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Investigation of picosecond laser pulse properties using a streak camera and their utilization for TALIF studies in a microwave plasma torch
Dimitrios Stefas
,
Abdoulaye Constant Siby
,
Yanis Agha
,
Laurent Invernizzi
,
C.Y. Duluard
AIAA Science and Technology Forum and Exposition (AIAA SciTech Forum), Jan 2024, Orlando (Florida), United States. ⟨10.2514/6.2024-0806⟩
Communication dans un congrès
hal-04230342v1
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Characterization of a helium micro-plasma jet by means of ps-TALIF and a streak camera
Kristaq Gazeli
,
L Invernizzi
,
Charalambos Anastassiou
,
Joachim Franzke
,
Corinne y Duluard
Plasma Thin Film International Union Meeting (PLATHINIUM), Sep 2023, Antibes (France), France
Communication dans un congrès
hal-04228751v1
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Determination of absolute atomic hydrogen densities by TALIF in a H2/CH4 microwave plasma at high power and high pressure
M. Wartel
,
C. Duluard
,
X. Aubert
,
C. Rond
,
A. Gicquel
9th International Workshop Strong Microwaves and Terahertz Waves, Jul 2014, Volga river, Russia
Communication dans un congrès
hal-01056888v1
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Determination of absolute atomic hydrogen densities by Two-Photon Absorption Laser Induced Fluorescence in a H2/CH4 Microwave Plasma at High Pressure and High Microwave Power
M. Wartel
,
C. Duluard
,
X. Aubert
,
C. Rond
,
A. Gicquel
Gas Discharge 2014, Jul 2014, Orléans, France. pp.718-721
Communication dans un congrès
hal-01056857v1
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Detection of Hydrogen Atoms by Two Photons Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma
M. Wartel
,
C. Rond
,
N. Derkaoui
,
C. Duluard
,
A. Gicquel
The 10th Frontiers in Low Temperature Plasma Diagnostics, Apr 2013, Kerkrade, Netherlands
Communication dans un congrès
hal-01056898v1
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Atomic Hydrogen density and temperature measurements by Two-Photon Absorption Laser Induced Fluorescence in a High Power Density H2/CH4 Microwave Plasma
M. Wartel
,
C. Duluard
,
C. Rond
,
N. Derkaoui
,
A. Gicquel
The XXXI edition of the International Conference on Phenomena in Ionized Gases (ICPIG) 2013, Jul 2013, Grenade, Spain
Communication dans un congrès
hal-01056903v1
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Optical diagnostics and mass spectrometry on the afterglow of an atmospheric pressure Ar/O2 radiofrequency plasma used for polymer surface treatment
C.Y. Duluard
,
Thierry Dufour
,
J Hubert
,
F Reniers
30th ICPIG, Aug 2011, Belfast, Ireland. pp.C.10
Communication dans un congrès
hal-01303169v2
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STiGer cryoetching process of silicon: passivation mechanisms, enhanced robustness and performances
Jeremy Pereira
,
Hao Jiang
,
Laurianne E. Pichon
,
Remi Dussart
,
Corinne Y. Duluard
Plasma Etch and Strip in Microelectronics 2nd International Workshop, Feb 2009, Louvain, Belgium
Communication dans un congrès
hal-00444370v1
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A comparative study on O2 and SO2 passivating chemistry for silicon deep cryogenic etching
Corinne Y. Duluard
,
Thomas Tillocher
,
Laurianne E. Pichon
,
Remi Dussart
,
Philippe Lefaucheux
AVS 53rd International Symposium & Exhibition, Nov 2009, San Francisco, United States
Communication dans un congrès
hal-00442683v1
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Study of SiOxFy passivation layer deposited in SiF4/O2 ICP discharge
Jeremy Pereira
,
Laurianne E. Pichon
,
Remi Dussart
,
Corinne Y. Duluard
,
El-Houcine Oubensaid
AVS 55th International Symposium & Exhibition, Oct 2008, Boston, United States
Communication dans un congrès
hal-00444361v1
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SiOxFy film growth in SiF4/O2 plasma at cryogenic temperature
Laurianne E. Pichon
,
Corinne Y. Duluard
,
Thomas Tillocher
,
Remi Dussart
,
Philippe Lefaucheux
18th International Symposium on Plasma Chemistry, Aug 2007, Kyoto, Japan. pp.30P-105
Communication dans un congrès
hal-00444241v1
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Enhanced robustness of the cryogenic process for silicon deep etching
Remi Dussart
,
Thomas Tillocher
,
El-Houcine Oubensaid
,
Philippe Lefaucheux
,
Pierre Ranson
Micro- and Nano-Engineering, Sep 2007, Copenhague, Denmark
Communication dans un congrès
hal-00444248v1
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Cryoetching of silicon for MEMS and microelectronic components
Remi Dussart
,
Philippe Lefaucheux
,
Pierre Ranson
,
Laurianne E. Pichon
,
Corinne Y. Duluard
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès
hal-00442662v1
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A robust passivation-enhanced cryogenic process used for deep silicon etching
Laurianne E. Pichon
,
El-Houcine Oubensaid
,
Corinne Y. Duluard
,
Remi Dussart
,
Philippe Lefaucheux
AVS 54th International Symposium & Exhibition, Oct 2007, Seattle, United States
Communication dans un congrès
hal-00444264v1
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A study on SF6/SiCl4 inductively coupled plasma by mass spectrometry and optical emission spectroscopy
Corinne Y. Duluard
,
Remi Dussart
,
Laurianne E. Pichon
,
Philippe Lefaucheux
,
Michel Puech
16th International Colloquium on Plasma Processes, Jun 2007, France
Communication dans un congrès
hal-00444208v1
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A new generation of cryogenic processes for silicon deep etching
Remi Dussart
,
Philippe Lefaucheux
,
Pierre Ranson
,
Laurianne E. Pichon
,
Corinne Y. Duluard
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès
hal-00442668v1
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SiOxFy film deposited by SiF4/O2 plasma on silicon at low temperature
Remi Dussart
,
Laurianne E. Pichon
,
Corinne Y. Duluard
,
Philippe Lefaucheux
,
Mohamed Boufnichel
16th International Colloquium on Plasma Processes, Jun 2007, Toulouse, France
Communication dans un congrès
hal-00444198v1
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Neutral production in SF6/SiCl4 inductively coupled plasmas
Corinne Y. Duluard
,
Remi Dussart
,
Laurianne E. Pichon
,
El-Houcine Oubensaid
,
Philippe Lefaucheux
60th Gaseous Electronics Conference, Oct 2007, Arlington, United States
Communication dans un congrès
hal-00444252v1
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