of solenoidal inductively coupled plasma sources considering finite size
J. Lee
,
S. Kim
,
K. Kim
,
Y. Lee
,
S. You
Article dans une revue
hal-04809113
v1
|
|
Computational study on influence of RF shielding box on inductance of coil
S J Kim
,
J J Lee
,
Y S Lee
,
J H Kim
,
S J You
Article dans une revue
hal-04809098
v1
|
|
Analysis of Impedance of Microwave Parallel Stripline Resonator Discharge Source for Application of Microplasma System at Atmospheric Pressure
Thanh Hai Tran
,
Si Jun Kim
,
Shin Jae You
Article dans une revue
hal-04809105
v1
|
|
Development of High-precision RF Sensor
Kwang Ki Kim
,
Jang Jae Lee
,
Si Jun Kim
,
Chul Hee Cho
,
Sung Wan Yoo
et al.
Article dans une revue
hal-04809103
v1
|