Sijun Kim

38
Documents

Publications

Publications

Initiation mechanism of arcing generated in RF capacitively coupled plasma

Chulhee Cho , Sijun Kim , Minsu Choi , Youngseok Lee , Inho Seong et al.
Physica Scripta, 2024, 99 (5), pp.055603. ⟨10.1088/1402-4896/ad3586⟩
Article dans une revue hal-04809216 v1

A unified global model accompanied with a voltage and current sensor for low-pressure capacitively coupled RF discharge

Inho Seong , Sijun Kim , Woobeen Lee , Youngseok Lee , Chulhee Cho et al.
Applied Physics Express, 2024, 17 (9), pp.096001. ⟨10.35848/1882-0786/ad7667⟩
Article dans une revue hal-04809218 v1

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process

Si-Jun Kim , Min-Su Choi , Sang-Ho Lee , Won-Nyoung Jeong , Young-Seok Lee et al.
Sensors, 2023, 23 (5), pp.2521. ⟨10.3390/s23052521⟩
Article dans une revue hal-04809193 v1

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled

Wonnyoung Jeong , Sijun Kim , Youngseok Lee , Chulhee Cho , Inho Seong et al.
Materials, 2023, 16 (10), pp.3820. ⟨10.3390/ma16103820⟩
Article dans une revue hal-04809204 v1

On the Quenching of Electron Temperature in Inductively Coupled Plasma

Inho Seong , Si-Jun Kim , Youngseok Lee , Chulhee Cho , Wonnyoung Jeong et al.
Materials, 2023, 16 (8), pp.3219. ⟨10.3390/ma16083219⟩
Article dans une revue hal-04809201 v1

Computational Study on the Parallel Double-Curling Probe for Multi-Site Electron Density Measurement in Low-Temperature Plasma

Si-Jun Kim , Won-Nyoung Jeong , Young-Seok Lee , You-Bin Seol , Chul-Hee Cho et al.
Applied Science and Convergence Technology, 2023, 32 (5), pp.127-133. ⟨10.5757/ASCT.2023.32.5.127⟩
Article dans une revue hal-04809213 v1

Computational Analysis on Self-Resonance Frequency of Solenoid and Planar Inductor

Min-Su Choi , Si-Jun Kim , Young-Seok Lee , Chul-Hee Cho , In-Ho Seong et al.
Applied Science and Convergence Technology, 2023, 32 (2), pp.54-57. ⟨10.5757/ASCT.2023.32.2.54⟩
Article dans une revue hal-04809199 v1

Analysis on crossing frequency in transmission microwave frequency spectrum of the cutoff probe

Si-Jun Kim , Youngseok Lee , Chulhee Cho , Inho Seong , Wonnyoung Jeong et al.
Physics of Plasmas, 2023, 30 (2), ⟨10.1063/5.0140333⟩
Article dans une revue hal-04809192 v1

Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma

Inho Seong , Sijun Kim , Minsu Choi , Woobeen Lee , Wonnyoung Jeong et al.
Materials, 2023, 16 (17), pp.5746. ⟨10.3390/ma16175746⟩
Article dans une revue hal-04809210 v1

Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction

Minsu Choi , Youngseok Lee , Yebin You , Chulhee Cho , Wonnyoung Jeong et al.
Materials, 2023, 16 (16), pp.5624. ⟨10.3390/ma16165624⟩
Article dans une revue hal-04809206 v1

Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method

Chulhee Cho , Sijun Kim , Youngseok Lee , Inho Seong , Wonnyoung Jeong et al.
Materials, 2023, 16 (7), pp.2762. ⟨10.3390/ma16072762⟩
Article dans une revue hal-04809197 v1

Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2

Youngseok Lee , Inho Seong , Jangjae Lee , Sangho Lee , Chulhee Cho et al.
Journal of Vacuum Science & Technology A, 2022, 40 (1), ⟨10.1116/6.0001466⟩
Article dans une revue hal-04809147 v1

Plasma Treatment Mechanism in Si–SiO 2 Direct Wafer Bonding

Youngseok Lee , Yebin You , Chulhee Cho , Sijun Kim , Jangjae Lee et al.
Science of advanced materials, 2022, 14 (7), pp.1265-1270. ⟨10.1166/sam.2022.4313⟩
Article dans une revue hal-04809182 v1

Purgeless atomic layer etching of SiO 2

Y Lee , S Kim , J Lee , C Cho , I Seong et al.
Journal of Physics D: Applied Physics, 2022, 55 (36), pp.365203. ⟨10.1088/1361-6463/ac7482⟩
Article dans une revue hal-04809154 v1

Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis

Si-Jun Kim , Young-Seok Lee , Chul-Hee Cho , Min-Su Choi , In-Ho Seong et al.
Scientific Reports, 2022, 12 (1), pp.20976. ⟨10.1038/s41598-022-25550-2⟩
Article dans une revue hal-04809190 v1

An electrostatic model of the cutoff probe

Si-Jun Kim , Dae-Woong Kim , Jang-Jae Lee , Young-Seok Lee , Chul-Hee Cho et al.
Current Applied Physics, 2022, 39, pp.289-295. ⟨10.1016/j.cap.2022.05.011⟩
Article dans une revue hal-04809151 v1

Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe

Youngseok Lee , Heejung Yeom , Daehan Choi , Sijun Kim , Jangjae Lee et al.
Nanomaterials, 2022, 12 (21), pp.3828. ⟨10.3390/nano12213828⟩
Article dans une revue hal-04809185 v1

Comprehensive Assessments in Bonding Energy of Plasma Assisted Si-SiO2 Direct Wafer Bonding after Low Temperature Rapid Thermal Annealing

Youngseok Lee , Yebin You , Chulhee Cho , Sijun Kim , Jangjae Lee et al.
Micromachines, 2022, 13 (11), pp.1856. ⟨10.3390/mi13111856⟩
Article dans une revue hal-04809172 v1

Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation

Si-Jun Kim , In-Ho Seong , Young-Seok Lee , Chul-Hee Cho , Won-Nyoung Jeong et al.
Sensors, 2022, 22 (15), pp.5871. ⟨10.3390/s22155871⟩
Article dans une revue hal-04809157 v1

Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe

Si-Jun Kim , Jang-Jae Lee , Young-Seok Lee , Chul-Hee Cho , Shin-Jae You
Sensors, 2022, 22 (3), pp.1291. ⟨10.3390/s22031291⟩
Article dans une revue hal-04809146 v1

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

Ye-Bin You , Young-Seok Lee , Si-Jun Kim , Chul-Hee Cho , In-Ho Seong et al.
Nanomaterials, 2022, 12 (21), pp.3798. ⟨10.3390/nano12213798⟩
Article dans une revue hal-04809180 v1

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma

Inho Seong , Jinho Lee , Sijun Kim , Youngseok Lee , Chulhee Cho et al.
Nanomaterials, 2022, 12 (22), pp.3963. ⟨10.3390/nano12223963⟩
Article dans une revue hal-04809188 v1

Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath

Inho Seong , Sijun Kim , Youngseok Lee , Chulhee Cho , Jangjae Lee et al.
Sensors, 2022, 22 (16), pp.6254. ⟨10.3390/s22166254⟩
Article dans une revue hal-04809163 v1

Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics

Si-Jun Kim , Sang-Ho Lee , Ye-Bin You , Young-Seok Lee , In-Ho Seong et al.
Sensors, 2022, 22 (15), pp.5487. ⟨10.3390/s22155487⟩
Article dans une revue hal-04809156 v1

Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma

Chulhee Cho , Sijun Kim , Youngseok Lee , Wonnyoung Jeong , Inho Seong et al.
Sensors, 2022, 22 (17), pp.6589. ⟨10.3390/s22176589⟩
Article dans une revue hal-04809167 v1

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2

Youngseok Lee , Sijun Kim , Jangjae Lee , Chulhee Cho , Inho Seong et al.
Sensors, 2022, 22 (16), pp.6029. ⟨10.3390/s22166029⟩
Article dans une revue hal-04809158 v1

A Quantification Method in Quadrupole Mass Spectrometer Measurement

Youngseok Lee , Sanghyeop Oh , Jangjae Lee , Chulhee Cho , Sijun Kim et al.
Applied Science and Convergence Technology, 2021, 30 (2), pp.50-53. ⟨10.5757/ASCT.2021.30.2.50⟩
Article dans une revue hal-04809136 v1

Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas

Chulhee Cho , Kwangho You , Sijun Kim , Youngseok Lee , Jangjae Lee et al.
Materials, 2021, 14 (17), pp.5036. ⟨10.3390/ma14175036⟩
Article dans une revue hal-04809143 v1

Finding the optimum design of the planar cutoff probe through a computational study

S. Kim , J. Lee , Y. Lee , D. Kim , S. You
AIP Advances, 2021, 11 (2), ⟨10.1063/5.0033222⟩
Article dans une revue hal-04809133 v1

Characterization of SiO 2 Over Poly-Si Mask Etching in Ar/C 4 F 8 Capacitively Coupled Plasma

In Ho Seong , Jang Jae Lee , Chul Hee Cho , Yeong Seok Lee , Si Jun Kim et al.
Applied Science and Convergence Technology, 2021, 30 (6), pp.176-182. ⟨10.5757/ASCT.2021.30.6.176⟩
Article dans une revue hal-04809150 v1

Mass Filter Characteristic and Design Role of Quadrupole Mass Spectrometer for Radical Measurement in Low-pressure Plasmas

Hee Jung Yeom , Jang Jae Lee , Si Jun Kim , Young Seok Lee , Chul Hee Cho et al.
Applied Science and Convergence Technology, 2020, 29 (4), pp.77-81. ⟨10.5757/ASCT.2020.29.4.077⟩
Article dans une revue hal-04809109 v1

Experimental Study of Argon and Helium Dielectric Barrier Discharge with Coplanar Electrodes at Intermediate Pressure for Reducing Radar Cross Section

Jang Jae Lee , Si Jun Kim , Young Seok Lee , Chul Hee Cho , Min Su Choi et al.
Applied Science and Convergence Technology, 2020, 29 (6), pp.170-175. ⟨10.5757/ASCT.2020.29.6.170⟩
Article dans une revue hal-04809121 v1

Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes

Si Jun Kim , Jang Jae Lee , Young Seok Lee , Hee Jung Yeom , Hyo Chang Lee et al.
Applied Sciences, 2020, 10 (20), pp.7066. ⟨10.3390/app10207066⟩
Article dans une revue hal-04809117 v1

Effect of an inhomogeneous electron density profile on the transmission microwave frequency spectrum of the cutoff probe

S Kim , J Lee , Y Lee , D Kim , S You
Plasma Sources Science and Technology, 2020, 29 (12), pp.125014. ⟨10.1088/1361-6595/abc816⟩
Article dans une revue hal-04809126 v1

A simple model of solenoidal inductively coupled plasma sources considering finite size

J. Lee , S. Kim , K. Kim , Y. Lee , S. You
AIP Advances, 2020, 10 (3), ⟨10.1063/1.5133862⟩
Article dans une revue hal-04809113 v1

Computational study on influence of RF shielding box on inductance of coil

S J Kim , J J Lee , Y S Lee , J H Kim , S J You
Plasma Science and Technology, 2019, 21 (6), pp.064004. ⟨10.1088/2058-6272/ab0d42⟩
Article dans une revue hal-04809098 v1

Analysis of Impedance of Microwave Parallel Stripline Resonator Discharge Source for Application of Microplasma System at Atmospheric Pressure

Thanh Hai Tran , Si Jun Kim , Shin Jae You
Applied Science and Convergence Technology, 2019, 28 (4), pp.113-121. ⟨10.5757/ASCT.2019.28.4.113⟩
Article dans une revue hal-04809105 v1

Development of High-precision RF Sensor

Kwang Ki Kim , Jang Jae Lee , Si Jun Kim , Chul Hee Cho , Sung Wan Yoo et al.
Applied Science and Convergence Technology, 2019, 28 (4), pp.88-92. ⟨10.5757/ASCT.2019.28.4.88⟩
Article dans une revue hal-04809103 v1